AU2003221077A1 - Photopolymer composition for holographic recording material, holographic recording medium, and process for producing the same - Google Patents

Photopolymer composition for holographic recording material, holographic recording medium, and process for producing the same

Info

Publication number
AU2003221077A1
AU2003221077A1 AU2003221077A AU2003221077A AU2003221077A1 AU 2003221077 A1 AU2003221077 A1 AU 2003221077A1 AU 2003221077 A AU2003221077 A AU 2003221077A AU 2003221077 A AU2003221077 A AU 2003221077A AU 2003221077 A1 AU2003221077 A1 AU 2003221077A1
Authority
AU
Australia
Prior art keywords
holographic recording
producing
same
recording medium
photopolymer composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003221077A
Inventor
Kouji Aoki
Naruhito Iwasa
Yasuo Matoba
Takashi Matsuo
Tetsuyuki Saika
Kazunori Yokoyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osaka Soda Co Ltd
Original Assignee
Daiso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daiso Co Ltd filed Critical Daiso Co Ltd
Publication of AU2003221077A1 publication Critical patent/AU2003221077A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer
AU2003221077A 2002-03-27 2003-03-25 Photopolymer composition for holographic recording material, holographic recording medium, and process for producing the same Abandoned AU2003221077A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002089128 2002-03-27
JP2002-89128 2002-03-27
PCT/JP2003/003576 WO2003081344A1 (en) 2002-03-27 2003-03-25 Photopolymer composition for holographic recording material, holographic recording medium, and process for producing the same

Publications (1)

Publication Number Publication Date
AU2003221077A1 true AU2003221077A1 (en) 2003-10-08

Family

ID=28449487

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003221077A Abandoned AU2003221077A1 (en) 2002-03-27 2003-03-25 Photopolymer composition for holographic recording material, holographic recording medium, and process for producing the same

Country Status (3)

Country Link
JP (1) JP4325404B2 (en)
AU (1) AU2003221077A1 (en)
WO (1) WO2003081344A1 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050233246A1 (en) * 2004-04-16 2005-10-20 Eugene Boden Novel optical storage materials, methods of making the storage materials, and methods for storing and reading data
JP4496845B2 (en) * 2004-05-20 2010-07-07 日立化成工業株式会社 Photosensitive resin composition, photosensitive element using the same, resist pattern forming method, and printed wiring board manufacturing method
JP2006113164A (en) * 2004-10-13 2006-04-27 Daiso Co Ltd Hologram recording material composition with high transparency, hologram recording medium, and its manufacturing method
JP4745333B2 (en) * 2005-03-08 2011-08-10 新日鐵化学株式会社 Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same
US8034514B2 (en) 2005-03-08 2011-10-11 Nippon Steel Chemical Co., Ltd. Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same
WO2008096712A1 (en) * 2007-02-05 2008-08-14 Nippon Steel Chemical Co., Ltd. Volume phase hologram recording material and optical information recording medium
JP5214986B2 (en) * 2008-01-23 2013-06-19 新日鉄住金化学株式会社 Volume phase hologram recording material and optical information recording medium using the same
JP5230254B2 (en) * 2008-05-01 2013-07-10 株式会社林原 Photosensitive composition for volume hologram recording
WO2010125949A1 (en) * 2009-04-27 2010-11-04 日産化学工業株式会社 Photosensitive composition utilizing photopolymerizable polymer having fluorene skeleton
JP5533249B2 (en) 2010-05-20 2014-06-25 Ｔｄｋ株式会社 Volume hologram recording material and volume hologram recording medium
WO2018043593A1 (en) * 2016-08-30 2018-03-08 ソニー株式会社 Photosensitive composition for hologram recording, hologram recording medium, and hologram
WO2020071261A1 (en) * 2018-10-03 2020-04-09 富士フイルム株式会社 Chemical liquid and chemical liquid housing

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5315152A (en) * 1976-07-27 1978-02-10 Canon Inc Hologram
JPH0586149A (en) * 1991-09-30 1993-04-06 I C I Japan Kk Resin composition for optical three-dimensional molding and formation of three-dimensional molded product
JPH075796A (en) * 1993-02-09 1995-01-10 Toyo Ink Mfg Co Ltd Hologram recording composition, hologram recording medium, and production of hologram using the same
JPH08272284A (en) * 1995-03-31 1996-10-18 Toyo Ink Mfg Co Ltd Photosensitive material for hologram, recording medium for hologram and production of hologram using the same
JPH1010714A (en) * 1996-06-21 1998-01-16 Konica Corp Photosensitive composition
JP2001282082A (en) * 2000-01-25 2001-10-12 Natl Inst Of Advanced Industrial Science & Technology Meti Hologram recording material composition, hologram recording medium and producing method thereof
JP2002062786A (en) * 2000-06-09 2002-02-28 Mitsubishi Chemicals Corp Composition for volume hologram recording, and hologram recording medium
JP2003029604A (en) * 2001-07-19 2003-01-31 National Institute Of Advanced Industrial & Technology Composition for hologram recording material, hologram recording medium and method for manufacturing the same

Also Published As

Publication number Publication date
JPWO2003081344A1 (en) 2005-07-28
JP4325404B2 (en) 2009-09-02
WO2003081344A1 (en) 2003-10-02

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase