KR900016810A - 광경화성 조성물 및 그들의 연속 층으로부터 삼차원물품을 가공하는 방법 - Google Patents

광경화성 조성물 및 그들의 연속 층으로부터 삼차원물품을 가공하는 방법 Download PDF

Info

Publication number
KR900016810A
KR900016810A KR1019900005577A KR900005577A KR900016810A KR 900016810 A KR900016810 A KR 900016810A KR 1019900005577 A KR1019900005577 A KR 1019900005577A KR 900005577 A KR900005577 A KR 900005577A KR 900016810 A KR900016810 A KR 900016810A
Authority
KR
South Korea
Prior art keywords
composition
volume
polymer
photocuring
photocurable
Prior art date
Application number
KR1019900005577A
Other languages
English (en)
Inventor
베씰리우 유스터씨어스
그로사 마리오
Original Assignee
제임즈 제이 플린
이 아이 듀우판 디 네모아 앤드 캄파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 제임즈 제이 플린, 이 아이 듀우판 디 네모아 앤드 캄파니 filed Critical 제임즈 제이 플린
Publication of KR900016810A publication Critical patent/KR900016810A/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C9/00—Stereo-photographic or similar processes
    • G03C9/08—Producing three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0833—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using actinic light
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/49—Nc machine tool, till multiple
    • G05B2219/49013—Deposit layers, cured by scanning laser, stereo lithography SLA, prototyping
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/108—Polyolefin or halogen containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)

Abstract

내용 없음

Description

광경화성 조성물 및 그들의 연속 층으로부터 삼차원물품을 가공하는 방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 방법의 바람직한 실시양태를 수행하는데 사용되는 장치의 블록 선도이다.

Claims (17)

  1. 에틸렌형 불포화 단량체, 광개시제 및 조성물을 광경화시킬때 조성물내에 녹으나 별개의 상으로 분리되고, 조성물의 다른 성분 모두가 없을때 첫번째 부피를 점유하는 이에 혼합된 첨가제로 구성되고, 상기 혼합된 첨가제가 없을때 두번째 부피를 점유하고, 첫번째 부피 및 두번째 부피의 합보다 작은 세번째 부피를 점유하는 첨가제를 함유하는, 고체 상형성에서 사용되기 위해 광경화시킬때 수축이 적게 되거나 수축되지 않는 것을 특징으로 하는 광경화성 조성물.
  2. 제1항에 있어서, 별개의상이, 250㎛이하의 직경을 영역의 형태이고 광경화 후에 조성물의 전체 부피의 최소한 10%를 구성하는 부피를 가지는 광경화성 조성물.
  3. 제1항에 있어서, 첨가 화합물이 전체 조성물의 10중량%-50중량%인 광경화성 조성물.
  4. 제1항에 있어서, 첨가 화합물이 중합체인 광경화성 조성물.
  5. 제4항에 있어서, 중합체가 10,000-250,000의 수평균 분자량을 가지는 광경화성 조성물.
  6. 제4항에 있어서, 중합체가 스티렌, 치환된 스티렌, 알파 알킬 스티렌, 베타 알킬 스티렌, 치환된 알파 알킬 스티렌, 치환된 베타 알킬 스티렌 또는 그들의 혼합물로 구성되는 군으로부터 선택되는 단량체를 포함하는 광경화성 조성물.
  7. 제4항에 있어서, 중합체가, 만일 단일중합반응되면 광경화되기전에 광경화성 조성물내에 녹으나 광경화할때 두번째 상으로 분리되는 중합체를 형성하는 첫번째 단량체, 및 만일 단일 중합반응되면 광경화전 이나 후에 모두 광경화성 조성물내에 녹는 중합체를 형성하는 두번째 단량체로 부터 형성되는 공중합체인 광경화성 조성물.
  8. 제4항에 있어서, 중합체가 불포화된 부위당 1,000-5,000g의 당량을 가진 에틸렌 불포화를 가지는 광경화성 조성물.
  9. (a) 광경화성 액체 층을 형성시키는 단계: (b) 광경화성 액체 층의 적어도 일부를 화학선에 노출시켜 광경화 시키는 단계: (c) 화학선에 이미 노출된 층위에 새로운 광경화성 액체층을 도입시키는 단계: 및 (d) 최소한 일부분의 신규한 액체 층을 화학선에 노출시킴으로 광경화시키는 단계로 구성되는, 에틸렌형 불포화 단량체, 광개시제 및 조성물을 광경화시킬때 조성물내에 녹으나 별개의 상으로 분리되고, 조성물의 다른 성분모두가 없을때 첫번째 부피를 점유하는 이에 혼합된 첨가제로 구성되고, 상기 혼합된 첨가제가 없을때 두번째 부피를 점유하고, 첫번째 부피 및 두번째 부피의 합보다 작은 세번째 부피를 점유하는 첨가제를 함유하는 것을 특징으로하는 광경화성 액체조성물의 연속 층으로부터 완전한 삼차원 물품을 정확하게 가공하는 방법.
  10. 제9항에 있어서, (c) 및 (d)단계가 연속적으로 반복되는 방법.
  11. 제9항에 있어서, 별개이상이 250㎛이하의 직경을 가지는 영역의 형태이고 광경화 후에 조성물의 전체부피의 최소한 10%를 구성하는 부피를 가지는 방법.
  12. 제9항에 있어서, 첨가 화합물이 전체 광경화성 조성물의 10중량%-50중량%인 방법.
  13. 제9항에 있어서, 첨가 화합물이 중합체인 방법.
  14. 제13항에 있어서, 중합체가 10,000-250,000의 수평균 분자량을 가지는 방법.
  15. 제13항에 있어서, 중합체가 스티렌, 치환된 스티렌, 알파 알킬 스티렌, 베타 알킬 스티렌, 치환된 알파 알킬 스티렌, 치환된 베타 알킬 스티렌 또는 그들의 혼합물로 구성되는 군으로 부터 선택되는 단량체를 포함하는 방법.
  16. 제13항에 있어서, 중합체가 광경화 되기전에 광경화성 조성물내에 녹으나 광경화 할때 두번째 상으로 분리되는 단일 중합체에 상응하는 첫번째 단량체, 및 광경화전이나 후에 모두 광경화성 조성물내에 녹는 단일 중합체에 상응하는 두번째 단량체로 구성되는 공중합체인 방법.
  17. 제15항에 있어서, 중합체가 불포화된 부위당 1,000-5,000g의 단량을 가진 에틸렌 불포화를 가지는 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019900005577A 1989-04-21 1990-04-20 광경화성 조성물 및 그들의 연속 층으로부터 삼차원물품을 가공하는 방법 KR900016810A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/341,868 US5128235A (en) 1989-04-21 1989-04-21 Method of forming a three-dimensional object comprising additives imparting reduction of shrinkage to photohardenable compositions
US341,868 1989-04-21

Publications (1)

Publication Number Publication Date
KR900016810A true KR900016810A (ko) 1990-11-14

Family

ID=23339356

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900005577A KR900016810A (ko) 1989-04-21 1990-04-20 광경화성 조성물 및 그들의 연속 층으로부터 삼차원물품을 가공하는 방법

Country Status (8)

Country Link
US (1) US5128235A (ko)
EP (1) EP0393672B1 (ko)
JP (1) JP2610692B2 (ko)
KR (1) KR900016810A (ko)
CN (1) CN1046614A (ko)
AU (1) AU636140B2 (ko)
CA (1) CA2014808A1 (ko)
DE (1) DE69021114T2 (ko)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5182715A (en) * 1989-10-27 1993-01-26 3D Systems, Inc. Rapid and accurate production of stereolighographic parts
US5167882A (en) * 1990-12-21 1992-12-01 Loctite Corporation Stereolithography method
US5399624A (en) * 1990-12-21 1995-03-21 Loctite Corporation High purity resins for thiol-ene polymerizations and method for producing same
US5460758A (en) * 1990-12-21 1995-10-24 Eos Gmbh Electro Optical Systems Method and apparatus for production of a three-dimensional object
WO1992011577A1 (de) * 1990-12-21 1992-07-09 Eos Gmbh Electro Optical Systems Verfahren und vorrichtung zum herstellen eines dreidimensionalen objekts
US5512162A (en) * 1992-08-13 1996-04-30 Massachusetts Institute Of Technology Method for photo-forming small shaped metal containing articles from porous precursors
DE4433118A1 (de) * 1994-09-16 1996-03-21 Eos Electro Optical Syst Verfahren zur Herstellung eines dreidimensionalen Objektes
US5572431A (en) * 1994-10-19 1996-11-05 Bpm Technology, Inc. Apparatus and method for thermal normalization in three-dimensional article manufacturing
US5717599A (en) * 1994-10-19 1998-02-10 Bpm Technology, Inc. Apparatus and method for dispensing build material to make a three-dimensional article
US5633021A (en) * 1994-10-19 1997-05-27 Bpm Technology, Inc. Apparatus for making a three-dimensional article
US5555176A (en) * 1994-10-19 1996-09-10 Bpm Technology, Inc. Apparatus and method for making three-dimensional articles using bursts of droplets
JP3117394B2 (ja) * 1994-11-29 2000-12-11 帝人製機株式会社 光学的立体造形用樹脂組成物
US5763503A (en) * 1995-06-07 1998-06-09 Esschem, Inc. Radiation-curable, moldable material, methods for curing it and molded articles obtained therefrom
US5784279A (en) * 1995-09-29 1998-07-21 Bpm Technology, Inc. Apparatus for making three-dimensional articles including moving build material reservoir and associated method
US5700406A (en) * 1996-04-26 1997-12-23 Bpm Technology, Inc. Process of and apparatus for making a three-dimensional article
US7332537B2 (en) 1996-09-04 2008-02-19 Z Corporation Three dimensional printing material system and method
EP1152848B1 (en) * 1998-11-20 2011-08-17 Rolls-Royce Corporation Method and apparatus for production of a cast component
DE60008778T2 (de) 1999-11-05 2005-02-10 Z Corp., Burlington Verfahren für dreidimensionales drucken
US6569373B2 (en) * 2000-03-13 2003-05-27 Object Geometries Ltd. Compositions and methods for use in three dimensional model printing
US8481241B2 (en) 2000-03-13 2013-07-09 Stratasys Ltd. Compositions and methods for use in three dimensional model printing
EP1741545B1 (en) * 2000-03-13 2013-07-17 Stratasys Ltd. Compositions for use in three dimensional model printing
US7300619B2 (en) 2000-03-13 2007-11-27 Objet Geometries Ltd. Compositions and methods for use in three dimensional model printing
US20010050031A1 (en) 2000-04-14 2001-12-13 Z Corporation Compositions for three-dimensional printing of solid objects
KR101148770B1 (ko) 2003-05-21 2012-05-24 3디 시스템즈 인코오퍼레이티드 3ｄ 인쇄 시스템으로부터의 외관 모형용 열가소성 분말 물질 시스템
US7261542B2 (en) 2004-03-18 2007-08-28 Desktop Factory, Inc. Apparatus for three dimensional printing using image layers
EP2089215B1 (en) 2006-12-08 2015-02-18 3D Systems Incorporated Three dimensional printing material system
WO2008086033A1 (en) 2007-01-10 2008-07-17 Z Corporation Three-dimensional printing material system with improved color, article performance, and ease of use
US7968626B2 (en) 2007-02-22 2011-06-28 Z Corporation Three dimensional printing material system and method using plasticizer-assisted sintering
EP3216810A4 (en) * 2014-11-04 2018-08-22 Three Bond Co., Ltd. Photocurable resin composition, cured product of same and method for producing cured product
EP3758916A4 (en) * 2018-03-02 2021-10-27 Formlabs, Inc. LATENT CURING RESINS AND RELATED PROCESSES
CN108912287B (zh) * 2018-07-17 2020-11-06 深圳摩方新材科技有限公司 一种改善打印层纹的双引发固化体系及其制备方法
US11155039B2 (en) 2019-10-08 2021-10-26 Thermwood Corporation Warp compensation for additive manufacturing

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL218803A (ko) * 1956-07-09
US3701748A (en) * 1966-07-20 1972-10-31 Rohm & Haas Unsaturated polyester resinous compositions
NL6813993A (ko) * 1968-09-30 1970-04-01
US4005244A (en) * 1974-09-30 1977-01-25 Ppg Industries, Inc. Ultraviolet light curable opacifying compositions
US4078229A (en) * 1975-01-27 1978-03-07 Swanson Wyn K Three dimensional systems
US4151219A (en) * 1977-05-11 1979-04-24 The Dow Chemical Company Vinyl ester resins containing polyoxyalkylene low profile additives
US4288861A (en) * 1977-12-01 1981-09-08 Formigraphic Engine Corporation Three-dimensional systems
US4245068A (en) * 1977-12-27 1981-01-13 The Dow Chemical Company Low profile additives for unsaturated polyester resins
EP0099058B1 (de) * 1982-07-06 1986-04-23 BASF Aktiengesellschaft Verfahren zur Herstellung von schrumpfarmen Polyamid-Formkörpern
US4575330A (en) * 1984-08-08 1986-03-11 Uvp, Inc. Apparatus for production of three-dimensional objects by stereolithography
JPS61217036A (ja) * 1985-03-22 1986-09-26 Kuraray Co Ltd 水溶性感光性組成物
DE3537380A1 (de) * 1985-10-21 1987-04-23 Hoechst Ag Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial
DE3750709T2 (de) * 1986-06-03 1995-03-16 Cubital Ltd Gerät zur Entwicklung dreidimensionaler Modelle.
JPS62288667A (ja) * 1986-06-09 1987-12-15 Nippon Kayaku Co Ltd 塗料組成物
US4752498A (en) * 1987-03-02 1988-06-21 Fudim Efrem V Method and apparatus for production of three-dimensional objects by photosolidification
JPH0791171B2 (ja) * 1987-03-20 1995-10-04 株式会社クラレ 矯正用光硬化型樹脂複合組成物
US4942112A (en) * 1988-01-15 1990-07-17 E. I. Du Pont De Nemours And Company Photopolymerizable compositions and elements for refractive index imaging
US4945032A (en) * 1988-03-31 1990-07-31 Desoto, Inc. Stereolithography using repeated exposures to increase strength and reduce distortion
JPH07103218B2 (ja) * 1988-09-13 1995-11-08 旭電化工業株式会社 光学的造形用樹脂組成物
US4942060A (en) * 1989-04-21 1990-07-17 E. I. Du Pont De Nemours And Company Solid imaging method utilizing photohardenable compositions of self limiting thickness by phase separation

Also Published As

Publication number Publication date
EP0393672A3 (en) 1992-05-27
EP0393672A2 (en) 1990-10-24
CN1046614A (zh) 1990-10-31
AU636140B2 (en) 1993-04-22
CA2014808A1 (en) 1990-10-21
AU5376790A (en) 1990-10-25
JP2610692B2 (ja) 1997-05-14
DE69021114D1 (de) 1995-08-31
US5128235A (en) 1992-07-07
DE69021114T2 (de) 1996-01-25
JPH0320315A (ja) 1991-01-29
EP0393672B1 (en) 1995-07-26

Similar Documents

Publication Publication Date Title
KR900016810A (ko) 광경화성 조성물 및 그들의 연속 층으로부터 삼차원물품을 가공하는 방법
KR900016808A (ko) 광 경화성 액체 조성물의 연속층으로부터 삼차원 물품을 가공하는 방법
KR900016807A (ko) 삼차원 물품의 제조방법 및 이에 의해 얻어진 삼차원 고체부품
DE1645125C3 (de) Verfahren zur Herstellung photopolymerisierbarer polymerer Ester
KR900016805A (ko) 광경화성 액체 조성물의 연속층으로 부터 완전한 삼차원 물품을 가공하는 방법 및 그로부터 제조된 경질 고형물품
DE2055157C3 (de) Fotopolymerisierbares Gemisch
EP0322808A3 (en) Radiation curable compositions based on unsaturated polyesters and compounds having at least two vinyl ether groups
JPS55118030A (en) Photopolymerizable composition
KR100485857B1 (ko) 잔류물이 감량된 감광성 조성물의 연속 액체 처리 방법
KR900016809A (ko) 광경화성 액체 조성물의 연속층으로 부터 삼차원 물품을 가공하는 방법
KR960022615A (ko) 감광성 내식막 조성물
EP0102921A3 (de) Verfahren zur Erzeugung von Abbildungen aus flüssigen Massen
DE69017477T2 (de) Photohärtbare Zusammensetzungen.
EP0442071A2 (de) Verfahren zur Herstellung photostrukturierter Schichten mit verbesserten mechanischen Eigenschaften
US2927023A (en) Photopolymerizable compositions
JPS5744143A (en) Composition and method for forming micropattern
Fukuda et al. Interactions between unlike polymers versus dilute solution properties of copolymers
JP2000074900A5 (ko)
DE3473357D1 (de) Photopolymerizable laminate
KR920016549A (ko) 광경화성 수지 조성물
JPS6088005A (ja) 光硬化樹脂組成物
Baxter et al. A study of the photodecomposition products of an acylphosphine oxide and 2, 2-dimethoxy-2-phenylacetophenone
KR930700888A (ko) 레지스트 물질 및 그의 사용 방법
JPS5575405A (en) Photopolymerizable composition
EP0463015B1 (de) Lichtempfindliches aufzeichnungselement mit einer aufzeichnungsschicht und einer deckschicht unterschiedlicher löslichkeitseigenschaften sowie verfahren zu seiner entwicklung in einem arbeitsgang

Legal Events

Date Code Title Description
WITB Written withdrawal of application