EP3393679B1 - Dispositif de durcissement aux uv présentant des miroirs divisés de déviation des uv - Google Patents

Dispositif de durcissement aux uv présentant des miroirs divisés de déviation des uv Download PDF

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Publication number
EP3393679B1
EP3393679B1 EP16816196.6A EP16816196A EP3393679B1 EP 3393679 B1 EP3393679 B1 EP 3393679B1 EP 16816196 A EP16816196 A EP 16816196A EP 3393679 B1 EP3393679 B1 EP 3393679B1
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Prior art keywords
mirror
radiation
source
curing device
processing zone
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EP16816196.6A
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German (de)
English (en)
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EP3393679A1 (fr
Inventor
Othmar Zueger
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Oerlikon Surface Solutions AG Pfaeffikon
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Oerlikon Surface Solutions AG Pfaeffikon
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B05D3/065—After-treatment
    • B05D3/067—Curing or cross-linking the coating

Definitions

  • Lacquer coatings serve as a protective layer on component surfaces and give them a specifically desired appearance.
  • the protection of the surfaces can be of a mechanical nature, e.g. Scratch resistance of the surfaces, but also chemical resistance or prevention of aging effects caused by environmental influences such as light or moisture. Varnishes are used particularly in components made of materials whose surfaces are known to be neither mechanically strong, nor are they very stable to signs of aging when exposed to environmental conditions such as sunlight and moisture over a long period of time. Such materials can be a wide variety of plastics or natural materials such as wood. For reasons of clarity, the following descriptions are limited to plastics, without excluding other materials. Both the plastic components and the paint coatings are only partially temperature-resistant, which requires special attention during process steps during their processing to ensure that critical forming temperatures are never exceeded.
  • UV-curing paints are used in many different areas. Hardening essentially means the crosslinking of polymer chains. In UV-curing lacquers, this crosslinking is induced by UV radiation. UV-curing lacquer coatings have the advantage over thermally induced or chemically self-hardening lacquers that the curing reaction takes place much faster and more specifically via photonic induction and hardly depends on diffusion processes in the lacquer, as is the case with thermally and chemically induced reactions.
  • the paints are cured in a curing device which consists of an exposure device and various peripheral components, such as the cooling device or the component conveyor.
  • High-intensity UV radiation sources are based on gas discharge lamps, which emit large amounts of visible light (VIS) and infrared radiation (IR) in addition to the desired UV radiation.
  • VIS and IR contribute to a significant increase in temperature when curing paints. However, it must be avoided that the temperature rises above the glass transition temperature of the plastic components and the lacquer during the curing process. It is desirable to suppress this VIS & IR contribution as much as possible, but to lose as little UV radiation as possible.
  • the use of wavelength-selective mirrors has proven to be a very efficient means of efficiently reducing the wavelength range in the VIS & IR range, i.e. the heat input.
  • a device which can have one or two partially transparent mirrors, which increase the relative UV component of the radiation arriving at the substrate by single or multiple beam deflection.
  • the multi-mirror arrangement described reduces the IR radiation in the curing area, but also reduces the UV radiation dose in the effective area, especially in the case of multiple deflection.
  • the inventors have further recognized that the heat generated by transmitted IR radiation in the exposure device creates a heat dissipation problem if one intends a compact overall construction.
  • Air or liquid-cooled cooling fins which are arranged behind the partially transparent mirror in the main radiation direction of the UV source, are mentioned as a solution. At first glance, this cooling strategy has considerable disadvantages. On the one hand, this only effects indirect cooling of the exposure apparatus, but not of the mirror or the radiation source.
  • a cooling device has to be installed behind the partially transparent mirror, which affects the device size and any maintenance work in the exposure device.
  • a UV curing device with split UV deflecting mirrors is used, which significantly shortens the light path from the UV source to the substrate and thereby enables both a decisive increase in the area intensity in the area of application and at the same time one ensures efficient cooling of the heat-exposed components of the device.
  • a simple configuration of the curing device optimal exposure conditions for high-intensity UV exposure to the substrates and the possible shortening of the exposure times, which meet the economic aspect of the invention, can be achieved.
  • FIG. 1 A typical structure of a UV curing device is in Figure 1 shown.
  • High-intensity, broadband UV radiation sources consist of a gas discharge lamp 1 and a lamp reflector element 2, which collects UV radiation emitted in the direction facing away from the component and reflects it in the area in which the components 10 coated with UV-curing lacquer 11 are located are located. This area, hereinafter referred to as the processing area, is therefore exposed to radiation which is composed of direct radiation and reflected radiation.
  • the gas discharge lamp 1 is essentially tubular. However, it can also consist of one or a series of individual, essentially point-shaped lamps which are arranged in a row.
  • Gas discharge lamps as a UV radiation source consist of a tube which is highly permeable to UV radiation and hermetically sealed, with an evaporable amount of metal enclosed therein and an inert gas filling. The latter is excited by an electrically induced gas discharge, which heats it and leads to the evaporation of the amount of metal through heat transfer.
  • the metal vapor formed is also electrically excited and the metal vapor plasma that forms emits radiation according to known excitation lines, in particular UV light.
  • the plasma also emits radiation in the visible (VIS) and infrared (IR) range of the electromagnetic spectrum.
  • the tube of the gas discharge lamp which usually consists of UV-transmissive quartz glass, and causes the tube to heat up.
  • the hot gas in the pipe also transfers heat to the pipe walls. Because of that Pipe material made of quartz glass due to its material properties limits are set with regard to the temperature, beyond which the strength of the pipe is lost, this pipe must be cooled.
  • the cooling takes place by the flow of gas 31 (normally air), which heats up and thus dissipates the energy from the pipe.
  • the cooling gas is usually supplied actively with pressure in order to increase the flow quantity and thus the cooling capacity via one or more access openings 30.
  • the lamp tube is partially surrounded on one side with a lamp reflector element 2, which efficiently reflects the UV radiation into the opposite side in the processing area.
  • the cooling gas 31 must essentially be supplied on the lamp reflector side, since the desired UV radiation should be able to propagate freely to the component to be exposed on the front side.
  • the gas flow can be supplied through holes in the lamp reflector element 2 through which the gas flows with pressure onto the lamp tube 1.
  • the heated gas must be able to flow away as freely as possible on the processing area side to ensure the effectiveness of the cooling.
  • the lamp reflector element 2 can be provided with a coating which reflects the UV portion of the radiation well, the VIS & IR Share but little reflected. This can be done by a dichroic thin film coating, which on the one hand highly reflects the UV component and transmits the VIS & IR component in the lamp reflector body, which are absorbed by the underlying reflector material. The lamp reflector is heated and the resulting heat has to be dissipated via the IR radiation and the gas flow.
  • the direct radiation from the tubular gas discharge lamp ie the radiation that does not reach the processing area via the lamp reflector, is not attenuated in the VIS and / or IR portion.
  • a residual portion of the VIS & IR radiation which is not transmitted by the coating of the lamp reflector and is not absorbed in the reflector, reaches the processing area.
  • a further suppression of the VIS & IR radiation can be achieved by an additional, wavelength-selective deflection mirror 8 positioned in the beam path will. This deflecting mirror 8 is intended to reflect the UV component in the radiation 5 from the source as well as possible, while reflecting the VIS & IR component 7 as poorly as possible.
  • such a deflecting mirror is designed as a flat mirror which is coated with a dichroic thin-layer filter coating.
  • This mirror is usually arranged at an angle of 45 ° between the normal to the mirror surface to the main beam of the UV source, the processing region with the components 10 exposed to UV-curable lacquer 11 then being located downstream in the beam path of the UV radiation reflected by the deflecting mirror rotated by 90 ° to the main beam of the UV source.
  • the deflecting mirror can also be arranged at an angle ⁇ to the mirror normal that deviates from 45 °, the processing region then being rotated by the angle 2 ⁇ ⁇ relative to the main beam of the UV source.
  • the VIS & IR radiation 7 is mostly transmitted through the specific choice of the dichroic filter coating.
  • a suitable VIS & IR-permeable mirror substrate material is selected and ensures that the VIS & IR radiation 7 is transmitted as far as possible through the mirror and is thus kept away from the processing area.
  • Glasses with high VIS & IR transparency are particularly suitable as the mirror substrate. Borosilicate glass or quartz glass are particularly suitable for this, however the transparency for these glasses in the IR range is limited to wavelengths less than 2800 nm or 3500 nm.
  • the dimension of the deflecting mirror 8 should be chosen so that the largest possible proportion of the light emitted by the source hits the mirror and directs it into the processing area. With the size of this UV deflecting mirror, however, the light path d between the UV source and the processing area increases, so that the UV light intensity in this area decreases. Furthermore, the cooling gas flow from the UV source must be diverted past the deflecting mirror.
  • the Flow of this cooling gas should be as laminar as possible in order to ensure an efficient and unobstructed discharge.
  • the cooling gas flow usually runs, as can be seen from the prior art and in Figure 1 shown, along a closed line and flows out through an opening with the width a at the end of the UV deflection mirror which is furthest away from the UV source.
  • the cooling gas flow can also flow through a plurality of openings along an imaginary line from the end of the lamp reflector 2 to the end of the divided UV deflection mirrors 81 to 83 in Figure 4 respectively.
  • the simplest version uses a quartz glass panel. Furthermore, the spatial separation of the processing area from the exposure device described above by means of an optical disk element 9 makes it possible to carry out a separate substrate cooling by means of cooling gas, which allows the permissible exposure dose to be increased. With active suction devices in the area of the deflecting mirror facing away, the necessary cooling gas flow could be achieved with a reduced cross-sectional width a, but this requires additional pumps and fluidically advantageous arrangements of the mirror and their holders in order to ensure a uniform suction flow over the length L of the mirror. With the length L of the mirror, the dimension is perpendicular to the plane of Figure 1 designated and is in Figure 2 shown as a supervision of the arrangement. Such fluidically However, optimized arrangements represent unwanted restrictions regarding the most efficient UV light guidance in the processing area.
  • the cooling gas flow could be derived laterally, at least with a limited length of the UV source and the deflecting mirror, ie perpendicular to the plane of Figure 1 .
  • an ever greater cooling gas flow would have to be discharged through these two lateral openings, which limits the cooling efficiency with increasing length L , especially in the area of the center of the UV source.
  • flat reflector elements 18 are preferably attached laterally to the deflecting mirror.
  • lateral reflector elements direct light rays from the UV source, which have an essential component laterally along the length L of the UV source and predominantly spread in these directions, into the processing region, which extends essentially over the length L of the UV source.
  • a better uniformity of the illumination of the processing area with UV light is achieved.
  • intensity distribution curves over the length L of the UV source are shown schematically. Curve 181 shows the case without lateral reflector elements 18, curve 182 shows the case with lateral reflector elements 18, with the improved illumination compared to curve 181.
  • These lateral reflector elements 18 extend essentially over the entire height from the upper edge of the deflecting mirror 8 to the disk element 9 in Figure 1 and 4 to 7 in order to obtain the most homogeneous illumination possible over the length L. With the preferred use of these lateral reflector elements 18, however, the cooling gas is prevented from being able to flow off laterally. In this configuration, which is advantageous for illuminating the processing area, it must therefore be ensured that the cooling gas flow can flow out into area 4 exclusively over the cross-sectional opening width a.
  • a preferred embodiment of the present invention is in with a solution for guiding the UV light into the processing area as efficiently as possible while at the same time efficiently removing the cooling gas stream from the UV source Figure 4 shown schematically.
  • the cooling gas can pass between the Mirror segments are separated into individual cooling gas flow segments 41, 42, 43, 44.
  • Subdivision into three mirror segments shown is to be understood as an example; subdivisions into more than two, that is to say N, segments are possible, where N can be an integer greater than or equal to two.
  • the sum of the opening widths b1 , b2 , b3 , b4 in Figure 4 be substantially the same as the width a in Figure 1 .
  • both the widths b1 and b4 are kept as small as possible in order to make the light path d between the source and the processing area as short as possible.
  • the gap widths b2 and b3 result from this as an offset of the deflecting mirror segments.
  • both the optical disk element 9 and, accordingly, the paint-coated components 10 can be brought much closer to the deflecting mirror. This shortens the light path d between the UV source and components, which leads to an advantageously higher intensity of the UV light that falls on these components.
  • the reflected UV light 61 from segment 81 can be directed into the processing area with greater efficiency.
  • the angle ⁇ 3 of segment 83 can be reduced in order to bring the reflected UV light 63 closer to the region of the UV light 62 of segment 82.
  • This collection of the UV light in a region of smaller extent corresponds to a focusing of the UV light in the processing region.
  • the geometric extent of the usable processing area scales with the radius of the circular movement path. This trajectory should not be kept larger than the minimum necessary for the respective component size in a mechanically advantageous design.
  • the present invention enables the components 10 to be very close to the processing area in a single movement or alternately back-and-forth movement linear 101 or rotating 102 on a circular path for the duration of the curing.
  • the deflecting mirrors are designed in three segments. According to the invention, this division of the deflecting mirror can take place in at least two up to N segments, N being intended to represent an integer.
  • a FusionUV-Heraeus type LH10 source is to be used as the UV radiation source, which is equipped with an H13plus mercury metal halide gas discharge lamp.
  • This source has a length L of approximately 25 cm.
  • the total radiation power is nominally 6 kW and requires a cooling gas flow of at least 150 L / s ambient air, which with around 2500 Pa overpressure of the UV source the connection provided for this must be supplied. According to the situation in Figure 1 this cooling gas flow is led away in a laminar flow past the UV deflecting mirror.
  • a single deflecting mirror results in an intensity for the UVA radiation (mean value over the wavelength range 320 to 400 nm) at the apex of the circular path of 290 mW / cm 2 and a UVA dose rate of 48 mJ / cm 2 / s, wherein the dose rate denotes the dose that a flat component surface element receives during one revolution on the circular path at a rotational speed of 1 rotation per second.
  • the irradiated dose rate of VIS & IR radiation onto the components per rotation cycle in the illustrated case is around 60 mJ / cm 2 / s, while this value is only 27 mJ / cm 2 / s for the case corresponding to the prior art with a related, segmented deflection mirror.
  • the VIS & IR light increases more than twice in this configuration with the lower light path and partly direct VIS & IR radiation, while the desired UV radiation increases by 24% in the dose rate.
  • Figure 6 Another embodiment is shown. Compared to Figure 4 or Figure 5 the axis of rotation of the component movement is shifted relative to the UV source so that light rays can no longer reach the components directly from the UV lamp.
  • the UV deflecting mirrors are arranged at an angle ⁇ 45 ° with respect to the main beam, as a result of which a UVA dose rate in the present case of around 62 mJ / cm 2 / s is achieved, with a VIS- & IR dose rate of 31 mJ / cm 2 / s, which is about the same as in the case of the segmented and connected mirror.
  • the UV source can be tilted such that it is tilted away from the substrates 10 and thus the housing of the UV source direct radiation of the UV source towards the substrate shields and therefore the substrates are only exposed to the reflected radiation from the reflector element 2 and / or the divided mirror elements.
  • FIG. 7 Another application example is based on Figure 7 clarifies. Is made according to the configuration Figure 5 introduced a diaphragm element 21 with the length of 25 mm at the lower end of the reflector element 2, which blocks all direct rays from the UV lamp to the components in the processing area, the heat load can be eliminated by directly irradiated VIS & IR light.
  • the diaphragm element 21, like the reflector element 2, can be coated in order to increase the UV reflection, but the diaphragm element must be impervious to the VIS & IR radiation.
  • the unintentional blocking of UV light which should fall into the processing area as reflected by the UV deflecting mirror segment, is comparatively low.
  • Table 1 shows the data given for UVA intensity, UVA dose rate, and the corresponding dose rates for the irradiated VIS and IR light for the cases shown here from Figure 1 , 5 , 6 and 7 summarized.
  • the case of the coherently segmented UV deflecting mirror corresponding to the prior art was assumed to be a 100% reference value for the comparisons of the UVA intensity and dose rate.
  • a linear component movement through the processing area is possible in all of the above-mentioned embodiments, the components in the configurations of Figure 5 , 6 and 7 are slightly exposed to direct radiation from the UV lamp.
  • the individual mirror elements separated from each other can be shifted from the side, ie parallel to the main beam, in such a way that the upper edge of one mirror element protrudes from the lower edge of the neighboring mirror element, which, viewed from the UV source, is perceived as "opaque" and thus continuous mirror surface is avoided, whereby an intensity loss of UV radiation is avoided.
  • a curing device for components 10 coated with a curable lacquer 11 comprising at least one radiation source 1, at least one reflector element 2 surrounding the radiation source, at least two divided dichroic mirror elements opposite the radiation source, which largely transmit the VIS and IR component of the radiation source and keep away from a processing area and at the same time reflect the UV component of the radiation source in the direction of a processing area, at least one optical disk element 9, which separates the cooling gas flow in the exposure device from the processing area, characterized in that the at least two dichroic mirror elements are arranged such that they are separated from one another and offset from one another in the direction of the main beam and are displaced parallel to the main beam and are therefore opaque to the main beam, so that through the openings created, cooling Gas can flow out, but there is no loss of intensity of UV radiation.
  • the at least two divided dichroic mirror elements are tilted relative to one another by respective angles ⁇ 1 to ⁇ N between the mirror normal and the main radiation direction of the UV source such that the UV radiation is brought together in the processing area.
  • the angles ⁇ 1 to ⁇ N of the deflecting mirror elements differ in such a way that the largest angle ⁇ 1 is taken by the mirror element that is closest to the reflector element 2 and the angles of the further mirror elements are smaller than ⁇ 1, the angle of the mirror segment which is closest to the disk element 9 being ⁇ N and the smallest being the angle ⁇ 1 to ⁇ N.
  • reflector elements 18 are attached laterally to the lighting device over the entire height from the upper edge of the at least two mirror elements to the pane element 9.
  • the UV source and the at least two divided dichroic mirror elements are arranged in such a way that both direct radiation and reflected radiation are directed into the processing area. In a preferred embodiment, only reflected radiation is directed into the processing area. In a preferred embodiment, the UV source is inclined such that no direct radiation falls into the processing area.
  • a method for curing lacquer-coated substrates which uses a curing device in which the cooling gas is removed via openings between the mirror elements as described above and an increase in the UV intensity in the processing area by shortening the light path d from the source to the surface of the coated Substrate by suitable number and arrangement of the mirror elements in terms of distance, angle, and the like.
  • the coated components are cooled separately by means of cooling gas.
  • Gas discharge lamp 1 Lamp reflector: 2nd Cooling gas supply: 30th Cooling gas inflow: 31 Cooling gas outflow / flows: 4, 41, 42, 43, 44 Emitted radiation from the UV source: 5, 51, 52, 53, 54 Radiation reflected by UV deflecting mirror (mainly UV): 6, 61, 62, 63 Radiation transmitted by UV deflecting mirror (mainly VIS & lR): 7, 71, 72, 73 Deflecting mirror, Deflecting mirror segments: 8, 81, 82, 83 Optical disc element to separate the cooling gas flow: 9 Components: 10th Paint coating of the components: 11 Linear component movement: 101 Rotating component movement: 102 cover 21st Lateral reflector element 18th UV intensity distribution without side reflector elements 181 UV intensity distribution with side reflector elements 182 Opening cross section width in each case: - between disc element 9 and deflecting mirror 8: a - between reflector element 2 and mirror segment 81: b1 - between mirror segments 81-82 and 82-83:

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Claims (11)

  1. Dispositif de durcissement pour des composants (10) revêtus d'une laque durcissable (11), comprenant au moins une source de rayonnement (1), au moins un élément réflecteur (2) entourant la source de rayonnement, au moins deux éléments de miroir dichroïques divisés, opposés à la source de rayonnement, qui transmettent majoritairement la part VIS & IR de la source de rayonnement et la maintiennent éloignée d'une zone de traitement et réfléchissent simultanément la part UV de la source de rayonnement en direction d'une zone de traitement, au moins un élément de disque optique (9) qui sépare le flux de gaz de refroidissement dans le dispositif d'exposition vis-à-vis de la zone de traitement,
    caractérisé en ce que
    lesdits au moins deux éléments de miroir dichroïques sont disposés de telle sorte que :
    - ils sont séparés l'un de l'autre et décalés l'un par rapport à l'autre dans la direction du faisceau principal et
    - ils sont déplacés parallèlement au faisceau principal et sont donc opaques par rapport au faisceau principal,
    - de sorte qu'un gaz de refroidissement peut s'écouler à travers les ouvertures créées, mais il n'y a pas de perte d'intensité du rayonnement UV.
  2. Dispositif de durcissement selon la revendication 1,
    caractérisé en ce que
    lesdits au moins deux éléments de miroir dichroïques divisés sont inclinés l'un par rapport à l'autre selon des angles respectifs α1 à αN entre la normale au miroir et la direction du faisceau principal de la source UV de telle sorte que le rayonnement UV soit réuni dans la zone de traitement.
  3. Dispositif de durcissement selon la revendication 2,
    caractérisé en ce que
    les angles α1 à αN des éléments de miroir de déviation sont différents de telle sorte que l'angle α1 le plus grand est occupé par l'élément de miroir le plus proche de l'élément réflecteur (2), et les angles des autres éléments de miroir sont inférieurs à α1, l'angle du segment de miroir le plus proche de l'élément de disque (9) étant αN et représentant le plus petit parmi les angles α1 à αN.
  4. Dispositif de durcissement selon l'une au moins des revendications précédentes,
    caractérisé en ce que
    des éléments réflecteurs (18) sont montés latéralement sur le dispositif d'éclairage sur toute la hauteur depuis l'arête supérieure desdits au moins deux éléments de miroir jusqu'à l'élément de disque (9).
  5. Dispositif de durcissement selon l'une au moins des revendications précédentes,
    caractérisé en ce que
    l'agencement de la source UV et desdits au moins deux éléments de miroir dichroïques dirige aussi bien un rayonnement direct qu'un rayonnement réfléchi jusque dans la zone de traitement.
  6. Dispositif de durcissement selon l'une au moins des revendications précédentes,
    caractérisé en ce que
    exclusivement un rayonnement réfléchi est dirigé dans la zone de traitement.
  7. Dispositif de durcissement selon l'une au moins des revendications précédentes,
    caractérisé en ce que
    la source UV est inclinée de telle sorte qu'aucun rayonnement direct ne tombe dans la zone de traitement.
  8. Dispositif de durcissement selon l'une au moins des revendications précédentes,
    caractérisé en ce que
    parmi toutes les ouvertures ayant en section transversales les largeurs (b1) à (bN) et situées
    - entre les éléments de miroir individuels et
    - entre l'élément de miroir le plus proche de l'élément réflecteur et l'élément réflecteur (2) et
    - entre chaque élément de miroir le plus proche de l'élément de disque (9) et l'élément de disque (9),
    la plus petite largeur en section transversale, bN, est située entre l'élément de miroir (9) et l'élément de miroir le plus proche.
  9. Procédé utilisant un dispositif de durcissement selon l'une ou plusieurs des revendications précédentes pour faire durcir des substrats revêtus d'une laque.
  10. Procédé selon la revendication 9,
    dans lequel
    l'intensité UV dans la zone de traitement est augmentée par raccourcissement du chemin de lumière d depuis la source jusqu'à la surface du substrat revêtu.
  11. Procédé selon la revendication 10 ou 9,
    caractérisé en ce que
    il est prévu un refroidissement séparé des composants laqués par un gaz de refroidissement.
EP16816196.6A 2015-12-22 2016-12-07 Dispositif de durcissement aux uv présentant des miroirs divisés de déviation des uv Active EP3393679B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PL16816196T PL3393679T3 (pl) 2015-12-22 2016-12-07 Urządzenie utwardzające UV z podzielonymi zwierciadłami przekierowującymi UV

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DE102015016730.8A DE102015016730A1 (de) 2015-12-22 2015-12-22 UV-Aushärtevorrichtung mit geteilten UV-Umlenkspiegeln
PCT/EP2016/002074 WO2017108163A1 (fr) 2015-12-22 2016-12-07 Dispositif de durcissement aux uv présentant des miroirs divisés de déviation des uv

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EP3393679A1 EP3393679A1 (fr) 2018-10-31
EP3393679B1 true EP3393679B1 (fr) 2020-05-27

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US (1) US11203038B2 (fr)
EP (1) EP3393679B1 (fr)
JP (1) JP6934008B2 (fr)
KR (1) KR20180105654A (fr)
CN (1) CN108698078B (fr)
DE (1) DE102015016730A1 (fr)
ES (1) ES2813559T3 (fr)
MX (1) MX2018007671A (fr)
PL (1) PL3393679T3 (fr)
WO (1) WO2017108163A1 (fr)

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DE112018007709T5 (de) * 2018-06-08 2021-02-18 Toshiba Mitsubishi-Electric Industrial Systems Coproration Filmausbildungsvorrichtung
CN112122071B (zh) * 2020-08-13 2022-07-26 博斯特精工科技(苏州)有限公司 一种用于点胶设备的传输装置
CN115709156B (zh) * 2022-11-15 2023-06-30 中科伟通智能科技（江西）有限公司 一种贯穿式车灯用uv固化生产线

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JP6934008B2 (ja) 2021-09-08
WO2017108163A1 (fr) 2017-06-29
PL3393679T3 (pl) 2020-11-16
US11203038B2 (en) 2021-12-21
JP2019503269A (ja) 2019-02-07
CN108698078A (zh) 2018-10-23
DE102015016730A1 (de) 2017-06-22
KR20180105654A (ko) 2018-09-28
ES2813559T3 (es) 2021-03-24
EP3393679A1 (fr) 2018-10-31
MX2018007671A (es) 2018-11-14
CN108698078B (zh) 2021-12-24
US20190001371A1 (en) 2019-01-03

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