EP1245385B1 - Nassoffset-Druckform mit fotothermisch veränderbarem Material, Verfahren und Vorrichtung zur Erzeugung und/oder Löschung eines Druckbildes einer Nassoffset-Druckform - Google Patents
Nassoffset-Druckform mit fotothermisch veränderbarem Material, Verfahren und Vorrichtung zur Erzeugung und/oder Löschung eines Druckbildes einer Nassoffset-Druckform Download PDFInfo
- Publication number
- EP1245385B1 EP1245385B1 EP02405245A EP02405245A EP1245385B1 EP 1245385 B1 EP1245385 B1 EP 1245385B1 EP 02405245 A EP02405245 A EP 02405245A EP 02405245 A EP02405245 A EP 02405245A EP 1245385 B1 EP1245385 B1 EP 1245385B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- printing form
- layer
- printing
- wet offset
- offset printing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000463 material Substances 0.000 title claims abstract description 101
- 238000000034 method Methods 0.000 title claims abstract description 40
- 230000008569 process Effects 0.000 title claims abstract description 33
- 238000007645 offset printing Methods 0.000 title claims abstract description 31
- 238000010521 absorption reaction Methods 0.000 claims abstract description 63
- 230000005855 radiation Effects 0.000 claims abstract description 29
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 26
- 238000010438 heat treatment Methods 0.000 claims abstract description 25
- 230000001678 irradiating effect Effects 0.000 claims abstract 2
- 238000007639 printing Methods 0.000 claims description 178
- 238000003384 imaging method Methods 0.000 claims description 43
- 238000005538 encapsulation Methods 0.000 claims description 16
- 238000009792 diffusion process Methods 0.000 claims description 14
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 12
- 230000001699 photocatalysis Effects 0.000 claims description 12
- 239000004065 semiconductor Substances 0.000 claims description 11
- 230000004888 barrier function Effects 0.000 claims description 10
- 239000002245 particle Substances 0.000 claims description 8
- 230000003647 oxidation Effects 0.000 claims description 7
- 238000007254 oxidation reaction Methods 0.000 claims description 7
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 claims description 7
- 238000001228 spectrum Methods 0.000 claims description 6
- 229910000831 Steel Inorganic materials 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- 230000009467 reduction Effects 0.000 claims description 5
- 239000010959 steel Substances 0.000 claims description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 239000002105 nanoparticle Substances 0.000 claims description 3
- 239000011787 zinc oxide Substances 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims 2
- 229910002370 SrTiO3 Inorganic materials 0.000 claims 1
- 239000004411 aluminium Substances 0.000 claims 1
- 230000002209 hydrophobic effect Effects 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 126
- 238000012217 deletion Methods 0.000 description 16
- 230000037430 deletion Effects 0.000 description 16
- 238000004140 cleaning Methods 0.000 description 7
- 238000009736 wetting Methods 0.000 description 7
- 229910010413 TiO 2 Inorganic materials 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- 238000009413 insulation Methods 0.000 description 6
- 230000009471 action Effects 0.000 description 5
- 239000003570 air Substances 0.000 description 5
- 230000005284 excitation Effects 0.000 description 5
- 230000003993 interaction Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 238000004378 air conditioning Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 230000018109 developmental process Effects 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 230000005281 excited state Effects 0.000 description 3
- 230000006798 recombination Effects 0.000 description 3
- 238000005215 recombination Methods 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 229910001093 Zr alloy Inorganic materials 0.000 description 2
- 230000002745 absorbent Effects 0.000 description 2
- 239000002250 absorbent Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 230000005660 hydrophilic surface Effects 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 238000013032 photocatalytic reaction Methods 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 238000009827 uniform distribution Methods 0.000 description 2
- 229910002367 SrTiO Inorganic materials 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012822 chemical development Methods 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- TUJKJAMUKRIRHC-UHFFFAOYSA-N hydroxyl Chemical compound [OH] TUJKJAMUKRIRHC-UHFFFAOYSA-N 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 230000003020 moisturizing effect Effects 0.000 description 1
- 239000011146 organic particle Substances 0.000 description 1
- 238000007146 photocatalysis Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002352 surface water Substances 0.000 description 1
- 230000010148 water-pollination Effects 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1041—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by modification of the lithographic properties without removal or addition of material, e.g. by the mere generation of a lithographic pattern
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/006—Cleaning, washing, rinsing or reclaiming of printing formes other than intaglio formes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41P—INDEXING SCHEME RELATING TO PRINTING, LINING MACHINES, TYPEWRITERS, AND TO STAMPS
- B41P2227/00—Mounting or handling printing plates; Forming printing surfaces in situ
- B41P2227/70—Forming the printing surface directly on the form cylinder
Definitions
- the invention relates to a wet offset printing form having a surface which can be imaged or imaged with a printed image, wherein this surface is formed by a material which contains a photocatalytically and thermally variable material as a proportion in a uniform distribution or consists solely of such a material.
- a photocatalytically and thermally changeable material is understood as meaning a material which, by irradiation with light, is photocatalytically displaceable into a hydrophilic state and thermally, namely by heating, into a lipophilic state.
- the invention further relates to a method of producing the printed image, i.
- the invention relates to a method and apparatus for imaging and erasing a printing form, for example for a multiple Imaging of the same printing form with different print images.
- the printing form, the method and the device are preferably used in wet offset web-fed rotary printing, in particular in newspaper printing.
- an imaging is understood to mean a process in which the printing form is acted upon at the locations which form the pixels, so that a latent image is produced on the printing form.
- a deletion is understood to mean a process in which the printing form is preferably treated in a manner not dependent on the image but on the entire surface in such a way that the image information applied during the imaging, ie the printed image is eliminated.
- the action in the imaging is preferably a image-wise heating, but in principle can also be a picture-wise irradiation with UV light.
- Newspapers are mainly produced in wet offset.
- Printing machines typically include printing units with blanket cylinders, plate cylinders, inking units and dampening units.
- a printing form stretched onto a printing form cylinder usually has a surface in the form of a top layer which, in the illustrated state, has hydrophilic (water-friendly) and lipophilic (water-repellent) regions.
- the printing form is formed by a printing plate, which is mounted on a plate cylinder designed as a plate cylinder.
- the printing form has imagewise applied lipophilic areas.
- the non-image sites are hydrophilic and bind water more strongly than paint.
- the lipophilic areas repel water and therefore have a color-friendly effect.
- any surface can be used for the offset process, which can be divided into hydrophilic and lipophilic areas.
- printing plates For the production of printing plates a variety of methods and devices using appropriate printing forms are known. For example, it is possible to imagewise irradiate a printing plate with a laser and then develop it chemically. Furthermore, printing forms can be produced by laser ablation. In this case, either lipophilic areas under a hydrophilic layer or hydrophilic areas under a lipophilic layer are exposed.
- the relevant for the imaging exposure process can either be done in a separate system or within the printing press, as the invention prefers this.
- the outer drum principle is known. In most cases, so-called process-free printing plates are used, which do not require any chemical development.
- Printing forms used today are used only once. For economic and ecological reasons, however, it is desirable to be able to use the same printing form multiple times.
- EP 0 911 154 A1 describes the imaging by imagewise heating and erasure by UV irradiation. Further details are described in EP 1 020 304 A2.
- a lithographic printing element which is made of a ceramic consisting of a zirconium alloy and an alpha-aluminum.
- the zirconium alloy When the zirconium alloy is converted from a stoichiometric composition to a substoichiometric composition, the ceramic changes its property from hydrophilic to lipophilic.
- the transition from a stoichiometric to a substoichiometric composition is achieved by reduction while the transition from the substoichiometric composition to the stoichiometric composition is achieved by oxidation.
- the oxidation can be achieved by thermally assisted oxidation or laser assisted oxidation.
- the oxidation converts the ceramic into a hydrophilic state.
- the reduction leading to a lipophilic state of the ceramic is described as a laser assisted reduction by exposure to 1064 mm radiation.
- EP 1 020 304 A2 discloses an offset printing method and a corresponding printing apparatus.
- the printing plate becomes hydrophilic at a first temperature and hydrophobic at the second temperature.
- a printing press and an image forming method for a printing press are known.
- the wet offset printing is described.
- a drying unit that uses hot air or UV radiation vaporizes a solvent.
- a device for wetting a polymer coating with a water solution is also provided.
- the printing form does not need to be specially cleaned after use for the deletion of the printed image.
- the imaging of a printing form and / or the deletion of a printed image of a printing form should or should be facilitated, preferably in a wet offset printing machine.
- the invention is based on the idea of achieving the local wetting behavior, that is to say the hydrophilic or lipophilic behavior of a printing form, by virtue of the atoms or molecules of a photocatalytically and thermally alterable material forming the imageable or imaged surface of the printing form. from an excited state in which they normally reside, be transferred by the imaging in a low-energy state. On deletion, conversely, the atoms or molecules are transferred from the low energy to the excited state.
- the printing form is thus before carrying out a Berithungsvorgangs or after performing a deletion process in a hydrophilic starting state, which is converted by a local, image-wise, preferably short-term, heating of the photocatalytically and thermally variable material in the imagewise lipophilic and hydrophilic state of use.
- An advantage of this type of imaging is that the unimaged printing form can be easily handled in daylight.
- the deletion of the printed image and not the imaging is done by the action of natural or artificial daylight or UV light, preferably on the entire surface of the printed image surface.
- the loss of an image in the installed state of the printing form is unlikely, since in the printing machine no more natural light impinges on the printing form, which would cause a deletion to a relevant extent.
- Yet another advantage is the self-cleaning property of the surface formed by the photocatalytically and thermally alterable material that is effective in erasing the image. Not only is the printing plate hydrophilic in its surface, but also organic residues are catalytically oxidized.
- the printing forme By imaging the printing forme by imagewise local irradiation, preferably laser irradiation, not the entire printing form, but only a near-surface depth range of the printing forme is briefly locally heated.
- the overall printing plate remains at ambient temperature, which generally corresponds to the usual room temperature.
- a printing form according to the invention has absorption centers for radiation in an upper layer, on the surface of which the printed image is produced, in order to generate heat by absorption of this radiation in the upper layer.
- the absorption centers will be formed by particles of a material (semiconductor material) which absorbs light, preferably infrared light (IR), which can extend into the visible range, ie, into the near infrared range (NIR).
- IR infrared light
- NIR near infrared range
- the absorbent material is uniformly dispersed in fine particles in the photocatalytic and thermally changeable material.
- the particles of the absorption material are preferably nanoparticles, ie particles whose maximum spatial extent is in the nanoscale.
- the known photocatalytic materials are transparent. Transparency is the immediate consequence of the band structure of the material. In fact, a band gap of more than 3 eV is required to cause the excitation of the photocatalytic material to a state in which the bonding of OH groups to the surface of the material in question is possible. At this bandgap energy, i. Band-gap energy, however, an interaction with low-energy, long-wave photons is not possible. Therefore, the known photocatalytic semiconductors are transparent in the visible range.
- the invention provides a photocatalytically and photothermally variable material by the fine distribution of the absorption centers in the photocatalytically and thermally alterable material.
- Semiconductors are particularly preferred examples of materials for forming the absorption centers.
- the upper layer which forms the surface to be imaged or already illustrated, thus comprises a photocatalytically interacting with light material and the absorption centers, which are finely distributed in the photocatalytically interactive material, hereinafter also referred to simply as a photocatalytic material.
- the photocatalytic material interacts with light whose wavelength is less than the wavelength or the wavelength range of the radiation absorbed by the absorption centers and converted into heat. Due to its bandgap energy of at least 3 eV, the photocatalytic material interacts only with light whose wavelength is less than 400 nm. The material forming the absorption centers interacts accordingly
- Radiation whose wavelength is 400 nm or larger, preferably, it absorbs light from the IR wavelength range.
- the invention provides a new material which has both photocatalytic and absorbing properties.
- One advantage is that the coating of a support material can be simplified, since both interactions, namely the photocatalysis and the absorption, take place in a single layer and therefore an absorption layer serving exclusively for absorption can be saved.
- the thickness of the photocatalytic and photothermally variable material layer is less critical. While in a multilayer system, the thickness of the photothermally variable top layer has a great influence on the heating, more uniform heating can be achieved within a single layer, as long as the absorption centers are homogeneously distributed in this layer. Furthermore, the heat-generating absorption centers are closer to the imageable or already imaged surface, so that sharper temperature gradients in the surface are possible.
- the producibility of particularly sharp temperature gradients on the surface is advantageous, in particular, for the preferred imaging by imagewise heating since the sharpness of the printed image is improved.
- the printing form according to the invention is in principle also advantageous for an imaging process in which the imaging is brought about by imagewise hydrophilization of the surface and erasure by full-surface hydrophobization.
- Eme likewise inventive printing form has below one of the top layer according to claim 1 on the surface of the printed image is generated, an absorption layer.
- the absorption layer is locally heated by short-term, local irradiation, ie it is heated according to image with locally warm and cold places.
- the absorption layer should be uniformly thin in order to release the heat primarily normal to the absorption layer to the preferably immediately above upper layer with the photocatalytically and thermally variable material and a heat balance within the absorption layer in the tangential direction between the image locally warm and to prevent cold spots of the absorption layer.
- the locally imagewise generated heat in the absorption layer is transferred by heat conduction from the absorption layer into the upper layer, so that the lipophilic areas of the printed image are formed on the surface of the upper layer.
- the two layers are thermally conductively connected to each other over the entire surface.
- the absorption layer preferably directly adjoins the upper layer.
- Each of the two layers interacts with radiation from a certain wavelength range, wherein the upper layer with radiation, which is particularly strongly absorbed by the absorption layer, little or no interaction, that is permeable to this radiation.
- the top layer interacts photocatalytically with light from the UV region, while the absorption layer is heated by interaction with radiation from another wavelength range, preferably from the IR region, which is transmitted by the top layer.
- the upper layer is likewise heated in accordance with the image by heat conduction from the imagewise heated absorption layer and forms the lipophilic image areas on its surface due to this heating.
- a thermal insulation layer is preferably provided between the absorption layer and a printing form support in order to minimize heat losses to the support. If an absorption layer is not present, a thermal insulation layer may nevertheless be formed between the upper layer and the support.
- absorption centers in the top layer can be dispensed with (not claimed).
- the absorption layer and the absorption centers in the upper layer may also be advantageously formed in combination.
- the formation of a printing form according to the invention by means of the absorption layer is also advantageous for an imaging process in which the imaging is effected by irradiation with UV light and the deletion by heating.
- the diffusion barrier can be formed, for example, by an SiO 2 quartz layer.
- a layer acting as a diffusion barrier should be at most 1 ⁇ m thick, preferably such a layer has a uniform thickness of 100 nm less.
- a gradual diffusion of, for example, Fe and / or Al atoms into the upper layer could interfere with the semiconductor effect used according to the invention, since the electronic band structure of the upper layer could be adversely affected by such diffusion effects during the course of the operation of the printing plate.
- the diffusion barrier can simultaneously be formed as a thermal insulation layer.
- a diffusion barrier may be formed by a layer provided for this purpose, which may in principle be arranged between each of the layers of a printing form according to the invention.
- a layer provided specifically as a diffusion barrier is formed between the support and the absorption layer if an absorption layer is provided. If a thermal insulation layer is present, the diffusion barrier may be provided between the support and the insulation layer or between the insulation layer and the optional absorption layer.
- such a layer acting as a diffusion barrier can be arranged directly below the upper layer. In this case, foreign atoms, which may possibly originate not only from one carrier but also from another functional layer, can be most reliably prevented from diffusing into the upper layer.
- the erasing process of the printing form takes place by irradiation of the surface with UV light. According to the invention, it is ensured during the deletion process that care is taken at the surface of the printing forme to be activated for a high humidity which supports the extinguishing process. If there is no moisture at the activated surface, recombination of the electron-hole pairs produced by UV irradiation occurs so that a permanent hydrophilization of the surface is not achieved.
- water is preferably supplied to the surface during the process by setting a high air humidity on the surface.
- the increase in humidity relative to the environment can be particularly due to the Supply of water vapor can be effected or by means of the dampening unit of a printing press, which is assigned in this case a device for misting of water.
- the moisture at and near the surface is preferably such that the air adjacent thereto is saturated with moisture.
- high humidity is generally undesirable in the printing unit. For example, it can lead to the formation of condensation, which drips on the cylinder and causes disturbances in the printed image. Also, the offset process can be adversely affected in the course of a production, if due to a moisture-saturated ambient air evaporation of surface water is difficult, which is on the printing plate surface or passes when splitting a color film to the surface of the ink.
- a moisturizing and preferably also a temperature maintenance i. an air conditioning of the printing unit made such that during the hydrophilization by UV radiation, a high humidity of more than 60%, more preferably more than 80%, and for the hydrophobization of the surface a significantly lower humidity is set. Furthermore, a significantly lower humidity is also set during the printing process and preferably during all times outside the hydrophilization by the humid, preferably air conditioning.
- An encapsulation of the printing unit simplifies the setting and attitude of the desired values of the moisture and preferably also the temperature in the printing unit and in particular on the printing plate.
- the humidity or the climate can be monitored by the arrangement of humidity sensors and preferably also by temperature sensors.
- FIG. 1a shows a hydrophilic surface 130 of a wet offset printing form 31, which is also referred to below as a UV-hydrophilic surface, due to irradiation with light from the UV region.
- the surface 130 is formed by a top layer 11 of the printing form 31, which contains a photocatalytically and thermally changeable material or consists entirely of such a material.
- the normally existing excited state results, for example, from the irradiation with natural or artificial daylight.
- the layer 11 is irradiated by a light source that emits UV light at least as part of its spectrum, preferably a daylight source and / or a UV light source 12, there is an irradiation of the layer 11 with high-energy photons 17, so that in near the surface 130 of the layer 11, electrons from the valence band of the photocatalytically and thermally alterable material are excited into the conduction band.
- the missing electrons in the valence band leave positive holes h +.
- the photocatalytically and thermally changeable material can react with water molecules 14, such that a hydroxyl radical OH is formed which adheres to the atoms or molecules of the photocatalytically and thermally changeable material binds.
- a hydroxyl radical OH is formed which adheres to the atoms or molecules of the photocatalytically and thermally changeable material binds.
- the hydrophilic character of the surface 130 increases.
- water molecules 14 can bind via hydrogen bonds to the OH groups, which in turn are bound to the positive holes h + of the upper layer 11.
- FIG. 1 b illustrates the wetting of the UV-hydrophilic surface 130 of the layer 11 with a water droplet 140.
- the acute contact angle formed by the edge of the water droplet 140 with the surface 130 is a measure of the hydrophilicity of the surface 130.
- a preferred photocatalytically and thermally alterable material for the topsheet 11 of the printing form 31 is titanium oxide TiO 2 in the anatase crystal structure.
- the excitation energy from the valence band into the conduction band is about 3.2 eV, which corresponds to a wavelength of 387 nm.
- the action of ultraviolet light whose wavelength is not greater than 387 nm excitation of valence electrons of TiO 2 occurs in the conduction band of the semiconductor.
- a positive hole h + arises in the valence band.
- a fall back of the excited electron on the positive hole h + is prevented when previously chemical bonding of another substance to the activated semiconductor surface occurs.
- titanium oxide and certain other semiconductors for example, this is possible when water is present.
- the hydrophilic state may persist even when no UV light is applied to the photothermally variable material.
- the photocatalytically and thermally changeable material in the context of the invention should have a valence band energy and a conduction band energy, measured in each case on the two mutually facing edges of the energy bands, which are suitable for the reduction and oxidation of water.
- the conduction band energy should therefore be at least as negative as that required to reduce water.
- Energy (0.0V in acidic solution) and the valence band energy should be at least as positive as the energy required to oxidize water (+1.23V).
- a surface-forming topsheet formed of, or at least in large part, the photothermally-variable material has band-gap energy, preferably at least 3.2 eV. Band-gap energy is the energy required to excite electrons from the valence band into the conduction band.
- the positive holes of the valence band formed by the excitation have in this case an advantageously great potential for forming highly reactive OH radicals in conjunction with water.
- Particularly preferred materials are the aforementioned anatase TiO 2 and other materials of suitable electronic structure to bond to the material surface by excitation with UV light in the manner described. Examples of such materials which are likewise suitable are zinc oxide, ZrO 2 , SrTiO 3 , KTaO 3 or KTa 0.77 Nb 0.23 O 3 , which, like TiO 2, the photocatalytically and thermally alterable material, either alone or in a material combination of at least two of the form materials including TiO 2 .
- the printing form 31 preferably has at least 40% by weight of the photocatalytically and thermally variable material in the depth range relevant for the UV-hydrophilic surface, measured on the total weight of the material of the printing plate forming this region.
- the photocatalytically and catalytically and thermally changeable material is formed by a combination of materials, a combination of TiO 2 and SiO 2 is a particularly preferred material.
- SiO 2 can also advantageously form a material in combination with another or several of the materials mentioned contains the photocatalytically and thermally variable material.
- hydrophilicity of anatase titanium oxide as an effect of a photocatalytic reaction is known and used, for example, in self-cleaning surfaces on buildings and anti-fog glasses, for example in the automotive sector.
- titanium oxide layers Another advantageous property of titanium oxide layers is to have a self-cleaning effect, since organic particles on the surface are photocatalytically decomposed over time. This also applies to the other materials mentioned.
- the printing form can be natural or artificial daylight be deleted.
- the deletion can be supported by an additional UV source.
- a UV emitter used for erasure alone or in combination with daylight should have a spectrum with a sufficient amount of UV light having a wavelength of 387 nm and smaller.
- the peak of the emitted spectrum is at a wavelength of 387 nm, corresponding to a band-gap energy of 3.2 eV, or a shorter wavelength.
- the spectral distribution of the radiation is preferably predominantly below 387 nm.
- a UV laser or UV laser system can be used as the UV radiator. On a focusing optics for the laser or is preferably omitted.
- the UV-hydrophilic surface is made locally friendly by irradiation with (IR) infrared laser light.
- the printing form is not heated significantly overall. It remains at the temperature normally prevailing in a printing machine in the range of 10 ° C to 40 ° C.
- Figure 1c illustrates the elimination of the hydrophilicity of the UV-hydrophilic surface 130.
- the exposure or imaging is effected by irradiation with laser light 18.
- the wavelength of the laser light 18 may be in the visible range up to the near infrared (NIR), ie between about 400 and 3000 nm.
- NIR near infrared
- laser light from the range of 700 nm to 3000 nm and particularly preferably from the range of 800 nm to 1100 nm is used for imaging. Due to the local action of the laser light 18, a lipophilic surface area 131 corresponding to the laser spot on the surface is produced on the surface 130.
- Figure 1d illustrates the wetting of the layer 11 by water in the unirradiated surface area 130 and the irradiated surface area 131.
- the water wetting is low.
- the contact angle between the surface area 131 and the water drop 141 formed in the surface area 131 is large, and the layer 11 is lipophilic in this surface area 131.
- Figures 2a to 2d show advantageous embodiments of a layered printing plate 31, which is preferably designed as a printing plate and can be clamped onto a printing form cylinder or is already clamped.
- the printing form 31 of FIG. 2a has a two-layer structure with a carrier layer 21 and a single upper layer 24 applied directly to the carrier layer 21, on whose free surface the printed image is produced or is already present in the case of an imaged printing plate 31.
- the layer 24 contains a photocatalytically and thermally alterable material 24a in a sufficiently large proportion to allow pixel-wise fine imaging. It should be the case, however, not claimed, that the layer 24 consists solely of a photocatalytically and thermally changeable material 24a.
- the carrier layer 21 is formed as in the other embodiments of a flexible steel plate or aluminum plate and hereinafter also referred to simply as a carrier.
- the topsheet 24 in the exemplary embodiment is a dispersion of the photocatalytically and thermally alterable material 24a and absorbent particles dispersed in the material 24a in a fine, uniform distribution.
- the absorption particles are nanoparticles of a semiconductor material which absorbs radiation from the IR wavelength range, converts it into heat and delivers it to the surrounding, photocatalytically and thermally changeable material 24a.
- the absorption particles form the absorption centers 24b for the heating radiation. Also, particles of multiple semiconductor materials can form the absorption centers 24b.
- an underlayer immediately adjacent to the upper layer may be designed to absorb heat.
- materials are suitable which allow a high heat conduction and have a high heat capacity. Since a printing plate support should have a high mechanical strength to allow permanent installation within the printing press, such a support may for example consist of steel or aluminum.
- an insulating layer can be provided between the upper layer and the carrier, which reduces the heat conduction to the carrier.
- the material of the insulating layer should naturally have a low thermal conductivity.
- FIG. 2b shows an embodiment in which first an absorption layer 23 and then the upper layer 24 are applied to the carrier 21.
- heat is generated locally as a result of the irradiation during the imaging in the absorption layer.
- the heat generated in the absorption layer 23 is transferred via the contact surface into the top layer 24, which contains the photocatalytically and thermally alterable material 24a, and reaches the surface of the top layer 24.
- a layer thickness of the absorption layer 23 of 1 ⁇ m to 5 ⁇ m is advantageous.
- the upper layer 24, when forming a particular absorption layer 23, has a uniform thickness of preferably 0.05 ⁇ m to 5 ⁇ m, particularly preferably 0.05 ⁇ m to 2 ⁇ m.
- the upper layer 24 advantageously has a layer thickness of 1 ⁇ m to 30 ⁇ m, particularly advantageously between 1 ⁇ m and 10 ⁇ m.
- Figure 2c shows a third preferred embodiment.
- a thermally insulating intermediate layer 22 on which the upper layer 24 with the photocatalytically and thermally active material 24a is directly arranged.
- the thickness of the intermediate layer 22 is preferably between 1 ⁇ m and 30 ⁇ m.
- absorption centers 24b are uniformly distributed again as in the first embodiment.
- the upper layer 24 preferably has a thickness of 1 .mu.m to 30 .mu.m, more preferably a thickness of 1 .mu.m to 10 .mu.m.
- FIG. 2d shows a fourth exemplary embodiment.
- a thermally insulating intermediate layer 22 whose thickness is preferably between 1 .mu.m and 30 .mu.m.
- an absorption layer 23 is provided, whose layer thickness is preferably between 1 .mu.m and 5 .mu.m.
- an upper layer 24 is arranged, which contains the photocatalytically and thermally changeable material 24a or consists exclusively of such material and preferably has a thickness of 0.05 .mu.m to 5 .mu.m, more preferably from 0.05 .mu.m to 2 .mu.m ,
- topsheets 24 of the embodiments of FIGS. 2b and 2d also have dispersed absorption centers according to the claims, although the incorporation of absorption centers into which the photocatalytically and thermally alterable material could be dispensed with is also not required because of the absorption layer 23.
- a top layer 24 having dispersed absorption centers 24b is formed.
- the sol-gel method and the CVD method are suitable.
- the layer or layers may be applied directly over one another, i. without mediating layers such as adhesive layers.
- Figure 3 shows a printing unit with a printing form cylinder 32, an associated blanket cylinder 38 and a counter-pressure cylinder 39 which forms a printing gap for a web to be printed 37 with the blanket cylinder 38.
- On the printing form cylinder 32 two printing plates 31 are fixed in a known manner. However, each of the two printing plates 31 is formed by a printing plate according to the invention, for example according to one of the embodiments of FIGS. 2a to 2d.
- an imaging device 33, two erasing devices 34, inking rollers 35 and a dampening roller 36 are arranged in the printing press.
- a dampening solution film preferably a water film
- the counter-pressure cylinder 39 may itself be a blanket cylinder of another printing unit for double-sided printing, a steel cylinder for only a single printing point or a steel cylinder of a satellite printing unit, for example a 9 or 10-cylinder printing unit.
- the imaging device 33 faces directly to the surface of the printing forme 31 to be imaged and is arranged parallel to the axis of rotation of the printing forme cylinder 32.
- the imaging unit 33 has a plurality of lasers arranged next to one another along the axis of rotation of the printing form cylinder 32. The laser spots of these lasers are focused on the surface of the printing plate 31.
- the lasers of the imaging device 33 are preferably combined to form one or more laser arrays arranged next to one another.
- the two extinguishing devices 34 each have at least one daylight emitter and / or at least one UV emitter.
- the erasing devices 34 are arranged spaced apart from each other over the circumference of the printing forme cylinder 32, each being arranged parallel to the axis of rotation of the printing forme cylinder 32. Basically, a single one of the erasers 34 would be sufficient to erase the imaged surfaces of the printing plates 31 by the photothermally variable material forming the respective surfaces with respect to the respective printed image in the hydrophilic normal state by full-area irradiation with light from the UV range becomes.
- the erasers 34 are turned off.
- no rollers or cylinders are in contact with the printing form cylinder 32, in particular the printing plates 31, in order to allow the printing plate cylinder 32 to rotate as smoothly as possible.
- the erasers 34 are turned on.
- the surfaces of the printing plates 31 are wetted with water; around the UV-excited, previously rendered lipophilic surface areas permanently hydrophilic by binding of OH groups.
- the dampening unit of the printing unit or a steam generator can be used.
- the printing unit which comprises the printing form cylinder 32 and the blanket cylinder 38, is encapsulated with respect to the environment and conditioned to optimally adapt the humidity and also the temperature to the respective operating state within the encapsulation 40.
- a uniformly high air humidity of at least 60% should prevail within the encapsulation 40 during the deletion process, preferably at least 80%, while for the imaging and the ongoing print production the humidity should be significantly lower.
- the encapsulation 40 preferably encloses, as in the exemplary embodiment, the counter-pressure cylinder 39. If the printing unit comprises further cylinders, the further cylinders belonging to the printing unit are preferably also enclosed by the encapsulation 40.
- the encapsulation 40 preferably encloses in each case the two mutually set blanket cylinders and their associated printing form cylinders. Encapsulants 40 in the case of printing units thus formed can also be used for the usual H or N bridges, i. for each four blanket cylinder and the plate cylinder, are formed. In satellite printing units with nine- or ten-cylinder units, these units are preferably enclosed in each case by a separate encapsulation 40.
- the a predetermined humidity for adjusting and attitude F to and a predetermined temperature T set air conditioner used comprises on the encapsulation 40 and the means for the supply of water, in the embodiment, the dampener roller 36, a humidity and temperature controller 43 and at least one within the Encapsulation 40 arranged humidity sensor 41 and at least one within the Encapsulation 40 temperature sensor arranged 42.
- the sensors 41 and 42 take place within the encapsulation 40, the humidity and the temperature and pass both the humidity and the temperature of each is provided as a control variable F and T to the controller 43.
- the controller 43 forms from the Difference of the recorded values of the humidity and temperature and the given values the respective difference F soll -F ist and T soll -T is and forms depending on the humidity difference and the temperature difference the humidity order size F and the temperature control variable T for those acting within the enclosure 40 Facilities for supplying water and influencing the temperature.
- the imaging and erasing in the printing press is preferred, especially the imaging and deletion on the printing form cylinder on which the printing form is also fixed in the printed production or integrated on the cylinder.
- the imaging and deletion can also be made outside the printing press.
- the implementation of one of the processes in the printing press and implementation of the other of the processes outside the printing press should not be excluded.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10115435A DE10115435B8 (de) | 2001-03-29 | 2001-03-29 | Verfahren zur Erzeugung eines Druckbilds und/oder zur Löschung eines Druckbilds einer Nassoffset-Druckform mit fotothermisch veränderbarem Material |
DE10115435 | 2001-03-29 |
Publications (3)
Publication Number | Publication Date |
---|---|
EP1245385A2 EP1245385A2 (de) | 2002-10-02 |
EP1245385A3 EP1245385A3 (de) | 2002-11-20 |
EP1245385B1 true EP1245385B1 (de) | 2006-03-29 |
Family
ID=7679484
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP02405245A Expired - Lifetime EP1245385B1 (de) | 2001-03-29 | 2002-03-27 | Nassoffset-Druckform mit fotothermisch veränderbarem Material, Verfahren und Vorrichtung zur Erzeugung und/oder Löschung eines Druckbildes einer Nassoffset-Druckform |
Country Status (7)
Country | Link |
---|---|
US (2) | US7051652B2 (ja) |
EP (1) | EP1245385B1 (ja) |
JP (3) | JP3874692B2 (ja) |
AT (1) | ATE321661T1 (ja) |
DE (2) | DE10115435B8 (ja) |
DK (1) | DK1245385T3 (ja) |
ES (1) | ES2261623T3 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10213802B4 (de) | 2002-03-27 | 2010-02-18 | Wifag Maschinenfabrik Ag | Verfahren zur Erhaltung von Bildinformation einer bebilderten Druckform |
FI116389B (fi) * | 2002-07-16 | 2005-11-15 | Millidyne Oy | Menetelmä pinnan ominaisuuksien säätämiseksi |
DE102004007600A1 (de) * | 2004-02-17 | 2005-09-01 | Heidelberger Druckmaschinen Ag | Druckform mit mehreren flächigen Funktionszonen |
JP2006062365A (ja) | 2004-08-25 | 2006-03-09 | Heidelberger Druckmas Ag | 版を製造する方法 |
DE202006004340U1 (de) * | 2006-03-18 | 2006-05-11 | Man Roland Druckmaschinen Ag | Bogendruckmaschine |
US20090130451A1 (en) * | 2007-11-19 | 2009-05-21 | Tony Farrell | Laser-weldable thermoplastics, methods of manufacture, and articles thereof |
US8246754B2 (en) * | 2009-09-25 | 2012-08-21 | Hewlett-Packard Development Company, L.P. | Process for removing ink from printed substrate |
CN102248688A (zh) * | 2011-03-14 | 2011-11-23 | 北京工业大学 | 水膜快速擦写导电聚偏乙烯导电层的方法 |
DE102013114706B4 (de) * | 2013-12-20 | 2017-02-16 | Sandvik Surface Solutions Division Of Sandvik Materials Technology Deutschland Gmbh | Reinigung von Pressblechen oder umlaufenden Pressbändern |
CN114911141B (zh) * | 2022-07-11 | 2022-09-23 | 上海传芯半导体有限公司 | Euv光刻方法及euv光刻设备 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4004924A (en) * | 1965-05-17 | 1977-01-25 | Agfa-Gevaert N.V. | Thermorecording |
US4084023A (en) | 1976-08-16 | 1978-04-11 | Western Electric Company, Inc. | Method for depositing a metal on a surface |
DE4123959C1 (ja) * | 1991-07-19 | 1993-02-04 | Man Roland Druckmaschinen Ag, 6050 Offenbach, De | |
US5365847A (en) * | 1993-09-22 | 1994-11-22 | Rockwell International Corporation | Control system for a printing press |
DE19612927B4 (de) * | 1995-05-11 | 2009-12-10 | Kodak Graphic Communications Canada Company, Burnaby | Druckmaschine und Bilderzeugungsverfahren für eine Druckmaschine |
US5743188A (en) * | 1995-10-20 | 1998-04-28 | Eastman Kodak Company | Method of imaging a zirconia ceramic surface to produce a lithographic printing plate |
US5694848A (en) * | 1996-03-13 | 1997-12-09 | Heidelberger Druckmaschinen Ag | Printing unit for water based inks |
US5836248A (en) * | 1997-05-01 | 1998-11-17 | Eastman Kodak Company | Zirconia-alumina composite ceramic lithographic printing member |
EP0903223B1 (en) * | 1997-09-12 | 2002-06-05 | Fuji Photo Film Co., Ltd. | Lithographic printing method and printing plate precursor for lithographic printing |
DE69805385T2 (de) | 1997-10-24 | 2002-09-12 | Fuji Photo Film Co Ltd | Vorrichtung zur Herstellung einer Druckplatte und Drucker und Drucksystem die diese Vorrichtung verwenden |
EP0911155B1 (en) | 1997-10-24 | 2003-01-15 | Fuji Photo Film Co., Ltd. | Plate making device and printer and printing system using the plate making device |
US6096471A (en) * | 1998-05-25 | 2000-08-01 | Agfa-Gevaert, N.V. | Heat sensitive imaging element for providing a lithographic printing plate |
DE19826377A1 (de) * | 1998-06-12 | 1999-12-16 | Heidelberger Druckmasch Ag | Druckmaschine und Druckverfahren |
US6391522B1 (en) * | 1998-10-23 | 2002-05-21 | Fuji Photo Film Co., Ltd. | Offset printing plate precursor and method for offset printing using the same |
DE60027059T2 (de) * | 1999-01-18 | 2007-03-15 | Fuji Photo Film Co., Ltd., Minami-Ashigara | Flachdruck-Verfahren und -Vorrichtung |
EP1084863A4 (en) * | 1999-02-05 | 2004-07-14 | Mitsubishi Heavy Ind Ltd | PRINTING PLATE MATERIAL AND METHODS OF MAKING AND REGENERATING |
DE19911907B4 (de) | 1999-03-17 | 2005-01-20 | Maschinenfabrik Wifag | Belichtungsverfahren und Belichtungsvorrichtung zur Bebilderung einer Druckform für einen Nassoffsetdruck |
JP2000272265A (ja) * | 1999-03-29 | 2000-10-03 | Kodak Polychrome Graphics Japan Ltd | 直描型平版印刷版原版およびそれを用いた印刷刷版作製方法 |
JP2001105757A (ja) * | 1999-10-08 | 2001-04-17 | Fuji Photo Film Co Ltd | 平版印刷用刷版の作製方法 |
JP2001105761A (ja) | 1999-10-14 | 2001-04-17 | Fuji Photo Film Co Ltd | 平版印刷用ネガ型印刷原板、及び平版印刷用ネガ型印刷版の作製方法 |
DE10021451A1 (de) * | 2000-05-03 | 2001-11-08 | Heidelberger Druckmasch Ag | Gesteuerte Bebilderung und Löschung einer Druckform aus metallischem Titan |
DE10037998A1 (de) * | 2000-08-04 | 2002-02-14 | Heidelberger Druckmasch Ag | Verfahren und Vorrichtung zum Löschen einer wiederbebilderbaren Druckform |
-
2001
- 2001-03-29 DE DE10115435A patent/DE10115435B8/de not_active Expired - Fee Related
-
2002
- 2002-03-27 ES ES02405245T patent/ES2261623T3/es not_active Expired - Lifetime
- 2002-03-27 AT AT02405245T patent/ATE321661T1/de not_active IP Right Cessation
- 2002-03-27 DK DK02405245T patent/DK1245385T3/da active
- 2002-03-27 EP EP02405245A patent/EP1245385B1/de not_active Expired - Lifetime
- 2002-03-27 DE DE50206222T patent/DE50206222D1/de not_active Expired - Lifetime
- 2002-03-28 US US10/109,476 patent/US7051652B2/en not_active Expired - Fee Related
- 2002-03-29 JP JP2002097578A patent/JP3874692B2/ja not_active Expired - Fee Related
-
2004
- 2004-02-10 US US10/775,951 patent/US6976428B2/en not_active Expired - Fee Related
- 2004-06-08 JP JP2004170392A patent/JP2004306613A/ja active Pending
-
2005
- 2005-11-28 JP JP2005342057A patent/JP2006137197A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
DE50206222D1 (de) | 2006-05-18 |
JP2003011536A (ja) | 2003-01-15 |
JP2004306613A (ja) | 2004-11-04 |
ES2261623T3 (es) | 2006-11-16 |
JP2006137197A (ja) | 2006-06-01 |
US7051652B2 (en) | 2006-05-30 |
DE10115435B4 (de) | 2006-11-02 |
DK1245385T3 (da) | 2006-07-24 |
DE10115435A1 (de) | 2002-10-24 |
EP1245385A3 (de) | 2002-11-20 |
JP3874692B2 (ja) | 2007-01-31 |
US20040168599A1 (en) | 2004-09-02 |
US20020139269A1 (en) | 2002-10-03 |
ATE321661T1 (de) | 2006-04-15 |
US6976428B2 (en) | 2005-12-20 |
DE10115435B8 (de) | 2007-02-08 |
EP1245385A2 (de) | 2002-10-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0963839B1 (de) | Druckmaschine und Druckverfahren | |
DE60024190T2 (de) | Infrarotlaser-bebilderbare Flachdruckplatte und Verfahren zu ihrer Herstellung | |
DE10206937A1 (de) | Verfahren und Einrichtung zum Drucken, wobei vor dem Auftrag eines Feuchtmittels eine benetzungsfördernde Substanz in molekularer Schichtdicke aufgetragen wird | |
EP1245385B1 (de) | Nassoffset-Druckform mit fotothermisch veränderbarem Material, Verfahren und Vorrichtung zur Erzeugung und/oder Löschung eines Druckbildes einer Nassoffset-Druckform | |
DE10132204A1 (de) | Verfahren und Vorrichtung zum Erzeugen unterschiedlicher Druckbilder auf demselben Druckträger | |
DE4442235C2 (de) | Verfahren zur Herstellung einer Druckform für einen Formzylinder einer Druckmaschine und danach hergestellte Druckform | |
EP1151857B1 (de) | Gesteuerte Bebilderung und Löschung einer Druckform aus metallischem Titan | |
DE10206938A1 (de) | Verfahren und Einrichtung zum Drucken, wobei eine hydrophile Schicht erzeugt und diese strukturiert wird | |
DE69820219T2 (de) | Formbeständige Lithographie-Druckplatten mit Sol-Gel-Schicht | |
DE60115067T2 (de) | Druckplatte | |
DE60214058T2 (de) | Seidenpapier zu einem wärmeempfindlichen Schablonenblatt, wärmeempfindliches Schablonenblatt, und Herstellungsverfahren dafür | |
DE69917126T2 (de) | Vorläufer für eine Flachdruckplatte sowie Verfahren zu deren Herstellung | |
DE10213802B4 (de) | Verfahren zur Erhaltung von Bildinformation einer bebilderten Druckform | |
DE19945847A1 (de) | Druckform und Verfahren zum Ändern ihrer Benetzungseigenschaften | |
DE60308248T2 (de) | Druckmaschine, Vorrichtung und Verfahren zum Regenerieren einer Druckplatte | |
DE10206944A1 (de) | Verfahren und Einrichtung zum Drucken, wobei die Dicke der Feuchtmittelschicht gemessen und reduziert wird | |
DE60314994T2 (de) | Drucker, druckplattenherstellungsverfahren, und druckplattenrecyclingverfahren | |
DE60315824T2 (de) | Verfahren zur regenerierung einer lithographischen druckplatte | |
DE19602289A1 (de) | Druckvorrichtung | |
EP2111652A1 (de) | Verfahren zum übertragen von strukturinformationen und vorrichtung hierfür | |
EP1476304B1 (de) | Verfahren und einrichtung zum drucken, wobei eine hydrophilisierung des drucktr gers durch freie ionen erfolgt | |
DE102004011316A1 (de) | Verfahren zur Strukturierung einer Glasoberfläche in hydrophile und hydrophobe Bereiche und Druckform | |
DE19953340B4 (de) | Vor-Ort-Herstellung von prozeßfreien thermischen Druckplatten durch Verwenden reaktiver Materialien | |
DE102006047596A1 (de) | Verfahren zur Behandlung einer wiederbebilderbaren Druckform | |
DE102007005815A1 (de) | Bebilderung einer Offset-Druckform |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR |
|
AX | Request for extension of the european patent |
Free format text: AL;LT;LV;MK;RO;SI |
|
PUAL | Search report despatched |
Free format text: ORIGINAL CODE: 0009013 |
|
AK | Designated contracting states |
Kind code of ref document: A3 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR |
|
AX | Request for extension of the european patent |
Free format text: AL;LT;LV;MK;RO;SI |
|
17P | Request for examination filed |
Effective date: 20030520 |
|
AKX | Designation fees paid |
Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR |
|
17Q | First examination report despatched |
Effective date: 20030710 |
|
GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
GRAS | Grant fee paid |
Free format text: ORIGINAL CODE: EPIDOSNIGR3 |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20060329 |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: FG4D Free format text: NOT ENGLISH |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: EP |
|
REG | Reference to a national code |
Ref country code: IE Ref legal event code: FG4D Free format text: LANGUAGE OF EP DOCUMENT: GERMAN |
|
REF | Corresponds to: |
Ref document number: 50206222 Country of ref document: DE Date of ref document: 20060518 Kind code of ref document: P |
|
GBT | Gb: translation of ep patent filed (gb section 77(6)(a)/1977) |
Effective date: 20060530 |
|
REG | Reference to a national code |
Ref country code: SE Ref legal event code: TRGR |
|
REG | Reference to a national code |
Ref country code: DK Ref legal event code: T3 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: PT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20060829 |
|
ET | Fr: translation filed | ||
REG | Reference to a national code |
Ref country code: IE Ref legal event code: FD4D |
|
REG | Reference to a national code |
Ref country code: ES Ref legal event code: FG2A Ref document number: 2261623 Country of ref document: ES Kind code of ref document: T3 |
|
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
26N | No opposition filed |
Effective date: 20070102 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: MC Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20070331 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20060630 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: AT Payment date: 20090323 Year of fee payment: 8 Ref country code: DK Payment date: 20090321 Year of fee payment: 8 Ref country code: ES Payment date: 20090325 Year of fee payment: 8 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FI Payment date: 20090325 Year of fee payment: 8 Ref country code: NL Payment date: 20090324 Year of fee payment: 8 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20090324 Year of fee payment: 8 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: BE Payment date: 20090330 Year of fee payment: 8 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LU Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20070327 Ref country code: CY Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20060329 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: SE Payment date: 20090325 Year of fee payment: 8 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: TR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20060329 |
|
BERE | Be: lapsed |
Owner name: MASCHINENFABRIK *WIFAG Effective date: 20100331 |
|
REG | Reference to a national code |
Ref country code: NL Ref legal event code: V1 Effective date: 20101001 |
|
EUG | Se: european patent has lapsed | ||
REG | Reference to a national code |
Ref country code: DK Ref legal event code: EBP |
|
GBPC | Gb: european patent ceased through non-payment of renewal fee |
Effective date: 20100327 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: AT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20100327 Ref country code: FI Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20100327 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: NL Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20101001 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: BE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20100331 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20100327 |
|
REG | Reference to a national code |
Ref country code: ES Ref legal event code: FD2A Effective date: 20110415 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DK Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20100331 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 20110401 Year of fee payment: 10 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: ES Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20110404 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: CH Payment date: 20110620 Year of fee payment: 10 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: ES Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20100328 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: IT Payment date: 20110329 Year of fee payment: 10 Ref country code: DE Payment date: 20110526 Year of fee payment: 10 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20100328 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: ST Effective date: 20121130 |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R119 Ref document number: 50206222 Country of ref document: DE Effective date: 20121002 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LI Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20120331 Ref country code: CH Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20120331 Ref country code: FR Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20120402 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20120327 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20121002 |