ES2140613T3 - Metodo de fabricacion de una matriz para producir discos opticos sin un disco maestro. - Google Patents

Metodo de fabricacion de una matriz para producir discos opticos sin un disco maestro.

Info

Publication number
ES2140613T3
ES2140613T3 ES95200328T ES95200328T ES2140613T3 ES 2140613 T3 ES2140613 T3 ES 2140613T3 ES 95200328 T ES95200328 T ES 95200328T ES 95200328 T ES95200328 T ES 95200328T ES 2140613 T3 ES2140613 T3 ES 2140613T3
Authority
ES
Spain
Prior art keywords
photoresist film
matrix
film
photoresist
unstructured
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES95200328T
Other languages
English (en)
Inventor
Maria Elizabet Reuhman-Huisken
Der Plaat Alex Thomas Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OD&ME BV
ODME International BV
Original Assignee
OD&ME BV
ODME International BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OD&ME BV, ODME International BV filed Critical OD&ME BV
Application granted granted Critical
Publication of ES2140613T3 publication Critical patent/ES2140613T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/263—Preparing and using a stamper, e.g. pressing or injection molding substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

LA INVENCION SE REFIERE A UN METODO PARA MANUFACTURAR UNA MATRIZ PARA LA PRODUCCION DE DISCOS OPTICOS APLICANDO UNA PELICULA FOTORRESISTENTE A UNA PLACA DE MATRIZ NO ESTRUCTURADA Y ESTRUCTURANDO LA PELICULA FOTORRESISTENTE MEDIANTE UNA EXPOSICION SELECTIVA Y REVELANDO DICHA PELICULA. CUANDO SE UTILIZA FOTORRESISTENCIA QUE ACTUA NEGATIVAMENTE, LA MATRIZ PUEDE SER GALVANIZADA SOBRE LA SUPERFICIE PROVISTA CON LA PELICULA FOTORRESISTENTE DESPUES DE ESTRUCTURAR LA PELICULA FOTORRESISTENTE. LA ESTRUCTURACION DE LA PELICULA FOTORRESISTENTE PUEDE COMPRENDER EL CALENTAMIENTO DE LA PELICULA FOTORRESISTENTE SELECTIVAMENTE EXPUESTA, LA EXPOSICION INTEGRAL DE LA PELICULA FOTORRESISTENTE ANTES DE SU REVELADO Y EL CALENTAMIENTO DE LA PELICULA FOTORRESISTENTE DESPUES DE SU REVELADO. LA PLACA DE MATRIZ NO ESTRUCTURADA PUEDE SER QUIMICAMENTE ATACADA, UTILIZANDO LA PELICULA FOTORRESISTENTE ESTRUCTURADA COMO MASCARA, DESPUES DE LO CUAL LA PELICULA FOTORRESISTENTE SE SEPARA PARA PRODUCIR LA MATRIZ. ANTES DE APLICAR LA PELICULA FOTORRESISTENTE A LA PLACA DE MATRIZ NO ESTRUCTURADA PUEDE APLICARSE UNA PELICULA DE METAL, HASTA UN GROSOR IGUAL A LA ALTURA DE LA ESTRUCTURA DESEADA EN LA MATRIZ. CUANDO SE UTILIZA FOTORRESISTENCIA QUE ACTUA POSITIVAMENTE, SE APLICA UNA PELICULA DE METAL A LA PLACA DE MATRIZ NO ESTRUCTURADA, UTILIZANDO LA PELICULA FOTORRESISTENTE ESTRUCTURA COMO MASCARA, DESPUES DE LO CUAL SE QUITA LA PELICULA FOTORRESISTENTE PARA PRODUCIR LA MATRIZ. DE ESTA FORMA PUEDE UTILIZARSE UN PROCESO DE LLENADO.
ES95200328T 1994-02-14 1995-02-10 Metodo de fabricacion de una matriz para producir discos opticos sin un disco maestro. Expired - Lifetime ES2140613T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL9400225A NL9400225A (nl) 1994-02-14 1994-02-14 Werkwijze voor het zonder tussenkomst van een master vervaardigen van een stamper voor het voortbrengen van optische schijven.

Publications (1)

Publication Number Publication Date
ES2140613T3 true ES2140613T3 (es) 2000-03-01

Family

ID=19863833

Family Applications (1)

Application Number Title Priority Date Filing Date
ES95200328T Expired - Lifetime ES2140613T3 (es) 1994-02-14 1995-02-10 Metodo de fabricacion de una matriz para producir discos opticos sin un disco maestro.

Country Status (12)

Country Link
US (1) US6159664A (es)
EP (1) EP0667608B1 (es)
JP (1) JP3636387B2 (es)
KR (1) KR100336105B1 (es)
CN (1) CN1056937C (es)
AT (1) ATE187010T1 (es)
DE (1) DE69513424T2 (es)
ES (1) ES2140613T3 (es)
HK (1) HK1003736A1 (es)
NL (1) NL9400225A (es)
SG (1) SG52782A1 (es)
TW (1) TW279978B (es)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19653078A1 (de) * 1996-12-19 1998-06-25 Trace Optical Leitstrukturen in optischen Speichermedien
SE9703479D0 (sv) * 1997-06-02 1997-09-25 Toolex Alpha Ab Stamper
SE9703480D0 (sv) * 1997-07-16 1997-09-25 Toolex Alpha Ab Stamper and method of manufacturing the same
NL1007216C2 (nl) 1997-10-07 1999-04-08 Od & Me Bv Werkwijze voor het vervaardigen van een stamper voor het voortbrengen van optische schijven, aldus verkregen stamper en optische schijf verkregen onder toepassing van een dergelijke stamper.
NL1009106C2 (nl) * 1998-05-08 1999-11-09 Od & Me Bv Werkwijze voor het vervaardigen van een stamper, stamper verkregen volgens een dergelijke werkwijze alsmede optische schijf verkregen onder toepassing van een dergelijke stamper.
DE19919764A1 (de) * 1999-04-29 2000-11-02 Innovators Ag Neuhausen Am Rhe Herstellung eienr Preßform für Compact Discs
JP3104699B1 (ja) * 1999-06-01 2000-10-30 株式会社ニコン 細溝付き成形基板の製造方法
FR2809532B1 (fr) * 2000-05-23 2003-09-26 St Microelectronics Sa Procede de fabrication de circuits semiconducteurs double face
NL1015524C2 (nl) * 2000-06-26 2001-12-28 Otb Group Bv Werkwijze ter vervaardiging van een substraat om te worden toegepast in een stampervervaardigingsproces, alsmede substraat verkregen volgens een dergelijke werkwijze.
JP2002096334A (ja) * 2000-09-25 2002-04-02 Nippon Columbia Co Ltd スタンパの製造方法
JP3592678B2 (ja) 2002-02-27 2004-11-24 松下電器産業株式会社 ブランク盤の製造方法とダイレクトスタンパーの製作方法
ITTO20011038A1 (it) * 2001-10-30 2003-04-30 St Microelectronics Srl Procedimento per la fabbricazione di una fetta semiconduttrice integrante dispositivi elettronici e una struttura per il disaccoppiamento el
CN100386807C (zh) * 2003-09-18 2008-05-07 周照耀 圆片上集成电路图案的制作方法及其应用
US20050151283A1 (en) * 2004-01-08 2005-07-14 Bajorek Christopher H. Method and apparatus for making a stamper for patterning CDs and DVDs
TWI298522B (en) * 2004-01-13 2008-07-01 Hon Hai Prec Ind Co Ltd A manufacturing method of a cavity
CN1300792C (zh) * 2004-03-15 2007-02-14 周照耀 信息记录薄膜材料及其制备方法
US20060115789A1 (en) * 2004-11-26 2006-06-01 Wishart Kenneth D Self-approximating intraoral
TW200903192A (en) * 2007-01-17 2009-01-16 Sony Corp Developing solution and method for production of finely patterned material

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3832176A (en) * 1973-04-06 1974-08-27 Eastman Kodak Co Novel photoresist article and process for its use
FR2278474A1 (fr) * 1974-07-16 1976-02-13 Thomson Brandt Procede de fabrication d'une matrice destinee a la duplication d'un enregistrement de signaux en videofrequence, et matrice ainsi obtenue
US4164754A (en) * 1974-07-16 1979-08-14 Thomson-Brandt Method of manufacturing a die designed to duplicate a video frequency signal recording
JPS57172548A (en) * 1981-04-17 1982-10-23 Toshiba Corp Original disk for medium for reproducing stored information
US4650735A (en) * 1982-10-14 1987-03-17 U.S. Philips Corporation Method of manufacturing a metal matrix and an intermediate product obtained in performing the method
JPS6045956A (ja) * 1983-08-20 1985-03-12 Dainippon Screen Mfg Co Ltd 光ディスク原盤作成方法
JPS60251537A (ja) * 1984-05-25 1985-12-12 Fujitsu Ltd 光デイスク用原盤の製造方法
JPS60256947A (ja) * 1984-06-01 1985-12-18 Hitachi Ltd スタンパ作製方法
US4724043A (en) * 1984-09-04 1988-02-09 International Business Machines Corporation Process for forming a master mold for optical storage disks
JPS6168746A (ja) * 1984-09-04 1986-04-09 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 光学記憶デイスクを製造するためのモ−ルド・インサ−トを形成する方法
US4729940A (en) * 1986-05-16 1988-03-08 Cbs Inc. Method of manufacturing master for optical information carrier
US5156936A (en) * 1989-09-19 1992-10-20 U.S. Philips Corporation Contact device for the photocathode of photoelectric tubes and manufacturing method
JP2585861B2 (ja) * 1990-11-30 1997-02-26 シャープ株式会社 光メモリ素子用フォトマスクの製造方法
JP2868682B2 (ja) * 1992-05-15 1999-03-10 シャープ株式会社 光ディスク
FR2701151B1 (fr) * 1993-02-03 1995-03-10 Digipress Sa Procédé de fabrication d'une matrice de pressage, notamment pour la réalisation de disques optiques, matrice de pressage obtenue par ce procédé et produit, tel que disque optique, obtenu à partir de cette matrice de pressage.
US5407787A (en) * 1993-04-14 1995-04-18 The United States Of America As Represented By The Secretary Of The Navy Process to fabricate thick coplanar microwave electrode structures

Also Published As

Publication number Publication date
JP3636387B2 (ja) 2005-04-06
KR100336105B1 (ko) 2002-11-27
KR950034137A (ko) 1995-12-26
SG52782A1 (en) 1998-09-28
US6159664A (en) 2000-12-12
EP0667608B1 (en) 1999-11-24
HK1003736A1 (en) 1998-11-06
CN1121240A (zh) 1996-04-24
DE69513424T2 (de) 2000-03-23
CN1056937C (zh) 2000-09-27
JPH07326077A (ja) 1995-12-12
EP0667608A1 (en) 1995-08-16
NL9400225A (nl) 1995-09-01
TW279978B (es) 1996-07-01
ATE187010T1 (de) 1999-12-15
DE69513424D1 (de) 1999-12-30

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