AU2003274736A1 - Structured material, magnetic recording medium utilizing the same, and magnetic recording/reproducing apparatus - Google Patents

Structured material, magnetic recording medium utilizing the same, and magnetic recording/reproducing apparatus

Info

Publication number
AU2003274736A1
AU2003274736A1 AU2003274736A AU2003274736A AU2003274736A1 AU 2003274736 A1 AU2003274736 A1 AU 2003274736A1 AU 2003274736 A AU2003274736 A AU 2003274736A AU 2003274736 A AU2003274736 A AU 2003274736A AU 2003274736 A1 AU2003274736 A1 AU 2003274736A1
Authority
AU
Australia
Prior art keywords
magnetic recording
same
reproducing apparatus
structured material
recording medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003274736A
Inventor
Tohru Den
Nobuhiro Yasui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of AU2003274736A1 publication Critical patent/AU2003274736A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C23C14/025—Metallic sublayers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
    • G11B5/7369—Two or more non-magnetic underlayers, e.g. seed layers or barrier layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/11—Magnetic recording head
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771—Transition metal-base component
    • Y10T428/12861—Group VIII or IB metal-base component
AU2003274736A 2002-10-23 2003-10-22 Structured material, magnetic recording medium utilizing the same, and magnetic recording/reproducing apparatus Abandoned AU2003274736A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002-308367 2002-10-23
JP2002308367A JP4136590B2 (en) 2002-10-23 2002-10-23 Alignment film, magnetic recording medium using alignment film, and magnetic recording / reproducing apparatus
PCT/JP2003/013471 WO2004038702A1 (en) 2002-10-23 2003-10-22 Structured material, magnetic recording medium utilizing the same, and magnetic recording/reproducing apparatus

Publications (1)

Publication Number Publication Date
AU2003274736A1 true AU2003274736A1 (en) 2004-05-13

Family

ID=32170972

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003274736A Abandoned AU2003274736A1 (en) 2002-10-23 2003-10-22 Structured material, magnetic recording medium utilizing the same, and magnetic recording/reproducing apparatus

Country Status (4)

Country Link
US (2) US7510780B2 (en)
JP (1) JP4136590B2 (en)
AU (1) AU2003274736A1 (en)
WO (1) WO2004038702A1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3897688B2 (en) 2002-12-11 2007-03-28 キヤノン株式会社 Optoelectronic wiring board
US7713389B2 (en) * 2005-12-21 2010-05-11 Hitachi Global Storage Technologies Netherlands B.V. Perpendicular magnetic recording disk with ultrathin nucleation film for improved corrosion resistance and method for making the disk
JP4405485B2 (en) 2006-08-02 2010-01-27 株式会社東芝 Magnetic film and method of manufacturing magnetic film
US20080057350A1 (en) * 2006-09-01 2008-03-06 Heraeus, Inc. Magnetic media and sputter targets with compositions of high anisotropy alloys and oxide compounds
JP2008159141A (en) * 2006-12-22 2008-07-10 Canon Inc Magnetic recording and reproducing device and information processor
US7892664B2 (en) * 2007-11-28 2011-02-22 Seagate Technology Llc Magnetic recording media having a chemically ordered magnetic layer
US9245563B2 (en) 2011-05-17 2016-01-26 Showa Denko K.K. Magnetic medium with an orientation control layer
US8609263B1 (en) * 2011-05-20 2013-12-17 WD Media, LLC Systems and methods for forming magnetic media with an underlayer

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19531372A1 (en) 1995-08-25 1997-02-27 Siemens Ag Smart card
US6248416B1 (en) 1997-11-10 2001-06-19 Carnegie Mellon University Highly oriented magnetic thin films, recording media, transducers, devices made therefrom and methods of making
JP3220116B2 (en) * 1999-07-06 2001-10-22 株式会社日立製作所 Perpendicular magnetic recording medium and magnetic storage device
JP3637883B2 (en) * 2000-08-31 2005-04-13 住友電気工業株式会社 Surface coated boron nitride sintered body tool
KR100374794B1 (en) * 2001-01-04 2003-03-04 삼성전자주식회사 Perpendicular magnetic recording media
JP4416408B2 (en) * 2002-08-26 2010-02-17 株式会社日立グローバルストレージテクノロジーズ Perpendicular magnetic recording medium

Also Published As

Publication number Publication date
JP4136590B2 (en) 2008-08-20
US20090176128A1 (en) 2009-07-09
US20060040118A1 (en) 2006-02-23
US8003238B2 (en) 2011-08-23
US7510780B2 (en) 2009-03-31
WO2004038702A1 (en) 2004-05-06
JP2004145946A (en) 2004-05-20

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase