EG25410A - Method for the preparation of group I-III-VI quaternary or higher alloy semiconductor films - Google Patents
Method for the preparation of group I-III-VI quaternary or higher alloy semiconductor filmsInfo
- Publication number
- EG25410A EG25410A EGNA2006000140A EG25410A EG 25410 A EG25410 A EG 25410A EG NA2006000140 A EGNA2006000140 A EG NA2006000140A EG 25410 A EG25410 A EG 25410A
- Authority
- EG
- Egypt
- Prior art keywords
- quaternary
- iii
- preparation
- group
- semiconductor films
- Prior art date
Links
- 239000000956 alloy Substances 0.000 title 1
- 229910045601 alloy Inorganic materials 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
- H01L31/0322—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 comprising only AIBIIICVI chalcopyrite compounds, e.g. Cu In Se2, Cu Ga Se2, Cu In Ga Se2
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/541—CuInSe2 material PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Photovoltaic Devices (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Chemical Vapour Deposition (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Electrodes Of Semiconductors (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Particle Accelerators (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ZA200306316 | 2003-08-14 | ||
ZA200402497 | 2004-03-30 | ||
PCT/IB2004/051458 WO2005017978A2 (en) | 2003-08-14 | 2004-08-13 | Method for the preparation of group ib-iiia-via quaternary or higher alloy semiconductor films |
Publications (1)
Publication Number | Publication Date |
---|---|
EG25410A true EG25410A (en) | 2012-01-02 |
Family
ID=34198392
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EGNA2006000140 EG25410A (en) | 2003-08-14 | 2006-02-11 | Method for the preparation of group I-III-VI quaternary or higher alloy semiconductor films |
Country Status (20)
Country | Link |
---|---|
US (3) | US7682939B2 (ko) |
EP (3) | EP1654751A2 (ko) |
JP (2) | JP4994032B2 (ko) |
KR (2) | KR101027318B1 (ko) |
AP (2) | AP2180A (ko) |
AT (1) | ATE510304T2 (ko) |
AU (2) | AU2004301076B2 (ko) |
BR (2) | BRPI0413572A (ko) |
CA (2) | CA2539556C (ko) |
CY (1) | CY1111940T1 (ko) |
DE (1) | DE202004021800U1 (ko) |
DK (1) | DK1654769T4 (ko) |
EA (2) | EA009012B1 (ko) |
EG (1) | EG25410A (ko) |
ES (1) | ES2366888T5 (ko) |
HK (1) | HK1097105A1 (ko) |
IL (2) | IL173694A0 (ko) |
MX (2) | MXPA06001723A (ko) |
OA (2) | OA13236A (ko) |
WO (2) | WO2005017978A2 (ko) |
Families Citing this family (56)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7057256B2 (en) | 2001-05-25 | 2006-06-06 | President & Fellows Of Harvard College | Silicon-based visible and near-infrared optoelectric devices |
US7442629B2 (en) | 2004-09-24 | 2008-10-28 | President & Fellows Of Harvard College | Femtosecond laser-induced formation of submicrometer spikes on a semiconductor substrate |
ES2373147T3 (es) * | 2006-01-12 | 2012-01-31 | Heliovolt Corporation | Aparato para fabricar estructuras de dominios de fase segregados, de manera controlada. |
US8071419B2 (en) * | 2006-06-12 | 2011-12-06 | Nanosolar, Inc. | Thin-film devices formed from solid particles |
DE102006055662B3 (de) * | 2006-11-23 | 2008-06-26 | Gfe Metalle Und Materialien Gmbh | Beschichtungswerkstoff auf Basis einer Kupfer-Indium-Gallium-Legierung, insbesondere zur Herstellung von Sputtertargets, Rohrkathoden und dergleichen |
US20080302413A1 (en) * | 2007-03-30 | 2008-12-11 | Craig Leidholm | Formation of photovoltaic absorber layers on foil substrates |
US8071179B2 (en) | 2007-06-29 | 2011-12-06 | Stion Corporation | Methods for infusing one or more materials into nano-voids if nanoporous or nanostructured materials |
WO2009017172A1 (ja) * | 2007-08-02 | 2009-02-05 | Showa Shell Sekiyu K. K. | Cis系薄膜太陽電池の光吸収層の作製方法 |
US8258001B2 (en) * | 2007-10-26 | 2012-09-04 | Solopower, Inc. | Method and apparatus for forming copper indium gallium chalcogenide layers |
US8779283B2 (en) * | 2007-11-29 | 2014-07-15 | General Electric Company | Absorber layer for thin film photovoltaics and a solar cell made therefrom |
JP4620105B2 (ja) * | 2007-11-30 | 2011-01-26 | 昭和シェル石油株式会社 | Cis系薄膜太陽電池の光吸収層の製造方法 |
KR101447113B1 (ko) * | 2008-01-15 | 2014-10-07 | 삼성전자주식회사 | 화합물 반도체 수직 적층 이미지 센서 |
US20090215224A1 (en) * | 2008-02-21 | 2009-08-27 | Film Solar Tech Inc. | Coating methods and apparatus for making a cigs solar cell |
DE102008024230A1 (de) * | 2008-05-19 | 2009-11-26 | Avancis Gmbh & Co. Kg | Schichtsystem für Solarzellen |
EP2144026B1 (de) † | 2008-06-20 | 2016-04-13 | Volker Probst | Prozessvorrichtung und verfahren zum prozessieren von gestapelten prozessgütern |
US7947524B2 (en) * | 2008-09-30 | 2011-05-24 | Stion Corporation | Humidity control and method for thin film photovoltaic materials |
US20110018103A1 (en) * | 2008-10-02 | 2011-01-27 | Stion Corporation | System and method for transferring substrates in large scale processing of cigs and/or cis devices |
US8241943B1 (en) | 2009-05-08 | 2012-08-14 | Stion Corporation | Sodium doping method and system for shaped CIGS/CIS based thin film solar cells |
US8372684B1 (en) * | 2009-05-14 | 2013-02-12 | Stion Corporation | Method and system for selenization in fabricating CIGS/CIS solar cells |
US8507786B1 (en) | 2009-06-27 | 2013-08-13 | Stion Corporation | Manufacturing method for patterning CIGS/CIS solar cells |
US8398772B1 (en) | 2009-08-18 | 2013-03-19 | Stion Corporation | Method and structure for processing thin film PV cells with improved temperature uniformity |
CN102471061B (zh) * | 2009-09-04 | 2014-09-24 | 大阳日酸株式会社 | 太阳能电池用硒化氢混合气体的供给方法以及供给装置 |
TW201124544A (en) * | 2009-11-24 | 2011-07-16 | Applied Quantum Technology Llc | Chalcogenide absorber layers for photovoltaic applications and methods of manufacturing the same |
KR20110060139A (ko) * | 2009-11-30 | 2011-06-08 | 삼성전자주식회사 | 태양 전지 제조 방법 |
US8859880B2 (en) * | 2010-01-22 | 2014-10-14 | Stion Corporation | Method and structure for tiling industrial thin-film solar devices |
TWI411121B (zh) * | 2010-03-11 | 2013-10-01 | Ind Tech Res Inst | 光吸收層之製造方法及應用其之太陽能電池結構 |
KR20130016281A (ko) | 2010-03-17 | 2013-02-14 | 다우 글로벌 테크놀로지스 엘엘씨 | 타이 층을 포함하는 광전자 활성 칼코겐계 박막 구조물 |
US9096930B2 (en) | 2010-03-29 | 2015-08-04 | Stion Corporation | Apparatus for manufacturing thin film photovoltaic devices |
US8142521B2 (en) * | 2010-03-29 | 2012-03-27 | Stion Corporation | Large scale MOCVD system for thin film photovoltaic devices |
US20130029450A1 (en) * | 2010-04-19 | 2013-01-31 | Korea Institute Of Industrial Technology | Method for manufacturing solar cell |
US8692198B2 (en) | 2010-04-21 | 2014-04-08 | Sionyx, Inc. | Photosensitive imaging devices and associated methods |
KR20130100907A (ko) * | 2010-04-30 | 2013-09-12 | 다우 글로벌 테크놀로지스 엘엘씨 | 칼코게나이드계 태양광발전 셀의 제조 방법 |
US20110312160A1 (en) | 2010-05-21 | 2011-12-22 | Heliovolt Corp. | Liquid precursor for deposition of copper selenide and method of preparing the same |
KR20110128580A (ko) | 2010-05-24 | 2011-11-30 | 삼성전자주식회사 | 태양 전지 제조 방법 |
EP2583312A2 (en) | 2010-06-18 | 2013-04-24 | Sionyx, Inc. | High speed photosensitive devices and associated methods |
US8461061B2 (en) | 2010-07-23 | 2013-06-11 | Stion Corporation | Quartz boat method and apparatus for thin film thermal treatment |
WO2012023973A2 (en) | 2010-08-16 | 2012-02-23 | Heliovolt Corporation | Liquid precursor for deposition of indium selenide and method of preparing the same |
JP5867392B2 (ja) | 2010-08-17 | 2016-02-24 | 凸版印刷株式会社 | 化合物半導体薄膜作製用インクおよび太陽電池の製造方法 |
JP2012079997A (ja) * | 2010-10-05 | 2012-04-19 | Kobe Steel Ltd | 化合物半導体薄膜太陽電池用光吸収層の製造方法、およびIn−Cu合金スパッタリングターゲット |
WO2012070481A1 (ja) * | 2010-11-22 | 2012-05-31 | 京セラ株式会社 | 光電変換装置 |
JP2012160514A (ja) * | 2011-01-31 | 2012-08-23 | Kyocera Corp | 金属カルコゲナイド層の製造方法および光電変換装置の製造方法 |
EA020377B1 (ru) * | 2011-05-12 | 2014-10-30 | Общество С Ограниченной Ответственностью "Изовак" | Способ формирования тонких пленок cigs для солнечных батарей и устройство для его реализации |
US9496308B2 (en) | 2011-06-09 | 2016-11-15 | Sionyx, Llc | Process module for increasing the response of backside illuminated photosensitive imagers and associated methods |
US20130016203A1 (en) | 2011-07-13 | 2013-01-17 | Saylor Stephen D | Biometric imaging devices and associated methods |
JP2013021231A (ja) * | 2011-07-13 | 2013-01-31 | Kyocera Corp | 半導体層の製造方法および光電変換装置の製造方法 |
JP2015508375A (ja) * | 2011-12-15 | 2015-03-19 | ミッドサマー・アーベー | 銅インジウムガリウムジセレニドのリサイクル |
US20130344646A1 (en) * | 2011-12-21 | 2013-12-26 | Intermolecular, Inc. | Absorbers for High-Efficiency Thin-Film PV |
DE102012205378A1 (de) * | 2012-04-02 | 2013-10-02 | Robert Bosch Gmbh | Verfahren zur Herstellung von Dünnschichtsolarmodulen sowie nach diesem Verfahren erhältliche Dünnschichtsolarmodule |
ITFI20120090A1 (it) * | 2012-05-10 | 2013-11-11 | Advanced Res On Pv Tech S R L | Processo per la produzione di celle solari a film sottili |
US8586457B1 (en) * | 2012-05-17 | 2013-11-19 | Intermolecular, Inc. | Method of fabricating high efficiency CIGS solar cells |
US9105797B2 (en) | 2012-05-31 | 2015-08-11 | Alliance For Sustainable Energy, Llc | Liquid precursor inks for deposition of In—Se, Ga—Se and In—Ga—Se |
JPWO2014064823A1 (ja) * | 2012-10-26 | 2016-09-05 | 株式会社日立製作所 | 半導体膜の製造方法、太陽電池及びカルコパイライト化合物 |
WO2014209421A1 (en) | 2013-06-29 | 2014-12-31 | Sionyx, Inc. | Shallow trench textured regions and associated methods |
US9768015B2 (en) * | 2015-06-11 | 2017-09-19 | Alliance For Sustainable Energy, Llc | Methods of forming CIGS films |
WO2019157562A1 (en) * | 2018-02-16 | 2019-08-22 | Newsouth Innovations Pty Limited | Adamantine semiconductor and uses thereof |
KR102015985B1 (ko) * | 2018-04-17 | 2019-08-29 | 한국과학기술연구원 | 태양전지용 cigs 박막의 제조방법 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0555615A (ja) * | 1991-08-28 | 1993-03-05 | Fuji Electric Co Ltd | 薄膜太陽電池の製造方法 |
US5441897A (en) * | 1993-04-12 | 1995-08-15 | Midwest Research Institute | Method of fabricating high-efficiency Cu(In,Ga)(SeS)2 thin films for solar cells |
US5356839A (en) * | 1993-04-12 | 1994-10-18 | Midwest Research Institute | Enhanced quality thin film Cu(In,Ga)Se2 for semiconductor device applications by vapor-phase recrystallization |
US5436204A (en) * | 1993-04-12 | 1995-07-25 | Midwest Research Institute | Recrystallization method to selenization of thin-film Cu(In,Ga)Se2 for semiconductor device applications |
US5674555A (en) | 1995-11-30 | 1997-10-07 | University Of Delaware | Process for preparing group Ib-IIIa-VIa semiconducting films |
JPH1012635A (ja) * | 1996-04-26 | 1998-01-16 | Yazaki Corp | I−iii−vi2系薄膜層の形成方法及びその形成装置 |
JP2922466B2 (ja) | 1996-08-29 | 1999-07-26 | 時夫 中田 | 薄膜太陽電池 |
US5985691A (en) | 1997-05-16 | 1999-11-16 | International Solar Electric Technology, Inc. | Method of making compound semiconductor films and making related electronic devices |
JP4177480B2 (ja) | 1998-05-15 | 2008-11-05 | インターナショナル ソーラー エレクトリック テクノロジー,インコーポレイテッド | 化合物半導体フィルムおよび関連電子装置の製造方法 |
US6127202A (en) * | 1998-07-02 | 2000-10-03 | International Solar Electronic Technology, Inc. | Oxide-based method of making compound semiconductor films and making related electronic devices |
WO2001037324A1 (en) | 1999-11-16 | 2001-05-25 | Midwest Research Institute | A NOVEL PROCESSING APPROACH TOWARDS THE FORMATION OF THIN-FILM Cu(In,Ga)Se¿2? |
US20030008493A1 (en) * | 2001-07-03 | 2003-01-09 | Shyh-Dar Lee | Interconnect structure manufacturing |
-
2004
- 2004-08-13 MX MXPA06001723A patent/MXPA06001723A/es active IP Right Grant
- 2004-08-13 OA OA1200600050A patent/OA13236A/en unknown
- 2004-08-13 CA CA2539556A patent/CA2539556C/en not_active Expired - Lifetime
- 2004-08-13 AU AU2004301076A patent/AU2004301076B2/en not_active Ceased
- 2004-08-13 KR KR1020067003123A patent/KR101027318B1/ko not_active IP Right Cessation
- 2004-08-13 JP JP2006523109A patent/JP4994032B2/ja not_active Expired - Fee Related
- 2004-08-13 DE DE202004021800U patent/DE202004021800U1/de not_active Expired - Lifetime
- 2004-08-13 AU AU2004301075A patent/AU2004301075B2/en not_active Ceased
- 2004-08-13 AT AT04744786T patent/ATE510304T2/de active
- 2004-08-13 AP AP2006003507A patent/AP2180A/xx active
- 2004-08-13 OA OA1200600051A patent/OA13237A/en unknown
- 2004-08-13 ES ES04744786.7T patent/ES2366888T5/es not_active Expired - Lifetime
- 2004-08-13 US US10/568,227 patent/US7682939B2/en not_active Expired - Fee Related
- 2004-08-13 DK DK04744786.7T patent/DK1654769T4/en active
- 2004-08-13 CA CA2535703A patent/CA2535703C/en not_active Expired - Lifetime
- 2004-08-13 AP AP2006003508A patent/AP2149A/xx active
- 2004-08-13 KR KR1020067003122A patent/KR101004452B1/ko not_active IP Right Cessation
- 2004-08-13 WO PCT/IB2004/051458 patent/WO2005017978A2/en active Search and Examination
- 2004-08-13 EA EA200600407A patent/EA009012B1/ru not_active IP Right Cessation
- 2004-08-13 EP EP04744787A patent/EP1654751A2/en not_active Withdrawn
- 2004-08-13 BR BRPI0413572-5A patent/BRPI0413572A/pt not_active IP Right Cessation
- 2004-08-13 EA EA200600406A patent/EA010171B1/ru not_active IP Right Cessation
- 2004-08-13 EP EP10014635A patent/EP2284905A2/en not_active Withdrawn
- 2004-08-13 JP JP2006523110A patent/JP4864705B2/ja not_active Expired - Fee Related
- 2004-08-13 BR BRPI0413567-9A patent/BRPI0413567A/pt not_active IP Right Cessation
- 2004-08-13 US US10/568,229 patent/US7744705B2/en not_active Expired - Fee Related
- 2004-08-13 MX MXPA06001726A patent/MXPA06001726A/es active IP Right Grant
- 2004-08-13 EP EP04744786.7A patent/EP1654769B2/en not_active Expired - Lifetime
- 2004-08-13 WO PCT/IB2004/051459 patent/WO2005017979A2/en active Search and Examination
-
2006
- 2006-02-11 EG EGNA2006000140 patent/EG25410A/xx active
- 2006-02-13 IL IL173694A patent/IL173694A0/en unknown
- 2006-02-13 IL IL173693A patent/IL173693A/en not_active IP Right Cessation
-
2007
- 2007-02-23 HK HK07102040.9A patent/HK1097105A1/xx not_active IP Right Cessation
-
2010
- 2010-03-19 US US12/728,054 patent/US8735214B2/en not_active Expired - Fee Related
-
2011
- 2011-08-17 CY CY20111100787T patent/CY1111940T1/el unknown
Also Published As
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EG25410A (en) | Method for the preparation of group I-III-VI quaternary or higher alloy semiconductor films | |
TWI372421B (en) | Wafer processing method | |
SG135040A1 (en) | Method for processing wafer | |
EP1551057A4 (en) | COMPOSITION FOR FORMATION OF SILICON FILM, AND CORRESPONDING FORMATION METHOD | |
SG110134A1 (en) | Wafer processing method | |
SG109568A1 (en) | Wafer processing method | |
AU2003246348A1 (en) | Method for dividing semiconductor wafer | |
AU2003248339A1 (en) | Method for dividing semiconductor wafer | |
EP1614768A4 (en) | FILMING PROCESS | |
EP1425279A4 (en) | PROCESS FOR THE PREPARATION OF CRYSTALLINE TETRAHYDROBENZOTHIEPINES | |
EP1501122A4 (en) | SILICON WAFER WITH HIGH RESISTANCE AND METHOD FOR THE PRODUCTION THEREOF | |
EP1643545A4 (en) | PROCESS FOR PROCESSING SILICON PADS | |
EP1662555A4 (en) | PROCESS FOR PRODUCING SOI PLATEBOARD | |
EP1693887A4 (en) | PROCESS FOR PROCESSING SILICON PLATEBOARD | |
EP1566830A4 (en) | METHOD FOR PRODUCING AN SOI WATER | |
AU2003301120A1 (en) | Method for passivating semiconductor devices | |
GB2419466B (en) | Compound semiconductor and method for producing same | |
SG135019A1 (en) | Semiconductor wafer processing method | |
EP1556400A4 (en) | PROCESS FOR THE PREPARATION OF 2-HALOGEN-2-DESOXYADENOSINE COMPOUNDS FROM 2-DESOXYGUANOSINE | |
EP1548801A4 (en) | METHOD OF MANUFACTURING A SEMICONDUCTOR WAFER | |
GB0303645D0 (en) | Method and compositions for boosting immune response | |
SG120140A1 (en) | Tungsten-copper interconnect and method for fabricating the same | |
EP1662550A4 (en) | METHOD FOR PRODUCING AN SOI WATER | |
GB0509662D0 (en) | 3-5 group compound semiconductor and method for preparation thereof | |
GB2399351B (en) | Method for forming film |