AU7105191A - Process for the preparation of photostructured layers with improved mechanical properties - Google Patents

Process for the preparation of photostructured layers with improved mechanical properties

Info

Publication number
AU7105191A
AU7105191A AU71051/91A AU7105191A AU7105191A AU 7105191 A AU7105191 A AU 7105191A AU 71051/91 A AU71051/91 A AU 71051/91A AU 7105191 A AU7105191 A AU 7105191A AU 7105191 A AU7105191 A AU 7105191A
Authority
AU
Australia
Prior art keywords
preparation
mechanical properties
improved mechanical
photostructured layers
photostructured
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU71051/91A
Inventor
Mario Grossa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of AU7105191A publication Critical patent/AU7105191A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
AU71051/91A 1990-02-15 1991-02-15 Process for the preparation of photostructured layers with improved mechanical properties Abandoned AU7105191A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4004620A DE4004620C1 (en) 1990-02-15 1990-02-15 Photo-structured layer of three=dimensional object prodn. - by using fusible plastisol or organosol contg. unsatd. monomer, photoinitiator and thermally reactive cpd.
DE4004620 1990-02-15

Publications (1)

Publication Number Publication Date
AU7105191A true AU7105191A (en) 1991-08-22

Family

ID=6400167

Family Applications (1)

Application Number Title Priority Date Filing Date
AU71051/91A Abandoned AU7105191A (en) 1990-02-15 1991-02-15 Process for the preparation of photostructured layers with improved mechanical properties

Country Status (7)

Country Link
EP (1) EP0442071B1 (en)
JP (1) JPH04214326A (en)
KR (1) KR910015889A (en)
CN (1) CN1054674A (en)
AU (1) AU7105191A (en)
CA (1) CA2035779A1 (en)
DE (2) DE4004620C1 (en)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5980812A (en) * 1997-04-30 1999-11-09 Lawton; John A. Solid imaging process using component homogenization
CN1180768C (en) 1998-01-21 2004-12-22 武田药品工业株式会社 Method for producing sustained-release prepn.
AU769767B2 (en) * 1999-03-09 2004-02-05 Lee Eisinger Application of textured or patterned surfaces to a prototype
DE102011015223A1 (en) * 2011-03-25 2012-09-27 Heraeus Kulzer Gmbh Dual-curable composition, process for its preparation and the use for the production of coatings
CN114734628A (en) 2014-06-23 2022-07-12 卡本有限公司 Method for producing three-dimensional objects from materials with multiple hardening mechanisms
BR112017016780A2 (en) 2015-02-05 2018-04-17 Carbon Inc intermittent exposure additive manufacturing method
US10391711B2 (en) 2015-03-05 2019-08-27 Carbon, Inc. Fabrication of three dimensional objects with multiple operating modes
JP7069006B2 (en) 2015-09-04 2022-05-17 カーボン，インコーポレイテッド Cyanate ester double curable resin for laminated modeling
EP3347399B1 (en) 2015-09-09 2020-12-09 Carbon, Inc. Epoxy dual cure resins for additive manufacturing
US10647873B2 (en) 2015-10-30 2020-05-12 Carbon, Inc. Dual cure article of manufacture with portions of differing solubility
WO2017079502A1 (en) 2015-11-05 2017-05-11 Carbon, Inc. Silicone dual cure resins for additive manufacturing
US10501572B2 (en) 2015-12-22 2019-12-10 Carbon, Inc. Cyclic ester dual cure resins for additive manufacturing
WO2017112751A1 (en) 2015-12-22 2017-06-29 Carbon, Inc. Blocked silicone dual cure resins for additive manufacturing
US10350823B2 (en) * 2015-12-22 2019-07-16 Carbon, Inc. Dual precursor resin systems for additive manufacturing with dual cure resins
JP6944935B2 (en) * 2015-12-22 2021-10-06 カーボン，インコーポレイテッド Manufacture of composite products from multiple intermediates by laminated molding using double-cured resin
US10343331B2 (en) 2015-12-22 2019-07-09 Carbon, Inc. Wash liquids for use in additive manufacturing with dual cure resins
US10538031B2 (en) 2015-12-22 2020-01-21 Carbon, Inc. Dual cure additive manufacturing of rigid intermediates that generate semi-rigid, flexible, or elastic final products
WO2017112483A2 (en) 2015-12-22 2017-06-29 Carbon, Inc. Accelerants for additive manufacturing with dual cure resins
US10500786B2 (en) 2016-06-22 2019-12-10 Carbon, Inc. Dual cure resins containing microwave absorbing materials and methods of using the same
WO2018094131A1 (en) 2016-11-21 2018-05-24 Carbon, Inc. Method of making three-dimensional object by delivering reactive component for subsequent cure
US11535686B2 (en) 2017-03-09 2022-12-27 Carbon, Inc. Tough, high temperature polymers produced by stereolithography
JP6894015B2 (en) 2017-06-21 2021-06-23 カーボン，インコーポレイテッド Laminated modeling method
US11292186B2 (en) * 2018-08-01 2022-04-05 Carbon, Inc. Production of low density products by additive manufacturing
US11504903B2 (en) 2018-08-28 2022-11-22 Carbon, Inc. 1K alcohol dual cure resins for additive manufacturing

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3615448A (en) * 1969-01-14 1971-10-26 Grace W R & Co Lithographic printing plate and method of preparation
US4309331A (en) * 1977-03-22 1982-01-05 E. I. Du Pont De Nemours And Company Surfactant-free acrylic plastisols and organosols compositions
US4288527A (en) * 1980-08-13 1981-09-08 W. R. Grace & Co. Dual UV/thermally curable acrylate compositions with pinacol
CA1194637A (en) * 1982-04-26 1985-10-01 Charles R. Morgan Uv and thermally curable, thermoplastic-containing compositions
DE3512176A1 (en) * 1985-04-03 1986-10-09 Winfried 7758 Meersburg Heinzel METHOD FOR TREATING THE SURFACE OF A PRINTING MACHINE CYLINDER
DE3814567A1 (en) * 1988-04-29 1989-11-09 Du Pont Deutschland PHOTOPOLYMERIZABLE COMPOSITIONS COMPRISING CARBOXYL GROUPS CONTAINING BINDER

Also Published As

Publication number Publication date
EP0442071A3 (en) 1992-04-29
JPH04214326A (en) 1992-08-05
CA2035779A1 (en) 1991-08-16
DE4004620C1 (en) 1991-09-05
EP0442071B1 (en) 1997-04-02
DE59010693D1 (en) 1997-05-07
CN1054674A (en) 1991-09-18
KR910015889A (en) 1991-09-30
EP0442071A2 (en) 1991-08-21

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