EP1062467B1 - Dispositif de rayonnement uv a lumiere froide - Google Patents

Dispositif de rayonnement uv a lumiere froide Download PDF

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Publication number
EP1062467B1
EP1062467B1 EP99913192A EP99913192A EP1062467B1 EP 1062467 B1 EP1062467 B1 EP 1062467B1 EP 99913192 A EP99913192 A EP 99913192A EP 99913192 A EP99913192 A EP 99913192A EP 1062467 B1 EP1062467 B1 EP 1062467B1
Authority
EP
European Patent Office
Prior art keywords
light source
barrier
substrate
radiation
heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP99913192A
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German (de)
English (en)
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EP1062467A1 (fr
Inventor
Michael Bisges
Knut Kisters
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DR HOENLE AG
Original Assignee
Arccure Technologies GmbH
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Filing date
Publication date
Application filed by Arccure Technologies GmbH filed Critical Arccure Technologies GmbH
Publication of EP1062467A1 publication Critical patent/EP1062467A1/fr
Application granted granted Critical
Publication of EP1062467B1 publication Critical patent/EP1062467B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V9/00—Elements for modifying spectral properties, polarisation or intensity of the light emitted, e.g. filters
    • F21V9/04—Elements for modifying spectral properties, polarisation or intensity of the light emitted, e.g. filters for filtering out infrared radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0466—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a non-reacting gas
    • B05D3/048—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a non-reacting gas for cooling
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B05D3/065—After-treatment
    • B05D3/067—Curing or cross-linking the coating
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V29/00—Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
    • F21V29/50—Cooling arrangements
    • F21V29/70—Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks
    • F21V29/74—Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks with fins or blades
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V29/00—Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
    • F21V29/50—Cooling arrangements
    • F21V29/70—Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks
    • F21V29/74—Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks with fins or blades
    • F21V29/76—Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks with fins or blades with essentially identical parallel planar fins or blades, e.g. with comb-like cross-section
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V7/00—Reflectors for light sources
    • F21V7/005—Reflectors for light sources with an elongated shape to cooperate with linear light sources
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B3/00—Drying solid materials or objects by processes involving the application of heat
    • F26B3/28—Drying solid materials or objects by processes involving the application of heat by radiation, e.g. from the sun
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B3/00—Drying solid materials or objects by processes involving the application of heat
    • F26B3/28—Drying solid materials or objects by processes involving the application of heat by radiation, e.g. from the sun
    • F26B3/283—Drying solid materials or objects by processes involving the application of heat by radiation, e.g. from the sun in combination with convection

Definitions

  • the invention relates to a device according to the preamble of claim 1.
  • Such cold light UV radiation devices are used when coating substrates from heat-sensitive Materials, especially plastics, with UV varnishes and printing inks.
  • the substrates can, for example as shaped bodies (bottles, discs, etc.) or as foils and lanes are available.
  • Disc-shaped bodies are, for example optical information carriers such as compact discs (CD's) or Digital Versatile Disks (DVD's).
  • More temperature sensitive Irradiation goods are ceramic-like Materials such as those found in electronic components be used. Also in electronic components Contained metal and plastic parts are often sensitive to temperature.
  • UV varnishes and printing inks in the short cycle times hardening of highly productive production lines a high UV light intensity is necessary.
  • UV light usually is used for curing UV light in the wavelength range from 200 to 400 nm used.
  • the long-wave heat radiation leads to a Deformation and embrittlement of the substrate and is therefore undesirable.
  • DE 38 01 283 C1 describes a hardening device known a UV protective lacquer layer on flat objects, at which is a flat between the device and the object Outlet nozzle is located, the inert gas, e.g. Nitrogen is supplied, causing the exposure process displaces the atmospheric oxygen and better quality the hardened protective lacquer layer can be achieved.
  • the inert gas e.g. Nitrogen
  • an irradiation device especially known for infrared radiation
  • at the at least one tube heater with primary reflectors in a flat housing with a housing outlet opening for the Radiation is arranged.
  • the tube heater and the primary reflectors in such a way Flat housing arranged that the radiated from these Radiation only on the inner walls of the housing meet that are lined with reflective material.
  • the invention is based on this prior art based on the task of a device for curing a UV coating to create an effective separation of UV from the IR radiation enables the thermal load of the Reduce substrates while at the same time by short Radiation paths a high UV intensity is achieved.
  • the UV radiation be focusable on the substrate.
  • the device according to the invention has an effective effect Separation of UV and IR radiation in which more than 90% of IR radiation are absorbed. Because of the minimized Path length of the radiation is the UV intensity with that of conventional devices, such as according to DE 39 02 643 C2 comparable, where the light source is directly above the material to be irradiated is arranged.
  • the separation of UV and IR radiation also enables the use of light sources with up to 8 times the performance compared to the previously used light sources without the heat load to increase the substrate. This allows extremely short cycle times, or high throughput speeds in the production lines can be achieved.
  • the reflection of UV radiation realized by the light source Due to the special geometry of the barrier with a shape for the UV reflection layer and its arrangement directly below the light source is the reflection of UV radiation realized by the light source.
  • the one in the formation arranged in cross-section partially circular UV reflection layer surrounds the light source on its underside partially. At least 50% of that on the UV reflective layer incident UV radiation is due to the invention Design and arrangement through the light source on the reflectors arranged behind the light source reflected.
  • UV radiation is applied to the outside of the light source reflected almost completely through the light source.
  • the losses in the passage of UV radiation through the vitreous body of the light source and the gas are relatively small.
  • the path of UV radiation is minimal. Since it's for this Solution of no special shape for the reflective layer at the barrier needed to pass through the UV radiation reflecting the light source through can be the barrier as a geometrically simple, heat-absorbing body, for example as a plate.
  • the heat absorbing body of the barrier avoids contact with the UV reflection layer the direct heat radiation path on the substrate.
  • UV reflective layer is part of the barrier of a cold light mirror.
  • the preferably also reflectors designed as cold light mirrors behind the Light sources only direct the UV radiation required for curing at least partially past the barrier on that Substrate.
  • the barrier Provided holes through the cooling media and / or Gases can be directed. Cooling prevents the barrier emits or reflects heat radiation. The absorbed heat radiation can be given off to the cooling medium but also to a flow of cooling air if the barrier is designed according to claim 5. By cooling the heat absorbing body of the barrier can be more constant Temperature is maintained at which the amount of heat dissipated is regulated.
  • gases e.g. Nitrogen
  • the gas through further holes in Apply the shape of nozzles in the barrier directly above the substrate.
  • gases can be applied, but alternatively also vacuum to prevent, for example, that that emerge from coatings of inferior quality low molecular weight substances are reflected on the reflectors.
  • the reflectors arranged behind the light source are at least partially cylindrical with a partially circular cross section.
  • the part-circular cross section of the reflectors focuses the radiation at a focal point on the substrate. If, on the other hand, you want to achieve extensive illumination, it is advisable to make the reflectors arranged behind the light source at least partially plate-shaped.
  • the asymmetrical arrangement of the barrier and reflectors according to claim 10 has the effect that the substrate is first pre-hardened as it passes under the device and then irradiated with high UV intensity. Such pre-hardening results in matting of the UV lacquer layer.
  • the intensity of UV radiation can be adjusted vary, the intensity decreasing with greater distance.
  • a small amount of heat radiation is necessary in order to to achieve optimal hardening.
  • a Panel system adjustable barrier geometry according to claim 12 can be the proportion of radiation still on the barrier passes, be adjusted.
  • Heat shields according to claim 13 also allow adjustment of the on the substrate incident radiation. You can also use the radiation completely prevent (shutter) and thus when the Production lines the substrate before too long UV radiation protect.
  • Adjustment of the panels of the panel system according to Claims 14 and 15 allow that on the substrate effective heat radiation while production is changing Production conditions (ambient temperature, humidity, Process speed, etc.).
  • FIG. 1 an inventive device in section AA according to Figure 7 is shown schematically.
  • Fig. 7 shows the side view of this device.
  • a barrier consists of a heat absorbing body (1), a UV reflection layer (2) and bores (3,4) through which cooling media or gases can be passed.
  • the bore (3) is provided with nozzles (3b), which make it possible to apply or extract gases directly above a substrate (12) with a UV lacquer layer (13).
  • a rod-shaped light source (5) is arranged above the barrier.
  • Reflectors (6) and (7) arranged behind the light source (5) are cylindrical with a partially circular cross section, which makes it possible to focus the UV radiation in the two points (20a) on the substrate (12).
  • the reflectors (6, 7) are preferably designed as cold light mirrors in order to ensure effective separation of UV and IR radiation.
  • heat absorbers (8, 9) which are provided with cooling channels (10), are arranged behind the reflectors.
  • Fig. 2 shows a variant of the device with heat shields (14, 14b) and 3 focus points (20 b) of UV radiation. They all have a barrier, a light source and heat absorbers.
  • the reflectors (17, 18) are each composed of two cylindrical parts with a part-circular cross-section. As a result, the UV radiation is focused in the three points (20b).
  • the heat shields (14, 14b) it is possible to block out part of the heat radiation (19).
  • the heat shields (14, 14b) are closed with the adjusting device (15, 16, 15b, 16b) to such an extent that the heat radiation (19) no longer, or only partially, onto the UV lacquer layer (13) of the substrate (12) meets.
  • Fig. 3 shows a device similar to Fig. 2.
  • the heat absorbers (8b, 9b) are designed plate-shaped.
  • Fig. 4 illustrates the operation of the holes in the barrier.
  • nitrogen (21) or a comparable gas can be passed onto the coated substrate (12, 13) according to the illustration above.
  • the exclusion of atmospheric oxygen enables faster and better curing of the UV lacquer layer (13) on the substrate (12).
  • the bore can be used for particularly heat-sensitive substrates (3) according to the figure below for the ducting of cooling air (23) can be used in a light airflow coated substrate (12, 13) cools. At the same time prevented the cooling air flow (23) that the low molecular weight substances can rise by removing these substances from the Pushes out irradiation device.
  • the barrier consists of one UV reflective layer (2) and a heat absorbing body (1), unless the UV reflection layer (2) is on the light source (5) applied.
  • the UV reflection layer (2) mainly reflects short-wave ones UV radiation while in infrared radiation is essentially permeable.
  • the UV reflective layer is applied to glass.
  • the cold light mirror (2c) is on the heat absorbing body (25) arranged.
  • the UV reflection layer (2e) can, for example also applied directly to the light source (5) are, then the vitreous as a carrier material for the UV reflection layer (2e) is used.
  • the UV reflection layer (2,2d, 2f) also directly on the heat absorbing Body (24, 26, 28) of the barrier applied be, for example, from an aluminum profile with an infrared absorption layer in the formation which can cause a backflow of IR radiation from the Prevents aluminum profile.
  • the heat absorbing bodies (24,25,27,28) of the barriers are provided with liquid cooling, during the heat-absorbing body (26) has air cooling.
  • the geometry of the barrier depends on its distance from the Light source (5) and the arrangement of the UV reflection layer (2) off. Is the UV reflection layer (2e) directly on applied to the light source (5), the barrier forming heat-absorbing body (27) made plate-shaped become.
  • Reflective layers (2.2d, 2f) When applied directly to the barrier Reflective layers (2.2d, 2f) must be the heat absorbing Body (24,25,26,29) of the barrier according to the desired Reflective properties are formed. Even with the Use of part-circular cold light mirrors (2c) it is advisable to arrange them in a corresponding circular part Formation of the heat absorbing body (25) the barrier. Cold light mirrors (2c) are easier to replace, than directly on the heat absorbing body of the Barrier or the light source (5) applied UV reflection layers (2, 2d, 2e, 2f).
  • the heat-absorbing body (28) has height-adjustable Apertures (29) through which the proportion of direct heat radiation (19), which passes the barrier and onto the substrate (12) hits, can be regulated.
  • fully extended Aperture (29) does not directly affect heat radiation the substrate, with the heat shields completely retracted (29) a portion of the heat radiation hits the substrate.
  • the Heat shields (29) can be adjusted individually.
  • Fig. 6 support bodies (30, 31) are shown, which protect the light source (5) against deflection.
  • their vitreous bodies are unable to maintain their shape at high temperatures.
  • the light source lies selectively on the support bodies (30), while the support body (31) supports the light source over the entire length.
  • the support bodies (30, 31) can be arranged on the heat-absorbing body (1) or on the UV reflection layer (2).
  • the UV radiation is not focused in two points (20a) on the substrate as shown in FIG. 1 , but rather is radially irradiated in the area (20c).
  • This areal radiation causes a slight pre-hardening of the UV lacquer layer (13), which is subsequently hardened in point (20a).
  • This hardening results in a slight roughening of the UV lacquer layer (13), which looks optically like a matting of the surface. This effect is used, for example, to produce glare-free surfaces in instrument panels.

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Microbiology (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Printing Methods (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Luminescent Compositions (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Liquid Crystal (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Claims (19)

  1. Dispositif destiné au durcissement d'une couche UV (13), plus particulièrement d'une couche de vernis UV ou d'encres UV, sur un substrat (12), plus particulièrement sur des matériaux sensibles à la chaleur, avec au moins une source de lumière (5) disposée au-dessus du substrat (12) dont la lumière peut être amenée, au moyen d'un système de réflecteurs (2, 6, 7, 17, 18), à la couche UV (13) à des fins de durcissement , une barrière au moins diaphragmant du moins en partie le trajet direct des rayons de la source de lumière sur le substrat (12) et un rayonnement UV émis par la source de lumière (5) étant réfléchi par une couche de réflexion UV (2, 2d, 2f) de la barrière au travers de la source de lumière (5) sur les réflecteurs (6, 7, 17, 18) disposés derrière la source de lumière,
    caractérisé en ce que
    la barrière est pourvue d'au moins un corps absorbant la chaleur (1, 24, 25, 26, 28) qui absorbe du moins en partie le rayonnement thermique émis par la source de lumière (5)
    et que la barrière est disposée directement en dessous de la source de lumière (5) et est pourvue d'une découpe pour la couche de réflexion UV (2).
  2. Dispositif destiné au durcissement d'une couche UV (13), plus particulièrement d'une couche de vernis UV ou d'encres UV, sur un substrat (12), plus particulièrement sur des matériaux sensibles à la chaleur, avec au moins une source de lumière (5) disposée au-dessus du substrat (12) dont la lumière peut être amenée, au moyen d'un système de réflecteurs (2, 6, 7, 17, 18), à la couche UV (13) à des fins de durcissement , une barrière au moins diaphragmant du moins en partie le trajet direct des rayons de la source de lumière (5) sur le substrat (12),
    caractérisé en ce que
    un rayonnement UV émis par la source de lumière (5) est réfléchi par une couche de réflexion UV (2e) appliquée directement sur la source de lumière (5) au travers de la source de lumière (5) sur les réflecteurs (6, 7, 17, 18) disposés derrière la source de lumière et
    que la barrière est pourvue d'au moins un corps absorbant la chaleur (27) qui absorbe du moins en partie le rayonnement thermique émis par la source de lumière (5).
  3. Dispositif selon l'une des revendications 1 à 2, caractérisé en ce que des alésages (3, 3b, 4) permettant le passage de fluides caloporteurs et/ou de gaz sont prévus dans la barrière.
  4. Dispositif selon l'une des revendications 1 à 3, caractérisé en ce que la couche de réflexion UV (2) fait partie d'un miroir à lumière froide (2c).
  5. Dispositif selon l'une des revendications 1 à 4, caractérisé en ce que le corps absorbant la chaleur (26) de la barrière est équipé d'ailettes de réfrigération qui cèdent la chaleur à un courant d'air de refroidissement.
  6. Dispositif selon l'une des revendications 1 à 5, caractérisé en ce que les réflecteurs (6, 7, 17, 18) situés derrière la source de lumière (5) détournent le rayonnement UV en le faisant contourner du moins en partie la barrière avant de le diriger sur la couche (13) du substrat (12).
  7. Dispositif selon l'une des revendications 1 à 6, caractérisé en ce que les réflecteurs (6, 7, 17, 18) disposés derrière la source de lumière (5) sont du moins en partie réalisés sous forme de plaque.
  8. Dispositif selon l'une des revendications 1 à 6, caractérisé en ce que les réflecteurs (6, 7, 17, 18) disposés derrière la source de lumière (5) sont du moins en partie réalisés sous forme de cylindre dont la section a la forme d'un arc de cercle.
  9. Dispositif selon l'une des revendications 1 à 8, caractérisé en ce que la barrière et les réflecteurs (6, 7, 17, 18) disposés derrière la source de lumière (5) sont montés de manière symétrique par rapport à un plan vertical qui contient l'axe longitudinal de la source de lumière (5) et est perpendiculaire à la surface du substrat (12).
  10. Dispositif selon l'une des revendications 1 à 8, caractérisé en ce que la barrière et les réflecteurs (6, 7b) disposés derrière la source de lumière (5) sont montés de manière asymétrique par rapport à un plan vertical qui contient l'axe longitudinal de la source de lumière (5) et est perpendiculaire à la surface du substrat (12).
  11. Dispositif selon l'une des revendications précédentes 1 à 10, caractérisé en ce que la distance entre la barrière et la source de lumière (5) est réglable.
  12. Dispositif selon l'une des revendications 1 à 11, caractérisé en ce que la barrière est pourvue d'un système de diaphragmes comprenant des diaphragmes (29) réglables en hauteur et permettant de régler le rayonnement qui est émis par la source de lumière (5) et frappe la couche UV (13) du substrat (12) sans être réfléchi.
  13. Dispositif selon l'une des revendications 1 à 12, caractérisé en ce qu'il est pourvu de diaphragmes thermiques (14, 14b) disposés au-dessus du substrat (12) que l'on peut déplacer jusqu'à la barrière et qui sont en mesure de protéger entièrement le substrat (12) du rayonnement de la source de lumière (5).
  14. Dispositif selon l'une des revendications 12 ou 13, caractérisé en ce que les diaphragmes (29) du système de diaphragmes et/ou les diaphragmes thermiques (14, 14b) sont réglables de manière asymétrique par rapport à un plan vertical contenant l'axe longitudinal de la source de lumière (5) et perpendiculaire à la surface du substrat (12).
  15. Dispositif selon l'une des revendications 12 à 14, caractérisé en ce que les diaphragmes (29) du système de diaphragmes et/ou les diaphragmes thermiques (14, 14b) sont réglables de l'extérieur pendant le fonctionnement du dispositif.
  16. Dispositif selon l'une des revendications 12 à 15, caractérisé en ce que les diaphragmes (29) du système de diaphragmes et/ou les diaphragmes thermiques (14, 14b) sont réglables au moyen d'une commande électrique ou pneumatique.
  17. Dispositif selon l'une des revendications 1 ou 3 à 16 en combinaison avec 1, caractérisé en ce que le rayonnement émis par la source de lumière (5) et le rayonnement réfléchi par la couche de réflexion UV (2) de la barrière au travers de la source de lumière (5) est du moins en partie focalisé par les réflecteurs (6, 7, 17, 18) sur la couche (13) du substrat (12).
  18. Dispositif selon l'une des revendications 1 à 17, caractérisé en ce qu'il y a du moins en partie un contact entre la barrière et la source de lumière (5).
  19. Dispositif selon l'une des revendications 1 à 18, caractérisé en ce que au moins un élément de soutien (30, 31) empêchant le fléchissement du corps de Jampe de la source de lumière (5) lorsqu'il est chaud est prévu dans la fente entre la barrière et la source de lumière (5).
EP99913192A 1998-03-11 1999-02-26 Dispositif de rayonnement uv a lumiere froide Expired - Lifetime EP1062467B1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19810455 1998-03-11
DE19810455A DE19810455C2 (de) 1998-03-11 1998-03-11 Kaltlicht-UV-Bestrahlungsvorrichtung
PCT/EP1999/001244 WO1999046546A1 (fr) 1998-03-11 1999-02-26 Dispositif de rayonnement uv a lumiere froide

Publications (2)

Publication Number Publication Date
EP1062467A1 EP1062467A1 (fr) 2000-12-27
EP1062467B1 true EP1062467B1 (fr) 2002-10-23

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EP99913192A Expired - Lifetime EP1062467B1 (fr) 1998-03-11 1999-02-26 Dispositif de rayonnement uv a lumiere froide

Country Status (9)

Country Link
US (1) US6621087B1 (fr)
EP (1) EP1062467B1 (fr)
JP (1) JP3545337B2 (fr)
AT (1) ATE226709T1 (fr)
AU (1) AU3141999A (fr)
DE (2) DE19810455C2 (fr)
DK (1) DK1062467T3 (fr)
ES (1) ES2185325T3 (fr)
WO (1) WO1999046546A1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10352184A1 (de) * 2003-11-05 2005-06-23 Arccure Technologies Gmbh Vorrichtung zum Härten und/oder Trocknen einer Beschichtung auf einem Substrat
DE102005045203A1 (de) * 2005-09-21 2007-03-22 Dr. Hönle AG Modulare Bestrahlungsvorrichtung
DE102012107816A1 (de) * 2012-08-24 2014-02-27 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zum Kurzzeittempern einer auf einem Substrat aufgebrachten Schicht

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JP2002505975A (ja) 2002-02-26
DE19810455C2 (de) 2000-02-24
DE19810455A1 (de) 1999-09-23
ES2185325T3 (es) 2003-04-16
US6621087B1 (en) 2003-09-16
WO1999046546A1 (fr) 1999-09-16
DK1062467T3 (da) 2003-02-17
JP3545337B2 (ja) 2004-07-21
EP1062467A1 (fr) 2000-12-27
DE59903167D1 (de) 2002-11-28
AU3141999A (en) 1999-09-27

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