KR900016808A - 광 경화성 액체 조성물의 연속층으로부터 삼차원 물품을 가공하는 방법 - Google Patents

광 경화성 액체 조성물의 연속층으로부터 삼차원 물품을 가공하는 방법 Download PDF

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Publication number
KR900016808A
KR900016808A KR1019900005575A KR900005575A KR900016808A KR 900016808 A KR900016808 A KR 900016808A KR 1019900005575 A KR1019900005575 A KR 1019900005575A KR 900005575 A KR900005575 A KR 900005575A KR 900016808 A KR900016808 A KR 900016808A
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South Korea
Prior art keywords
composition
actinic radiation
photocurable liquid
refractive index
photocurable
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KR1019900005575A
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English (en)
Inventor
그로사 마리오
Original Assignee
제임즈 제이 플린
이 아이 듀우판 디 네모아 앤드 캄파니
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Application filed by 제임즈 제이 플린, 이 아이 듀우판 디 네모아 앤드 캄파니 filed Critical 제임즈 제이 플린
Publication of KR900016808A publication Critical patent/KR900016808A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C9/00—Stereo-photographic or similar processes
    • G03C9/08—Producing three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/148—Light sensitive titanium compound containing

Abstract

내용 없음

Description

광 경화성 액체 조성물의 연속층으로부터 삼차원 물품을 가공하는 방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 방법의 바람직한 실시양태를 수행하는데 사용되는 장치의 블록 선도이다.

Claims (7)

  1. (a) 광 경화성 액체층을 형성시키는 단계: (b) 광 경화성 액체층의 적어도 일부를 화학선에 노출시켜 광경화 시키는 단계; (c) 화학선에 이미 노출된 층상에 새로운 광경화성 액체층을 도입시키는 단계; 및 (d) 새로운 액체층의 적어도 일부를 화학선에 노출시켜 광경화시키는 단계로 구성되고, 광경화성 조성물은 에틸렌형 불포화 단량체, 광 개시제 및 조성물내에서 용액인 잠복사선 굴절(latent radiation deflecting)물질로 구성되고, 조성물을 화학선에 적용시켜 조성물을 관경화시킬때 분리된 상으로 분리되고, 분리된 상은 첫번째 굴절 지수를 갖고 나머지 광경화된 조성물은 두번째 굴절지수를 가지며, 단 첫번째 굴절지수와 두번째 굴절지수간의 차이의 절대값이 0.01이상인 것을 자격요건으로하는, 광경화성 액체 조성물의 연속 층으로부터 완전한 삼차원 물품을 정밀하게 가공하는 방법.
  2. 제1항에 있어서, 단계(c) 및 (d)를 연속적으로 반복시키는 방법.
  3. 제2항에 있어서, 화학선이 비임의 형태인 방법.
  4. 제2항에 있어서, 분리된 상이 기체인 방법.
  5. 제2항에 있어서, 분리된 상이 액체인 방법.
  6. 제2항에 있어서, 분리된 상이 고체인 방법.
  7. 제3항에 있어서, 비임이 광 비임인 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019900005575A 1989-04-21 1990-04-20 광 경화성 액체 조성물의 연속층으로부터 삼차원 물품을 가공하는 방법 KR900016808A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US341,611 1989-04-21
US07/341,611 US4942060A (en) 1989-04-21 1989-04-21 Solid imaging method utilizing photohardenable compositions of self limiting thickness by phase separation

Publications (1)

Publication Number Publication Date
KR900016808A true KR900016808A (ko) 1990-11-14

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900005575A KR900016808A (ko) 1989-04-21 1990-04-20 광 경화성 액체 조성물의 연속층으로부터 삼차원 물품을 가공하는 방법

Country Status (9)

Country Link
US (1) US4942060A (ko)
EP (1) EP0393674B1 (ko)
JP (1) JPH0767745B2 (ko)
KR (1) KR900016808A (ko)
CN (1) CN1046613A (ko)
AU (1) AU623004B2 (ko)
CA (1) CA2014807A1 (ko)
DE (1) DE69021245T2 (ko)
HK (1) HK53997A (ko)

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Also Published As

Publication number Publication date
EP0393674B1 (en) 1995-08-02
HK53997A (en) 1997-05-02
JPH0341126A (ja) 1991-02-21
DE69021245T2 (de) 1996-02-15
US4942060A (en) 1990-07-17
AU5376290A (en) 1990-10-25
JPH0767745B2 (ja) 1995-07-26
EP0393674A1 (en) 1990-10-24
DE69021245D1 (de) 1995-09-07
CA2014807A1 (en) 1990-10-21
CN1046613A (zh) 1990-10-31
AU623004B2 (en) 1992-04-30

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