KR910015889A - 광구조된 층 및 입체 물체의 제조 방법 - Google Patents

광구조된 층 및 입체 물체의 제조 방법 Download PDF

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Publication number
KR910015889A
KR910015889A KR1019910002278A KR910002278A KR910015889A KR 910015889 A KR910015889 A KR 910015889A KR 1019910002278 A KR1019910002278 A KR 1019910002278A KR 910002278 A KR910002278 A KR 910002278A KR 910015889 A KR910015889 A KR 910015889A
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South Korea
Prior art keywords
layer
photo
compound
thermally reactive
sensitive
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KR1019910002278A
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English (en)
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그로싸 마리오
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원본미기재
이 아이 듀우판 디 네모아 앤드 캄파니
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Publication of KR910015889A publication Critical patent/KR910015889A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

내용 없음

Description

광구조된 층 및 입체 물체의 제조 방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (10)

  1. a) 1. 열 가융성 중합체 및 가소제 분산액, 2. 적어도 하나의 첨가-중합성, 에틸렌형 불포화 화합물, 3. 광개시제 또는 광개시제 시스템, 및 4. 열적 반응성 화합물을 함유 하는 광-감성(light-semsitive)혼합물로 부터 층을 형성하고, b) 광-감성 층을 상형성방식으로 노출시키고, c) 층의 비노출 영역을 제거하고, 및 d) 노출층을 열처리하는 단계로 구성 되는, 광구조된 층의 제조 방법.
  2. 제1항에 있어서, 열적 반응성 화합물이 열 개시제인 것을 특징으로 하는 방법.
  3. 제1항에 있어서, 상형성방식 노출이 노출되는 층의 흡광도가 적어도 1.3인 파장에서 완수되는 것을 특징으로 하는 방법.
  4. 제1항에 있어서, 다른 반응성을 갖는 적어도 두개의 첨가-중합성, 에틸렌형 불포화 화합물이 사용되는 것을 특징으로 하는 방법.
  5. 제1항에 있어서, 열개시제가 중합체/가소제 분산액이 용융하는 온도에서 또는 그 이상에서 분해하는 것을 특징으로 하는 방법.
  6. 제1항에 있어버, 열적 반응성 화합물이 화합물 자체와 또는 혼합물의 적어도 하나의 성분과 열가교가능한 화합물임을 특징으로 하는 방법.
  7. 제6항에 있어서, 열적 반응성 화합물이 에폭시 또는 멜라민 화합물임을 특징으로 하는 방법.
  8. 제1항에 있어서, 중합체/가소제 분산액이 플라스티졸 또는 오르가노졸임을 특징으로 하는 방법.
  9. 제1항에 있어서, 광-감성 혼합물이 고온에서 기체를 방출하는 적어도 하나의 화합물을 함유하는 것을 특징으로 하는 방법.
  10. a) 1. 열 가융성 중합체 및 가소제 분산액. 2. 적어도 하나의 첨가- 중합성, 에틸렌향 불포화 화합물, 3. 광개시제 또는 광개시제 시스템, 및4. 열적 반응성 화합물을 함유하는 광- 감성혼합물로 부터 층을 형성하고, b) 광- 감성 층을 상형성 방식으로 노출시키고, c) b에 따라 노출된 층상에 광- 감성 혼합물의 새로운 층을 적용시키고, d) 광- 감성 층을 상형성방식으로 노출시키고, e) 입체 물체가 완전히 형성될 때까지 단계 c) 및 d)를 연속 반복하고, f) 비노출 영역을 제거하고, 및 g) 입체 물체를 열처리시키는 단계로 구성 되는, 입체 물체의 제조 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019910002278A 1990-02-15 1991-02-11 광구조된 층 및 입체 물체의 제조 방법 KR910015889A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4004620A DE4004620C1 (en) 1990-02-15 1990-02-15 Photo-structured layer of three=dimensional object prodn. - by using fusible plastisol or organosol contg. unsatd. monomer, photoinitiator and thermally reactive cpd.
DE40046206 1990-02-15

Publications (1)

Publication Number Publication Date
KR910015889A true KR910015889A (ko) 1991-09-30

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ID=6400167

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019910002278A KR910015889A (ko) 1990-02-15 1991-02-11 광구조된 층 및 입체 물체의 제조 방법

Country Status (7)

Country Link
EP (1) EP0442071B1 (ko)
JP (1) JPH04214326A (ko)
KR (1) KR910015889A (ko)
CN (1) CN1054674A (ko)
AU (1) AU7105191A (ko)
CA (1) CA2035779A1 (ko)
DE (2) DE4004620C1 (ko)

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EP1085971B1 (en) * 1999-03-09 2004-06-02 Lee Eisinger Application of textured or patterned surfaces to a prototype
DE102011015223B4 (de) * 2011-03-25 2024-10-31 Kulzer Gmbh Dualhärtende Zusammensetzung, Verfahren zu ihrer Herstellung und die Verwendung zur Herstellung von Beschichtungen
KR20170023977A (ko) 2014-06-23 2017-03-06 카본, 인크. 3차원 물체의 제조에 사용하기 위한, 다중 경화 메커니즘을 갖는 폴리우레탄 수지
MX2017010111A (es) 2015-02-05 2017-11-23 Carbon Inc Metodo de fabricacion aditiva mediante exposicion intermitente.
WO2016140886A1 (en) 2015-03-05 2016-09-09 Carbon3D, Inc. Fabrication of three dimensional objects with multiple operating modes
JP7069006B2 (ja) 2015-09-04 2022-05-17 カーボン，インコーポレイテッド 積層造形用シアネートエステル二重硬化樹脂
WO2017044381A1 (en) 2015-09-09 2017-03-16 Carbon3D, Inc. Epoxy dual cure resins for additive manufacturing
US10647873B2 (en) 2015-10-30 2020-05-12 Carbon, Inc. Dual cure article of manufacture with portions of differing solubility
WO2017079502A1 (en) 2015-11-05 2017-05-11 Carbon, Inc. Silicone dual cure resins for additive manufacturing
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US10343331B2 (en) 2015-12-22 2019-07-09 Carbon, Inc. Wash liquids for use in additive manufacturing with dual cure resins
WO2017112751A1 (en) 2015-12-22 2017-06-29 Carbon, Inc. Blocked silicone dual cure resins for additive manufacturing
JP6944935B2 (ja) * 2015-12-22 2021-10-06 カーボン，インコーポレイテッド 二重硬化樹脂を用いた積層造形による複数の中間体からの複合生産物の製作
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US10500786B2 (en) 2016-06-22 2019-12-10 Carbon, Inc. Dual cure resins containing microwave absorbing materials and methods of using the same
CN110023056B (zh) 2016-11-21 2021-08-24 卡本有限公司 通过递送反应性组分用于后续固化来制造三维物体的方法
US11535686B2 (en) 2017-03-09 2022-12-27 Carbon, Inc. Tough, high temperature polymers produced by stereolithography
JP6894015B2 (ja) 2017-06-21 2021-06-23 カーボン，インコーポレイテッド 積層造形の方法
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Also Published As

Publication number Publication date
JPH04214326A (ja) 1992-08-05
DE4004620C1 (en) 1991-09-05
CA2035779A1 (en) 1991-08-16
AU7105191A (en) 1991-08-22
CN1054674A (zh) 1991-09-18
EP0442071A3 (en) 1992-04-29
EP0442071B1 (de) 1997-04-02
EP0442071A2 (de) 1991-08-21
DE59010693D1 (de) 1997-05-07

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