EP3393679A1 - Dispositif de durcissement aux uv présentant des miroirs divisés de déviation des uv - Google Patents

Dispositif de durcissement aux uv présentant des miroirs divisés de déviation des uv

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Publication number
EP3393679A1
EP3393679A1 EP16816196.6A EP16816196A EP3393679A1 EP 3393679 A1 EP3393679 A1 EP 3393679A1 EP 16816196 A EP16816196 A EP 16816196A EP 3393679 A1 EP3393679 A1 EP 3393679A1
Authority
EP
European Patent Office
Prior art keywords
radiation
mirror
source
processing area
curing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP16816196.6A
Other languages
German (de)
English (en)
Other versions
EP3393679B1 (fr
Inventor
Othmar Zueger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oerlikon Surface Solutions AG Pfaeffikon
Original Assignee
Oerlikon Surface Solutions AG Pfaeffikon
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Surface Solutions AG Pfaeffikon filed Critical Oerlikon Surface Solutions AG Pfaeffikon
Priority to PL16816196T priority Critical patent/PL3393679T3/pl
Publication of EP3393679A1 publication Critical patent/EP3393679A1/fr
Application granted granted Critical
Publication of EP3393679B1 publication Critical patent/EP3393679B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B05D3/065—After-treatment
    • B05D3/067—Curing or cross-linking the coating

Definitions

  • UV curing device with split UV deflecting mirrors
  • Paint coatings serve as a protective layer of component surfaces and give them a specific desired appearance.
  • the protection of the surfaces may be both mechanical in nature, e.g. Scratch resistance of the surfaces, but also chemical resistance or prevention of aging effects caused by environmental influences such as light or moisture.
  • Coatings are used in particular for components made of materials whose surfaces are known to be neither mechanically strong nor very stable to aging phenomena are in long-term exposure to environmental conditions such as sunlight and moisture. Such materials can be a wide variety of plastics or natural products such as wood. The following descriptions are limited to the sake of clarity on plastics, without excluding other materials. Both the plastic components as well as the lacquer coatings are only limited temperature resistant, which requires special attention during process steps in their processing to ensure that critical deformation temperatures are never exceeded.
  • UV-curing coatings are used in many different areas. Curing is essentially understood to mean the crosslinking of polymer chains. In UV-curing paints, this crosslinking is induced by UV radiation. UV-curing lacquer coatings have the advantage over thermally induced or chemically self-curing lacquers that the curing reaction via the photonic induction much faster and more targeted and hardly depends on diffusion processes in the paint, as is the case with thermally and chemically induced reactions.
  • the curing of the lacquers is carried out in a curing device, which consists of an exposure device and various peripheral components, such as, inter alia, the cooling device or the component conveyor device.
  • CONFIRMATION COPY is proportional to the exposure dose, but over a certain threshold disproportionately decreases with smaller area intensity and thus can not be compensated over the exposure time. It is thus desirable to achieve the highest possible surface intensity, ie the intensity per unit area, and thereby to make the required exposure time as short as possible.
  • High intensity UV radiation sources are based on gas discharge lamps, which in addition to the desired UV radiation also emit large amounts of visible light (VIS) and infrared radiation (IR).
  • VIS and IR contribute to a significant increase in temperature when curing paints. However, it must be avoided that the temperature rises during the curing process on the glass transition temperature of the plastic components and the paint. It is desirable to suppress this VIS & IR contribution as much as possible while losing as little UV radiation as possible.
  • wavelength-selective mirrors For this purpose, the use of wavelength-selective mirrors has proven to be a very efficient means for efficiently reducing the wavelength range in the Vis & IR range, ie the heat input.
  • a device which may have one or two partially transparent mirrors which increase the relative UV component of the radiation arriving at the substrate by simple or multiple beam deflection.
  • the IR radiation in the curing area is reduced by the described multi-mirror arrangement, the UV radiation dose in the area of action is reduced even in the case of multiple deflection.
  • the inventors have further recognized that the heat generated by the transmitted IR radiation in the exposure device creates a heat dissipation problem, if one intends a compact overall construction.
  • air or liquid cooled cooling fins which are arranged in the main radiation direction of the UV source behind the partially transparent mirror called.
  • this cooling strategy has considerable disadvantages.
  • the embodiment of the cold-light mirror arrangement includes a plate-shaped heat refraction filter, which spatially shields the illumination unit from the curing area, and thus prevents the heated gas from flowing out of the substrate.
  • this curing device has the significant disadvantage that a certain amount of device is necessary for sufficient cooling by the gas flow, which causes a prolonged light path of the UV radiation to the component, which must be accompanied by a reduction of the surface intensity.
  • a practical design of the curing device should be as simple as possible and easy to maintain and be inexpensive to implement.
  • the curing device should take the lowest possible geometric extent and be easily adaptable to different substrate geometries.
  • a UV curing device with divided UV deflecting mirrors is used, which significantly shortens the light path from the UV source to the substrate, thereby enabling both a significant increase in area intensity in the area of application and at the same time ensuring efficient cooling of the heat-exposed components of the device.
  • This can be a simple design of the curing device, optimum exposure conditions for high-intensity UV exposure of the substrates and the possible shortening of the exposure times are achieved, which meet the economic aspect of the invention.
  • FIG. 1 schematically shows a UV curing device as a side section with a planar deflecting mirror 8 for the separation of UV light from the VIS & IR light.
  • Schematically for the beam path are shown in simplified form only three beams from the UV source, the middle beam is to correspond to the main beam.
  • Figure 2 shows schematically the curing device according to Figure 1 in plan view with a length L, which may be substantially arbitrary.
  • the lateral reflectors 18 are subsequently shown at the ends of the deflecting mirror 8, with which the illumination in the processing area is made more uniform over the length of the source.
  • FIG. 3 schematically shows a typical intensity distribution of the UV radiation over the length of the irradiation device in the processing area in which the components for exposure are located, with, and without, 181, lateral reflector elements.
  • FIG. 4 shows schematically a UV curing device as a side section with individual segmented, staggered Umlenkaptianan, between which the heated cooling gas can flow away from the UV source upwards. This arrangement allows a reduction of the light path d between the UV source and components while maintaining the necessary cooling gas flow of the UV source.
  • FIG. 5 schematically shows a UV curing device as a side section with individual segmented, mutually offset deflection mirrors arranged at different angles to the main beam in order to concentrate the UV radiation in the processing region and to collect the UV radiation of the source more efficiently.
  • FIG. 6 shows a UV curing device as a side section according to FIG. 5, wherein the arrangement of the components relative to the UV source is relatively displaced or tilted in order to minimize the direct irradiation of VIS & IR light from the UV lamp onto the components.
  • Figure 7 shows a UV curing device as a side section as in Figure 5 with additional aperture 21, which prevents irradiation of the substrate with direct radiation of the UV source.
  • High-intensity, broad-band UV radiation sources consist of a gas discharge lamp 1 and a lamp reflector element 2 which collects UV radiation emitted in the direction away from the component and reflects in the direction in which the components 10 coated with UV-curing lacquer 11 to find oneself.
  • This area hereinafter referred to as processing area, is therefore exposed to radiation, which is composed of direct radiation and reflected radiation.
  • the gas discharge lamp 1 is substantially tubular. But it can also consist of one or as a series of individual, substantially point-shaped lamps, which are arranged in a row.
  • Gas discharge lamps as a UV radiation source consist of a UV-radiation highly permeable, hermetically sealed tube l with an enclosed vaporizable amount of metal and a noble gas filling. The latter is excited by an electrically induced gas discharge, whereby it is heated and leads by heat transfer to evaporation of the amount of metal.
  • the metal vapor formed is also electrically excited and the resulting metal vapor plasma emits radiation according to known excitation lines, in particular UV light.
  • the plasma also emits radiation in the visible (VIS) and infrared (IR) regions of the electromagnetic spectrum.
  • the tube of the gas discharge lamp which is usually made of UV-transparent quartz glass
  • a part of the infrared radiation emitted by the metal vapor plasma is absorbed and leads to a heating of the tube.
  • the hot gas in the pipe transfers heat to the pipe walls. Since the quartz glass tube material has limits on the temperature due to its material properties, exceeding which the strength of the tube is lost, this pipe has to be cooled.
  • the cooling is done by flowing with gas 31 (usually air), which heats up and thus dissipates the energy from the pipe.
  • the supply of the cooling gas is usually active with pressure to increase the flow rate and thus the cooling capacity via one or more access openings 30th
  • the lamp tube In order to bring as much emitted UV light into the processing area, the lamp tube is partially surrounded on one side with a lamp reflector element 2, which efficiently reflects the UV radiation in the opposite side in the processing area.
  • the supply of the cooling gas 31 must be carried out substantially lamp-reflector side, since the front side, the desired UV radiation should be able to propagate unhindered to be exposed component.
  • the gas flow can be supplied through holes in the lamp reflector element 2, through which the gas flows with pressure on the lamp tube 1.
  • the heated gas must be able to flow away as freely as possible on the processing area, in order to ensure the effectiveness of the cooling.
  • the lamp reflector element 2 can be provided with a coating which reflects the UV component of the radiation well, the VIS & IR sensor. Share but little reflected. This can be done by a dichroic thin film coating, which on the one hand highly reflects the UV component, and transmits VIS & IR component in the lamp reflector bodies, which are absorbed by the underlying reflector material. The lamp reflector is thereby heated, and the resulting heat must be dissipated via the IR radiation and the gas stream.
  • the direct radiation from the tubular gas discharge lamp ie the radiation that does not reach the processing area via the lamp reflector, experiences no attenuation of the VIS and / or IR component.
  • Even a residual portion of the VIS & IR radiation which is not transmitted by the coating of the lamp reflector and is not absorbed in the reflector, enters the processing area.
  • Further suppression of the VIS & IR radiation can be achieved by an additional wavelength-selective deflection mirror 8 positioned in the beam path. This deflecting mirror 8 is intended to reflect the UV component in the radiation 5 as well as possible from the source, but to reflect the VIS and IR component 7 as poorly as possible.
  • Such a deflection mirror is in the simplest case as a flat mirror executed, which is covered with a dichroic thin-film filter coating.
  • This mirror is usually placed at an angle of 45 ° between the normal on the mirror surface to the main beam of the UV source, then the processing area with the acted upon with UV-curable resist 11 components 10 then downstream in the beam path of reflected by the deflection mirror UV radiation is rotated 90 ° to the main beam of the UV source is located.
  • the deflecting mirror can also be arranged at an angle a deviating from 45 ° to the mirror normal, wherein the processing area is then rotated by the angle 2 a relative to the main beam of the UV source.
  • the VIS & IR radiation 7 is mostly transmitted by the specific choice of the dichroic filter coating.
  • a suitable VIS & IR transparent mirror substrate material is selected for the deflection mirror and ensure that the VIS & IR radiation 7 continues to be transmitted as far as possible through the mirror and thus kept away from the processing area. Glasses with high VIS & IR transparency are particularly suitable as a mirror substrate.
  • Borosilicate glass or quartz glass are particularly suitable for this purpose, but the transparency is also limited for these glasses in the IR range to wavelengths less than 2800 nm, or 3500 nm.
  • For the transmitted VIS & IR radiation 7 must be taken to ensure that they are in the rest The structure of the structure is further deflected away and ultimately absorbed so that it can no longer reach a significant proportion of multiple reflections on parts of the structure neither in the processing area nor in the UV source itself, in order to avoid undesired heating in both cases.
  • the dimension of the deflecting mirror 8 should be chosen so that the largest possible proportion of the light emitted by the source hits the mirror and directs it into the processing area.
  • the cooling gas flow must be removed from the UV source past the deflection mirror.
  • the flow of this cooling gas should be as laminar as possible in order to ensure an efficient and less hindered outflow.
  • the cooling gas stream usually runs, as can be seen in the prior art and shown in Figure 1, along a closed line and flows through an opening with the width a at the end of the UV deflecting mirror, which is furthest away from the UV source , out.
  • the cooling gas flow may also be via a plurality of openings along an imaginary line from the end of the lamp reflector 2 to the end of the split UV deflecting mirrors 81 to 83 in FIG.
  • minimal openings with the cross-sectional widths b1 to b4 between the divided UV deflecting mirrors, as well as the deflecting mirrors and the reflector element 2 or the disk element 9 are sufficient for the cooling gas flow to be divided into the areas 41 to 44. It is thus possible to bring the disk element 9 closer to the split mirror elements, which causes a shortening of the entire light path d from the UV source to the surface of the coated substrate.
  • the gas flow of the lamp tube and the lamp reflector does not flow directly into the processing area and leads to undesired heating of the components to be exposed, the gas flow is separated from the processing area by means of an optical disk element 9, which transmits the desired UV radiation as well as possible.
  • an optical disk element 9 which transmits the desired UV radiation as well as possible.
  • a disk element made of quartz glass is used for this purpose.
  • the derivation of the cooling gas flow could be done laterally, ie perpendicular to the plane of at least for a limited length of the UV source and the deflection mirror FIG. 1. As the length L of the source increases, however, an ever greater flow of cooling gas would have to be dissipated via these two lateral openings, which limits the cooling efficiency with increasing length L, in particular in the region of the center of the UV source.
  • flat reflector elements 18 are preferably attached laterally to the deflecting mirror. These side reflector elements direct light rays of the UV source, which have a substantial component laterally along the length L of the UV source and propagate mostly in these directions, into the processing region which extends substantially the length L of the UV source. With these side reflectors 18, a better uniformity of the illumination of the processing area is achieved with UV light.
  • These lateral reflector elements 18 extend substantially over the entire height from the upper edge of the deflecting mirror 8 to the disk element 9 in FIGS. 1 and 4 to 7 in order to obtain the most homogeneous possible illumination over the length L. With the preferred use of these lateral reflector elements 18, however, the cooling gas is prevented from being able to flow off to the side. It must therefore be ensured in this configuration, which is advantageous for the illumination of the processing region, that the cooling gas flow can flow out into the region 4 exclusively via the cross-sectional opening width a.
  • a preferred embodiment of the subject invention is shown schematically in Figure 4 with a solution for the most efficient management of UV light in the processing area, at the same time efficient removal of the cooling gas flow from the UV source.
  • the cooling gas can be separated between the mirror segments into individual cooling gas flow segments 41, 42, 43, 44.
  • the subdivision into three mirror segments shown in FIG. 4 is to be understood as an example, subdivisions into more than two, ie N, segments are possible, wherein N may be an integer greater than or equal to two.
  • the sum of the opening widths b1, b2, b3, b4 in Figure 4 must be substantially equal to the width a in Figure 1.
  • the same cross-sectional areas for the exit of the cooling gas flow and thus substantially the same cooling performance for different configurations result. It has proved to be particularly advantageous if both the width b1 and b4 are kept as small as possible in order to make the light path d between source and processing area as short as possible. In order to obtain the necessary cooling gas flow, this results in the gap widths b2 and b3 as an offset of the deflection mirror segments.
  • lacquer-coated components 10 are brought much closer to the deflection mirror.
  • the light path d between the UV source and components is shortened, resulting in an advantageously higher intensity of the UV light that falls on these components.
  • the exposure time can be shortened, thus achieving higher productivity in the exposure process in this arrangement.
  • the reduction of the distance b1 from the mirror segment 81 from the UV source are natural limits. If the distance is too small, a portion of the UV light reflected at the mirror segment 81 is reflected back into the UV source and does not enter the processing area as desired.
  • FIG. 5 A particularly preferred embodiment is shown in Figure 5, wherein the tilt angle ⁇ 1, ⁇ 2, a3 of the individual deflecting mirror segments 81, 82, 83 may be different. Accordingly, these angles can be individually adapted to the situation.
  • the angle cr3 of segment 83 may be decreased to bring the reflected UV light 63 closer to the region of the UV light 62 of segment 82.
  • this division of the deflecting mirror can take place in at least two to N segments, where N is intended to represent an integer number.
  • the source of UV radiation is a FusionUV-Heraeus type LH10 source equipped with a H13plus mercury metal halide gas discharge lamp.
  • This source has a length L of about 25 cm.
  • the total radiant power is nominally 6 kW and requires a cooling gas flow of at least 150 L / s of ambient air, which must be supplied with approximately 2500 Pa overpressure of the UV source via the connection provided for this purpose. In accordance with the situation in FIG. 1, this cooling gas flow is conducted away in a laminar flow past the UV deflecting mirror.
  • the light path d of the main beam decreases from 285 mm to 250 mm, ie the light path is shortened by 35 mm.
  • the irradiated dose rate of VIS & IR radiation on the components per rotation cycle in the case illustrated is around 60 mJ / cm 2 / s, while this value is only 27 mJ / cm 2 / s for the prior art case with cohesive, segmented deflection mirror amounts.
  • the VIS & IR light increases more than twice in this configuration with the lower light path and partial direct VIS & IR irradiance, while the desired UV radiation increases by 24% in the dose rate.
  • FIG. 5 Another embodiment is shown in FIG. In comparison to FIG. 4 or FIG. 5, the axis of rotation of the component movement is shifted relative to the UV source so that no light rays can pass directly from the UV lamp to the components.
  • the UV deflecting mirrors are arranged at an angle ⁇ 45 ° with respect to the main beam, whereby a UVA dose rate of around 62 mJ / cm 2 / s is achieved in the present case, with a VIS & IR dose rate of 31 mJ / cm 2 / s, which is about the same as in the case of the segmented and contiguous mirror.
  • This achieves an increase in the UV dose rate over the prior art with coherently segmented UV deflecting mirrors, but which lies below the UVA dose rate as with separated UV deflecting mirrors as shown in FIG.
  • tilting of the UV source may be such that it is tilted away from the substrates 10 and thus the UV source enclosure is the direct radiation of the UV source to the substrate shielded and thus the substrates are exposed only by the reflected radiation from the reflector element 2 and / or the split mirror elements.
  • FIG. 5 Another application example is illustrated with reference to FIG. If, in accordance with the configuration of FIG. 5, an aperture element 21 with the length of 25 mm is inserted at the lower end of the reflector element 2, which blocks all direct rays from the UV lamp to the components in the processing area, the heat load can be directly transmitted by VIS & IR Light are eliminated.
  • the diaphragm element 21, like the reflector element 2, may be coated in order to increase the UV reflection, but for the VIS & IR radiation the diaphragm element must be impermeable. The unintentional with this panel element The blocking of UV light which should be reflected by the UV deflecting mirror segment into the processing area is comparatively small.
  • Table 1 summarizes the indicated data on UVA intensity, UVA dose rate and the corresponding dose rates for the irradiated VIS & IR light for the cases of FIGS. 1, 5, 6 and 7 shown here.
  • 100% reference value for comparisons of UVA intensity and dose rate the case of the prior art contiguously segmented UV deflecting mirror was assumed.
  • a linear component movement through the processing area is possible in all the embodiments mentioned above, wherein the components in the configurations of FIGS. 5, 6 and 7 are slightly exposed to the direct irradiation of the UV lamp. Complete suppression is often not required in actual applications and this effect can be easily compensated from an economic point of view by the improved UV dose rate, as well as the possibility of additional substrate cooling by the spatial arrangement, and thus shorter exposure cycles.
  • the curing device according to the invention with mirror segments arranged separately from each other, in addition to the reduction of the light path d and thereby increased surface intensity of the component, an optimal outflow of the cooling gas is achieved.
  • the optimization of the illumination of the exposure device inherent in the invention also allows a previously impossible increase in the power of the UV source without risking a negative impact on the lacquer-coated substrates, which corresponds to an overall efficiency increase of the UV intensity in the curing area.
  • the individual mutually separate mirror elements can be viewed from the side, ie parallel to the main beam, be shifted so that the upper edge of a mirror element with respect to the lower edge of the adjacent Mirror element survives what is seen from the UV source as "opaque" and thus continuous mirror surface, whereby a loss of intensity of UV radiation is avoided.
  • a curing device has been proposed for components (10) coated with a curable lacquer (11), comprising at least one radiation source (1), at least one reflector element (2) surrounding the radiation source, at least two divided dichroic mirror elements opposite the radiation source.
  • the & IR portion of the radiation source is transmitted and kept away from a processing area and at the same time reflects the UV component of the radiation source towards a processing area, at least one optical disk element (9) separating the cooling gas flow in the exposure apparatus from the processing area, characterized in that the at least two dichroic Mirror elements are arranged so that they are separated from each other and offset from one another in the direction of the main beam and parallel to the main beam thus opaque to the main beam are opaque, so that by the resulting NEN openings cooling gas can flow, but it does not come to a loss of intensity of UV radiation.
  • the at least two divided dichroic mirror elements are tilted relative to one another by respective angles cr1 to orN between the mirror normal and the main radiation direction of the UV source such that the UV radiation is brought together in the processing region.
  • the angles cr1 to ⁇ of the deflecting mirror elements are different in that the largest angle a1 is occupied by the mirror element which is closest to the reflector element (2), and the angles of the further mirror elements are smaller than ⁇ 1, where Angle of the mirror segment closest to the disk element (9) is ⁇ and the smallest is the angle a1 to crN.
  • reflector elements (18) are attached laterally to the illumination device over the entire height from the top edge of the at least two mirror elements to the pane element (9).
  • the UV source and the at least two divided dichroic mirror elements are arranged such that both direct radiation and reflected radiation are directed into the processing area. In a preferred embodiment, only reflected radiation is directed into the processing area.
  • the UV source is tilted such that no direct radiation falls within the processing area.
  • a method for curing varnish-coated substrates which employs a curing device wherein cooling gas is removed via openings between the mirror elements as described above and an increase in UV intensity in the processing area by shortening the light path d from the source to the surface of the coated substrate by suitable number and arrangement of the mirror elements in terms of distance, angle, and the like.
  • a separate cooling of the painted components takes place by means of cooling gas.
  • Coolant gas supply 30
  • Cooling gas flow / streams 4, 41, 42, 43, 44
  • Main radiation axis of the UV source a1, a2, a3:

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Abstract

La présente invention concerne un dispositif de durcissement pour soumettre des substrats à l'action d'un rayonnement UV, comprenant au moins une source de rayonnement, au moins un élément réflecteur entourant la source de rayonnement, au moins deux éléments miroir dichroïques divisés, situés en face de la source de rayonnement, qui transmettent en grande partie la proportion visible et infrarouge de la source de rayonnement et la tiennent éloignée de la zone de traitement et qui réfléchissent en grande partie simultanément la proportion ultraviolette de la source de rayonnement vers la zone de traitement, et au moins un élément vitre optique qui sépare le flux de gaz de refroidissement dans le dispositif d'éclairage de la zone de traitement. Le dispositif est caractérisé en ce que lesdits au moins deux éléments miroir dichroïques divisés sont disposés de manière telle qu'ils sont séparés l'un de l'autre et décalés l'un par rapport à l'autre dans le sens du rayon principal et sont déplacés parallèlement par rapport au rayon principal et donc opaques par rapport au rayon principal de telle sorte que le gaz de refroidissement peut s'écouler à travers les ouvertures formées sans cependant générer une perte d'intensité du rayonnement UV.
EP16816196.6A 2015-12-22 2016-12-07 Dispositif de durcissement aux uv présentant des miroirs divisés de déviation des uv Active EP3393679B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PL16816196T PL3393679T3 (pl) 2015-12-22 2016-12-07 Urządzenie utwardzające UV z podzielonymi zwierciadłami przekierowującymi UV

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102015016730.8A DE102015016730A1 (de) 2015-12-22 2015-12-22 UV-Aushärtevorrichtung mit geteilten UV-Umlenkspiegeln
PCT/EP2016/002074 WO2017108163A1 (fr) 2015-12-22 2016-12-07 Dispositif de durcissement aux uv présentant des miroirs divisés de déviation des uv

Publications (2)

Publication Number Publication Date
EP3393679A1 true EP3393679A1 (fr) 2018-10-31
EP3393679B1 EP3393679B1 (fr) 2020-05-27

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US (1) US11203038B2 (fr)
EP (1) EP3393679B1 (fr)
JP (1) JP6934008B2 (fr)
KR (1) KR20180105654A (fr)
CN (1) CN108698078B (fr)
DE (1) DE102015016730A1 (fr)
ES (1) ES2813559T3 (fr)
MX (1) MX2018007671A (fr)
PL (1) PL3393679T3 (fr)
WO (1) WO2017108163A1 (fr)

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KR102487935B1 (ko) * 2018-06-08 2023-01-13 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 성막 장치
CN112122071B (zh) * 2020-08-13 2022-07-26 博斯特精工科技(苏州)有限公司 一种用于点胶设备的传输装置
CN115709156B (zh) * 2022-11-15 2023-06-30 中科伟通智能科技（江西）有限公司 一种贯穿式车灯用uv固化生产线

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JP5156338B2 (ja) 2007-06-27 2013-03-06 三洋電機株式会社 照明装置及びそれを用いた投写型映像表示装置
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KR20180105654A (ko) 2018-09-28
US20190001371A1 (en) 2019-01-03
CN108698078A (zh) 2018-10-23
EP3393679B1 (fr) 2020-05-27
ES2813559T3 (es) 2021-03-24
DE102015016730A1 (de) 2017-06-22
WO2017108163A1 (fr) 2017-06-29
CN108698078B (zh) 2021-12-24
JP6934008B2 (ja) 2021-09-08
JP2019503269A (ja) 2019-02-07
US11203038B2 (en) 2021-12-21
PL3393679T3 (pl) 2020-11-16

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