GB1396436A - Process for the electrolytic production of hard-magnetic layers - Google Patents
Process for the electrolytic production of hard-magnetic layersInfo
- Publication number
- GB1396436A GB1396436A GB96773A GB96773A GB1396436A GB 1396436 A GB1396436 A GB 1396436A GB 96773 A GB96773 A GB 96773A GB 96773 A GB96773 A GB 96773A GB 1396436 A GB1396436 A GB 1396436A
- Authority
- GB
- United Kingdom
- Prior art keywords
- current density
- magnetic layers
- density during
- hard
- amps
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/615—Microstructure of the layers, e.g. mixed structure
- C25D5/617—Crystalline layers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Power Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
Abstract
1396436 Electro-depositing magnetic layers AKADEMIE der WISSENSCHAFTEN der DDR 8 Jan 1973 967/73 Heading C7B Hard-magnetic metallic layers are produced on metallized non-rigid substrates drawn through an electrolysis bath at constant speed using electrolytes containing at least one salt of the metal or metals to be deposited and 2-30 grams/litre of disodium dihydrogen ethylenediaminetetraacetate, the solution having a pH of 2À5-6À0. A squarewave impulse current is used for electrolysis with a frequency of 2-10 Hz, the amplitude alternating from + to -, and the duration of a - part of the wave being 2-4 times the duration of the + part, the cathodic current density during the - part being at least 10 amps/dm<SP>2</SP> and the overall cathodically effective current density being 0À5-7 amps/dm<SP>2</SP> the anodic current density during a + part being related to the cathodic current density during a - part by a given formula. Reference is made to the production of magnetic layers of Co-P, Co-Ni-P, Co-W and Co-Ni-W.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB96773A GB1396436A (en) | 1973-01-08 | 1973-01-08 | Process for the electrolytic production of hard-magnetic layers |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB96773A GB1396436A (en) | 1973-01-08 | 1973-01-08 | Process for the electrolytic production of hard-magnetic layers |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1396436A true GB1396436A (en) | 1975-06-04 |
Family
ID=9713674
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB96773A Expired GB1396436A (en) | 1973-01-08 | 1973-01-08 | Process for the electrolytic production of hard-magnetic layers |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1396436A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2371038A1 (en) * | 1976-11-15 | 1978-06-09 | Ibm | MAGNETIC RECORDING MEDIA AND THEIR MANUFACTURING PROCESS |
US4468293A (en) * | 1982-03-05 | 1984-08-28 | Olin Corporation | Electrochemical treatment of copper for improving its bond strength |
US4515671A (en) * | 1983-01-24 | 1985-05-07 | Olin Corporation | Electrochemical treatment of copper for improving its bond strength |
WO1997019206A1 (en) * | 1995-11-21 | 1997-05-29 | Atotech Deutschland Gmbh | Process for the electrolytic deposition of metal layers |
WO2006065220A1 (en) * | 2004-12-14 | 2006-06-22 | Polymer Kompositer I Göteborg Ab | Pulse-plating method and apparatus |
DE4225961C5 (en) * | 1992-08-06 | 2011-01-27 | Atotech Deutschland Gmbh | Apparatus for electroplating, in particular copper plating, flat plate or arched objects |
-
1973
- 1973-01-08 GB GB96773A patent/GB1396436A/en not_active Expired
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2371038A1 (en) * | 1976-11-15 | 1978-06-09 | Ibm | MAGNETIC RECORDING MEDIA AND THEIR MANUFACTURING PROCESS |
US4468293A (en) * | 1982-03-05 | 1984-08-28 | Olin Corporation | Electrochemical treatment of copper for improving its bond strength |
US4515671A (en) * | 1983-01-24 | 1985-05-07 | Olin Corporation | Electrochemical treatment of copper for improving its bond strength |
DE4225961C5 (en) * | 1992-08-06 | 2011-01-27 | Atotech Deutschland Gmbh | Apparatus for electroplating, in particular copper plating, flat plate or arched objects |
WO1997019206A1 (en) * | 1995-11-21 | 1997-05-29 | Atotech Deutschland Gmbh | Process for the electrolytic deposition of metal layers |
US6099711A (en) * | 1995-11-21 | 2000-08-08 | Atotech Deutschland Gmbh | Process for the electrolytic deposition of metal layers |
WO2006065220A1 (en) * | 2004-12-14 | 2006-06-22 | Polymer Kompositer I Göteborg Ab | Pulse-plating method and apparatus |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PLNP | Patent lapsed through nonpayment of renewal fees |