EP1062467B1 - Kaltlicht-uv-bestrahlungsvorrichtung - Google Patents

Kaltlicht-uv-bestrahlungsvorrichtung Download PDF

Info

Publication number
EP1062467B1
EP1062467B1 EP99913192A EP99913192A EP1062467B1 EP 1062467 B1 EP1062467 B1 EP 1062467B1 EP 99913192 A EP99913192 A EP 99913192A EP 99913192 A EP99913192 A EP 99913192A EP 1062467 B1 EP1062467 B1 EP 1062467B1
Authority
EP
European Patent Office
Prior art keywords
light source
barrier
substrate
radiation
heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP99913192A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP1062467A1 (de
Inventor
Michael Bisges
Knut Kisters
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DR HOENLE AG
Original Assignee
Arccure Technologies GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arccure Technologies GmbH filed Critical Arccure Technologies GmbH
Publication of EP1062467A1 publication Critical patent/EP1062467A1/de
Application granted granted Critical
Publication of EP1062467B1 publication Critical patent/EP1062467B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V9/00—Elements for modifying spectral properties, polarisation or intensity of the light emitted, e.g. filters
    • F21V9/04—Elements for modifying spectral properties, polarisation or intensity of the light emitted, e.g. filters for filtering out infrared radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0466—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a non-reacting gas
    • B05D3/048—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a non-reacting gas for cooling
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B05D3/065—After-treatment
    • B05D3/067—Curing or cross-linking the coating
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V29/00—Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
    • F21V29/50—Cooling arrangements
    • F21V29/70—Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks
    • F21V29/74—Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks with fins or blades
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V29/00—Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
    • F21V29/50—Cooling arrangements
    • F21V29/70—Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks
    • F21V29/74—Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks with fins or blades
    • F21V29/76—Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks with fins or blades with essentially identical parallel planar fins or blades, e.g. with comb-like cross-section
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V7/00—Reflectors for light sources
    • F21V7/005—Reflectors for light sources with an elongated shape to cooperate with linear light sources
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B3/00—Drying solid materials or objects by processes involving the application of heat
    • F26B3/28—Drying solid materials or objects by processes involving the application of heat by radiation, e.g. from the sun
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B3/00—Drying solid materials or objects by processes involving the application of heat
    • F26B3/28—Drying solid materials or objects by processes involving the application of heat by radiation, e.g. from the sun
    • F26B3/283—Drying solid materials or objects by processes involving the application of heat by radiation, e.g. from the sun in combination with convection

Definitions

  • the invention relates to a device according to the preamble of claim 1.
  • Such cold light UV radiation devices are used when coating substrates from heat-sensitive Materials, especially plastics, with UV varnishes and printing inks.
  • the substrates can, for example as shaped bodies (bottles, discs, etc.) or as foils and lanes are available.
  • Disc-shaped bodies are, for example optical information carriers such as compact discs (CD's) or Digital Versatile Disks (DVD's).
  • More temperature sensitive Irradiation goods are ceramic-like Materials such as those found in electronic components be used. Also in electronic components Contained metal and plastic parts are often sensitive to temperature.
  • UV varnishes and printing inks in the short cycle times hardening of highly productive production lines a high UV light intensity is necessary.
  • UV light usually is used for curing UV light in the wavelength range from 200 to 400 nm used.
  • the long-wave heat radiation leads to a Deformation and embrittlement of the substrate and is therefore undesirable.
  • DE 38 01 283 C1 describes a hardening device known a UV protective lacquer layer on flat objects, at which is a flat between the device and the object Outlet nozzle is located, the inert gas, e.g. Nitrogen is supplied, causing the exposure process displaces the atmospheric oxygen and better quality the hardened protective lacquer layer can be achieved.
  • the inert gas e.g. Nitrogen
  • an irradiation device especially known for infrared radiation
  • at the at least one tube heater with primary reflectors in a flat housing with a housing outlet opening for the Radiation is arranged.
  • the tube heater and the primary reflectors in such a way Flat housing arranged that the radiated from these Radiation only on the inner walls of the housing meet that are lined with reflective material.
  • the invention is based on this prior art based on the task of a device for curing a UV coating to create an effective separation of UV from the IR radiation enables the thermal load of the Reduce substrates while at the same time by short Radiation paths a high UV intensity is achieved.
  • the UV radiation be focusable on the substrate.
  • the device according to the invention has an effective effect Separation of UV and IR radiation in which more than 90% of IR radiation are absorbed. Because of the minimized Path length of the radiation is the UV intensity with that of conventional devices, such as according to DE 39 02 643 C2 comparable, where the light source is directly above the material to be irradiated is arranged.
  • the separation of UV and IR radiation also enables the use of light sources with up to 8 times the performance compared to the previously used light sources without the heat load to increase the substrate. This allows extremely short cycle times, or high throughput speeds in the production lines can be achieved.
  • the reflection of UV radiation realized by the light source Due to the special geometry of the barrier with a shape for the UV reflection layer and its arrangement directly below the light source is the reflection of UV radiation realized by the light source.
  • the one in the formation arranged in cross-section partially circular UV reflection layer surrounds the light source on its underside partially. At least 50% of that on the UV reflective layer incident UV radiation is due to the invention Design and arrangement through the light source on the reflectors arranged behind the light source reflected.
  • UV radiation is applied to the outside of the light source reflected almost completely through the light source.
  • the losses in the passage of UV radiation through the vitreous body of the light source and the gas are relatively small.
  • the path of UV radiation is minimal. Since it's for this Solution of no special shape for the reflective layer at the barrier needed to pass through the UV radiation reflecting the light source through can be the barrier as a geometrically simple, heat-absorbing body, for example as a plate.
  • the heat absorbing body of the barrier avoids contact with the UV reflection layer the direct heat radiation path on the substrate.
  • UV reflective layer is part of the barrier of a cold light mirror.
  • the preferably also reflectors designed as cold light mirrors behind the Light sources only direct the UV radiation required for curing at least partially past the barrier on that Substrate.
  • the barrier Provided holes through the cooling media and / or Gases can be directed. Cooling prevents the barrier emits or reflects heat radiation. The absorbed heat radiation can be given off to the cooling medium but also to a flow of cooling air if the barrier is designed according to claim 5. By cooling the heat absorbing body of the barrier can be more constant Temperature is maintained at which the amount of heat dissipated is regulated.
  • gases e.g. Nitrogen
  • the gas through further holes in Apply the shape of nozzles in the barrier directly above the substrate.
  • gases can be applied, but alternatively also vacuum to prevent, for example, that that emerge from coatings of inferior quality low molecular weight substances are reflected on the reflectors.
  • the reflectors arranged behind the light source are at least partially cylindrical with a partially circular cross section.
  • the part-circular cross section of the reflectors focuses the radiation at a focal point on the substrate. If, on the other hand, you want to achieve extensive illumination, it is advisable to make the reflectors arranged behind the light source at least partially plate-shaped.
  • the asymmetrical arrangement of the barrier and reflectors according to claim 10 has the effect that the substrate is first pre-hardened as it passes under the device and then irradiated with high UV intensity. Such pre-hardening results in matting of the UV lacquer layer.
  • the intensity of UV radiation can be adjusted vary, the intensity decreasing with greater distance.
  • a small amount of heat radiation is necessary in order to to achieve optimal hardening.
  • a Panel system adjustable barrier geometry according to claim 12 can be the proportion of radiation still on the barrier passes, be adjusted.
  • Heat shields according to claim 13 also allow adjustment of the on the substrate incident radiation. You can also use the radiation completely prevent (shutter) and thus when the Production lines the substrate before too long UV radiation protect.
  • Adjustment of the panels of the panel system according to Claims 14 and 15 allow that on the substrate effective heat radiation while production is changing Production conditions (ambient temperature, humidity, Process speed, etc.).
  • FIG. 1 an inventive device in section AA according to Figure 7 is shown schematically.
  • Fig. 7 shows the side view of this device.
  • a barrier consists of a heat absorbing body (1), a UV reflection layer (2) and bores (3,4) through which cooling media or gases can be passed.
  • the bore (3) is provided with nozzles (3b), which make it possible to apply or extract gases directly above a substrate (12) with a UV lacquer layer (13).
  • a rod-shaped light source (5) is arranged above the barrier.
  • Reflectors (6) and (7) arranged behind the light source (5) are cylindrical with a partially circular cross section, which makes it possible to focus the UV radiation in the two points (20a) on the substrate (12).
  • the reflectors (6, 7) are preferably designed as cold light mirrors in order to ensure effective separation of UV and IR radiation.
  • heat absorbers (8, 9) which are provided with cooling channels (10), are arranged behind the reflectors.
  • Fig. 2 shows a variant of the device with heat shields (14, 14b) and 3 focus points (20 b) of UV radiation. They all have a barrier, a light source and heat absorbers.
  • the reflectors (17, 18) are each composed of two cylindrical parts with a part-circular cross-section. As a result, the UV radiation is focused in the three points (20b).
  • the heat shields (14, 14b) it is possible to block out part of the heat radiation (19).
  • the heat shields (14, 14b) are closed with the adjusting device (15, 16, 15b, 16b) to such an extent that the heat radiation (19) no longer, or only partially, onto the UV lacquer layer (13) of the substrate (12) meets.
  • Fig. 3 shows a device similar to Fig. 2.
  • the heat absorbers (8b, 9b) are designed plate-shaped.
  • Fig. 4 illustrates the operation of the holes in the barrier.
  • nitrogen (21) or a comparable gas can be passed onto the coated substrate (12, 13) according to the illustration above.
  • the exclusion of atmospheric oxygen enables faster and better curing of the UV lacquer layer (13) on the substrate (12).
  • the bore can be used for particularly heat-sensitive substrates (3) according to the figure below for the ducting of cooling air (23) can be used in a light airflow coated substrate (12, 13) cools. At the same time prevented the cooling air flow (23) that the low molecular weight substances can rise by removing these substances from the Pushes out irradiation device.
  • the barrier consists of one UV reflective layer (2) and a heat absorbing body (1), unless the UV reflection layer (2) is on the light source (5) applied.
  • the UV reflection layer (2) mainly reflects short-wave ones UV radiation while in infrared radiation is essentially permeable.
  • the UV reflective layer is applied to glass.
  • the cold light mirror (2c) is on the heat absorbing body (25) arranged.
  • the UV reflection layer (2e) can, for example also applied directly to the light source (5) are, then the vitreous as a carrier material for the UV reflection layer (2e) is used.
  • the UV reflection layer (2,2d, 2f) also directly on the heat absorbing Body (24, 26, 28) of the barrier applied be, for example, from an aluminum profile with an infrared absorption layer in the formation which can cause a backflow of IR radiation from the Prevents aluminum profile.
  • the heat absorbing bodies (24,25,27,28) of the barriers are provided with liquid cooling, during the heat-absorbing body (26) has air cooling.
  • the geometry of the barrier depends on its distance from the Light source (5) and the arrangement of the UV reflection layer (2) off. Is the UV reflection layer (2e) directly on applied to the light source (5), the barrier forming heat-absorbing body (27) made plate-shaped become.
  • Reflective layers (2.2d, 2f) When applied directly to the barrier Reflective layers (2.2d, 2f) must be the heat absorbing Body (24,25,26,29) of the barrier according to the desired Reflective properties are formed. Even with the Use of part-circular cold light mirrors (2c) it is advisable to arrange them in a corresponding circular part Formation of the heat absorbing body (25) the barrier. Cold light mirrors (2c) are easier to replace, than directly on the heat absorbing body of the Barrier or the light source (5) applied UV reflection layers (2, 2d, 2e, 2f).
  • the heat-absorbing body (28) has height-adjustable Apertures (29) through which the proportion of direct heat radiation (19), which passes the barrier and onto the substrate (12) hits, can be regulated.
  • fully extended Aperture (29) does not directly affect heat radiation the substrate, with the heat shields completely retracted (29) a portion of the heat radiation hits the substrate.
  • the Heat shields (29) can be adjusted individually.
  • Fig. 6 support bodies (30, 31) are shown, which protect the light source (5) against deflection.
  • their vitreous bodies are unable to maintain their shape at high temperatures.
  • the light source lies selectively on the support bodies (30), while the support body (31) supports the light source over the entire length.
  • the support bodies (30, 31) can be arranged on the heat-absorbing body (1) or on the UV reflection layer (2).
  • the UV radiation is not focused in two points (20a) on the substrate as shown in FIG. 1 , but rather is radially irradiated in the area (20c).
  • This areal radiation causes a slight pre-hardening of the UV lacquer layer (13), which is subsequently hardened in point (20a).
  • This hardening results in a slight roughening of the UV lacquer layer (13), which looks optically like a matting of the surface. This effect is used, for example, to produce glare-free surfaces in instrument panels.

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Microbiology (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma & Fusion (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Printing Methods (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Liquid Crystal (AREA)
  • Luminescent Compositions (AREA)
EP99913192A 1998-03-11 1999-02-26 Kaltlicht-uv-bestrahlungsvorrichtung Expired - Lifetime EP1062467B1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19810455 1998-03-11
DE19810455A DE19810455C2 (de) 1998-03-11 1998-03-11 Kaltlicht-UV-Bestrahlungsvorrichtung
PCT/EP1999/001244 WO1999046546A1 (de) 1998-03-11 1999-02-26 Kaltlicht-uv-bestrahlungsvorrichtung

Publications (2)

Publication Number Publication Date
EP1062467A1 EP1062467A1 (de) 2000-12-27
EP1062467B1 true EP1062467B1 (de) 2002-10-23

Family

ID=7860464

Family Applications (1)

Application Number Title Priority Date Filing Date
EP99913192A Expired - Lifetime EP1062467B1 (de) 1998-03-11 1999-02-26 Kaltlicht-uv-bestrahlungsvorrichtung

Country Status (9)

Country Link
US (1) US6621087B1 (da)
EP (1) EP1062467B1 (da)
JP (1) JP3545337B2 (da)
AT (1) ATE226709T1 (da)
AU (1) AU3141999A (da)
DE (2) DE19810455C2 (da)
DK (1) DK1062467T3 (da)
ES (1) ES2185325T3 (da)
WO (1) WO1999046546A1 (da)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10352184A1 (de) * 2003-11-05 2005-06-23 Arccure Technologies Gmbh Vorrichtung zum Härten und/oder Trocknen einer Beschichtung auf einem Substrat
DE102005045203A1 (de) * 2005-09-21 2007-03-22 Dr. Hönle AG Modulare Bestrahlungsvorrichtung
DE102012107816A1 (de) * 2012-08-24 2014-02-27 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zum Kurzzeittempern einer auf einem Substrat aufgebrachten Schicht

Families Citing this family (65)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE29919483U1 (de) * 1999-11-05 2000-03-30 Dr. Hönle AG, 82152 Planegg UV-Bestrahlungsvorrichtung
US6755518B2 (en) * 2001-08-30 2004-06-29 L&P Property Management Company Method and apparatus for ink jet printing on rigid panels
DE10051641B4 (de) * 2000-10-18 2009-10-15 Advanced Photonics Technologies Ag Bestrahlungsanordnung
DE10125467C2 (de) * 2001-05-25 2003-04-10 Arccure Technologies Gmbh Bestrahlungsvorrichtung mit einer Anordnung von optischen Wellenleitern
DE10125770C2 (de) * 2001-05-26 2003-06-26 Arccure Technologies Gmbh Bestrahlungsvorrichtung mit langgestreckter Strahlungsquelle und Verfahren zum Betrieb derselben
DE20112396U1 (de) * 2001-07-27 2001-11-15 Ackermann, Gunther, 81737 München Bestrahlungsvorrichtung mit Abflußdüse
DE10161705C2 (de) * 2001-12-15 2003-10-30 Arccure Technologies Gmbh Anordnung zur Bestrahlung von Objekten mit einer langgestreckten Strahlungsquelle sowie Vorrichtung zu deren Lagerung und Energieübertragung
DE20203303U1 (de) * 2001-12-21 2003-02-27 Dr. Hönle AG, 82152 Planegg UV-Bestrahlungsvorrichtung zum stationären Bestrahlen in CO2
DE10215024A1 (de) * 2002-04-03 2003-10-30 Juergen Welle UV-Strahler
NL1020370C2 (nl) * 2002-04-11 2003-10-14 Testprint Bv Proefdrukinrichting en werkwijze voor het doen van proefdrukken alsmede bestralingssamenstel.
JP3647834B2 (ja) * 2002-09-25 2005-05-18 松下電器産業株式会社 露光装置用のミラー、露光装置用の反射型マスク、露光装置及びパターン形成方法
US6883936B2 (en) * 2002-10-15 2005-04-26 Delaware Capital Formation, Inc. Shutter apparatus, curing lamp housing incorporating same, and method of shutter replacement
US6834984B2 (en) * 2002-10-15 2004-12-28 Delaware Captial Formation, Inc. Curved reflective surface for redirecting light to bypass a light source coupled with a hot mirror
US7128429B2 (en) * 2002-10-15 2006-10-31 Mark Andy, Inc. Light trap and heat transfer apparatus and method
US6942367B2 (en) * 2002-10-15 2005-09-13 Delaware Capital Formation, Inc. Curved and reflective surface for redirecting light to bypass a light source
DE10333664B4 (de) * 2003-07-23 2014-03-27 Eltosch Torsten Schmidt Gmbh Vorrichtung zum Härten von Substanzen
DE102004023536B4 (de) * 2003-07-24 2007-12-27 Eisenmann Anlagenbau Gmbh & Co. Kg Vorrichtung zur Aushärtung einer aus einem Material, das unter elektromagnetischer Strahlung aushärtet, insbesondere aus einem UV-Lack oder aus einem thermisch aushärtenden Lack, bestehenden Beschichtung eines Gegenstandes
US7137695B2 (en) * 2003-09-30 2006-11-21 Konica Minolta Medical & Graphics, Inc. Inkjet recording apparatus
DE102004017047B4 (de) * 2004-04-02 2007-05-16 Hoenle Ag Dr Verfahren und Vorrichtung zur Härtung von radikalisch polymerisierbaren Beschichtungen
DE102004038592A1 (de) 2004-08-06 2006-03-16 Ist Metz Gmbh Bestrahlungsaggregat
DE102005000837B4 (de) 2005-01-05 2022-03-31 Advanced Photonics Technologies Ag Thermische Bestrahlungsanordnung zur Erwärmung eines Bestrahlungsgutes
US7777198B2 (en) * 2005-05-09 2010-08-17 Applied Materials, Inc. Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation
US7638780B2 (en) * 2005-06-28 2009-12-29 Eastman Kodak Company UV cure equipment with combined light path
US8251689B2 (en) * 2005-09-20 2012-08-28 Summit Business Products, Inc. Ultraviolet light-emitting diode device
US7692171B2 (en) * 2006-03-17 2010-04-06 Andrzei Kaszuba Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors
US7909595B2 (en) * 2006-03-17 2011-03-22 Applied Materials, Inc. Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections
DE102006035986B4 (de) * 2006-08-02 2016-10-27 Koenig & Bauer Ag Vorrichtung zum Trocknen von UV-Druckfarben oder UV-Lacken auf einem Bedruckstoff
DE102007008964A1 (de) * 2007-02-21 2008-09-04 Ssr Engineering Gmbh UV-Bestrahlungsvorrichtung
US20090115828A1 (en) * 2007-10-26 2009-05-07 Seiko Epson Corporation Recording apparatus and liquid ejecting apparatus
US7959282B2 (en) * 2007-12-20 2011-06-14 Summit Business Products, Inc. Concentrated energy source
US8287116B2 (en) * 2008-02-14 2012-10-16 Hewlett-Packard Development Company, L.P. Printing apparatus and method
US8022377B2 (en) * 2008-04-22 2011-09-20 Applied Materials, Inc. Method and apparatus for excimer curing
US8179046B2 (en) * 2008-05-20 2012-05-15 Nordson Corporation Ultraviolet lamp system with cooling air filter
WO2010066297A1 (de) * 2008-12-11 2010-06-17 Osram Gesellschaft mit beschränkter Haftung Uv-leuchte mit reflektor
DE102008061597B4 (de) * 2008-12-11 2021-06-24 Venjakob Maschinenbau Gmbh & Co. Kg UV-Bestrahlungsvorrichtung
US20100154244A1 (en) 2008-12-19 2010-06-24 Exfo Photonic Solutions Inc. System, Method, and Adjustable Lamp Head Assembly, for Ultra-Fast UV Curing
AT510217B1 (de) * 2010-08-13 2013-12-15 Hueck Folien Gmbh Verfahren zur partiellen mattierung von uv-lackschichten
JP5976776B2 (ja) 2011-04-08 2016-08-24 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Ｕｖ処理、化学処理、および堆積のための装置および方法
US8729498B2 (en) * 2011-06-20 2014-05-20 Harland Medical Systems, Inc. High throughput UV curing systems and methods of curing a plurality of articles
JP6017573B2 (ja) * 2011-10-12 2016-11-02 フォセオン テクノロジー， インコーポレイテッドＰｈｏｓｅｏｎ Ｔｅｃｈｎｏｌｏｇｙ， Ｉｎｃ． 光ファイバーを硬化するための共同設置焦点を有する多重光収集とレンズの組合せ
DE102012209078B4 (de) * 2012-05-30 2014-01-16 Von Ardenne Anlagentechnik Gmbh Blitzlampe mit prismatischem Lampenkörper
DE102012020743A1 (de) * 2012-10-23 2014-04-24 Oerlikon Trading Ag, Trübbach UV-Bestrahlungsvorrichtung für den getakteten Betrieb
DE102013011066A1 (de) * 2013-07-03 2015-01-08 Oerlikon Trading Ag, Trübbach Wärme-Lichttrennung für eine UV-Strahlungsquelle
DE102013110426B4 (de) * 2013-09-20 2017-11-23 Von Ardenne Gmbh Substratbehandlungsanlage
KR101460018B1 (ko) * 2013-12-12 2014-11-11 유버 주식회사 Ｕｖ 경화장치
US9126434B2 (en) * 2014-01-22 2015-09-08 Ricoh Company, Ltd. Radiant heat control with adjustable reflective element
WO2015110619A1 (en) 2014-01-27 2015-07-30 Agfa Graphics Nv An uv inkjet printer
CN105478319A (zh) * 2015-11-21 2016-04-13 武汉华星光电技术有限公司 一种面板中粘合剂的固化装置
CN105694750A (zh) * 2016-02-03 2016-06-22 河北华夏实业有限公司 一种新型耐高温聚氯乙烯胶带的制作方法
CN106004031B (zh) * 2016-05-26 2018-04-17 北京印刷学院 标签印刷机的可变功率紫外发光二级管固化装置
CN105856831B (zh) * 2016-05-26 2018-04-17 北京印刷学院 标签印刷机平凸柱面透镜多级快速紫外线固化装置
CN105856832B (zh) * 2016-05-26 2018-04-17 北京印刷学院 标签印刷机双反射紫外线多级快速固化装置
CN106004030B (zh) * 2016-05-26 2018-04-17 北京印刷学院 标签印刷机的平面光源和反光倍增线光源的互补固化装置
US10086628B1 (en) * 2017-05-05 2018-10-02 Xerox Corporation Protective louvers in a dryer module for a printing apparatus
PT3415316T (pt) 2017-06-13 2020-05-06 Hymmen Gmbh Maschinen & Anlagenbau Processo e dispositivo de fabrico de uma superfície estruturada
IT201800010863A1 (it) * 2018-12-06 2020-06-06 Ind Chimica Adriatica S P A In Sigla Ica S P A Sistema meccanico di riflessione ed irraggiamento per la reticolazione di vernici polimerizzabili uv.
JP7472148B2 (ja) 2019-01-07 2024-04-22 スリーエム イノベイティブ プロパティズ カンパニー 互いに反対側にあるコールドミラー及びホットミラーによって形成される光学的キャビティを備える画像形成装置用バックライト
DE102019206431A1 (de) 2019-05-03 2020-11-05 Hymmen GmbH Maschinen- und Anlagenbau Verfahren zum Herstellen einer Struktur auf einer Oberfläche
US11241832B2 (en) 2019-07-08 2022-02-08 Hewlett Packard Development Company, L.P. Energy emitting apparatuses for build material layers
IT202000026476A1 (it) * 2020-11-05 2022-05-05 Elmag Spa Apparato per il coating di manufatti.
IT202000026479A1 (it) * 2020-11-05 2022-05-05 Elmag Spa Apparato per il coating di manufatti.
IT202100001580A1 (it) * 2021-01-27 2022-07-27 Cefla Soc Cooperativa Apparato e metodo per l’essiccazione/polimerizzazione di prodotti chimici
EP4067797A1 (en) * 2021-01-27 2022-10-05 Cefla Societa' Cooperativa Apparatus and method for the drying/curing of chemical products
JP2024156254A (ja) * 2023-04-24 2024-11-06 株式会社リコー 加熱装置、乾燥装置および液体を付与する装置
CN116811428B (zh) * 2023-08-30 2023-11-10 淮安市康诺克彩印有限公司 一种印刷品的印刷设备

Family Cites Families (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3099403A (en) 1959-12-10 1963-07-30 Raymond L Strawick Light fixture
DE1201278B (de) * 1962-05-04 1965-09-23 Quarzlampen Gmbh Operationsleuchte
DE1497325A1 (de) 1966-07-30 1969-10-30 Original Hanau Quarzlampen Operationsleuchte mit Streuscheibe
US3769503A (en) 1972-06-23 1973-10-30 Gen Electric Lamp fixture having dichoric filter arrangement for selectively directing heat and light
DD109731A1 (da) * 1973-12-06 1974-11-12
GB1482743A (en) * 1974-09-18 1977-08-10 Wallace Knight Ltd Lamp housing
GB1515086A (en) 1975-05-22 1978-06-21 Sun Chemical Corp Ultraviolet lamp assembly
US4048490A (en) * 1976-06-11 1977-09-13 Union Carbide Corporation Apparatus for delivering relatively cold UV to a substrate
NZ186674A (en) 1977-04-18 1980-12-19 Screen Printing Supplies Drying photo-developing ink infrared filter intercepts some of direct light
US4143278A (en) * 1977-05-16 1979-03-06 Geo. Koch Sons, Inc. Radiation cure reactor
US4177383A (en) 1978-05-04 1979-12-04 Wallace Knight Limited Apparatus for treating a sheet material with radiation
DE2820399A1 (de) * 1978-05-10 1979-11-15 Wallace Knight Ltd Vorrichtung zur behandlung von blattmaterial durch bestrahlen
DE2830870C2 (de) * 1978-07-13 1984-12-06 Screen Printing Supplies Pty. Ltd., Greenacre, Neusüdwales Vorrichtung zum Trocknen von insbesondere durch Siebdurck bedrucktem Material
HU180333B (en) 1980-03-07 1983-02-28 Egyesuelt Izzolampa Reflecting mirror for decreasing the luminous rays being in the infrared region
DE3124335A1 (de) 1981-06-20 1983-01-05 Martin Dr.med. 7300 Esslingen Heckel Bestrahlungsvorrichtung insbesondere zur infrarotbestrahlung
NL8300115A (nl) * 1983-01-13 1984-08-01 Philips Nv Bestralingsinrichting.
US4563589A (en) * 1984-01-09 1986-01-07 Scheffer Herbert D Ultraviolet curing lamp device
CH660489A5 (de) * 1984-08-31 1987-04-30 Bernhard Glaus Verfahren und vorrichtung zum aushaerten polymerisierbarer beschichtungsmassen auf nicht textilen substraten.
DE3526082A1 (de) * 1985-07-20 1987-01-29 Rueesch Ferd Ag Vorrichtung zum trocknen von uv-druckfarben
US4798960A (en) 1986-07-17 1989-01-17 Ferd. Ruesch Ag Device for the treatment of substances by UV radiation
US4864145A (en) 1986-10-31 1989-09-05 Burgio Joseph T Jr Apparatus and method for curing photosensitive coatings
US4839522A (en) * 1987-07-29 1989-06-13 American Screen Printing Company Reflective method and apparatus for curing ink
DE3801283C1 (en) * 1988-01-19 1989-08-31 Hamatech Gmbh, 7130 Muehlacker, De Apparatus for curing a UV protective coating on flat objects
DE3814539A1 (de) 1988-04-29 1989-11-09 Heraeus Gmbh W C Beleuchtungsanordnung mit halogengluehlampe
DE3902643A1 (de) * 1989-01-30 1990-12-13 Metz Luft Und Trocknungsanlage Uv-strahler
DE9014652U1 (de) * 1990-10-23 1992-02-27 STEAG Micro-Tech GmbH Sternenfels, 75447 Sternenfels Bestrahlungsvorrichtung
DE4301718A1 (de) * 1993-01-22 1994-07-28 Jochen Dipl Ing Hagedorn UV-Bestrahlungseinrichtung
DE4318735A1 (de) 1993-06-05 1994-12-08 Kammann Maschf Werner UV-Strahler zum Bestrahlen von Druckfarben auf Objekten und Verfahren zum Trocknen von mit Druckfarbe versehenen Objekten
GB2284469B (en) * 1993-12-01 1997-12-03 Spectral Technology Limited Lamp assembly
DE4409426A1 (de) * 1994-03-18 1995-09-21 Bacher Graphische Geraete Gmbh Lampeneinheit für die Reproduktionstechnik
EP0879146B1 (en) 1995-03-15 2001-01-24 Nlm-Combineering Aps A method for activating photoinitiators in photosensitive substrates and an apparatus for curing such substrates
DE19516053C2 (de) * 1995-05-04 2000-08-24 Ist Metz Gmbh UV-Strahler
DE19547252C2 (de) * 1995-12-06 1997-12-18 Fraunhofer Ges Forschung Optisches Bauelement zur Frequenzvervielfachung
US5667850A (en) * 1996-10-04 1997-09-16 Gavenco, Llc Method of curing with ultraviolet radiation on substrates requiring low heat
DE19651977C2 (de) * 1996-12-13 2001-03-01 Michael Bisges UV-Bestrahlungsvorrichtung

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10352184A1 (de) * 2003-11-05 2005-06-23 Arccure Technologies Gmbh Vorrichtung zum Härten und/oder Trocknen einer Beschichtung auf einem Substrat
DE102005045203A1 (de) * 2005-09-21 2007-03-22 Dr. Hönle AG Modulare Bestrahlungsvorrichtung
DE102005045203B4 (de) * 2005-09-21 2009-08-20 Uviterno Ag Modulare Bestrahlungsvorrichtung
DE102012107816A1 (de) * 2012-08-24 2014-02-27 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zum Kurzzeittempern einer auf einem Substrat aufgebrachten Schicht

Also Published As

Publication number Publication date
JP2002505975A (ja) 2002-02-26
WO1999046546A1 (de) 1999-09-16
JP3545337B2 (ja) 2004-07-21
DE19810455C2 (de) 2000-02-24
DE59903167D1 (de) 2002-11-28
EP1062467A1 (de) 2000-12-27
US6621087B1 (en) 2003-09-16
ATE226709T1 (de) 2002-11-15
ES2185325T3 (es) 2003-04-16
AU3141999A (en) 1999-09-27
DE19810455A1 (de) 1999-09-23
DK1062467T3 (da) 2003-02-17

Similar Documents

Publication Publication Date Title
EP1062467B1 (de) Kaltlicht-uv-bestrahlungsvorrichtung
DE19651977C2 (de) UV-Bestrahlungsvorrichtung
EP3752765B1 (de) Kraftfahrzeugscheinwerfer mit einer abschirmblende zur abschirmung eintretender sonnenstrahlung
DE112006001842B4 (de) Einheit und Verfahren für Hochleistungs-Laserbearbeitung
DE2622993A1 (de) Uv-lampen-anordnung
CH660489A5 (de) Verfahren und vorrichtung zum aushaerten polymerisierbarer beschichtungsmassen auf nicht textilen substraten.
DE2639728A1 (de) Verfahren und vorrichtung zum behandeln eines substrats mit ultraviolettstrahlung
DE69718100T2 (de) Verfahren und Vorrichtung zum Zusammenleimen von Platten miteinander
DE69416284T2 (de) Ablative Blitzlampeaufzeichnung
EP0487679B1 (de) Scheinwerfer für kraftfahrzeuge
DE3525482C1 (de) Belichtungsvorrichtung
EP0554538A2 (de) Verfahren und Vorrichtung zum Erwärmen eines Materials
EP3393679B1 (de) Uv-aushärtevorrichtung mit geteilten uv-umlenkspiegeln
DE10106888B4 (de) Verfahren und Vorrichtung zur Herstellung einer Oberflächenbeschichtung
DE3801283C1 (en) Apparatus for curing a UV protective coating on flat objects
EP4061566B1 (de) Vorrichtung zur additiven fertigung mit pulver-layer-verfahren
DE1805750A1 (de) Bestrahlungsanlage mit mindestens einer Ultraviolett-Quecksilber-Hochdrucklampe
EP0930104B1 (de) Verfahren und Vorrichtung zum Vernetzen und Härten von Lack
WO2017178651A1 (de) Vorrichtung zur belichtung eines substrats
EP1390969B1 (de) Vorrichtung zur erwärmung von substraten mit seitenblenden und sekundären reflektoren
DE102007029330A1 (de) UV-Strahlungsanlage
DE19706846A1 (de) Vorrichtung zur lichtinitiierten chemischen Vernetzung von Material
DE102006035986B4 (de) Vorrichtung zum Trocknen von UV-Druckfarben oder UV-Lacken auf einem Bedruckstoff
DE20016302U1 (de) Scheinwerfer
DE102005046233A1 (de) UV-Bestrahlungsaggregat

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20000923

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE CH DE DK ES FR GB IE IT LI NL SE

17Q First examination report despatched

Effective date: 20010710

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: KISTERS, KNUT

Owner name: ARCCURE TECHNOLOGIES GMBH

RIN1 Information on inventor provided before grant (corrected)

Inventor name: KISTERS, KNUT

Inventor name: ARCCURE TECHNOLOGIES GMBH

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: ARCCURE TECHNOLOGIES GMBH

RIN1 Information on inventor provided before grant (corrected)

Inventor name: ARCCURE TECHNOLOGIES GMBH

GRAG Despatch of communication of intention to grant

Free format text: ORIGINAL CODE: EPIDOS AGRA

GRAG Despatch of communication of intention to grant

Free format text: ORIGINAL CODE: EPIDOS AGRA

GRAH Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOS IGRA

RIN1 Information on inventor provided before grant (corrected)

Inventor name: KISTERS, KNUT

Inventor name: BISGES, MICHAEL

GRAH Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOS IGRA

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AT BE CH DE DK ES FR GB IE IT LI NL SE

REF Corresponds to:

Ref document number: 226709

Country of ref document: AT

Date of ref document: 20021115

Kind code of ref document: T

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

Free format text: NOT ENGLISH

RIC1 Information provided on ipc code assigned before grant

Free format text: 7F 26B 3/28 A, 7F 21V 9/04 B, 7F 21V 29/00 B

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

Free format text: GERMAN

REF Corresponds to:

Ref document number: 59903167

Country of ref document: DE

Date of ref document: 20021128

REG Reference to a national code

Ref country code: CH

Ref legal event code: NV

Representative=s name: PATENTANWALTSBUERO ZINK

GBT Gb: translation of ep patent filed (gb section 77(6)(a)/1977)

Effective date: 20021130

REG Reference to a national code

Ref country code: DK

Ref legal event code: T3

RIN2 Information on inventor provided after grant (corrected)

Inventor name: KISTERS, KNUT

Inventor name: BISGES, MICHAEL

ET Fr: translation filed
REG Reference to a national code

Ref country code: ES

Ref legal event code: FG2A

Ref document number: 2185325

Country of ref document: ES

Kind code of ref document: T3

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed

Effective date: 20030724

REG Reference to a national code

Ref country code: GB

Ref legal event code: 732E

REG Reference to a national code

Ref country code: CH

Ref legal event code: PUE

Owner name: DR. HOENLE AG

Free format text: ARCCURE TECHNOLOGIES GMBH#RAIFFEISENSTRASSE 18 C#59557 LIPPSTADT (DE) -TRANSFER TO- DR. HOENLE AG#LOCHHAMER SCHLAG 1#82166 GRAEFELFING (DE)

NLS Nl: assignments of ep-patents

Owner name: DR. HOENLE AG

Effective date: 20061206

REG Reference to a national code

Ref country code: ES

Ref legal event code: PC2A

REG Reference to a national code

Ref country code: FR

Ref legal event code: TP

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: IE

Payment date: 20090218

Year of fee payment: 11

Ref country code: AT

Payment date: 20090219

Year of fee payment: 11

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: NL

Payment date: 20090223

Year of fee payment: 11

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: BE

Payment date: 20090224

Year of fee payment: 11

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: SE

Payment date: 20090223

Year of fee payment: 11

BERE Be: lapsed

Owner name: DR. *HOENLE A.G.

Effective date: 20100228

REG Reference to a national code

Ref country code: NL

Ref legal event code: V1

Effective date: 20100901

EUG Se: european patent has lapsed
REG Reference to a national code

Ref country code: IE

Ref legal event code: MM4A

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: AT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20100226

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20100901

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20100226

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20100228

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20100227

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 17

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: IT

Payment date: 20150225

Year of fee payment: 17

Ref country code: CH

Payment date: 20150223

Year of fee payment: 17

Ref country code: ES

Payment date: 20150223

Year of fee payment: 17

Ref country code: DK

Payment date: 20150223

Year of fee payment: 17

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20150217

Year of fee payment: 17

Ref country code: GB

Payment date: 20150223

Year of fee payment: 17

REG Reference to a national code

Ref country code: DK

Ref legal event code: EBP

Effective date: 20160229

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20160226

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20160229

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20160229

REG Reference to a national code

Ref country code: FR

Ref legal event code: ST

Effective date: 20161028

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20160226

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20160229

Ref country code: DK

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20160229

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20160226

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: ES

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20160227

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20171227

Year of fee payment: 20

REG Reference to a national code

Ref country code: DE

Ref legal event code: R071

Ref document number: 59903167

Country of ref document: DE