EP3508924B1 - Lichtempfindliche zusammensetzung zur hologrammaufzeichnung, hologrammaufzeichnungsmedium und hologramm - Google Patents

Lichtempfindliche zusammensetzung zur hologrammaufzeichnung, hologrammaufzeichnungsmedium und hologramm Download PDF

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Publication number
EP3508924B1
EP3508924B1 EP17846597.7A EP17846597A EP3508924B1 EP 3508924 B1 EP3508924 B1 EP 3508924B1 EP 17846597 A EP17846597 A EP 17846597A EP 3508924 B1 EP3508924 B1 EP 3508924B1
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Prior art keywords
hologram recording
monomer
group
hologram
photosensitive composition
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French (fr)
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EP3508924A4 (de
EP3508924A1 (de
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Hisaya HARA
Eri IGARASHI
Kenshiro Kawasaki
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Sony Group Corp
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Sony Group Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
    • C08F2/40—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation using retarding agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/2403—Layers; Shape, structure or physical properties thereof
    • G11B7/24035—Recording layers
    • G11B7/24044—Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions, e.g. volume storage
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/251—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials dispersed in an organic matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/14—Photoresist
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/30—Details of photosensitive recording material not otherwise provided for

Definitions

  • the present technology relates to a photosensitive composition for hologram recording, a hologram recording medium, and a hologram.
  • holograms are used in a wide variety of fields such as optical information processing, security, medical science, and three-dimensional image display. Holograms enable recording of large-capacity three-dimensional information associated with an object as optical information. That is why holograms are attracting attention as next-generation recording media, and research and development on holograms are now active.
  • Patent Document 1 discloses a photosensitive composition for volume hologram recording that includes a binder resin, a photopolymerizable compound, a photopolymerization initiator, and a sensitizer.
  • the binder resin has an average molecular weight of 10,000 to 250,000, and the glass transition temperature of this composition is 80°C or more.
  • a half width of a diffraction spectrum of the obtained volume hologram is 20 nm or less and an amount of refractive index change is 0.03 or more.
  • Patent Document 2 discloses a composition for a volume phase hologram recording material which is used for recording, as changes in refractive index, intensity distributions of bright and dark sections of interference fringes obtained by interference of light.
  • This composition includes (note that the composition does not include aryl prepolymer) a thermoplastic resin soluble in an organic solvent (A), a radically polymerizable compound (B) which has a 9,9-diaryl fluorene skeleton and at least one radically polymerizable unsaturated double bond and which is a solid at room temperature and normal pressure, a plasticizer (C), and a photopolymerization initiator (D).
  • the US patent 4,942,102 discloses holographic optical elements that contain a reflection hologram and, in addition, a process for forming the reflection hologram.
  • a photosensitive composition for a volume hologram is known from the Japanese patent application publication JP 2011 118363 A .
  • a photosensitive composition and a photosensitive substrate for volume hologram recording is known from the European patent application publication EP 2 889 700 A1 .
  • the Japanese patent application publication JP 2006 010796 A discloses a pattern forming material having at least a photosensitive layer on a support containing a binder, a polymerized compound and a photopolymerization initiator.
  • Patent Documents 1 and 2 may not contribute to further improvement in diffraction characteristic.
  • the present technology has been made in light of such a situation, and a main object of the present technology is to provide a photosensitive composition for hologram recording, a hologram recording medium, and a hologram which contribute to further improvement in diffraction characteristic.
  • the present inventors have succeeded in significantly improving the diffraction characteristic, whereby completing the present technology.
  • the present invention provides, according to a first aspect, a photosensitive composition in accordance with independent claim 1.
  • the present invention provides a hologram recording medium in accordance with independent claim 11.
  • the present invention provides a hologram in accordance with independent claim 12.
  • the present technology provides a photosensitive composition for hologram recording that includes at least two kinds of photopolymerizable monomers, a photopolymerization initiator, a binder resin, and a polymerization inhibitor, in which the at least two kinds of photopolymerizable monomers are a monofunctional monomer and a polyfunctional monomer.
  • the monofunctional monomer may be a dinaphthothiophene monomer, and the polyfunctional monomer may also be a dinaphthothiophene monomer.
  • the monofunctional monomer may be a carbazole monomer and the polyfunctional monomer may be a fluorene monomer.
  • the polyfunctional monomer may also be a triphenylethynylbenzene monomer or a trinaphthylethynylbenzene monomer.
  • the monofunctional monomer may also be a dinaphthothiophene monomer.
  • the polyfunctional monomer may also be a dinaphthothiophene monomer.
  • the polymerization inhibitor may be a quinone compound.
  • the polymerization inhibitor may be a hindered phenol compound.
  • the polymerization inhibitor may be a benzotriazole compound.
  • the polymerization inhibitor may be a thiazine compound.
  • the photosensitive composition for hologram recording according to the present technology may further include an inorganic particulate.
  • the inorganic particulate may be ZrO 2 particulate or TiO 2 particulate.
  • the monofunctional monomer may be a carbazole monomer and the polyfunctional monomer may be a fluorene monomer.
  • the monofunctional monomer may be a compound represented by the following General Formula (8).
  • R 801 and R 802 independently are a univalent substituent represented by the following General Formula (9), where i and j independently are an integer of 0 or 1, and i and j are not simultaneously 0 or 1.
  • R 903 and R 904 independently are a single bond or a substituted or unsubstituted straight or branched C 1 - 10 alkylene group
  • R 905 is hydrogen or a substituted or unsubstituted straight or branched C 1 - 10 alkyl group
  • X is a divalent aromatic group represented by the following Formulae (9-1) to (9-8).
  • the divalent aromatic group is unsubstituted or includes at least one substituent.
  • Two binding sites of the divalent aromatic group for R 903 and R 904 may be on any carbon in the aromatic group that is to be bound.
  • the monofunctional monomer may be a compound represented by General Formula (8), and the polyfunctional monomer may be a fluorene monomer.
  • the monofunctional monomer may be a compound represented by General Formula (8), and the polyfunctional monomer may be a dinaphthothiophene monomer.
  • the present technology provides a hologram recording medium that includes at least a photosensitive layer including the photosensitive composition for hologram recording according to the present technology; and at least one transparent base material, in which the photosensitive layer is formed on the at least one transparent base material.
  • the present technology provides a hologram obtained with use of the hologram recording medium according to the present technology, and an amount of refractive index change of the hologram is 0.06 or more.
  • a photosensitive composition for hologram recording including at least one kind of photopolymerizable monomer, a photopolymerization initiator, a binder resin, and a polymerization inhibitor
  • a photosensitive composition for hologram recording including at least two kinds of photopolymerizable monomers, a photopolymerization initiator, a binder resin, and a polymerization inhibitor.
  • Fig. 1 is a cross-sectional view schematically showing an example of a hologram recording medium according to a second embodiment to which the present technology is applied.
  • the present technology relates to a photosensitive composition for hologram recording, a hologram recording medium, and a hologram.
  • ⁇ represents a diffraction efficiency
  • d represents a film thickness of a photosensitive layer (photopolymer)
  • ⁇ represents a recording laser wavelength
  • ⁇ represents an incident angle of recording laser light relative to a photosensitive material.
  • the present inventors In order to obtain a high amount of refractive index change ( ⁇ n) without performing heating, the present inventors have found that it is necessary to prevent polymerization in dark sections while promoting polymerization in bright sections during interference exposure. In addition, the present inventors have found that a polymerization inhibitor included in a photosensitive composition for hologram recording prevents dark polymerization during interference exposure, which promotes refractive index change and achieves a high diffraction characteristic.
  • the present technology employs a polymerization inhibitor in a photosensitive composition for hologram recording. This makes it possible to promote polymerization of photopolymerizable monomers in a bright sections, during interference exposure, and to prevent polymerization of photopolymerizable monomers in dark sections so that the photopolymerizable monomers in the dark sections diffuse into the bright sections. Moreover, the polymerization of the photopolymerizable monomers in the bright sections is further promoted, which achieves a high amount of refractive index change ( ⁇ n) after the interference exposure.
  • ⁇ n refractive index change
  • a photosensitive composition for hologram recording makes it possible to provide a photosensitive composition for hologram recording, a hologram recording medium, and a hologram which have an excellent diffraction characteristic and do not require heating after interference exposure.
  • the photosensitive composition for hologram recording according to the present technology is determined by, for example, chromatograph typified by nuclear magnetic resonance spectroscopy, infrared spectroscopy, Raman spectroscopy, ultraviolet-visible absorption spectroscopy, high performance liquid chromatography, and gas chromatography.
  • the photosensitive composition for hologram recording according to the first embodiment of the present technology is a photosensitive composition for hologram recording including at least two kinds of photopolymerizable monomers, a photopolymerization initiator, a binder resin, and a polymerization inhibitor.
  • the at least two kinds of photopolymerizable monomers are a monofunctional monomer and a polyfunctional monomer.
  • the photosensitive composition for hologram recording according to the first embodiment of the present technology offers a high amount of refractive index change ( ⁇ n) and an excellent diffraction characteristic.
  • the at least two kinds of photopolymerizable monomers included in the photosensitive composition for hologram recording according to the first embodiment of the present technology are a monofunctional monomer and a polyfunctional monomer, as described above.
  • the photosensitive composition for hologram recording includes one kind of monofunctional monomer and one kind of polyfunctional monomer.
  • the photosensitive composition for hologram recording includes one kind of monofunctional monomer and one kind of polyfunctional monomer, and the other one or more kinds of the photopolymerizable monomers may be a monofunctional monomer(s) or a polyfunctional monomer(s).
  • the monofunctional monomer included in the photosensitive composition for hologram recording according to the first embodiment of the present technology should be a dinaphthothiophene monomer, and the polyfunctional monomer should be a dinaphthothiophene monomer.
  • the polyfunctional dinaphthothiophene monomer is preferably a bifunctional dinaphthothiophene monomer.
  • the photosensitive composition for hologram recording according to the first embodiment of the present technology includes at least a monofunctional dinaphthothiophene monomer, a bifunctional dinaphthothiophene monomer, and hydroquinone as described later as a polymerization inhibitor.
  • the monofunctional monomer included in the photosensitive composition for hologram recording according to the first embodiment of the present technology should be a dinaphthothiophene monomer.
  • the polyfunctional monomer included in the photosensitive composition for hologram recording according to the first embodiment of the present technology should be a dinaphthothiophene monomer.
  • the photosensitive composition for hologram recording according to the first embodiment of the present technology includes at least a monofunctional monomer dinaphthothiophene monomer, a bifunctional monomer, and a quinone compound as described later or a thiazine compound as a polymerization inhibitor.
  • the photosensitive composition for hologram recording according to the first embodiment of the present technology includes at least a monofunctional monomer, a bifunctional dinaphthothiophene monomer, and a quinone compound as described later or a thiazine compound as a polymerization inhibitor.
  • the monofunctional or polyfunctional dinaphthothiophene monomer is preferably a compound represented by the following General Formula (1) or General Formula (5).
  • R is a substituent on a benzene ring which is not condensed with a thiophene ring, and R is a hydroxyl group, a 2-allyloxy group, a vinyloxy group, a 2,3-epoxypropoxy group, a 2-(meth)acryloyloxy group, a 2-(meth)acryloyloxyethoxy group, an R 1 O-group (where R 1 is an alkyl group which may include oxygen or sulfur as a heteroatom) or HO-X-O group (where X is an alkylene chain or an aralkylene chain which may include oxygen or sulfur as a heteroatom).
  • either one of the two Rs in the above General Formula (1) is a group having a polymerizable unsaturated bond
  • the two Rs in General Formula (1) are groups having a polymerizable unsaturated bond
  • R 1 is an alkyl group which may include oxygen or sulfur as a heteroatom.
  • R 1 may be a straight or branched C 1 - 20 alkyl group, for example, a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, a 2-ethylhexyl group, a dodecyl group, a cetyl group, a methoxymethyl group, a 2-methoxyethyl group, an ethoxymethyl group, 2-(ethoxy)ethyl group, a 2-(methylmercapto)ethyl group, and the like.
  • X is an alkylene chain or an aralkylene chain which may include oxygen or sulfur as a heteroatom.
  • An example of the alkylene chain includes a straight or branched C 1 - 10 alkylene chain, for example, a methylene group, an ethylene group, a trimethylene group, a tetramethylene group, a hexamethylene group, a decamethylene group, a propylene group, cyclohexylene group, and the like.
  • An example of the alkylene chain which may include oxygen or sulfur as a heteroatom includes a polyoxyalkylene chain including oxyethylene or oxypropylene as a repeating unit.
  • An example of an alkylene moiety of the aralkylene chain which may include oxygen or sulfur as a heteroatom includes the aforementioned alkylene chain.
  • the dinaphthothiophene monomer represented by General Formula (1) may be synthesized by various known synthesis, and may be synthesized, for example, on the basis of the synthesis disclosed in JP-A-2014-196288 .
  • R 100 and R 101 are substituents on a benzene ring condensed with a thiophene ring.
  • R 100 and R 101 independently are a hydroxyl group, a 2-allyloxy group, a vinyloxy group, a 2,3-epoxypropoxy group, a 2-(meth)acryloyloxy group, a 2-(meth)acryloyloxyethoxy group, an R 1 O-group (where R 1 is an alkyl group which may include oxygen or sulfur as a heteroatom) or HO-X-O group (where X is an alkylene chain or an aralkylene chain which may include oxygen or sulfur as a heteroatom).
  • a and b are independently an integer of 0 to 2.
  • R 1 is an alkyl group which may include oxygen or sulfur as a heteroatom.
  • R 1 may be a straight or branched C 1 - 20 alkyl group, for example, a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, a 2-ethylhexyl group, a dodecyl group, a cetyl group, a methoxymethyl group, a 2-methoxyethyl group, an ethoxymethyl group, 2-(ethoxy)ethyl group, a 2-(methylmercapto)ethyl group, and the like.
  • X is an alkylene chain or an aralkylene chain which may include oxygen or sulfur as a heteroatom.
  • An example of the alkylene chain includes a straight or branched C 1 - 10 alkylene chain, for example, a methylene group, an ethylene group, a trimethylene group, a tetramethylene group, a hexamethylene group, a decamethylene group, a propylene group, cyclohexylene group, and the like.
  • An example of the alkylene chain which may include oxygen or sulfur as a heteroatom includes a polyoxyalkylene chain including oxyethylene or oxypropylene as a repeating unit.
  • An example of an alkylene moiety of the aralkylene chain which may include oxygen or sulfur as a heteroatom includes the aforementioned alkylene chain.
  • monofunctional dinaphthothiophene monomer examples include 6VDNpTh, DNTMA, 5EDNTMA, NVC, the following exemplary compounds 5-1 to 5-4, and the like.
  • polyfunctional dinaphthothiophene monomer examples include DHEDNTMA, DAEDNT, 3,11-DHEDNTMA, 3,11-DAEDNT, EA0200, the following exemplary compounds 5-5 to 5-7, and the like.
  • the polyfunctional monomer included in the photosensitive composition for hologram recording according to the first embodiment of the present technology should be a triphenylethynylbenzene monomer or a trinaphthylethynylbenzene monomer.
  • the photosensitive composition for hologram recording according to the first embodiment of the present technology includes at least a monofunctional monomer, a trifunctional triphenylethynylbenzene monomer or a trifunctional trinaphthylethynylbenzene monomer, and a quinone compound as described later or a thiazine compound as a polymerization inhibitor.
  • the trifunctional triphenylethynylbenzene monomer is preferably a compound represented by the following General Formula (6).
  • R 102 , R 103 , and R 104 independently are a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group. From the aspect of enhancing a high refractive index and improving solubility, it is preferable that R 102 , R 103 , and R 104 independently be a methyl group, an ethyl group, a propyl group, a butyl group, an isobutyl group, or an isopropyl group.
  • c to e independently are an integer of 0 to 5.
  • trifunctional trinaphthylethynylbenzene monomer is preferably a compound represented by the following General Formula (7) .
  • R 105 , R 106 , and R 107 independently are a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group. From the aspect of enhancing a high refractive index and improving solubility, it is preferable that R 105 , R 106 , and R 107 independently be a methyl group, an ethyl group, a propyl group, a butyl group, an isobutyl group, or an isopropyl group.
  • f to h independently are an integer of 0 to 3.
  • a synthesis scheme of the compound 5-5 is as follows.
  • a compound A is obtained by the following procedures.
  • a compound B is obtained by the following procedures.
  • the compound 5-5 is obtained by the following procedures.
  • a synthesis scheme of the compound 5-6 is as follows.
  • a compound D is obtained by the following procedures. Note that the compound A is obtained on the basis of Step A.
  • the compound 5-6 is obtained by the following procedures.
  • a synthesis scheme of the compound 7-1 is as follows.
  • the compound 7-1 is obtained by the following procedures.
  • a synthesis scheme of the compound 6-1 is as follows.
  • the compound 6-1 is obtained by the following procedures.
  • the monofunctional monomer included in the photosensitive composition for hologram recording according to the first embodiment of the present technology should be a carbazole monomer, and the polyfunctional monomer should be a fluorene monomer.
  • the polyfunctional fluorene monomer is preferably a bifunctional fluorene monomer.
  • the photosensitive composition for hologram recording according to the first embodiment of the present technology includes at least a monofunctional carbazole monomer, a bifunctional fluorene monomer, and a quinone compound or a thiazine compound as described later as a polymerization inhibitor. Furthermore, as a preferred embodiment, the photosensitive composition for hologram recording according to the first embodiment of the present technology includes at least a monofunctional carbazole monomer, a bifunctional fluorene monomer, and a hindered phenol compound as described later or a benzotriazole compound as a polymerization inhibitor.
  • the monofunctional carbazole monomer is preferably 2-(9H-carbazole-9-yl)ethyl acrylate or 9H-carbazole-9-ethylmethacrylate. Furthermore, the monofunctional carbazole monomer is preferably a compound represented by the following General Formula (2).
  • Y 1 , Y 2 , Y 3 , Y 4 , and Y 5 is substituted with any one of substituents represented by the following General Formulae (3-1) to (3-7).
  • the carbazole monomer is polyfunctional (bifunctional or higher-functional) monomer.
  • Y 1 to Y 5 (except for at least one of Y 1 , Y 2 , Y 3 , Y 4 , and Y 5 which is to be at least one of the substituents represented by General Formulae (3-1) to (3-7)) and R41 to R47 independently are, but not specifically limited to, for example, an alkyl group (for example, a methyl group, an ethyl group, a propyl group, an isopropyl group, a t-butyl group, a pentyl group, a hexyl group, an octyl group, a dodecyl group, a trifluoromethyl group, and the like), a cycloalkyl group (for example, a cyclopentyl group, a cyclohexyl group, and the like), an aryl group (for example, a phenyl group, a naphthyl group, and the like), an acylamino group (for
  • the compound represented by General Formula (2) is preferably an N-vinylcarbazole derivative or a 2-vinylcarbazole derivative, more preferably, N-vinylcarbazole or 2-vinylcarbazole.
  • the monofunctional carbazole monomer or the polyfunctional (bifunctional or higher-functional) carbazole monomer represented by the above General Formula (2) may be synthesized by various known synthesis, and may be synthesized, for example, on the basis of the synthesis disclosed in JP-A-2015-105239 .
  • the bifunctional fluorene monomer (polyfunctional fluorene monomer) is preferably 9,9-bisarylfluorenes, and is, for example, a compound represented by the following General Formula (4).
  • the ring Z is an aromatic hydrocarbon ring
  • R 1 is a substituent
  • R 2 is an alkylene group
  • R 3 is a hydrogen atom or a methyl group
  • R 4 is a substituent
  • k is an integer of 0 to 4
  • m is an integer of 0 or more
  • n is an integer of 0 or more
  • p is an integer of 1.
  • the fluorene monomer is polyfunctional (tetrafunctional or higher-functional) monomer.
  • examples of the aromatic hydrocarbon ring represented by the ring Z include a benzene ring, a condensed polycyclic arene (or condensed polycyclic aromatic hydrocarbon) ring, and the like.
  • examples of the condensed polycyclic arene (or condensed polycyclic aromatic hydrocarbon) ring include a condensed bicyclic arene ring (for example, a C 8-20 condensed bicyclic arene ring such as an indene ring or a naphthalene ring, preferably a C 10-16 condensed bicyclic arene ring), a condensed tricyclic arene ring (for example, an anthracene ring, a phenanthrene ring, and the like), and the like.
  • the condensed polycyclic arene ring include a naphthalene ring, an anthracene ring, and the like, and a naphthalene ring is particularly preferable.
  • two rings Z may be the same or different, and typically, the rings Z may be the same.
  • a typical ring Z is a benzene ring or a naphthalene ring, and the ring Z may be a naphthalene ring, specifically, from the viewpoints of high heat resistance, high refractive index, and the like.
  • Examples of the group R 1 in the Formula (4) include a non-reactive substituent such as a cyano group, a halogen atom (such as a fluorine atom, a chlorine atom, and a bromine atom), and a hydrocarbon group [for example, an alkyl group, an aryl group (a C 6-10 aryl group such as a phenyl group and the like)].
  • a non-reactive substituent such as a cyano group, a halogen atom (such as a fluorine atom, a chlorine atom, and a bromine atom)
  • a hydrocarbon group for example, an alkyl group, an aryl group (a C 6-10 aryl group such as a phenyl group and the like)
  • the group R 1 is often a group other than a halogen atom, for example, an alkyl group.
  • alkyl group examples include a C 1-12 alkyl group (for example, a C 1-8 alkyl group, specifically, a C 1-4 alkyl group such as a methyl group) such as a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a t-butyl group, and the like.
  • k is plural (2 or more)
  • the groups R 1 may be different from each other or may be the same.
  • the groups R 1 which substitutes two benzene rings included in fluorene (or a fluorene skeleton) may be the same or different.
  • the binding position (substitution position) of the groups R 1 with respect to the benzene rings included in fluorene is not specifically limited.
  • the number of substitutions k is preferably 0 to 1, and particularly preferably 0. In the two benzene rings included in fluorene, note that the number of substitutions k may be the same or different from each other.
  • Examples of the alkylene group represented by the group R 2 in the Formula (4) include a C 2-6 alkylene group such as an ethylene group, a propylene group, a trimethylene group, a 1,2-butanediyl group, and a tetramethylene group, preferably a C 2-4 alkylene group, and more preferably a C 2-3 alkylene group.
  • m is 2 or more
  • the alkylene groups may be different, and typically, the alkylene groups may be the same.
  • the groups R 2 may be the same or different, and typically, the rings Z may be the same.
  • the number (the number of moles added) m of the oxyalkylene group (OR 2 ) may be selected from a range of about 0 to 15 (for example, 0 to 12), for example, 0 to 8 (for example, 0 to 8), preferably 0 to 6 (for example, 1 to 6), and more preferably 0 to 4 (for example, 1 to 4).
  • m may be 1 or more (for example, 1 to 4, preferably 1 to 3, more preferably 1 to 2, and particularly preferably 1).
  • the number of substitutions m may be the same or different in different rings Z.
  • the total (m ⁇ 2) of the oxyalkylene groups may be selected from a range of about 0 to 30 (for example, 2 to 24), for example, 0 to 16 (for example, 2 to 14), preferably 0 to 12 (for example, 2 to 10), more preferably 0 to 8 (for example, 0 to 6), and particularly preferably 0 to 4 (for example, 2 to 4).
  • the number of substitutions p of the group including the group R 2 (which may be referred to as a (meth)acryloyl group-including group or the like) is 1, but in a polyfunctional (tetrafunctional or higher-functional) fluorene monomer, the number of substitutions p is 2 or more. Note that the number of substitutions p may be the same or different in each ring Z, and typically, the number of substitutions is often the same. Note that the substitution position of the (meth)acryloyl group-including group is not specifically limited, and the (meth)acryloyl group-including group may substitute at any appropriate substitution position of the ring Z.
  • the (meth)acryloyl group-including group may substitute at an appropriate position from 2- to 6-positions of the benzene ring (specifically, at least the 4-position).
  • the (meth)acryloyl group-including group may substitute at least at a hydrocarbon ring different from the hydrocarbon ring bonded to the 9-position of fluorene (for example, the 5-position, the 6-position, or the like of the naphthalene ring).
  • substituent R 4 which substitutes the ring Z typically include non-reactive substituents, for example, a hydrocarbon group such as an alkyl group (for example, a C 1-12 alkyl group, preferably a C 1-8 alkyl group, and more preferably a C 1-6 alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group, and a butyl group), a cycloalkyl group
  • alkyl group for example, a C 1-12 alkyl group, preferably a C 1-8 alkyl group, and more preferably a C 1-6 alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group, and a butyl group
  • a cycloalkyl group such as an alkyl group (for example, a C 1-12 alkyl group, preferably a C 1-8 alkyl group, and more preferably
  • a C 5-8 cycloalkyl group preferably a C 5-6 cycloalkyl group such as a cyclohexyl group, and the like
  • an aryl group for example, a C 6-14 aryl group, preferably a C 6-10 aryl group, and more preferably a C 6-8 aryl group such as a phenyl group, a tolyl group, a xylyl group, a naphthyl group, and the like
  • an aralkyl group a C 6-10 aryl-C 1-4 alkyl group such as a benzyl group, phenethyl group, and the like
  • an -OR 5 group [where R 5 represents a hydrocarbon group (such as the above exemplified hydrocarbon group)] such as an alkoxy group (a C 1-8 alkoxy group, preferably a C 1-6 alkoxy group such as a methoxy group, an ethoxy group, and the like), a
  • Preferable examples of the group R 4 include a hydrocarbon group [for example, an alkyl group (for example, a C 1-6 alkyl group), a cycloalkyl group (for example, a C 5-8 cycloalkyl group), an aryl group (for example, a C 6-10 aryl group), and an aralkyl group (for example, a C 6-8 aryl-C 1-2 alkyl group and the like)], an alkoxy group (such as a C 1-4 alkoxy group), and the like.
  • a hydrocarbon group for example, an alkyl group (for example, a C 1-6 alkyl group), a cycloalkyl group (for example, a C 5-8 cycloalkyl group), an aryl group (for example, a C 6-10 aryl group), and an aralkyl group (for example, a C 6-8 aryl-C 1-2 alkyl group and the like)
  • an alkoxy group such as
  • R 2 is preferably an alkyl group [such as a C 1-4 alkyl group (specifically, a methyl group)], an aryl group [for example, a C 6-10 aryl group (specifically, a phenyl group) and the like], or the like.
  • the groups R 4 may be different from each other or may be the same. Furthermore, in the two rings Z, the groups R 4 may be the same or different. Furthermore, the preferable number of substitution n may be selected according to the kind of the ring Z and may be, for example, 0 to 8, preferably 0 to 4 (for example, 0 to 3), and more preferably 0 to 2. In the different rings Z, note that the number of substitutions n may be the same or different from each other, and typically, the number may be the same.
  • the compound represented by the Formula (4) includes 9,9-bis((meth)acryloyloxyaryl)fluorenes and 9,9-bis((meth)acryloyloxy(poly)alkoxyaryl)fluorenes.
  • 9,9-bis((meth)acryloyloxyaryl)fluorenes examples include 9,9-bis((meth)acryloyloxyphenyl)fluorenes (a compound in which a ring Z is a benzene ring and m is 0 in the Formula (4)) such as 9,9-bis((meth)acryloyloxyphenyl)fluorene [for example, 9,9-bis(4-(meth)acryloyloxyphenyl)fluorene and the like], 9,9-bis(alkyl-(meth)acryloyloxyphenyl)fluorene [for example, 9,9-bis(mono- or di-C 1-4 alkyl-(meth)acryloyloxyphenyl)fluorene such as 9,9-bis(4-(meth)acryloyloxy-3-methylphenyl)fluorene and 9,9-bis(4-(meth)acryloyloxy-3,5-dimethylphen
  • the 9,9-bis((meth)acryloyloxy(poly)alkoxyaryl)fluorenes corresponds to the 9,9-bis((meth)acryloyloxyaryl)fluorenes and are compounds in which m is 1 or more in Formula (4).
  • 9,9-bis((meth)acryloyloxy(poly)alkoxyaryl)fluorenes examples include 9,9-bis((meth)acryloyloxy(poly)alkoxyphenyl)fluorenes (a compound in which a ring Z is a benzene ring and m is 1 or more in Formula (4)) such as 9,9-bis ⁇ [2-(2-(meth) acryloyloxy C 2-4 alkoxy)C 2-4 alkoxy]phenyl ⁇ fluorene such as 9,9-bis((meth)acryloyloxyalkoxyphenyl)fluorene [for example, 9,9-bis((meth) acryloyloxy C 2-4 alkoxyphenyl)fluorene such as 9,9-bis(4-(2-(meth)acryloyloxyethoxy)phenyl)fluorene and the like], 9,9-bis((meth)acryloyloxydialkoxyphenyl)fluor
  • the bifunctional fluorene monomer (polyfunctional fluorene monomer) or the tetrafunctional or higher-functional fluorene monomer (polyfunctional fluorene monomer) represented by the above General Formula (4) may be synthesized by various known synthesis techniques, and may be synthesized, for example, on the basis of the synthesis disclosed in JP-A-2012-111942 .
  • the monofunctional monomer included in the photosensitive composition for hologram recording according to the first embodiment of the present technology should be a fluorene monomer, and the polyfunctional monomer should be a carbazole monomer.
  • the polyfunctional carbazole monomer is preferably a bifunctional carbazole monomer.
  • the monofunctional monomer included in the photosensitive composition for hologram recording according to the first embodiment of the present technology should be a compound represented by the following General Formula (8).
  • R 801 and R 802 are independently a univalent substituent represented by the following General Formula (9). Furthermore, i and j in the above General Formula (8) are independently an integer of 0 or 1, and i and j are not simultaneously 0 or 1.
  • R 903 and R 904 in the above General Formula (9) are independently a single bond or a substituted or unsubstituted straight or branched C 1 - 10 alkylene group.
  • the straight or branched C 1 - 10 alkylene group include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, and an isobutyl group.
  • the straight or branched C 1 - 10 alkylene group may be substituted with, for example, a halogen element.
  • R 905 is hydrogen or a substituted or unsubstituted straight or branched C 1 - 10 alkyl group.
  • the straight or branched C 1 - 10 alkyl group include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, and an isobutyl group.
  • the straight or branched C 1 - 10 alkyl group may be substituted with, for example, a halogen element.
  • X is a divalent aromatic group represented by the following Formulae (9-1) to (9-8).
  • the divalent aromatic group may be unsubstituted or may include at least one substituent.
  • Two binding sites of the divalent aromatic group for R 903 and R 904 may be on any carbon in the aromatic group that is to be bound.
  • the substituent is preferably a straight or branched C 1 - 10 alkyl group, an aromatic group, or a halogen element. Examples of the straight or branched C 1 - 10 alkyl group include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, and an isobutyl group.
  • the straight or branched C 1 - 10 alkyl group may be substituted with, for example, a halogen element.
  • the aromatic group is preferably a univalent or higher aromatic group represented by (9-1) to (9-8). Alternatively, the aromatic group may be unsubstituted or may include at least one substituent.
  • the univalent or higher aromatic group includes at least one substituent, similarly to the substituent of X, the substituent is preferably a straight or branched C 1 - 10 alkyl group, an aromatic group, or a halogen element.
  • the following chemical structural formula is for preferable exemplary compounds represented by the above General Formula (8) (compounds 10-1 to 10-6).
  • the compound 10-1 and the compound 10-2 are more preferably used in the photosensitive composition for hologram recording according to the first embodiment of the present technology.
  • the monofunctional monomer included in the photosensitive composition for hologram recording according to the first embodiment of the present technology may be a compound represented by the above General Formula (8), and the polyfunctional monomer may be a fluorene monomer. Furthermore, the monofunctional monomer included in the photosensitive composition for hologram recording according to the first embodiment of the present technology may be a compound represented by the above General Formula (8), and the polyfunctional monomer may be a dinaphthothiophene monomer.
  • the binder resin included in the photosensitive composition for hologram recording according to the first embodiment of the present technology is not specifically limited and may be any binder resin.
  • a preferable example of the binder resin includes a vinyl acetate resin, specifically, polyvinyl acetate or a hydrolysate thereof.
  • an acrylic resin specifically, a poly(meth)acrylic acid ester or a partial hydrolysate thereof is preferably used.
  • binder resins include copolymers including, as a polymerization component, at least one copolymerizable monomer group such as polyvinyl alcohol or a partial acetalized product thereof, triacetyl cellulose, polyisoprene, polybutadiene, polychloroprene, silicone rubber, polystyrene, polyvinyl butyral, polychloroprene, polyvinyl chloride, polyarylate, chlorinated polyethylene, chlorinated polypropylene, poly-N-vinylcarbazole or a derivative thereof, poly-N-vinylpyrrolidone or a derivative thereof, polyarylate, a copolymer of styrene and maleic anhydride or a half ester thereof, acrylic acid, acrylic acid ester, methacrylic acid, methacrylic acid ester, acrylamide, acrylonitrile, ethylene, propylene, vinyl chloride, vinyl acetate, and the like; and mixtures thereof.
  • an oligomer type curable resin may also be used.
  • the oligomer type curable resin include various phenolic compounds such as bisphenol A, bisphenol S, novolak, o-cresol novolak, p-alkylphenol novolak, and the like and epoxy compounds produced by a condensation reaction with epichlorohydrin.
  • the photopolymerization initiator included in the photosensitive composition for hologram recording according to the first embodiment of the present technology is not specifically limited and may be any type of photopolymerization initiator.
  • the photopolymerization initiator include a radical polymerization initiator (radical generator) or a cationic polymerization initiator (acid generator) of an imidazole type, a bisimidazole type, an N-arylglycine type, an organic azide compound type, a titanocene type, an aluminate complex type, an organic peroxide type, an N-alkoxypyridinium salt type, a thioxanthone derivative type, a sulfonic acid ester type, an imidosulfonate type, a dialkyl-4-hydroxysulfonium salt type, an arylsulfonic acid-p-nitrobenzyl ester type, a silanol-aluminum complex type, a ( ⁇ 6-benzene)(radical
  • the radical polymerization initiator may be, but is not limited to, 1,3-di(t-butyldioxycarbonyl)benzophenone, 3,3',4,4'-tetrakis(t-butyldioxycarbonyl)benzophenone, 3-phenyl-5-isoxazolone, 2-mercaptobenzimidazole, bis(2,4,5-triphenyl) imidazole, 2,2-dimethoxy-1,2-diphenylethan-1-one (trade name: Irgacure 651, available from Ciba Specialty Chemicals Inc.), 1-hydroxy-cyclohexyl-phenyl-ketone (trade name: Irgacure 184, available from Ciba Specialty Chemicals Inc.), 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-1-butanone (trade name: Irgacure 369, available from Ciba Specialty Chemicals Inc.),
  • the cationic polymerization initiator may be, but is not limited to, benzoin tosylate, 2,5-dinitrobenzyl tosylate, N-tosyphthalic acid imide, and the like.
  • a compound which may be used as the radical polymerization initiator (radical generator) and also as the cationic polymerization initiator (acid generator) may be, but is not limited to, iodonium chloride such as 4-isopropyl-4'-methyldiphenyliodonium tetrakis(pentafluorophenyl)borate, diphenyliodonium, ditolyliodonium, bis(p-tert-butylphenyl) iodonium, and bis(p-chlorophenyl) iodonium; an iodonium salt such as bromide, a borofluoride salt, a hexafluorophosphate salt, and a hexafluoroantimonate salt; sulfonium chloride such as triphenylsulfonium, 4-tert-butyltriphenylsulfonium, and tris(4-methylphenyl)sulfonium
  • the polymerization inhibitor included in the photosensitive composition for hologram recording according to the first embodiment of the present technology is not specifically limited and may be any polymerization inhibitor.
  • the polymerization inhibitor include a quinone compound, a hindered phenol compound, a benzotriazole compound, a thiazine compound, and the like.
  • An example of the quinone compound includes hydroquinone, and hydroquinone may be regarded as one type of phenol compound.
  • An example of the thiazine compound include phenothiazine.
  • the hindered phenol compound is preferably, but not specifically limited to, a compound which has a structure difficult to diffuse in the photosensitive composition for hologram recording (photosensitive layer) and has a large steric hindrance. More preferably, the hindered phenol compound is a compound having a 2,6-dialkylphenol structure. For example, n-octadecyl 3-(4'-hydroxy-3',5'-di-tert-butylphenyl)propionate (trade name: ADK STAB AO-50, available from Adeka Corporation) and the like is used preferably.
  • the benzotriazole compound is preferably, but not specifically limited to, a compound having a structure difficult to diffuse in the photosensitive composition for hologram recording (photosensitive layer) and has a large steric hindrance.
  • a compound having a structure difficult to diffuse in the photosensitive composition for hologram recording (photosensitive layer) and has a large steric hindrance for example, 2,2'-methylenebis[6-(2H-benzotriazol-2-yl)-4-(1,1,3,3-tetramethylbutyl)phenol] (trade name: ADK STAB LA-31, available from Adeka Corporation) is used preferably.
  • the photosensitive composition for hologram recording according to the first embodiment of the present technology includes at least the monofunctional carbazole monomer, the bifunctional fluorene monomer, and n-octadecyl 3-(4'-hydroxy-3',5'-di-tert-butylphenyl)propionate (trade name: ADK STAB AO-50, available from Adeka Corporation).
  • the photosensitive composition for hologram recording according to the first embodiment of the present technology includes at least the monofunctional carbazole monomer, the bifunctional fluorene monomer, and 2,2'-methylenebis[6-(2H-benzotriazol-2-yl)-4-(1,1,3,3-tetramethylbutyl)phenol] (trade name: ADK STAB LA-31, available from Adeka Corporation).
  • the photosensitive composition for hologram recording may include one kind of polymerization inhibitor, or two or more kinds of polymerization inhibitors.
  • the quinone compound and the phenol compound, or the quinone compound and the benzotriazole compound may be used in combination.
  • the polymerization inhibitor may be included in the photosensitive composition for hologram recording in any amount, but the polymerization inhibitor is preferably included in an amount of 0.01% by mass to 10% by mass, more preferably 0.1% by mass to 5.0% by mass, with respect to the total mass of the photosensitive composition for hologram recording. Furthermore, a mole ratio of the polymerization inhibitor to the photopolymerization initiator is preferably from 0.1 to 10, and more preferably from 0.5 to 1.5.
  • the photosensitive composition for hologram recording according to the first embodiment of the present technology preferably includes an inorganic particulate.
  • an inorganic particulate By including the inorganic particulate in the photosensitive composition for hologram recording, the effect of increasing the amount of refractive index change ( ⁇ n) is exerted.
  • the inorganic particulate is preferably, but not specifically limited to, TiO 2 particulate or ZrO 2 particulate.
  • the photosensitive composition for hologram recording may include one kind of inorganic particulate, or two or more kinds of inorganic particulates.
  • the above TiO 2 particulate and ZrO 2 particulate may be used in combination.
  • the photosensitive composition for hologram recording according to the first embodiment of the present technology includes at least the monofunctional carbazole monomer, the bifunctional fluorene monomer, and the TiO 2 particulate.
  • the photosensitive composition for hologram recording according to the first embodiment of the present technology includes at least the monofunctional carbazole monomer, the bifunctional fluorene monomer, and the ZrO 2 particulate.
  • the inorganic particulate may be included in the photosensitive composition for hologram recording in any amount, but the inorganic particulate is preferably included in an amount of 15% by mass to 85% by mass with respect to the total mass of the photosensitive composition for hologram recording.
  • the photosensitive composition for hologram recording according to the first embodiment of the present technology may include a plasticizer.
  • the plasticizer is present in order to change physical characteristics of the photosensitive composition for hologram recording such as adhesiveness, flexibility, hardness, and other characteristics.
  • the plasticizer include triethylene glycol, triethylene glycol diacetate, triethylene glycol dipropionate, triethylene glycol dicaprylate, triethylene glycol dimethyl ether, poly(ethylene glycol), poly(ethylene glycol) methyl ether, triethylene glycol bis(2-ethylhexanoate), tetraethylene glycol diheptanoate, diethyl sepacate, dibutyl suberate, tris(2-ethylhexyl)phosphate, isozorobyl naphthalene, diisopropyl naphthalene, poly(propylene glycol), glyceryl tributyrate, diethyl adipate, diethyl sebacate, nobutyl sub
  • the photosensitive composition for hologram recording may include one kind of plasticizer, or two or more kinds of plasticizers.
  • the plasticizer may be included in the photosensitive composition for hologram recording in any amount, but the plasticizer is preferably included in an amount of 5% by mass to 40% by mass with respect to the total mass of the photosensitive composition for hologram recording.
  • the photosensitive composition for hologram recording according to the first embodiment of the present technology may include a sensitizing dye.
  • the sensitizing dye intensifies sensitivity of the photopolymerization initiator with respect to light.
  • the sensitizing dye include a thiopyrylium salt dye, a merocyanine dye, a quinoline dye, a rose bengal dye, a styryl quinoline dye, a ketocoumarin dye, a thioxanthene dye, a xanthene dye, an oxonol dye, a cyanine dye, an acridine dye, a rhodamine dye, a pyrylium salt dye, a cyclopentanone dye, a cyclohexanone dye, and the like.
  • the cyanine dye and the merocyanine dye may be, but are not limited to, 3,3'-dicarboxyethyl-2,2'-thiocyanine bromide, 1-carboxymethyl-1'-carboxyethyl-2,2'-quinocyanine bromide, 1,3'-diethyl-2,2'-quinothiacyanine Iodide, 3-ethyl-5-[(3-ethyl-2(3H)-benzothiazolylidene)ethylidene]-2-thioxo-4-oxazolidine, and the like and specific examples of a coumarin dye and the ketocoumarin dye may include, but are not limited to, 3-(2'-benzimidazole)-7-diethylaminocoumarin, 3,3'-carbonylbis(7-diethylaminocoumarin), 3,3'-carbonylbiscoumarin, 3,3'-carbonylbis(5,7-dimethoxycoumarin), 3,3'-
  • the photosensitive composition for hologram recording may include one kind of sensitizing dye, or two or more kinds of sensitizing dyes.
  • the sensitizing dye may be included in the photosensitive composition for hologram recording in any amount, but the sensitizing dye is preferably included in an amount of 0.01% by mass to 3.0% by mass with respect to the total mass of the photosensitive composition for hologram recording.
  • the photosensitive composition for hologram recording according to the first embodiment of the present technology may include a chain transfer agent.
  • the chain transfer agent withdraws radicals from a growing end of the polymerization reaction, stops the growth, and becomes a new polymerization reaction initiation species which is added to the photopolymerizable monomer to start the growth of a new polymer.
  • the use of the chain transfer agent increases the frequency in chain transfer of radical polymerization, which increases a rate of reaction of the photopolymerizable monomer and improves sensitivity.
  • an increase in rate of reaction of the photopolymerizable monomer increases reaction-contributing components, which makes it possible to adjust the degree of polymerization of the photopolymerizable monomer.
  • chain transfer agent examples include ⁇ -methylstyrene dimer, 2-mercaptobenzoxazole, 2-mercaptobenzothiazole, tert-butyl alcohol, n-butanol, isobutanol, isopropylbenzene, ethylbenzene, chloroform, methyl ethyl ketone, propylene, vinyl chloride, and the like.
  • the photosensitive composition for hologram recording may include one kind of chain transfer agent, or two or more kinds of chain transfer agents.
  • the chain transfer agent may be included in the photosensitive composition for hologram recording in any amount, but the chain transfer agent is preferably included in an amount of 0.1% by mass to 1.0% by mass with respect to the total mass of the photosensitive composition for hologram recording.
  • the photosensitive composition for hologram recording according to the first embodiment of the present technology may include a solvent.
  • Solvents are effective for adjusting viscosity and compatibility and for improving film formability or the like. For example, acetone, xylene, toluene, methyl ethyl ketone, tetrahydrofuran, benzene, methylene chloride, dichloromethane, chloroform, methanol, and the like are often used as a solvent.
  • the photosensitive composition for hologram recording may include one kind of solvent, or two or more kinds of solvents.
  • the solvent may be included in the photosensitive composition for hologram recording in any amount, but the solvent is preferably included in an amount of 5% by mass to 95% by mass with respect to the total mass of the photosensitive composition for hologram recording.
  • the photosensitive composition for hologram recording according to the first embodiment of the present technology is produced by, for example, adding to the solvent at least two kinds of photopolymerizable monomers, a photopolymerization initiator, a binder resin, and a polymerization inhibitor in a predetermined amount at room temperature or the like, and by dissolving and mixing those additives. Furthermore, an inorganic particulate, a plasticizer, a sensitizing dye, a chain transfer agent, and the like may be added to the photosensitive composition depending on use, purpose, and the like.
  • the photosensitive composition for hologram recording according to the first embodiment of the present technology is formed on a transparent base material including in a hologram recording medium as described later, the photosensitive composition for hologram recording may be used as a coating solution.
  • a hologram recording medium includes at least a photosensitive layer including the photosensitive composition for hologram recording according to the first embodiment of the present technology, and at least one transparent base material.
  • the photosensitive layer herein is formed on the at least one transparent base material.
  • the hologram recording medium according to the second embodiment of the present technology may have a three-layer structure in which the photosensitive layer is formed on a first transparent base material and a second transparent base material is formed on a main surface of the photosensitive layer on which the first transparent base material is not formed.
  • FIG. 1 is a cross-sectional view schematically showing an example of the hologram recording medium according to the second embodiment of the present technology.
  • a hologram recording medium 11 illustrated herein has a three-layer structure in which a photosensitive layer 12 is disposed between a pair of transparent substrates, that is, a polyvinyl alcohol film (transparent base material) 11 and a glass substrate (transparent base material) 13.
  • the hologram recording medium according to the second embodiment of the present technology offers a high amount of refractive index change ( ⁇ n) and an excellent diffraction characteristic.
  • the photosensitive layer included in the hologram recording medium according to the second embodiment of the present technology may include the photosensitive composition for hologram recording according to the first embodiment of the present technology and other materials, or may include the photosensitive composition for hologram recording according to the first embodiment of the present technology.
  • the photosensitive layer may have any thickness, but preferably has a thickness of 0.1 ⁇ m or more and 100 ⁇ m or less. Having a thickness of less than 0.1 ⁇ m, the photosensitive layer may have difficulty in obtaining a sufficient diffraction efficiency. On the other hand, having a thickness over 100 ⁇ m, the photosensitive layer may not further improve in sensitivity and diffraction efficiency.
  • Examples of the transparent base material included in the hologram recording medium according to the second embodiment of the present technology include a glass substrate, a transparent resin substrate, and the like.
  • the transparent resin substrate include transparent substrates such as a polyethylene film, a polypropylene film, a polyethylene fluoride film, a polyvinylidene fluoride film, a polyvinyl chloride film, a polyvinylidene chloride film, an ethylene-vinyl alcohol film, a polyvinyl alcohol film, a polymethyl methacrylate film, a polyether sulfone film, a polyether ether ketone film, a polyamide film, a tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer film, a polyester film such as a polyethylene terephthalate film, and a polyimide film.
  • transparent substrates such as a polyethylene film, a polypropylene film, a polyethylene fluoride film, a polyvinylidene fluoride film, a polyvinyl chloride film, a polyvinylidene chloride film, an ethylene-vinyl alcohol film, a
  • the transparent base material may have any film thickness, but the film thickness is preferably 0.1 ⁇ m to 100 ⁇ m from the viewpoint of transparency and rigidity of the hologram recording medium.
  • the above exemplified film may be used as a protective film, and the film may be laminated on a coated surface. In this case, a contact surface between the laminated film and the coated surface may be subjected to mold-release treatment so as to make it easier to peel the laminated film afterward.
  • the hologram recording medium according to the second embodiment of the present technology is obtained by, for example, applying a coating solution that includes the photosensitive composition for hologram recording to the transparent base material with a spin coater, a gravure coater, a comma coater, a bar coater, or the like and by drying the solution to form a photosensitive layer.
  • a hologram according to a third embodiment of the present technology is obtained with use of the hologram recording medium according to the second embodiment of the present technology, and an amount of refractive index change of the hologram is 0.06 or more.
  • the hologram according to the third embodiment of the present technology offers an amount of refractive index change ( ⁇ n) of 0.06 or more and an excellent diffraction characteristic.
  • the hologram according to the third embodiment of the present technology is obtained by, for example, performing two-luminous-flux interference exposure on the hologram recording medium according to the second embodiment of the present technology with a semiconductor laser or the like in the range of visible light, and by irradiating the entire surface of the hologram recording medium with UV light to cure an uncured photopolymerizable monomer and to fix a refractive index distribution on the hologram recording medium.
  • Conditions for the two-luminous-flux interference exposure may be selected arbitrarily depending on use and purpose.
  • the two-luminous-flux interference exposure should be performed for 1 second to 1000 seconds, setting the light intensity of a single luminous flux on the recording medium to a range from 0.1 mW/cm 2 to 100 mW/cm 2 , and setting an angle formed by the two luminous fluxes to a range from 0.1° to 179.9°.
  • the amount of refractive index change (hereinafter also referred to as ⁇ n) was calculated on the basis of the Kogelnik theoretical formula.
  • a photosensitive composition for hologram recording 1 was prepared by mixing, at room temperature, 1.1 g of bisphenoxy ethanol fluorene dimethacrylate ("EA-0200", available from Osaka Gas Chemicals Co., Ltd.) as a polyfunctional (bifunctional) photopolymerizable monomer, 0.4 g of N-vinylcarbazole ("NVC", available from Tokyo Chemical Industry Co., Ltd.) as a monofunctional photopolymerizable monomer, 0.7 g of polyvinyl acetate (“SN-09T”, available from Denka Company Limited) as a binder resin, 0.09 g of 4-isopropyl-4'-methyldiphenyliodonium tetrakis(pentafluorophenyl)borate ("DI", available from Tokyo Chemical Industry Co., Ltd.) as a photopolymerization initiator, 0.01 g of hydroquinone ("HQ”, available from FUJIFILM Wako Pure Chemical Corporation) as a polymerization
  • the photosensitive composition for hologram recording 1 was applied by a bar coater to a polyvinyl alcohol film having a thickness of 2.5 ⁇ m so as to make a dried film have a thickness of 3 ⁇ m. Then, a film surface of a photosensitive layer 1 including resin of the photosensitive composition for hologram recording 1 was pressured and bonded to a glass substrate having a thickness of 1.0 mm, whereby preparing a hologram recording medium 1.
  • the hologram recording medium 1 was subjected to two-luminous-flux interference exposure by a semiconductor laser with an exposure wavelength of 457 nm, and then the entire surface of the medium 1 was irradiated with UV light to cure an uncured monomer, whereby fixing a refractive index distribution on the medium 1.
  • the light intensity of a single luminous flux on the recording medium was set to 20 mW/cm 2 , and the medium 1 was subjected to interference exposure for 20 seconds, making the two luminous fluxes form a 7-degree angle. Accordingly, the refractive index distribution was formed on the hologram recording medium 1, whereby preparing a hologram 1.
  • the amount of refractive index change ( ⁇ n) of Hologram 1 prepared herein was calculated based on the Kogelnik theoretical formula, and the amount of refractive index change ( ⁇ n) was 0.065.
  • photosensitive compositions for hologram recording 2 to 4 were prepared in a manner similar to Example 1 according to amounts of additives shown in the following Table 1 except that rose bengal ("RB”, available from Sigma-Aldrich) was used as a sensitizing dye in Example 2, polyvinyl acetate ("SN-55T”, available from Denka Company Limited) as a binder resin and 2-mercaptobenzoxazole ("2-MBO”, available from Tokyo Chemical Industry Co., Ltd.) as a chain transfer agent were used in Example 3, and polyvinyl acetate (“SN-55T”, available from Denka Company Limited) as a binder resin, rose bengal (“RB”, available from Sigma-Aldrich) as a sensitizing dye, and 2-mercaptobenzoxazole ("2-MBO”, available from Tokyo Chemical Industry Co., Ltd.) as a chain transfer agent were used in Example 4.
  • RB rose bengal
  • 2-MBO 2-mercaptobenzoxazole
  • hologram recording media 2 to 4 were prepared in a manner similar to Example 1.
  • holograms 2 to 4 were prepared in a manner similar to Example 1 except that exposure was carried out under conditions shown in Table 1.
  • the amounts of refractive index change ( ⁇ n) of each of Holograms 2 to 4 prepared herein were obtained in a manner similar to Example 1.
  • ⁇ n of the hologram 2 was 0.066
  • ⁇ n of the hologram 3 was 0.069
  • ⁇ n of the hologram 4 was 0.067.
  • photosensitive compositions for hologram recording 5 to 8 were prepared in a manner similar to Example 1 according to amounts of additives shown in the following Table 1 except that "3,11-DAEDNT” available from Sugai Chemical Industry Co., Ltd. as a polyfunctional (bifunctional) photopolymerizable monomer and "DNTMA” available from Sugai Chemical Industry Co., Ltd. as a monofunctional photopolymerizable monomer were used in Example 5, "3,11-DAEDNT” available from Sugai Chemical Industry Co., Ltd. as a polyfunctional (bifunctional) photopolymerizable monomer, "DNTMA” available from Sugai Chemical Industry Co., Ltd.
  • Example 8 polyvinyl acetate (“SN-55T”, available from Denka Company Limited) as a binder resin, rose bengal (“RB”, available from Sigma-Aldrich) as a sensitizing dye, and 2-mercaptobenzoxazole (“2-MBO”, available from Tokyo Chemical Industry Co., Ltd.) as a chain transfer agent were used in Example 8.
  • hologram recording media 5 to 8 were prepared in a manner similar to Example 1.
  • holograms 5 to 8 were prepared in a manner similar to Example 1 except that exposure was carried out under conditions shown in Table 1.
  • the amounts of refractive index change ( ⁇ n) of each of Holograms 5 to 8 prepared herein were obtained in a manner similar to Example 1.
  • ⁇ n of the hologram 5 was 0.087
  • ⁇ n of the hologram 6 was 0.086
  • ⁇ n of the hologram 7 was 0.091
  • ⁇ n of the hologram 8 was 0.092.
  • photosensitive compositions for hologram recording 9 to 12 were prepared in a manner similar to Example 1 according to amounts of additives shown in the following Table 2 except that a TiO 2 particulate ("SRD-K”, available from Sakai Chemical Industry Co., Ltd.) was used as inorganic particulate in Example 9, a ZrO 2 particulate (“SZR-K”, available from Sakai Chemical Industry Co., Ltd.) was used in Example 10, a TiO 2 particulate ("SRD-K”, available from Sakai Chemical Industry Co., Ltd.) as an inorganic particulate and rose bengal (“RB”, available from Sigma-Aldrich) as a sensitizing dye were used in Example 11, and a ZrO 2 particulate (“SZR-K”, available from Sakai Chemical Industry Co., Ltd.) and rose bengal (“RB”, available from Sigma-Aldrich) as a sensitizing dye were used in Example 12.
  • SRD-K TiO 2 particulate
  • SZR-K inorganic
  • photosensitive compositions for hologram recording 13 to 16 were prepared in a manner similar to Example 1 according to amounts of additives shown in the following Table 2 except that a TiO 2 particulate ("SRD-K”, available from Sakai Chemical Industry Co., Ltd.) as an inorganic particulate, polyvinyl acetate (“SN-55T", available from Denka Company Limited) as a binder resin, and 2-mercaptobenzoxazole ("2-MBO”, available from Tokyo Chemical Industry Co., Ltd.) as a chain transfer agent were used in Example 13, a ZrO 2 particulate (“SZR-K”, available from Sakai Chemical Industry Co., Ltd.), polyvinyl acetate (“SN-55T", available from Denka Company Limited) as a binder resin, and 2-mercaptobenzoxazole (“2-MBO”, available from Tokyo Chemical Industry Co., Ltd.) as a chain transfer agent were used in Example 14, a TiO 2 particulate ("SRD-K", available from Sakai Chemical Industry Co., Ltd
  • hologram recording media 9 to 16 were prepared in a manner similar to Example 1.
  • holograms 9 to 16 were prepared in a manner similar to Example 1 except that exposure was carried out under conditions shown in Table 2.
  • the amounts of refractive index change ( ⁇ n) of each of Holograms 9 to 16 prepared herein were obtained in a manner similar to Example 1.
  • ⁇ n of the hologram 9 was 0.078
  • ⁇ n of the hologram 10 was 0.073
  • ⁇ n of the hologram 11 was 0.08
  • ⁇ n of the hologram 12 was 0.076
  • ⁇ n of the hologram 13 was 0.083
  • ⁇ n of the hologram 14 was 0.081
  • ⁇ n of the hologram 15 was 0.088
  • ⁇ n of the hologram 16 was 0.085.
  • photosensitive compositions for hologram recording 17 to 20 were prepared in a manner similar to Example 1 according to amounts of additives shown in the following Table 3 except that "ADK STAB AO-50" available from Adeka Corporation was used as a polymerization inhibitor in Example 17, “ADK STAB LA-31” available from Adeka Corporation was used as a polymerization inhibitor in Example 18, “ADK STAB AO-50” available from Adeka Corporation as a polymerization inhibitor and rose bengal (“RB”, available from Sigma-Aldrich) as a sensitizing dye were used in Example 19, and "ADK STAB LA-31” available from Adeka Corporation as a polymerization inhibitor and rose bengal (“RB”, available from Sigma-Aldrich) as a sensitizing dye were used in Example 20.
  • photosensitive compositions for hologram recording 21 to 24 were prepared in a manner similar to Example 1 according to amounts of additives shown in the following Table 3 except that "ADK STAB AO-50" available from Adeka Corporation as a polymerization inhibitor, polyvinyl acetate ("SN-55T", available from Denka Company Limited) as a binder resin, and 2-mercaptobenzoxazole ("2-MBO", available from Tokyo Chemical Industry Co., Ltd.) as a chain transfer agent were used in Example 21, "ADK STAB LA-31” available from Adeka Corporation as a polymerization inhibitor, polyvinyl acetate (“SN-55T", available from Denka Company Limited) as a binder resin, and 2-mercaptobenzoxazole ("2-MBO”, available from Tokyo Chemical Industry Co., Ltd.) as a chain transfer agent were used in Example 22, "ADK STAB AO-50" available from Adeka Corporation as a polymerization inhibitor, polyvinyl acetate ("SN-55
  • hologram recording media 17 to 24 were prepared in a manner similar to Example 1.
  • holograms 17 to 24 were prepared in a manner similar to Example 1 except that exposure was carried out under conditions shown in Table 3.
  • the amounts of refractive index change ( ⁇ n) of each of Holograms 17 to 24 prepared herein were obtained in a manner similar to Example 1.
  • ⁇ n of the hologram 17 was 0.068
  • ⁇ n of the hologram 18 was 0.07
  • ⁇ n of the hologram 19 was 0.07
  • ⁇ n of the hologram 20 was 0.072
  • ⁇ n of the hologram 21 was 0.071
  • ⁇ n of the hologram 22 was 0.073
  • ⁇ n of the hologram 23 was 0.074
  • ⁇ n of the hologram 24 was 0.075.
  • Comparative Example 1 using a material similar to those used in Examples 1, 17, or 18, a photosensitive composition for hologram recording 101 was prepared in a manner similar to Example 1 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation), and no "ADK STAB AO-50" available from Adeka Corporation or "ADK STAB LA- 31" available from Adeka Corporation were used.
  • HQ hydroquinone
  • Adeka Corporation Adeka Corporation
  • ADK STAB LA- 31 available from Adeka Corporation
  • a photosensitive composition for hologram recording 102 was prepared in a manner similar to Example 1 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation), and no "ADK STAB AO-50" available from Adeka Corporation or "ADK STAB LA- 31" available from Adeka Corporation were used.
  • HQ hydroquinone
  • Adeka Corporation Adeka Corporation
  • ADK STAB LA- 31 available from Adeka Corporation
  • a photosensitive composition for hologram recording 103 was prepared in a manner similar to Example 1 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation), and no "ADK STAB AO-50" available from Adeka Corporation or "ADK STAB LA- 31" available from Adeka Corporation were used.
  • HQ hydroquinone
  • Adeka Corporation Adeka Corporation
  • ADK STAB LA- 31 available from Adeka Corporation
  • a photosensitive composition for hologram recording 104 was prepared in a manner similar to Example 1 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation), and no "ADK STAB AO-50" available from Adeka Corporation or "ADK STAB LA- 31" available from Adeka Corporation were used. Note that the photosensitive compositions for hologram recording 101 to 104 were prepared according to amounts of additives shown in the following Table 4.
  • hologram recording media 101 to 104 were prepared in a manner similar to Example 1.
  • holograms 101 to 104 were prepared in a manner similar to Example 1 except that exposure was carried out under conditions shown in Table 4.
  • the amounts of refractive index change ( ⁇ n) of each of Holograms 101 to 104 prepared herein were obtained in a manner similar to Example 1.
  • ⁇ n of the hologram 101 was 0.043
  • ⁇ n of the hologram 102 was 0.037
  • ⁇ n of the hologram 103 was 0.035
  • ⁇ n of the hologram 104 was 0.038.
  • a photosensitive composition for hologram recording 105 was prepared in a manner similar to Example 1 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • HQ hydroquinone
  • Comparative Example 6 using a material similar to one used in Example 6, a photosensitive composition for hologram recording 106 was prepared in a manner similar to Example 1 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • a photosensitive composition for hologram recording 107 was prepared in a manner similar to Example 1 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • HQ hydroquinone
  • Comparative Example 8 using a material similar to one used in Example 8, a photosensitive composition for hologram recording 108 was prepared in a manner similar to Example 1 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used. Note that the photosensitive compositions for hologram recording 105 to 108 were prepared according to amounts of additives shown in the following Table 4.
  • hologram recording media 105 to 108 were prepared in a manner similar to Example 1.
  • holograms 105 to 108 were prepared in a manner similar to Example 1 except that exposure was carried out under conditions shown in the following Table 4.
  • the amounts of refractive index change ( ⁇ n) of each of Holograms 105 to 108 prepared herein were obtained in a manner similar to Example 1.
  • ⁇ n of the hologram 105 was 0.047
  • ⁇ n of the hologram 106 was 0.049
  • ⁇ n of the hologram 107 was 0.046
  • ⁇ n of the hologram 108 was 0.048.
  • a photosensitive composition for hologram recording 109 was prepared in a manner similar to Example 1 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • HQ hydroquinone
  • a photosensitive composition for hologram recording 110 was prepared in a manner similar to Example 1 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • Comparative Example 11 using a material similar to one used in Example 11, a photosensitive composition for hologram recording 111 was prepared in a manner similar to Example 1 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • Comparative Example 12 using a material similar to one used in Example 12, a photosensitive composition for hologram recording 112 was prepared in a manner similar to Example 1 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • a photosensitive composition for hologram recording 113 was prepared in a manner similar to Example 1 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • HQ hydroquinone
  • Comparative Example 14 using a material similar to one used in Example 14, a photosensitive composition for hologram recording 114 was prepared in a manner similar to Example 1 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • a photosensitive composition for hologram recording 115 was prepared in a manner similar to Example 1 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • HQ hydroquinone
  • a photosensitive composition for hologram recording 116 was prepared in a manner similar to Example 1 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • the photosensitive compositions for hologram recording 109 to 116 were prepared according to amounts of additives shown in the following Table 5.
  • hologram recording media 109 to 116 were prepared in a manner similar to Example 1.
  • holograms 109 to 116 were prepared in a manner similar to Example 1 except that exposure was carried out under conditions shown in the following Table 5.
  • the amounts of refractive index change ( ⁇ n) of each of Holograms 109 to 116 prepared herein were obtained in a manner similar to Example 1.
  • ⁇ n of the hologram 109 was 0.048
  • ⁇ n of the hologram 110 was 0.046
  • ⁇ n of the hologram 111 was 0.049
  • ⁇ n of the hologram 112 was 0.046
  • ⁇ n of the hologram 113 was 0.045
  • ⁇ n of the hologram 114 was 0.044
  • ⁇ n of the hologram 115 was 0.046
  • ⁇ n of the hologram 116 was 0.045.
  • Examples 25 to 28 using materials similar to one used in Example 1, photosensitive compositions for hologram recording 25 to 28 were prepared in a manner similar to Example 1 according to amounts of additives shown in the following Table 6.
  • Examples 29 to 32 using materials similar to one used in Example 2, photosensitive compositions for hologram recording 29 to 32 were prepared in a manner similar to Example 1 according to amounts of additives shown in the following Table 6.
  • hologram recording media 25 to 32 were prepared in a manner similar to Example 1.
  • holograms 25 to 32 were prepared in a manner similar to Example 1 except that exposure was carried out under conditions shown in Table 6.
  • the amounts of refractive index change ( ⁇ n) of each of Holograms 25 to 32 prepared herein were obtained in a manner similar to Example 1.
  • ⁇ n of the hologram 25 was 0.065
  • ⁇ n of the hologram 26 was 0.067
  • ⁇ n of the hologram 27 was 0.066
  • ⁇ n of the hologram 28 was 0.067
  • ⁇ n of the hologram 29 was 0.066
  • ⁇ n of the hologram 30 was 0.068
  • ⁇ n of the hologram 31 was 0.069
  • ⁇ n of the hologram 32 was 0.065.
  • Examples 33 to 37 using materials similar to one used in Example 1, photosensitive compositions for hologram recording 33 to 37 were prepared in a manner similar to Example 1 according to amounts of additives shown in the following Table 7.
  • Examples 38 to 42 using materials similar to one used in Example 2, photosensitive compositions for hologram recording 38 to 42 were prepared in a manner similar to Example 1 according to amounts of additives shown in the following Table 7.
  • hologram recording media 33 to 42 were prepared in a manner similar to Example 1.
  • holograms 33 to 42 were prepared in a manner similar to Example 1 except that exposure was carried out under conditions shown in Table 7.
  • the amounts of refractive index change ( ⁇ n) of each of Holograms 33 to 42 prepared herein were obtained in a manner similar to Example 1.
  • ⁇ n of the hologram 33 was 0.060
  • ⁇ n of the hologram 34 was 0.062
  • ⁇ n of the hologram 35 was 0.061
  • ⁇ n of the hologram 36 was 0.063
  • ⁇ n of the hologram 37 was 0.062
  • ⁇ n of the hologram 38 was 0.060
  • ⁇ n of the hologram 39 was 0.060
  • ⁇ n of the hologram 40 was 0.062
  • ⁇ n of the hologram 41 was 0.063
  • ⁇ n of the hologram 42 was 0.062.
  • a photosensitive composition for hologram recording 43 was prepared by mixing, at room temperature, 1.1 g of the compound 5-5 as a polyfunctional (bifunctional) photopolymerizable monomer, 0.3 g of the compound 5-1 as a monofunctional photopolymerizable monomer, 0.5 g of polyvinyl acetate ("SN-55T", available from Denka Company Limited) as a binder resin, 0.09 g of 4-isopropyl-4'-methyldiphenyliodonium tetrakis(pentafluorophenyl)borate ("DI", available from Tokyo Chemical Industry Co., Ltd.) as a photopolymerization initiator, 0.03 g of hydroquinone ("HQ”, available from FUJIFILM Wako Pure Chemical Corporation) as a polymerization inhibitor, 1 g of diethyl sebacate (“SDE”, available from FUJIFILM Wako Pure Chemical Corporation) as a plasticizer, 0.08 g of rose bengal "RB" available
  • the photosensitive composition for hologram recording 43 was applied by a bar coater to a polyvinyl alcohol film having a thickness of 2.5 ⁇ m so as to make a dried film have a thickness of 3 ⁇ m. Then, a film surface of a photosensitive layer 43 including resin of the photosensitive composition for hologram recording 43 was pressured and bonded to a glass substrate having a thickness of 1.0 mm, whereby preparing a hologram recording medium 43.
  • the hologram recording medium 43 was subjected to two-luminous-flux interference exposure by a semiconductor laser with an exposure wavelength of 532 nm, and then the entire surface of the medium 43 was irradiated with UV light to cure an uncured monomer, whereby fixing a refractive index distribution on the medium 43.
  • the light intensity of a single luminous flux on the recording medium was set to 2.6 mW/cm 2 , and the medium 43 was subjected to interference exposure for 30 seconds, making the two luminous fluxes form a 7-degree angle. Accordingly, the refractive index distribution was formed on the hologram recording medium 43, whereby preparing a hologram 43.
  • the amount of refractive index change ( ⁇ n) of Hologram 43 prepared herein was calculated based on the Kogelnik theoretical formula, and the amount of refractive index change ( ⁇ n) was 0.091.
  • photosensitive composition for hologram recording 44 to 49 were prepared in a manner similar to Example 43 according to amounts of additives shown in the following Table 8 except that the compound 5-6 was used as a polyfunctional (bifunctional) photopolymerizable monomer in Example 44, the compound 5-7 was used as a polyfunctional (bifunctional) photopolymerizable monomer in Example 45, the compound 6-1 was used as a polyfunctional (trifunctional) photopolymerizable monomer in Example 46, the compound 7-1 was used as a polyfunctional (trifunctional) photopolymerizable monomer in Example 47, EA-0200 was used as a polyfunctional (bifunctional) photopolymerizable monomer in Example 48, and 3,11-DAEDNT was used as a polyfunctional (bifunctional) photopolymerizable monomer in Example 49.
  • hologram recording media 44 to 49 were prepared in a manner similar to Example 43.
  • holograms 44 to 49 were prepared in a manner similar to Example 43 except that exposure was carried out under conditions shown in Table 8.
  • the amounts of refractive index change ( ⁇ n) of each of Holograms 44 to 49 prepared herein were obtained in a manner similar to Example 43.
  • ⁇ n of the hologram 44 was 0.092
  • ⁇ n of the hologram 45 was 0.09
  • ⁇ n of the hologram 46 was 0.09
  • ⁇ n of the hologram 47 was 0.093
  • ⁇ n of the hologram 48 was 0.085
  • ⁇ n of the hologram 49 was 0.09.
  • photosensitive composition for hologram recording 50 to 56 were prepared in a manner similar to Example 43 according to amounts of additives shown in the following Table 8 except that the compound 5-2 was used as a monofunctional photopolymerizable monomer in Example 50, the compound 5-6 as a polyfunctional (bifunctional) photopolymerizable monomer and the compound 1-2 as a monofunctional photopolymerizable monomer were used in Example 51, the compound 5-7 as a polyfunctional (bifunctional) photopolymerizable monomer and the compound 1-2 as a monofunctional photopolymerizable monomer were used in Example 52, the compound 6-1 as a polyfunctional (trifunctional) photopolymerizable monomer and the compound 1-2 as a monofunctional photopolymerizable monomer were used in Example 53, the compound 7-1 as a polyfunctional (trifunctional) photopolymerizable monomer and the compound 1-2 as a monofunctional photopolymerizable monomer were used in Example 54, EA-0
  • hologram recording media 50 to 56 were prepared in a manner similar to Example 43.
  • holograms 50 to 56 were prepared in a manner similar to Example 43 except that exposure was carried out under conditions shown in Table 8.
  • the amounts of refractive index change ( ⁇ n) of each of Holograms 50 to 56 prepared herein were obtained in a manner similar to Example 43.
  • ⁇ n of the hologram 50 was 0.09
  • ⁇ n of the hologram 51 was 0.091
  • ⁇ n of the hologram 52 was 0.092
  • ⁇ n of the hologram 53 was 0.092
  • ⁇ n of the hologram 54 was 0.093
  • ⁇ n of the hologram 55 was 0.086
  • ⁇ n of the hologram 56 was 0.09.
  • photosensitive composition for hologram recording 57 to 63 were prepared in a manner similar to Example 43 according to amounts of additives shown in the following Table 9 except that the compound 1-3 was used as a monofunctional photopolymerizable monomer in Example 57, the compound 5-6 as a polyfunctional (bifunctional) photopolymerizable monomer and the compound 1-3 as a monofunctional photopolymerizable monomer were used in Example 58, the compound 5-7 as a polyfunctional (bifunctional) photopolymerizable monomer and the compound 1-3 as a monofunctional photopolymerizable monomer were used in Example 59, the compound 6-1 as a polyfunctional (trifunctional) photopolymerizable monomer and the compound 1-3 as a monofunctional photopolymerizable monomer were used in Example 60, the compound 7-1 as a polyfunctional (trifunctional) photopolymerizable monomer and the compound 1-3 as a monofunctional photopolymerizable monomer were used in Example
  • hologram recording media 57 to 63 were prepared in a manner similar to Example 43.
  • holograms 57 to 63 were prepared in a manner similar to Example 43 except that exposure was carried out under conditions shown in Table 9.
  • the amounts of refractive index change ( ⁇ n) of each of Holograms 57 to 63 prepared herein were obtained in a manner similar to Example 43.
  • ⁇ n of the hologram 57 was 0.09
  • ⁇ n of the hologram 58 was 0.093
  • ⁇ n of the hologram 59 was 0.092
  • ⁇ n of the hologram 60 was 0.094
  • ⁇ n of the hologram 61 was 0.095
  • ⁇ n of the hologram 62 was 0.087
  • ⁇ n of the hologram 63 was 0.091.
  • the photosensitive composition for hologram recording 64 to 70 were prepared in a manner similar to Example 43 according to amounts of additives shown in the following Table 9 except that the compound 1-4 was used as a monofunctional photopolymerizable monomer in Example 64, the compound 5-6 as a polyfunctional (bifunctional) photopolymerizable monomer and the compound 1-4 as a monofunctional photopolymerizable monomer were used in Example 65, the compound 5-7 as a polyfunctional (bifunctional) photopolymerizable monomer and the compound 1-4 as a monofunctional photopolymerizable monomer were used in Example 66, the compound 6-1 as a polyfunctional (trifunctional) photopolymerizable monomer and the compound 1-4 as a monofunctional photopolymerizable monomer were used in Example 67, the compound 7-1 as a polyfunctional (trifunctional) photopolymerizable monomer and the compound 1-4 as a monofunctional photopolymerizable monomer were used in Example 68,
  • hologram recording media 64 to 70 were prepared in a manner similar to Example 43.
  • holograms 64 to 70 were prepared in a manner similar to Example 43 except that exposure was carried out under conditions shown in Table 9.
  • the amounts of refractive index change ( ⁇ n) of each of Holograms 64 to 70 prepared herein were obtained in a manner similar to Example 43.
  • ⁇ n of the hologram 64 was 0.091
  • ⁇ n of the hologram 65 was 0.091
  • ⁇ n of the hologram 66 was 0.095
  • ⁇ n of the hologram 67 was 0.094
  • ⁇ n of the hologram 68 was 0.092
  • ⁇ n of the hologram 69 was 0.088
  • ⁇ n of the hologram 70 was 0.092.
  • photosensitive composition for hologram recording 71 to 75 were prepared in a manner similar to Example 43 according to amounts of additives shown in the following Table 10 except that N-vinylcarbazole (“NVC”) was used as a monofunctional photopolymerizable monomer in Example 71, the compound 5-6 as a polyfunctional (bifunctional) photopolymerizable monomer and N-vinylcarbazole (“NVC") as a monofunctional photopolymerizable monomer were used in Example 72, the compound 5-7 as a polyfunctional (bifunctional) photopolymerizable monomer and N-vinylcarbazole (“NVC") as a monofunctional photopolymerizable monomer were used in Example 73, the compound 6-1 as a polyfunctional (trifunctional) photopolymerizable monomer and N-vinylcarbazole (“NVC”) as a monofunctional photopolymerizable monomer were used in Example74, and the compound 7-1 as a polyfunctional
  • hologram recording media 71 to 75 were prepared in a manner similar to Example 43.
  • holograms 71 to 75 were prepared in a manner similar to Example 43 except that exposure was carried out under conditions shown in Table 10.
  • the amounts of refractive index change ( ⁇ n) of each of Holograms 71 to 75 prepared herein were obtained in a manner similar to Example 43.
  • ⁇ n of the hologram 71 was 0.085
  • ⁇ n of the hologram 72 was 0.086
  • ⁇ n of the hologram 73 was 0.085
  • ⁇ n of the hologram 74 was 0.087
  • ⁇ n of the hologram 75 was 0.088.
  • photosensitive composition for hologram recording 76 to 80 were prepared in a manner similar to Example 43 according to amounts of additives shown in the following Table 10 except that DNTMA was used as a monofunctional photopolymerizable monomer in Example 76, the compound 5-6 as a polyfunctional (bifunctional) photopolymerizable monomer and DNTMA as a monofunctional photopolymerizable monomer were used in Example 77, the compound 5-7 as a polyfunctional (bifunctional) photopolymerizable monomer and DNTMA as a monofunctional photopolymerizable monomer were used in Example 78, the compound 6-1 as a polyfunctional (trifunctional) photopolymerizable monomer and DNTMA as a monofunctional photopolymerizable monomer were used in Example 79, and the compound 7-1 as a polyfunctional (trifunctional) photopolymerizable monomer and DNTMA as a monofunctional photopolymerizable monomer were used in Example 80.
  • DNTMA was used as a monofunctional photo
  • hologram recording media 76 to 80 were prepared in a manner similar to Example 43.
  • holograms 76 to 80 were prepared in a manner similar to Example 43 except that exposure was carried out under conditions shown in Table 10.
  • the amounts of refractive index change ( ⁇ n) of each of Holograms 76 to 80 prepared herein were obtained in a manner similar to Example 43.
  • ⁇ n of the hologram 76 was 0.091
  • ⁇ n of the hologram 77 was 0.092
  • ⁇ n of the hologram 78 was 0.091
  • ⁇ n of the hologram 79 was 0.09
  • ⁇ n of the hologram 80 was 0.09.
  • a photosensitive composition for hologram recording 117 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • HQ hydroquinone
  • Comparative Example 18 using a material similar to one used in Example 44, a photosensitive composition for hologram recording 118 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • a photosensitive composition for hologram recording 119 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • HQ hydroquinone
  • a photosensitive composition for hologram recording 120 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • a photosensitive composition for hologram recording 121 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • HQ hydroquinone
  • Comparative Example 22 using a material similar to one used in Example 48, a photosensitive composition for hologram recording 122 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • a photosensitive composition for hologram recording 123 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used. Note that the photosensitive compositions for hologram recording 117 to 123 were prepared according to amounts of additives shown in the following Table 11.
  • hologram recording media 117 to 123 were prepared in a manner similar to Example 43.
  • holograms 117 to 123 were prepared in a manner similar to Example 43 except that exposure was carried out under conditions shown in the following Table 11.
  • the amounts of refractive index change ( ⁇ n) of each of Holograms 117 to 123 prepared herein were obtained in a manner similar to Example 43.
  • ⁇ n of the hologram 117 was 0.051
  • ⁇ n of the hologram 118 was 0.052
  • ⁇ n of the hologram 119 was 0.05
  • ⁇ n of the hologram 120 was 0.053
  • ⁇ n of the hologram 121 was 0.054
  • ⁇ n of the hologram 122 was 0.051
  • ⁇ n of the hologram 123 was 0.054.
  • a photosensitive composition for hologram recording 124 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • a photosensitive composition for hologram recording 125 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • a photosensitive composition for hologram recording 126 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • HQ hydroquinone
  • Comparative Example 27 using a material similar to one used in Example 53, a photosensitive composition for hologram recording 127 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • a photosensitive composition for hologram recording 128 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • HQ hydroquinone
  • Comparative Example 29 using a material similar to one used in Example 55, a photosensitive composition for hologram recording 129 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • a photosensitive composition for hologram recording 130 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used. Note that the photosensitive compositions for hologram recording 124 to 130 were prepared according to amounts of additives shown in the following Table 11.
  • hologram recording media 124 to 130 were prepared in a manner similar to Example 43.
  • holograms 124 to 130 were prepared in a manner similar to Example 43 except that exposure was carried out under conditions shown in the following Table 11.
  • the amounts of refractive index change ( ⁇ n) of each of Holograms 124 to 130 prepared herein were obtained in a manner similar to Example 43.
  • ⁇ n of the hologram 124 was 0.055, ⁇ n of the hologram 125 was 0.053, ⁇ n of the hologram 126 was 0.055, ⁇ n of the hologram 127 was 0.054, ⁇ n of the hologram 128 was 0.055, ⁇ n of the hologram 129 was 0.05, and ⁇ n of the hologram 130 was 0.054.
  • a photosensitive composition for hologram recording 131 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • HQ hydroquinone
  • a photosensitive composition for hologram recording 132 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • a photosensitive composition for hologram recording 133 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • HQ hydroquinone
  • Comparative Example 34 using a material similar to one used in Example 60, a photosensitive composition for hologram recording 134 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • a photosensitive composition for hologram recording 135 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • HQ hydroquinone
  • Comparative Example 36 using a material similar to one used in Example 62, a photosensitive composition for hologram recording 136 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • a photosensitive composition for hologram recording 137 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used. Note that the photosensitive compositions for hologram recording 131 to 137 were prepared according to amounts of additives shown in the following Table 12.
  • hologram recording media 131 to 137 were prepared in a manner similar to Example 43.
  • holograms 131 to 137 were prepared in a manner similar to Example 43 except that exposure was carried out under conditions shown in the following Table 12.
  • the amounts of refractive index change ( ⁇ n) of each of Holograms 131 to 137 prepared herein were obtained in a manner similar to Example 43.
  • ⁇ n of the hologram 131 was 0.054, ⁇ n of the hologram 132 was 0.055, ⁇ n of the hologram 133 was 0.053, ⁇ n of the hologram 134 was 0.052, ⁇ n of the hologram 135 was 0.054, ⁇ n of the hologram 136 was 0.05, and ⁇ n of the hologram 137 was 0.055.
  • a photosensitive composition for hologram recording 138 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • HQ hydroquinone
  • Comparative Example 39 using a material similar to one used in Example 65, a photosensitive composition for hologram recording 139 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • a photosensitive composition for hologram recording 140 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • HQ hydroquinone
  • Comparative Example 41 using a material similar to one used in Example 67, a photosensitive composition for hologram recording 141 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • a photosensitive composition for hologram recording 142 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • HQ hydroquinone
  • a photosensitive composition for hologram recording 143 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • a photosensitive composition for hologram recording 144 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used. Note that the photosensitive compositions for hologram recording 138 to 144 were prepared according to amounts of additives shown in the following Table 12.
  • hologram recording media 138 to 144 were prepared in a manner similar to Example 43.
  • holograms 138 to 144 were prepared in a manner similar to Example 43 except that exposure was carried out under conditions shown in the following Table 12.
  • the amounts of refractive index change ( ⁇ n) of each of Holograms 138 to 144 prepared herein were obtained in a manner similar to Example 43.
  • ⁇ n of the hologram 138 was 0.051
  • ⁇ n of the hologram 139 was 0.052
  • ⁇ n of the hologram 140 was 0.053
  • ⁇ n of the hologram 141 was 0.054
  • ⁇ n of the hologram 142 was 0.055
  • ⁇ n of the hologram 143 was 0.05
  • ⁇ n of the hologram 144 was 0.054.
  • Comparative Example 45 using a material similar to one used in Example 71, a photosensitive composition for hologram recording 145 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • Comparative Example 46 using a material similar to one used in Example 72, a photosensitive composition for hologram recording 146 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • a photosensitive composition for hologram recording 147 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • HQ hydroquinone
  • Comparative Example 48 using a material similar to one used in Example 74, a photosensitive composition for hologram recording 148 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • a photosensitive composition for hologram recording 149 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used. Note that the photosensitive compositions for hologram recording 145 to 149 were prepared according to amounts of additives shown in the following Table 13.
  • hologram recording media 145 to 149 were prepared in a manner similar to Example 43.
  • holograms 145 to 149 were prepared in a manner similar to Example 43 except that exposure was carried out under conditions shown in Table 13.
  • the amounts of refractive index change ( ⁇ n) of each of Holograms 145 to 149 prepared herein were obtained in a manner similar to Example 43.
  • ⁇ n of the hologram 145 was 0.049
  • ⁇ n of the hologram 146 was 0.05
  • ⁇ n of the hologram 147 was 0.048
  • ⁇ n of the hologram 148 was 0.048
  • ⁇ n of the hologram 149 was 0.049.
  • Comparative Example 50 using a material similar to one used in Example 76, a photosensitive composition for hologram recording 150 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • Comparative Example 51 using a material similar to one used in Example 77, a photosensitive composition for hologram recording 151 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • a photosensitive composition for hologram recording 152 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • HQ hydroquinone
  • Comparative Example 53 using a material similar to one used in Example 79, a photosensitive composition for hologram recording 153 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used.
  • a photosensitive composition for hologram recording 154 was prepared in a manner similar to Example 43 except that no polymerization inhibitor (hydroquinone ("HQ", available from FUJIFILM Wako Pure Chemical Corporation) was used. Note that the photosensitive compositions for hologram recording 150 to 154 were prepared according to amounts of additives shown in the following Table 13.
  • hologram recording media 150 to 154 were prepared in a manner similar to Example 43.
  • holograms 150 to 154 were prepared in a manner similar to Example 43 except that exposure was carried out under conditions shown in the following Table 13.
  • the amounts of refractive index change ( ⁇ n) of each of Holograms 150 to 154 prepared herein were obtained in a manner similar to Example 43.
  • ⁇ n of the hologram 150 was 0.051
  • ⁇ n of the hologram 151 was 0.052
  • ⁇ n of the hologram 152 was 0.051
  • ⁇ n of the hologram 153 was 0.055
  • ⁇ n of the hologram 154 was 0.054.
  • photosensitive composition for hologram recording 44 to 49 were prepared in a manner similar to Example 43 according to amounts of additives shown in the following Table 14 except that bisphenoxy ethanol fluorene dimethacrylate ("EA-0200", available from Osaka Gas Chemicals Co., Ltd.) as a polyfunctional (bifunctional) photopolymerizable monomer and the compound 10-1 as a monofunctional photopolymerizable monomer were used in Example 81, and bisphenoxy ethanol fluorene dimethacrylate ("EA-0200", available from Osaka Gas Chemicals Co., Ltd.) as a polyfunctional (bifunctional) photopolymerizable monomer and the compound 10-2 as a monofunctional photopolymerizable monomer were used in Example 82.
  • EA-0200 bisphenoxy ethanol fluorene dimethacrylate
  • EA-0200 available from Osaka Gas Chemicals Co., Ltd.
  • hologram recording media 81 to 82 were prepared in a manner similar to Example 43.
  • holograms 81 to 82 were prepared in a manner similar to Example 43 except that exposure was carried out under conditions shown in Table 14.
  • the amounts of refractive index change ( ⁇ n) of each of Holograms 81 to 82 prepared herein were obtained in a manner similar to Example 43.
  • ⁇ n of the hologram 81 was 0.090
  • ⁇ n of the hologram 82 was 0.092.
  • photosensitive compositions for hologram recording 83 to 88 were prepared in a manner similar to Example 43 according to amounts of additives shown in the following Table 15 except that bisphenoxy ethanol fluorene dimethacrylate ("EA-0200", available from Osaka Gas Chemicals Co., Ltd.) as a polyfunctional (bifunctional) photopolymerizable monomer, N-vinylcarbazole (“NVC", available from Sigma-Aldrich) as a monofunctional photopolymerizable monomer, and phenothiazine ("PT”, available from Tokyo Chemical Industry Co., Ltd.) as a polymerization inhibitor were used in Examples 83 to 86, bisphenoxy ethanol fluorene dimethacrylate ("EA-0200", available from Osaka Gas Chemicals Co., Ltd.) as a polyfunctional (bifunctional) photopolymerizable monomer, 2-(9H-carbazole-9-yl)ethyl acrylate ("EA-0200", available from Osaka
  • hologram recording media 83 to 88 were prepared in a manner similar to Example 43.
  • holograms 81 to 82 were prepared in a manner similar to Example 43 except that exposure was carried out under conditions shown in Table 14.
  • the amounts of refractive index change ( ⁇ n) of each of Holograms 83 to 88 prepared herein were obtained in a manner similar to Example 43.
  • ⁇ n of the hologram 83 was 0.066
  • ⁇ n of the hologram 84 was 0.069
  • ⁇ n of the hologram 85 was 0.068
  • ⁇ n of the hologram 86 was 0.060
  • ⁇ n of the hologram 87 was 0.062
  • ⁇ n of the hologram 88 was 0.061.
  • photosensitive compositions for hologram recording 1 to 82 prepared in Examples 1 to 82 according to the present technology are determined by, for example, chromatography typified by nuclear magnetic resonance spectroscopy, infrared spectroscopy, Raman spectroscopy, ultraviolet-visible absorption spectroscopy, high performance liquid chromatography, gas chromatography, and the like.
  • Examples are examples in which a polymerization inhibitor was used as an additive, while Comparative Examples are examples in which no polymerization inhibitor was used.
  • Comparative Examples are examples in which no polymerization inhibitor was used.
  • comparison of the results between Examples 1 to 4 and Comparative Examples 1 to 4 comparison of the results between Examples 5 to 8 and Comparative Examples 5 to 8, comparison of the results between Examples 9 to 12 and Comparative Examples 9 to 12, comparison of the results between Examples 13 to 16 and Comparative Examples 13 to 16, comparison of the results between Examples 17 to 24 and Comparative Examples 1 to 4, comparison of the results between Examples 1 to 4 and Examples 17 to 24, comparison of the results between Examples 43 to 56 and Comparative Examples 17 to 28, comparison of the results between Examples 57 to 70 and Comparative Examples 31 to 44, comparison of the results between Examples 71 to 80 and Comparative Examples 45 to 54, and the results of Examples 81 to 88.
  • the first effect is prevention of forming polymers in regions which mutually dim (dark sections) during interference exposure.
  • a polymer formed by polymerization may be a factor that inhibits diffusion when it is present in a diffusion path of components that change the refractive index such as a monomer, a plasticizer, and a matrix.
  • a polymerization inhibitor is effective in preventing formation of polymers which inhibit such diffusion.
  • the second effect is prevention of consuming monomers in the dark sections. Such an effect increases a quantity of monomers that diffuse from the dark sections to regions which mutually intensify (bright sections) during interference exposure, causing promotion of the refractive index change.
  • each photosensitive composition since a monomer with a high refractive index is contained in each photosensitive composition, when components with a low refractive index, such as a plasticizer and a matrix, and the monomer with a high refractive index are separated by interference exposure, the refractive index changes in a large extent.
  • the polymerization inhibitor promotes the separation of the components that change the refractive index, it is possible to obtain high ⁇ n due to a synergistic effect of containing the monomer with a high refractive index.
  • the polymerization inhibitor Before the interference exposure, the polymerization inhibitor is uniformly present in the hologram recording medium. For this reason, a photopolymerization initiation reaction and a termination reaction due to the polymerization inhibitor compete in both of the regions which mutually intensify (bright sections) and the regions which mutually dim (dark sections) during interference exposure. With an exposure intensity weaker than an optimum exposure intensity, the effect of the termination reaction due to the polymerization inhibitor in the bright sections becomes prominent, which hardly progresses polymerization. Accordingly, the components that change the refractive index are prevented from being separated from each other, leading to a decrease in ⁇ n.

Claims (14)

  1. Lichtempfindliche Zusammensetzung für die Hologrammaufzeichnung, umfassend mindestens:
    mindestens zwei Arten von photopolymerisierbaren Monomeren; einen Photopolymerisationsinitiator;
    ein Bindemittelharz und mindestens einen Polymerisationsinhibitor,
    wobei es sich bei den mindestens zwei Arten von photopolymerisierbaren Monomeren um ein monofunktionelles Monomer und ein polyfunktionelles Monomer handelt und
    wobei der mindestens eine Polymerisationsinitiator eine Benzotriazolverbindung umfasst.
  2. Lichtempfindliche Zusammensetzung für die Hologrammaufzeichnung nach Anspruch 1, wobei es sich bei dem monofunktionellen Monomer um ein Dinaphthothiophen-Monomer handelt und es sich bei dem polyfunktionellen Monomer um ein Dinaphthothiophen-Monomer handelt, insbesondere wobei der mindestens eine Polymerisationsinhibitor eine Chinonverbindung umfasst oder wobei der mindestens eine Polymerisationsinitiator eine Thiazinverbindung umfasst.
  3. Lichtempfindliche Zusammensetzung für die Hologrammaufzeichnung nach Anspruch 1, ferner umfassend ein anorganisches teilchenförmiges Material, insbesondere wobei es sich bei dem anorganischen teilchenförmigen Material um teilchenförmiges ZrO2-Material oder teilchenförmiges TiO2-Material handelt und/oder wobei es sich bei dem monofunktionellen Monomer um ein Carbazol-Monomer handelt und es sich bei dem polyfunktionellen Monomer um ein Fluoren-Monomer handelt.
  4. Lichtempfindliche Zusammensetzung für die Hologrammaufzeichnung nach Anspruch 1, wobei der mindestens eine Polymerisationsinhibitor eine gehinderte Phenolverbindung umfasst.
  5. Lichtempfindliche Zusammensetzung für die Hologrammaufzeichnung nach Anspruch 4, wobei es sich bei dem monofunktionellen Monomer um ein Carbazol-Monomer handelt und es sich bei dem polyfunktionellen Monomer um ein Fluoren-Monomer handelt.
  6. Lichtempfindliche Zusammensetzung für die Hologrammaufzeichnung nach Anspruch 1, wobei es sich bei dem monofunktionellen Monomer um ein Carbazol-Monomer handelt und es sich bei dem polyfunktionellen Monomer um ein Fluoren-Monomer handelt.
  7. Lichtempfindliche Zusammensetzung für die Hologrammaufzeichnung nach Anspruch 1, wobei es sich bei dem monofunktionellen Monomer um ein Carbazol-Monomer handelt und es sich bei dem polyfunktionellen Monomer um ein Fluoren-Monomer handelt, insbesondere wobei der mindestens eine Polymerisationsinhibitor eine Chinonverbindung umfasst oder wobei der mindestens eine Polymerisationsinitiator eine Thiazinverbindung umfasst.
  8. Lichtempfindliche Zusammensetzung für die Hologrammaufzeichnung nach Anspruch 1, wobei es sich bei dem polyfunktionellen Monomer um ein Triphenylethinylbenzol-Monomer oder ein Trinaphthylethinylbenzol-Monomer handelt, insbesondere wobei der mindestens eine Polymerisationsinhibitor eine Chinonverbindung umfasst oder wobei der mindestens eine Polymerisationsinitiator eine Thiazinverbindung umfasst.
  9. Lichtempfindliche Zusammensetzung für die Hologrammaufzeichnung nach Anspruch 1, wobei es sich bei dem monofunktionellen Monomer um ein Dinaphthothiophen-Monomer handelt, insbesondere wobei der mindestens eine Polymerisationsinhibitor eine Chinonverbindung umfasst oder wobei der mindestens eine Polymerisationsinitiator eine Thiazinverbindung umfasst.
  10. Lichtempfindliche Zusammensetzung für die Hologrammaufzeichnung nach Anspruch 1, wobei es sich bei dem polyfunktionellen Monomer um ein Dinaphthothiophen-Monomer handelt, insbesondere wobei der mindestens eine Polymerisationsinhibitor eine Chinonverbindung umfasst oder wobei der mindestens eine Polymerisationsinitiator eine Thiazinverbindung umfasst.
  11. Hologrammaufzeichnungsmedium, umfassend: mindestens eine lichtempfindliche Schicht, die die lichtempfindliche Zusammensetzung für die Hologrammaufzeichnung nach Anspruch 1 enthält; und mindestens ein transparentes Basismaterial, wobei die lichtempfindliche Schicht auf dem mindestens einen transparenten Basismaterial ausgebildet ist.
  12. Hologramm, erhalten unter Verwendung eines Hologrammaufzeichnungsmediums, umfassend:
    mindestens eine lichtempfindliche Schicht, die eine lichtempfindliche Zusammensetzung für die Hologrammaufzeichnung enthält, die mindestens Folgendes enthält:
    mindestens zwei Arten von photopolymerisierbaren Monomeren; einen Photopolymerisationsinitiator;
    ein Bindemittelharz und mindestens einen Polymerisationsinhibitor, wobei es sich bei den mindestens zwei Arten von photopolymerisierbaren Monomeren um ein monofunktionelles Monomer und ein polyfunktionelles Monomer handelt; und
    mindestens ein transparentes Basismaterial, wobei die lichtempfindliche Schicht auf dem mindestens einen transparenten Basismaterial ausgebildet ist;
    wobei der Betrag der Brechungsindexänderung des Hologramms 0,06 oder mehr beträgt.
  13. Lichtempfindliche Zusammensetzung für die Hologrammaufzeichnung nach Anspruch 1, wobei es sich bei dem monofunktionellen Monomer um eine Verbindung handelt, die durch die folgende allgemeine Formel (8) wiedergegeben wird:
    Figure imgb0050
     (in der allgemeinen Formel (8) stehen R801 und R802 unabhängig für einen einwertigen Substituenten, der durch die folgende allgemeine Formel (9) wiedergegeben wird, wobei i und j unabhängig für eine ganze Zahl mit einem Wert von 0 oder 1 stehen und i und j nicht gleichzeitig für 0 oder 1 stehen),
    Figure imgb0051
    Figure imgb0052
     (in der allgemeinen Formel (9) stehen R903 und R904 unabhängig für eine Einfachbindung oder eine substituierte oder unsubstituierte gerade oder verzweigte C1-10-Alkylengruppe, steht R905 für Wasserstoff oder eine substituierte oder unsubstituierte gerade oder verzweigte C1-10-Alkylgruppe und steht X für eine zweiwertige aromatische Gruppe, die durch die folgenden Formeln (9-1) bis (9-8) wiedergegeben wird, ist die zweiwertige aromatische Gruppe unsubstituiert oder enthält mindestens einen Substituenten, können sich zwei Bindungsstellen der zweiwertigen aromatischen Gruppe für R903 und R904 an einem beliebigen Kohlenstoffatom in der zu bindenden aromatischen Gruppe befinden),
    Figure imgb0053
    Figure imgb0054
  14. Lichtempfindliche Zusammensetzung für die Hologrammaufzeichnung nach Anspruch 13, wobei es sich bei dem polyfunktionellen Monomer um ein Fluoren-Monomer handelt.
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