EP1062467A1 - Kaltlicht-uv-bestrahlungsvorrichtung - Google Patents
Kaltlicht-uv-bestrahlungsvorrichtungInfo
- Publication number
- EP1062467A1 EP1062467A1 EP99913192A EP99913192A EP1062467A1 EP 1062467 A1 EP1062467 A1 EP 1062467A1 EP 99913192 A EP99913192 A EP 99913192A EP 99913192 A EP99913192 A EP 99913192A EP 1062467 A1 EP1062467 A1 EP 1062467A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- light source
- barrier
- substrate
- heat
- radiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V9/00—Elements for modifying spectral properties, polarisation or intensity of the light emitted, e.g. filters
- F21V9/04—Elements for modifying spectral properties, polarisation or intensity of the light emitted, e.g. filters for filtering out infrared radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0466—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a non-reacting gas
- B05D3/048—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a non-reacting gas for cooling
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
- B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
- B05D3/065—After-treatment
- B05D3/067—Curing or cross-linking the coating
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V29/00—Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
- F21V29/50—Cooling arrangements
- F21V29/70—Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks
- F21V29/74—Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks with fins or blades
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V29/00—Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
- F21V29/50—Cooling arrangements
- F21V29/70—Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks
- F21V29/74—Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks with fins or blades
- F21V29/76—Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks with fins or blades with essentially identical parallel planar fins or blades, e.g. with comb-like cross-section
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V7/00—Reflectors for light sources
- F21V7/005—Reflectors for light sources with an elongated shape to cooperate with linear light sources
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B3/00—Drying solid materials or objects by processes involving the application of heat
- F26B3/28—Drying solid materials or objects by processes involving the application of heat by radiation, e.g. from the sun
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B3/00—Drying solid materials or objects by processes involving the application of heat
- F26B3/28—Drying solid materials or objects by processes involving the application of heat by radiation, e.g. from the sun
- F26B3/283—Drying solid materials or objects by processes involving the application of heat by radiation, e.g. from the sun in combination with convection
Definitions
- the invention relates to a device according to the preamble of patent claim 1.
- Such cold-light UV radiation devices are used in the coating of substrates made of heat-sensitive materials, in particular plastics, with UV lacquers and printing inks.
- the substrates can be, for example, as moldings (bottles, disks, etc.) or as foils and
- Disc-shaped bodies are, for example, optical information carriers such as compact discs (CD's) or digital versatile discs (DVD's).
- Other temperature-sensitive radiation goods are ceramic-like materials, such as those used in electronic components. Metal and plastic parts contained in electronic components are also often sensitive to temperature.
- UV light in the wavelength range from 200 to 400 nm is usually used for curing.
- all common lamps also emit long-wave heat radiation (infrared radiation / IR radiation).
- the long-wave heat radiation leads to deformation and embrittlement of the substrate and is therefore undesirable.
- DE 39 02 643 C2 it is known to arrange the light source directly above the material to be irradiated and to arrange two cold light mirrors behind the light source to reduce the heat radiation. It is disadvantageous that the direct beam path from the lamp causes a high proportion of heat to reach the substrate.
- G 901 46 52.2 and in DE 440 942 6 which reduce the thermal load on the object by means of a heat filter in the direct beam path.
- These heat filters consist of a coated quartz glass pane and reduce the infrared radiation on the substrate only slightly. In addition, part of the UV radiation is also absorbed by the quartz glass panes.
- DE 38 01 283 Cl discloses a device for hardening a UV protective lacquer layer on flat objects, in which there is a flat outlet nozzle between the device and the object, the nozzle being supplied with inert gas, e.g. Nitrogen is supplied, whereby the atmospheric oxygen is displaced during the exposure process and a better quality of the hardened protective lacquer layer can be achieved.
- inert gas e.g. Nitrogen
- a UV lamp arrangement for curing photopolymerizable substances is known.
- the lamp In order to dissipate the heat radiation that cannot be used for curing, the lamp is surrounded by a water cooling jacket made of transparent molten quartz.
- a semicircular reflective coating is directly on the quartz envelope of the lamp. It generally focuses the radiation from the lamp towards a focal plane in the vicinity of the substrate.
- the invention is based on the object of providing a device for curing a UV coating which enables effective separation of the UV radiation from the IR radiation in order to reduce the thermal load on the substrate, while at the same time high UV intensity is achieved through short radiation paths.
- the UV radiation should be able to be focused on the substrate. This object is achieved according to the invention by a device having the features of claim 1 or claim 3.
- the device according to the invention effects an effective separation of the UN radiation from the IR radiation, in which more than 90% of the IR radiation can be absorbed. Due to the minimized path length of the radiation, the UV intensity is comparable to that of conventional devices, such as according to DE 39 02 643 C2, in which the light source is arranged directly above the material to be irradiated.
- the separation of UN and IR radiation also enables the use of light sources with up to 8 times the power compared to the previously used light sources without increasing the heat load on the substrate. This enables extremely short cycle times or high throughput speeds to be achieved in the production lines.
- the reflection of the UV radiation by the light source is realized instead of directing the radiation past the lamp as was customary hitherto.
- the part of the UN reflection layer which is partially circular in cross section, surrounds the light source on its underside. At least 50% of the UV radiation impinging on the UV reflection layer is reflected by the light source onto the reflectors arranged behind the light source due to its design and arrangement according to the invention. If the UN reflection layer is applied directly to the outside of the light source, the UV radiation is reflected almost completely through the light source. The losses in the passage of UN radiation through the glass body of the light source and the gas are relatively small. The path of UN radiation is minimal. Since this solution does not require any special shaping for the reflection layer on the barrier in order to reflect the UN radiation through the light source, the barrier can be designed as a geometrically simple, heat-absorbing body, for example as a plate.
- the heat-absorbing body of the barrier in conjunction with the UN reflection layer, avoids direct heat radiation on the substrate.
- UV varnishes are used in which low-molecular components evaporate, the low heat development on the substrate reduces the escape of these components.
- UV reflection layer on the barrier is part of a cold light mirror.
- the reflectors behind the light source which are also preferably designed as cold light mirrors, only guide the UN radiation required for curing at least partially past the barrier onto the substrate.
- holes are provided in the barrier through which cooling media and / or gases can be passed. Cooling prevents the barrier from emitting or reflecting heat radiation. The absorbed heat radiation can be given off to the cooling medium, but also to a cooling air flow if the barrier is designed according to claim 6. By cooling, the heat-absorbing body of the barrier can be kept at a constant temperature by regulating the amount of heat dissipated.
- Gases e.g. Nitrogen
- Nitrogen conduct to act on the substrate. In this way, short curing times can be achieved with optimal curing. It is particularly advantageous to apply the gas directly above the substrate through further holes in the form of nozzles in the barrier. These additional holes in the barrier not only allow gases to be applied, but alternatively they can also be suctioned off, for example to prevent the low molecular weight substances emerging from coatings of inferior quality from being deposited on the reflectors.
- the reflectors arranged behind the light source are at least partially cylindrical with a part-circular cross-section.
- the part-circular cross section of the reflectors focuses the radiation at a focal point on the substrate. If, on the other hand, you want to achieve extensive illumination, it is advisable to make the reflectors arranged behind the light source at least partially plate-shaped.
- the asymmetrical arrangement of the barrier and reflectors according to claim 11 has the effect that the substrate is first pre-hardened as it passes under the device and then irradiated with high UN intensity. Such pre-hardening results in matting of the UV lacquer layer.
- the intensity of the UV radiation can be varied, the intensity decreasing as the distance increases.
- Heat shields according to claim 14 also allow adjustment of the radiation incident on the substrate. You can also completely prevent the radiation (shutter) and thus protect the substrate from excessive UN radiation when the production lines are at a standstill.
- Adjustment possibilities of the screens of the screen system according to claims 15 and 16 make it possible to adapt the heat radiation effective on the substrate during production to changing production conditions (ambient temperature, air humidity, process speed, etc.).
- Deflection of the lamp body is prevented in the at least partial contact between the light source and the barrier, in particular through the support body. This allows the use of lamp bodies with a length up to 4m as they for example, for the curing of coatings on very wide packaging films or floor coverings.
- FIG. 1 shows a front view of a preferred exemplary embodiment of a device according to the invention in a schematic illustration
- FIG. 2 shows a front view of a second preferred exemplary embodiment of a device according to the invention in a schematic illustration; .
- FIG. 3 shows a front view of a third preferred exemplary embodiment of a device according to the invention in a schematic illustration; .
- FIG. 4 shows a schematic representation of the functioning of suction and gassing holes in barriers
- FIG. 6 front and side view of a detail of a device according to the invention in a schematic representation.
- Fig. 7 is a side view of the device of Figure 1 in a schematic representation.
- Fig. 8 is a front view of a preferred embodiment of a device according to the invention in a schematic representation.
- FIG. 1 a device according to the invention is shown schematically in section A-A of Figure 7.
- Fig. 7 shows the side view of this device.
- a barrier consists of a heat-absorbing body (1), a UV reflection layer (2) and bores (3,4) through which cooling media or gases can be passed.
- the bore (3) is provided with nozzles (3b), which make it possible to apply or extract gases directly above a substrate (12) with a UN lacquer layer (13).
- a rod-shaped light source (5) is arranged above the barrier.
- Reflectors (6) and (7) arranged behind the light source (5) are cylindrical with a partially circular cross section, which makes it possible to focus the UN radiation in the two points (20a) on the substrate (12).
- the reflectors (6, 7) are preferably designed as cold light mirrors in order to ensure effective separation of UV and IR radiation.
- heat absorbers (8, 9) which are provided with cooling channels (10), are arranged behind the reflectors.
- Fig. 2 shows a variant of the device with heat shields (14, 14b) and 3 focus points (20 b) of UV radiation. They all have a barrier, a light source and heat absorbers.
- the reflectors (17, 18) are each made of two cylindrical parts with 10
- the UN radiation is focused in the three points (20b).
- the heat shields (14, 14b) it is possible to block out part of the heat radiation (19).
- the heat shields (14, 14b) are closed with the adjusting device (15, 16, 15b, 16b) to such an extent that the heat radiation (19) no longer, or only partially, onto the UN lacquer layer (13) of the substrate (12) meets.
- the production lines are at a standstill, it is possible to shield the coated substrate (12, 13) from the radiation by advancing the heat shields (14, 14b) up to the barrier, as a result of which the beam path on the substrate is completely closed (see dashed lines) shown position of the heat shield (14b) (shutter function)).
- Fig. 3 shows a device similar to Fig. 2.
- the heat absorbers (8b, 9b) are designed plate-shaped.
- Fig. 4 illustrates the operation of the holes in the barrier.
- nitrogen (21) or a comparable gas can be passed onto the coated substrate (12, 13) according to the illustration above.
- the exclusion of atmospheric oxygen enables faster and better curing of the UV lacquer layer (13) on the substrate (12).
- a suction device (not shown) can be connected to the duct (3).
- the rising gas (22) is drawn off through the nozzles (3b).
- the bore (3) according to the illustration below can be used for the conduction of cooling air (23), which cools the coated substrate (12, 13) in a light air flow.
- cooling air flow (23) prevents the low molecular weight substances from rising by pushing these substances out of the radiation device.
- the barrier basically consists of a UN reflection layer (2) and a heat-absorbing body (1), unless the UV reflection layer (2) is applied to the light source (5).
- the UN reflection layer (2) mainly reflects short-wave UV radiation, while it is essentially transparent to infrared radiation.
- the UV reflection layer is applied to glass.
- the cold light mirror (2c) is arranged on the heat-absorbing body (25).
- the UN reflection layer (2e) can, for example, also be applied directly to the light source (5), the glass body then serving as a carrier material for the UV reflection layer (2e).
- the UV reflection layer (2.2d, 2f) can also be directly absorbed on the heat 12
- the body (24, 26, 28) of the barrier are applied, which can then consist, for example, of an aluminum profile with an infrared absorption layer in the formation, which prevents the IR radiation from flowing back from the aluminum profile.
- the heat-absorbing bodies (24, 25, 27, 28) of the barriers are provided with liquid cooling, while the heat-absorbing body (26) has air cooling.
- the geometry of the barrier depends on its distance from the light source (5) and on the arrangement of the UN reflection layer (2). If the UV reflection layer (2e) is applied directly to the light source (5), the heat-absorbing body (27) forming the barrier can be designed in the form of a plate. In the case of reflection layers (2, 2d, 2f) applied directly to the barrier, the heat-absorbing body (24, 25, 26, 29) of the barrier must be shaped in accordance with the desired reflection properties. When using partially circular cold light mirrors (2c), it is also advisable to arrange them in a corresponding partially circular shape of the heat-absorbing body (25) of the barrier. Cold light mirrors (2c) are easier to replace than UV reflection layers (2, 2d, 2e, 2f) applied directly to the heat-absorbing body of the barrier or the light source (5).
- the heat-absorbing body (28) has height-adjustable shutters (29), by means of which the proportion of direct heat radiation (19) that passes through the barrier and hits the substrate (12) can be regulated.
- NEN diaphragms (29) no heat radiation hits the substrate directly, with the heat shields (29) completely retracted, some of the heat radiation hits the substrate.
- the heat shields (29) can be adjusted individually.
- Fig. 6 support bodies (30, 31) are shown, which protect the light source (5) against deflection. In the case of particularly long light sources, their vitreous bodies are unable to maintain their shape at high temperatures.
- the light source lies selectively on the support bodies (30), while the support body (31) supports the light source over the entire length.
- the support bodies (30, 31) can be arranged on the heat-absorbing body (1) or on the UN reflection layer (2).
- the UV radiation is not focused in two points (20a) on the substrate as shown in FIG. 1, but rather is radially irradiated in the area (20c).
- This areal radiation causes a slight pre-hardening of the UV lacquer layer (13), which is subsequently hardened in point (20a).
- This hardening results in a slight roughening of the UV lacquer layer (13), which looks optically like a matting of the surface. This effect is used, for example, to produce glare-free surfaces in instrument panels.
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Microbiology (AREA)
- Mechanical Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma & Fusion (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
- Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Printing Methods (AREA)
- Luminescent Compositions (AREA)
- Liquid Crystal (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
Description
Claims
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19810455A DE19810455C2 (de) | 1998-03-11 | 1998-03-11 | Kaltlicht-UV-Bestrahlungsvorrichtung |
DE19810455 | 1998-03-11 | ||
PCT/EP1999/001244 WO1999046546A1 (de) | 1998-03-11 | 1999-02-26 | Kaltlicht-uv-bestrahlungsvorrichtung |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1062467A1 true EP1062467A1 (de) | 2000-12-27 |
EP1062467B1 EP1062467B1 (de) | 2002-10-23 |
Family
ID=7860464
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP99913192A Expired - Lifetime EP1062467B1 (de) | 1998-03-11 | 1999-02-26 | Kaltlicht-uv-bestrahlungsvorrichtung |
Country Status (9)
Country | Link |
---|---|
US (1) | US6621087B1 (de) |
EP (1) | EP1062467B1 (de) |
JP (1) | JP3545337B2 (de) |
AT (1) | ATE226709T1 (de) |
AU (1) | AU3141999A (de) |
DE (2) | DE19810455C2 (de) |
DK (1) | DK1062467T3 (de) |
ES (1) | ES2185325T3 (de) |
WO (1) | WO1999046546A1 (de) |
Families Citing this family (67)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE29919483U1 (de) * | 1999-11-05 | 2000-03-30 | Hoenle Ag Dr | UV-Bestrahlungsvorrichtung |
US6755518B2 (en) * | 2001-08-30 | 2004-06-29 | L&P Property Management Company | Method and apparatus for ink jet printing on rigid panels |
DE10051641B4 (de) * | 2000-10-18 | 2009-10-15 | Advanced Photonics Technologies Ag | Bestrahlungsanordnung |
DE10125467C2 (de) * | 2001-05-25 | 2003-04-10 | Arccure Technologies Gmbh | Bestrahlungsvorrichtung mit einer Anordnung von optischen Wellenleitern |
DE10125770C2 (de) * | 2001-05-26 | 2003-06-26 | Arccure Technologies Gmbh | Bestrahlungsvorrichtung mit langgestreckter Strahlungsquelle und Verfahren zum Betrieb derselben |
DE20112396U1 (de) * | 2001-07-27 | 2001-11-15 | Ackermann Gunther | Bestrahlungsvorrichtung mit Abflußdüse |
DE10161705C2 (de) * | 2001-12-15 | 2003-10-30 | Arccure Technologies Gmbh | Anordnung zur Bestrahlung von Objekten mit einer langgestreckten Strahlungsquelle sowie Vorrichtung zu deren Lagerung und Energieübertragung |
DE20203303U1 (de) * | 2001-12-21 | 2003-02-27 | Hoenle Ag Dr | UV-Bestrahlungsvorrichtung zum stationären Bestrahlen in CO2 |
DE10215024A1 (de) * | 2002-04-03 | 2003-10-30 | Juergen Welle | UV-Strahler |
NL1020370C2 (nl) * | 2002-04-11 | 2003-10-14 | Testprint Bv | Proefdrukinrichting en werkwijze voor het doen van proefdrukken alsmede bestralingssamenstel. |
JP3647834B2 (ja) * | 2002-09-25 | 2005-05-18 | 松下電器産業株式会社 | 露光装置用のミラー、露光装置用の反射型マスク、露光装置及びパターン形成方法 |
US6834984B2 (en) * | 2002-10-15 | 2004-12-28 | Delaware Captial Formation, Inc. | Curved reflective surface for redirecting light to bypass a light source coupled with a hot mirror |
US6883936B2 (en) * | 2002-10-15 | 2005-04-26 | Delaware Capital Formation, Inc. | Shutter apparatus, curing lamp housing incorporating same, and method of shutter replacement |
US7128429B2 (en) * | 2002-10-15 | 2006-10-31 | Mark Andy, Inc. | Light trap and heat transfer apparatus and method |
US6942367B2 (en) * | 2002-10-15 | 2005-09-13 | Delaware Capital Formation, Inc. | Curved and reflective surface for redirecting light to bypass a light source |
DE10333664B4 (de) * | 2003-07-23 | 2014-03-27 | Eltosch Torsten Schmidt Gmbh | Vorrichtung zum Härten von Substanzen |
DE102004023536B4 (de) * | 2003-07-24 | 2007-12-27 | Eisenmann Anlagenbau Gmbh & Co. Kg | Vorrichtung zur Aushärtung einer aus einem Material, das unter elektromagnetischer Strahlung aushärtet, insbesondere aus einem UV-Lack oder aus einem thermisch aushärtenden Lack, bestehenden Beschichtung eines Gegenstandes |
US7137695B2 (en) * | 2003-09-30 | 2006-11-21 | Konica Minolta Medical & Graphics, Inc. | Inkjet recording apparatus |
DE10352184A1 (de) * | 2003-11-05 | 2005-06-23 | Arccure Technologies Gmbh | Vorrichtung zum Härten und/oder Trocknen einer Beschichtung auf einem Substrat |
DE102004017047B4 (de) * | 2004-04-02 | 2007-05-16 | Hoenle Ag Dr | Verfahren und Vorrichtung zur Härtung von radikalisch polymerisierbaren Beschichtungen |
DE102004038592A1 (de) | 2004-08-06 | 2006-03-16 | Ist Metz Gmbh | Bestrahlungsaggregat |
DE102005000837B4 (de) | 2005-01-05 | 2022-03-31 | Advanced Photonics Technologies Ag | Thermische Bestrahlungsanordnung zur Erwärmung eines Bestrahlungsgutes |
US7777198B2 (en) | 2005-05-09 | 2010-08-17 | Applied Materials, Inc. | Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation |
US7638780B2 (en) * | 2005-06-28 | 2009-12-29 | Eastman Kodak Company | UV cure equipment with combined light path |
US8251689B2 (en) * | 2005-09-20 | 2012-08-28 | Summit Business Products, Inc. | Ultraviolet light-emitting diode device |
DE102005045203B4 (de) * | 2005-09-21 | 2009-08-20 | Uviterno Ag | Modulare Bestrahlungsvorrichtung |
US7909595B2 (en) * | 2006-03-17 | 2011-03-22 | Applied Materials, Inc. | Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections |
US7692171B2 (en) * | 2006-03-17 | 2010-04-06 | Andrzei Kaszuba | Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors |
DE102006035986B4 (de) * | 2006-08-02 | 2016-10-27 | Koenig & Bauer Ag | Vorrichtung zum Trocknen von UV-Druckfarben oder UV-Lacken auf einem Bedruckstoff |
DE102007008964A1 (de) * | 2007-02-21 | 2008-09-04 | Ssr Engineering Gmbh | UV-Bestrahlungsvorrichtung |
US20090115828A1 (en) * | 2007-10-26 | 2009-05-07 | Seiko Epson Corporation | Recording apparatus and liquid ejecting apparatus |
US7959282B2 (en) * | 2007-12-20 | 2011-06-14 | Summit Business Products, Inc. | Concentrated energy source |
US8287116B2 (en) * | 2008-02-14 | 2012-10-16 | Hewlett-Packard Development Company, L.P. | Printing apparatus and method |
US8022377B2 (en) * | 2008-04-22 | 2011-09-20 | Applied Materials, Inc. | Method and apparatus for excimer curing |
US8179046B2 (en) * | 2008-05-20 | 2012-05-15 | Nordson Corporation | Ultraviolet lamp system with cooling air filter |
DE102008061597B4 (de) * | 2008-12-11 | 2021-06-24 | Venjakob Maschinenbau Gmbh & Co. Kg | UV-Bestrahlungsvorrichtung |
WO2010066297A1 (de) * | 2008-12-11 | 2010-06-17 | Osram Gesellschaft mit beschränkter Haftung | Uv-leuchte mit reflektor |
US20100154244A1 (en) | 2008-12-19 | 2010-06-24 | Exfo Photonic Solutions Inc. | System, Method, and Adjustable Lamp Head Assembly, for Ultra-Fast UV Curing |
AT510217B1 (de) * | 2010-08-13 | 2013-12-15 | Hueck Folien Gmbh | Verfahren zur partiellen mattierung von uv-lackschichten |
JP5976776B2 (ja) | 2011-04-08 | 2016-08-24 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | Uv処理、化学処理、および堆積のための装置および方法 |
US8729498B2 (en) * | 2011-06-20 | 2014-05-20 | Harland Medical Systems, Inc. | High throughput UV curing systems and methods of curing a plurality of articles |
EP2766762B1 (de) * | 2011-10-12 | 2019-07-17 | Phoseon Technology, Inc. | Mehrere lichtsammlungs- und linsenkombinationen mit benachbarten foki zur härtung von optischen fasern |
DE102012209078B4 (de) * | 2012-05-30 | 2014-01-16 | Von Ardenne Anlagentechnik Gmbh | Blitzlampe mit prismatischem Lampenkörper |
DE102012107816A1 (de) * | 2012-08-24 | 2014-02-27 | Von Ardenne Anlagentechnik Gmbh | Verfahren und Vorrichtung zum Kurzzeittempern einer auf einem Substrat aufgebrachten Schicht |
DE102012020743A1 (de) * | 2012-10-23 | 2014-04-24 | Oerlikon Trading Ag, Trübbach | UV-Bestrahlungsvorrichtung für den getakteten Betrieb |
DE102013011066A1 (de) * | 2013-07-03 | 2015-01-08 | Oerlikon Trading Ag, Trübbach | Wärme-Lichttrennung für eine UV-Strahlungsquelle |
DE102013110426B4 (de) * | 2013-09-20 | 2017-11-23 | Von Ardenne Gmbh | Substratbehandlungsanlage |
KR101460018B1 (ko) * | 2013-12-12 | 2014-11-11 | 유버 주식회사 | Uv 경화장치 |
US9126434B2 (en) * | 2014-01-22 | 2015-09-08 | Ricoh Company, Ltd. | Radiant heat control with adjustable reflective element |
CN106414091B (zh) | 2014-01-27 | 2019-03-08 | 爱克发有限公司 | 一种紫外线喷墨打印机 |
CN105478319A (zh) * | 2015-11-21 | 2016-04-13 | 武汉华星光电技术有限公司 | 一种面板中粘合剂的固化装置 |
CN105694750A (zh) * | 2016-02-03 | 2016-06-22 | 河北华夏实业有限公司 | 一种新型耐高温聚氯乙烯胶带的制作方法 |
CN106004031B (zh) * | 2016-05-26 | 2018-04-17 | 北京印刷学院 | 标签印刷机的可变功率紫外发光二级管固化装置 |
CN105856832B (zh) * | 2016-05-26 | 2018-04-17 | 北京印刷学院 | 标签印刷机双反射紫外线多级快速固化装置 |
CN106004030B (zh) * | 2016-05-26 | 2018-04-17 | 北京印刷学院 | 标签印刷机的平面光源和反光倍增线光源的互补固化装置 |
CN105856831B (zh) * | 2016-05-26 | 2018-04-17 | 北京印刷学院 | 标签印刷机平凸柱面透镜多级快速紫外线固化装置 |
US10086628B1 (en) * | 2017-05-05 | 2018-10-02 | Xerox Corporation | Protective louvers in a dryer module for a printing apparatus |
HUE050387T2 (hu) | 2017-06-13 | 2020-11-30 | Hymmen Gmbh Maschinen & Anlagenbau | Eljárás és eszköz strukturált felület kialakítására |
IT201800010863A1 (it) * | 2018-12-06 | 2020-06-06 | Ind Chimica Adriatica S P A In Sigla Ica S P A | Sistema meccanico di riflessione ed irraggiamento per la reticolazione di vernici polimerizzabili uv. |
KR20210111272A (ko) | 2019-01-07 | 2021-09-10 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 서로 반대편에 있는 콜드 미러 및 핫 미러에 의해 형성된 광학 공동을 포함하는 이미지 형성 장치를 위한 백라이트 |
DE102019206431A1 (de) | 2019-05-03 | 2020-11-05 | Hymmen GmbH Maschinen- und Anlagenbau | Verfahren zum Herstellen einer Struktur auf einer Oberfläche |
US11241832B2 (en) * | 2019-07-08 | 2022-02-08 | Hewlett Packard Development Company, L.P. | Energy emitting apparatuses for build material layers |
IT202000026479A1 (it) * | 2020-11-05 | 2022-05-05 | Elmag Spa | Apparato per il coating di manufatti. |
IT202000026476A1 (it) * | 2020-11-05 | 2022-05-05 | Elmag Spa | Apparato per il coating di manufatti. |
EP4067797A1 (de) * | 2021-01-27 | 2022-10-05 | Cefla Societa' Cooperativa | Vorrichtung und verfahren zum trocknen/härten von chemischen produkten |
IT202100001580A1 (it) * | 2021-01-27 | 2022-07-27 | Cefla Soc Cooperativa | Apparato e metodo per l’essiccazione/polimerizzazione di prodotti chimici |
CN116811428B (zh) * | 2023-08-30 | 2023-11-10 | 淮安市康诺克彩印有限公司 | 一种印刷品的印刷设备 |
Family Cites Families (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3099403A (en) * | 1959-12-10 | 1963-07-30 | Raymond L Strawick | Light fixture |
DE1201278B (de) | 1962-05-04 | 1965-09-23 | Quarzlampen Gmbh | Operationsleuchte |
DE1497325A1 (de) * | 1966-07-30 | 1969-10-30 | Original Hanau Quarzlampen | Operationsleuchte mit Streuscheibe |
US3769503A (en) | 1972-06-23 | 1973-10-30 | Gen Electric | Lamp fixture having dichoric filter arrangement for selectively directing heat and light |
DD109731A1 (de) * | 1973-12-06 | 1974-11-12 | ||
GB1482743A (en) * | 1974-09-18 | 1977-08-10 | Wallace Knight Ltd | Lamp housing |
GB1515086A (en) * | 1975-05-22 | 1978-06-21 | Sun Chemical Corp | Ultraviolet lamp assembly |
US4048490A (en) * | 1976-06-11 | 1977-09-13 | Union Carbide Corporation | Apparatus for delivering relatively cold UV to a substrate |
NZ186674A (en) | 1977-04-18 | 1980-12-19 | Screen Printing Supplies | Drying photo-developing ink infrared filter intercepts some of direct light |
US4143278A (en) * | 1977-05-16 | 1979-03-06 | Geo. Koch Sons, Inc. | Radiation cure reactor |
US4177383A (en) | 1978-05-04 | 1979-12-04 | Wallace Knight Limited | Apparatus for treating a sheet material with radiation |
DE2820399A1 (de) * | 1978-05-10 | 1979-11-15 | Wallace Knight Ltd | Vorrichtung zur behandlung von blattmaterial durch bestrahlen |
DE2830870C2 (de) * | 1978-07-13 | 1984-12-06 | Screen Printing Supplies Pty. Ltd., Greenacre, Neusüdwales | Vorrichtung zum Trocknen von insbesondere durch Siebdurck bedrucktem Material |
HU180333B (en) * | 1980-03-07 | 1983-02-28 | Egyesuelt Izzolampa | Reflecting mirror for decreasing the luminous rays being in the infrared region |
DE3124335A1 (de) | 1981-06-20 | 1983-01-05 | Martin Dr.med. 7300 Esslingen Heckel | Bestrahlungsvorrichtung insbesondere zur infrarotbestrahlung |
NL8300115A (nl) * | 1983-01-13 | 1984-08-01 | Philips Nv | Bestralingsinrichting. |
US4563589A (en) * | 1984-01-09 | 1986-01-07 | Scheffer Herbert D | Ultraviolet curing lamp device |
CH660489A5 (de) | 1984-08-31 | 1987-04-30 | Bernhard Glaus | Verfahren und vorrichtung zum aushaerten polymerisierbarer beschichtungsmassen auf nicht textilen substraten. |
DE3526082A1 (de) * | 1985-07-20 | 1987-01-29 | Rueesch Ferd Ag | Vorrichtung zum trocknen von uv-druckfarben |
US4798960A (en) | 1986-07-17 | 1989-01-17 | Ferd. Ruesch Ag | Device for the treatment of substances by UV radiation |
US4864145A (en) | 1986-10-31 | 1989-09-05 | Burgio Joseph T Jr | Apparatus and method for curing photosensitive coatings |
US4839522A (en) * | 1987-07-29 | 1989-06-13 | American Screen Printing Company | Reflective method and apparatus for curing ink |
DE3801283C1 (en) * | 1988-01-19 | 1989-08-31 | Hamatech Gmbh, 7130 Muehlacker, De | Apparatus for curing a UV protective coating on flat objects |
DE3814539A1 (de) * | 1988-04-29 | 1989-11-09 | Heraeus Gmbh W C | Beleuchtungsanordnung mit halogengluehlampe |
DE3902643A1 (de) * | 1989-01-30 | 1990-12-13 | Metz Luft Und Trocknungsanlage | Uv-strahler |
DE9014652U1 (de) * | 1990-10-23 | 1992-02-27 | STEAG Micro-Tech GmbH Sternenfels, 75447 Sternenfels | Bestrahlungsvorrichtung |
DE4301718A1 (de) * | 1993-01-22 | 1994-07-28 | Jochen Dipl Ing Hagedorn | UV-Bestrahlungseinrichtung |
DE4318735A1 (de) * | 1993-06-05 | 1994-12-08 | Kammann Maschf Werner | UV-Strahler zum Bestrahlen von Druckfarben auf Objekten und Verfahren zum Trocknen von mit Druckfarbe versehenen Objekten |
GB2284469B (en) * | 1993-12-01 | 1997-12-03 | Spectral Technology Limited | Lamp assembly |
DE4409426A1 (de) * | 1994-03-18 | 1995-09-21 | Bacher Graphische Geraete Gmbh | Lampeneinheit für die Reproduktionstechnik |
EP0879146B1 (de) * | 1995-03-15 | 2001-01-24 | Nlm-Combineering Aps | Verfahren zum aktivieren von photoinitiatoren in lichtempfindlichen substraten und vorrichtung zur aushärtung solcher substrate |
DE19516053C2 (de) * | 1995-05-04 | 2000-08-24 | Ist Metz Gmbh | UV-Strahler |
DE19547252C2 (de) * | 1995-12-06 | 1997-12-18 | Fraunhofer Ges Forschung | Optisches Bauelement zur Frequenzvervielfachung |
US5667850A (en) * | 1996-10-04 | 1997-09-16 | Gavenco, Llc | Method of curing with ultraviolet radiation on substrates requiring low heat |
DE19651977C2 (de) | 1996-12-13 | 2001-03-01 | Michael Bisges | UV-Bestrahlungsvorrichtung |
-
1998
- 1998-03-11 DE DE19810455A patent/DE19810455C2/de not_active Expired - Lifetime
-
1999
- 1999-02-26 EP EP99913192A patent/EP1062467B1/de not_active Expired - Lifetime
- 1999-02-26 WO PCT/EP1999/001244 patent/WO1999046546A1/de active IP Right Grant
- 1999-02-26 DK DK99913192T patent/DK1062467T3/da active
- 1999-02-26 ES ES99913192T patent/ES2185325T3/es not_active Expired - Lifetime
- 1999-02-26 DE DE59903167T patent/DE59903167D1/de not_active Expired - Lifetime
- 1999-02-26 AT AT99913192T patent/ATE226709T1/de not_active IP Right Cessation
- 1999-02-26 US US09/623,784 patent/US6621087B1/en not_active Expired - Fee Related
- 1999-02-26 JP JP2000535883A patent/JP3545337B2/ja not_active Expired - Lifetime
- 1999-02-26 AU AU31419/99A patent/AU3141999A/en not_active Abandoned
Non-Patent Citations (1)
Title |
---|
See references of WO9946546A1 * |
Also Published As
Publication number | Publication date |
---|---|
US6621087B1 (en) | 2003-09-16 |
ES2185325T3 (es) | 2003-04-16 |
JP3545337B2 (ja) | 2004-07-21 |
ATE226709T1 (de) | 2002-11-15 |
DE19810455A1 (de) | 1999-09-23 |
JP2002505975A (ja) | 2002-02-26 |
DK1062467T3 (da) | 2003-02-17 |
DE59903167D1 (de) | 2002-11-28 |
WO1999046546A1 (de) | 1999-09-16 |
DE19810455C2 (de) | 2000-02-24 |
EP1062467B1 (de) | 2002-10-23 |
AU3141999A (en) | 1999-09-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP1062467B1 (de) | Kaltlicht-uv-bestrahlungsvorrichtung | |
DE19651977C2 (de) | UV-Bestrahlungsvorrichtung | |
DE102009037815B4 (de) | Verfahren und Vorrichtung zur Herstellung eines dreidimensionalen Objektes | |
DE112006001842B4 (de) | Einheit und Verfahren für Hochleistungs-Laserbearbeitung | |
EP1224053B1 (de) | Verfahren und vorrichtung zum schnellen schneiden eines werkstücks aus sprödbrüchigem werkstoff | |
DE69026258T2 (de) | Laserbearbeitungsverfahren | |
EP3752765B1 (de) | Kraftfahrzeugscheinwerfer mit einer abschirmblende zur abschirmung eintretender sonnenstrahlung | |
DE4124311A1 (de) | Anordnung zur kohaerenzreduktion und strahlformung eines laserstrahls | |
DE2639728A1 (de) | Verfahren und vorrichtung zum behandeln eines substrats mit ultraviolettstrahlung | |
EP1734301A1 (de) | Metallreflektor und Verfahren zu dessen Herstellung | |
EP2672170B1 (de) | Beleuchtungseinrichtung eines Kraftfahrzeugs | |
EP0487679B1 (de) | Scheinwerfer für kraftfahrzeuge | |
DE4202944C2 (de) | Verfahren und Vorrichtung zum Erwärmen eines Materials | |
EP2520394B1 (de) | Vorrichtung und Verfahren zum Randentschichten und Kerben beschichteter Substrate mit zwei von der gleichen Seite auf das beschichtete transparente Substrat einwirkenden Laserquellen | |
EP3393679B1 (de) | Uv-aushärtevorrichtung mit geteilten uv-umlenkspiegeln | |
DE2710483A1 (de) | Verfahren zum niederschlagen einer schicht | |
DE3801283C1 (en) | Apparatus for curing a UV protective coating on flat objects | |
DE102016107001A1 (de) | Vorrichtung zur Belichtung eines Substrats | |
EP1390969B1 (de) | Vorrichtung zur erwärmung von substraten mit seitenblenden und sekundären reflektoren | |
EP0930104B1 (de) | Verfahren und Vorrichtung zum Vernetzen und Härten von Lack | |
EP4061566B1 (de) | Vorrichtung zur additiven fertigung mit pulver-layer-verfahren | |
EP3016751B1 (de) | Wärme-lichttrennung für eine uv-strahlungsquelle | |
DE9402179U1 (de) | Vorrichtung zur Lichthärtung von Kunststoffgegenständen | |
DE102006035986B4 (de) | Vorrichtung zum Trocknen von UV-Druckfarben oder UV-Lacken auf einem Bedruckstoff | |
WO2005051856A2 (de) | Verfahren und einrichtungen zur herstellung und/oder zur bedruckung einer heizbaren gebogenen |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20000923 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE CH DE DK ES FR GB IE IT LI NL SE |
|
17Q | First examination report despatched |
Effective date: 20010710 |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: KISTERS, KNUT Owner name: ARCCURE TECHNOLOGIES GMBH |
|
RIN1 | Information on inventor provided before grant (corrected) |
Inventor name: KISTERS, KNUT Inventor name: ARCCURE TECHNOLOGIES GMBH |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: ARCCURE TECHNOLOGIES GMBH |
|
RIN1 | Information on inventor provided before grant (corrected) |
Inventor name: ARCCURE TECHNOLOGIES GMBH |
|
GRAG | Despatch of communication of intention to grant |
Free format text: ORIGINAL CODE: EPIDOS AGRA |
|
GRAG | Despatch of communication of intention to grant |
Free format text: ORIGINAL CODE: EPIDOS AGRA |
|
GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
RIN1 | Information on inventor provided before grant (corrected) |
Inventor name: KISTERS, KNUT Inventor name: BISGES, MICHAEL |
|
GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): AT BE CH DE DK ES FR GB IE IT LI NL SE |
|
REF | Corresponds to: |
Ref document number: 226709 Country of ref document: AT Date of ref document: 20021115 Kind code of ref document: T |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: FG4D Free format text: NOT ENGLISH |
|
RIC1 | Information provided on ipc code assigned before grant |
Free format text: 7F 26B 3/28 A, 7F 21V 9/04 B, 7F 21V 29/00 B |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: EP |
|
REG | Reference to a national code |
Ref country code: IE Ref legal event code: FG4D Free format text: GERMAN |
|
REF | Corresponds to: |
Ref document number: 59903167 Country of ref document: DE Date of ref document: 20021128 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: NV Representative=s name: PATENTANWALTSBUERO ZINK |
|
GBT | Gb: translation of ep patent filed (gb section 77(6)(a)/1977) |
Effective date: 20021130 |
|
REG | Reference to a national code |
Ref country code: DK Ref legal event code: T3 |
|
RIN2 | Information on inventor provided after grant (corrected) |
Inventor name: KISTERS, KNUT Inventor name: BISGES, MICHAEL |
|
ET | Fr: translation filed | ||
REG | Reference to a national code |
Ref country code: ES Ref legal event code: FG2A Ref document number: 2185325 Country of ref document: ES Kind code of ref document: T3 |
|
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
26N | No opposition filed |
Effective date: 20030724 |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: 732E |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PUE Owner name: DR. HOENLE AG Free format text: ARCCURE TECHNOLOGIES GMBH#RAIFFEISENSTRASSE 18 C#59557 LIPPSTADT (DE) -TRANSFER TO- DR. HOENLE AG#LOCHHAMER SCHLAG 1#82166 GRAEFELFING (DE) |
|
NLS | Nl: assignments of ep-patents |
Owner name: DR. HOENLE AG Effective date: 20061206 |
|
REG | Reference to a national code |
Ref country code: ES Ref legal event code: PC2A |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: TP |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: IE Payment date: 20090218 Year of fee payment: 11 Ref country code: AT Payment date: 20090219 Year of fee payment: 11 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: NL Payment date: 20090223 Year of fee payment: 11 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: BE Payment date: 20090224 Year of fee payment: 11 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: SE Payment date: 20090223 Year of fee payment: 11 |
|
BERE | Be: lapsed |
Owner name: DR. *HOENLE A.G. Effective date: 20100228 |
|
REG | Reference to a national code |
Ref country code: NL Ref legal event code: V1 Effective date: 20100901 |
|
EUG | Se: european patent has lapsed | ||
REG | Reference to a national code |
Ref country code: IE Ref legal event code: MM4A |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: AT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20100226 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: NL Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20100901 Ref country code: IE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20100226 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: BE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20100228 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20100227 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: PLFP Year of fee payment: 17 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: IT Payment date: 20150225 Year of fee payment: 17 Ref country code: CH Payment date: 20150223 Year of fee payment: 17 Ref country code: ES Payment date: 20150223 Year of fee payment: 17 Ref country code: DK Payment date: 20150223 Year of fee payment: 17 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 20150217 Year of fee payment: 17 Ref country code: GB Payment date: 20150223 Year of fee payment: 17 |
|
REG | Reference to a national code |
Ref country code: DK Ref legal event code: EBP Effective date: 20160229 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
GBPC | Gb: european patent ceased through non-payment of renewal fee |
Effective date: 20160226 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LI Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20160229 Ref country code: CH Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20160229 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: ST Effective date: 20161028 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20160226 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20160229 Ref country code: DK Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20160229 Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20160226 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: ES Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20160227 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20171227 Year of fee payment: 20 |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R071 Ref document number: 59903167 Country of ref document: DE |