DK14087A - Negativ fotoresistsammensaetning og fremgangsmaade til fremstilling af termisk stabile, negative billeder under anvendelse af sammensaetningen - Google Patents

Negativ fotoresistsammensaetning og fremgangsmaade til fremstilling af termisk stabile, negative billeder under anvendelse af sammensaetningen

Info

Publication number
DK14087A
DK14087A DK014087A DK14087A DK14087A DK 14087 A DK14087 A DK 14087A DK 014087 A DK014087 A DK 014087A DK 14087 A DK14087 A DK 14087A DK 14087 A DK14087 A DK 14087A
Authority
DK
Denmark
Prior art keywords
negative
composition
photoresis
pictures
making thermal
Prior art date
Application number
DK014087A
Other languages
Danish (da)
English (en)
Other versions
DK14087D0 (da
Inventor
Wayne E Feely
Original Assignee
Rohm & Haas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm & Haas filed Critical Rohm & Haas
Publication of DK14087D0 publication Critical patent/DK14087D0/da
Publication of DK14087A publication Critical patent/DK14087A/da

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Secondary Cells (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Polymerisation Methods In General (AREA)
DK014087A 1986-01-13 1987-01-12 Negativ fotoresistsammensaetning og fremgangsmaade til fremstilling af termisk stabile, negative billeder under anvendelse af sammensaetningen DK14087A (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US81843086A 1986-01-13 1986-01-13

Publications (2)

Publication Number Publication Date
DK14087D0 DK14087D0 (da) 1987-01-12
DK14087A true DK14087A (da) 1987-07-14

Family

ID=25225519

Family Applications (1)

Application Number Title Priority Date Filing Date
DK014087A DK14087A (da) 1986-01-13 1987-01-12 Negativ fotoresistsammensaetning og fremgangsmaade til fremstilling af termisk stabile, negative billeder under anvendelse af sammensaetningen

Country Status (19)

Country Link
EP (1) EP0232972B1 (en:Method)
JP (2) JPH083635B2 (en:Method)
KR (1) KR950000484B1 (en:Method)
CN (1) CN1036489C (en:Method)
AT (1) ATE94295T1 (en:Method)
AU (1) AU593880B2 (en:Method)
BR (1) BR8700092A (en:Method)
CA (1) CA1307695C (en:Method)
DE (1) DE3787296T2 (en:Method)
DK (1) DK14087A (en:Method)
FI (1) FI870104L (en:Method)
HK (1) HK143493A (en:Method)
IL (1) IL81229A (en:Method)
IN (1) IN167612B (en:Method)
MX (1) MX167803B (en:Method)
MY (1) MY103315A (en:Method)
NO (1) NO870119L (en:Method)
PH (1) PH27327A (en:Method)
ZA (1) ZA87199B (en:Method)

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DE2718254C3 (de) * 1977-04-25 1980-04-10 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliche Kopiermasse
DE3107109A1 (de) * 1981-02-26 1982-09-09 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
JPS59116744A (ja) * 1982-12-24 1984-07-05 Japan Synthetic Rubber Co Ltd 感電離放射線樹脂組成物
AU566309B2 (en) * 1983-06-27 1987-10-15 Stauffer Chemical Company Photopolymerizable composition
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CA1308596C (en) * 1986-01-13 1992-10-13 Rohm And Haas Company Microplastic structures and method of manufacture

Also Published As

Publication number Publication date
MY103315A (en) 1993-05-29
ZA87199B (en) 1988-09-28
JPS62164045A (ja) 1987-07-20
MX167803B (es) 1993-04-12
DE3787296T2 (de) 1994-03-31
EP0232972A3 (en) 1988-12-21
EP0232972A2 (en) 1987-08-19
AU6752887A (en) 1987-07-16
IL81229A (en) 1991-03-10
CA1307695C (en) 1992-09-22
IL81229A0 (en) 1987-08-31
JPH083635B2 (ja) 1996-01-17
BR8700092A (pt) 1987-12-01
KR870007449A (ko) 1987-08-19
ATE94295T1 (de) 1993-09-15
FI870104A7 (fi) 1987-07-14
FI870104L (fi) 1987-07-14
CN1036489C (zh) 1997-11-19
IN167612B (en:Method) 1990-11-24
PH27327A (en) 1993-06-08
EP0232972B1 (en) 1993-09-08
DK14087D0 (da) 1987-01-12
DE3787296D1 (de) 1993-10-14
NO870119L (no) 1987-07-14
AU593880B2 (en) 1990-02-22
NO870119D0 (no) 1987-01-13
KR950000484B1 (ko) 1995-01-20
FI870104A0 (fi) 1987-01-12
CN87100185A (zh) 1987-09-23
JP3320676B2 (ja) 2002-09-03
HK143493A (en) 1994-01-07
JP2000131842A (ja) 2000-05-12

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