JPS5625733A - Pattern forming method - Google Patents

Pattern forming method

Info

Publication number
JPS5625733A
JPS5625733A JP10126179A JP10126179A JPS5625733A JP S5625733 A JPS5625733 A JP S5625733A JP 10126179 A JP10126179 A JP 10126179A JP 10126179 A JP10126179 A JP 10126179A JP S5625733 A JPS5625733 A JP S5625733A
Authority
JP
Japan
Prior art keywords
layer
heating
absorbing material
light absorbing
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10126179A
Other languages
Japanese (ja)
Other versions
JPS6210419B2 (en
Inventor
Michiaki Hashimoto
Toshio Nakano
Tadao Kaneko
Akira Sasano
Haruo Matsumaru
Ken Tsutsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP10126179A priority Critical patent/JPS5625733A/en
Publication of JPS5625733A publication Critical patent/JPS5625733A/en
Publication of JPS6210419B2 publication Critical patent/JPS6210419B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

Abstract

PURPOSE:To directly form a color filter on an neven substrate by forming a desired pattern on a layer contg. a light absorbing material on the substrate by a photolithographic method, heating the layer to remove the light absorbig material, and carrying out dyeing to a desired color. CONSTITUTION:A soln. prepared by dissolving a light absorbing material such as oil yellow SS which is scattered by heating and glycidyl methacrylate is applied to uneven substrate 1 such as solid imaging element and dried to form layer 2, and layer 2 is covered with layer 3 of a photosensitive composition consisting preferably of polyvinyl clcohol and dichromate. Layer 3 is irradiated with ultraviolet rays 4 through mask 5 and developed with warm water to remove the unirradiated portion. After scattering the light absorbing material by heating, residual layer 2 is colored to form desired color filter 6 (symbol 7 is a filter 6 protecting layer).
JP10126179A 1979-08-10 1979-08-10 Pattern forming method Granted JPS5625733A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10126179A JPS5625733A (en) 1979-08-10 1979-08-10 Pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10126179A JPS5625733A (en) 1979-08-10 1979-08-10 Pattern forming method

Publications (2)

Publication Number Publication Date
JPS5625733A true JPS5625733A (en) 1981-03-12
JPS6210419B2 JPS6210419B2 (en) 1987-03-06

Family

ID=14295964

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10126179A Granted JPS5625733A (en) 1979-08-10 1979-08-10 Pattern forming method

Country Status (1)

Country Link
JP (1) JPS5625733A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4414317A (en) * 1982-04-21 1983-11-08 Armstrong World Industries, Inc. Transparency, a method for forming it and a photographic mask whose optical densities are correlated with the contour of a surface

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009190973A (en) * 2008-02-12 2009-08-27 Sumitomo Chemical Co Ltd Azo compound

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4414317A (en) * 1982-04-21 1983-11-08 Armstrong World Industries, Inc. Transparency, a method for forming it and a photographic mask whose optical densities are correlated with the contour of a surface

Also Published As

Publication number Publication date
JPS6210419B2 (en) 1987-03-06

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