KR830010405A - 릴리이프(relief)복사물의 제조방법 - Google Patents

릴리이프(relief)복사물의 제조방법 Download PDF

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Publication number
KR830010405A
KR830010405A KR1019820002068A KR820002068A KR830010405A KR 830010405 A KR830010405 A KR 830010405A KR 1019820002068 A KR1019820002068 A KR 1019820002068A KR 820002068 A KR820002068 A KR 820002068A KR 830010405 A KR830010405 A KR 830010405A
Authority
KR
South Korea
Prior art keywords
layer
photopolymerizable
exposure
photocurable
binder
Prior art date
Application number
KR1019820002068A
Other languages
English (en)
Other versions
KR880001436B1 (ko
Inventor
후라스 워너
크라우스혼
Original Assignee
윌리 웨트라우훠, 크루트 에울러
훽스트 아크티엔 게젤샤프트
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 윌리 웨트라우훠, 크루트 에울러, 훽스트 아크티엔 게젤샤프트 filed Critical 윌리 웨트라우훠, 크루트 에울러
Publication of KR830010405A publication Critical patent/KR830010405A/ko
Application granted granted Critical
Publication of KR880001436B1 publication Critical patent/KR880001436B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Holo Graphy (AREA)
  • Steroid Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Medicines Containing Plant Substances (AREA)
  • Preparation Of Compounds By Using Micro-Organisms (AREA)

Abstract

내용 없음

Description

릴리이프(relief) 복사물의 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (4)

  1. 광중합성 혼합물, 광에 의해 2량체화 하는 고분자 화합물 또는 디아조늄염의 중축합 생성물을 함유하는 광경화성 복사물질의 광경화성 층을 영상대로 노출시킨후 이어서 층의 비 노출된 부분을 현상제로 세척하고 노출시킨후 그 층을 잠시 초단파로 처리하고 이어서 현상시킴을 특징으로 하는 릴리이프 복사물을 제조하는 방법
  2. 제1항에 있어서, 4 내지 50℃의 범위에서 층을 초단파 처리하는 방법
  3. 제1항에 있어서, 5초 내지 40분 이하로 층을 초단파 처리하는 방법
  4. 제1항에 있어서, 적어도 2개의 에틸렌성 불포화 이중 결합을 가진 중합성 화합물, 중합성 결합제 및 노출시 유리기를 발생할 수 있는 광 개시재를 사용하여 광 중합성결합제 및 노출시 복사물을 제조하는 방법
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR828202068A 1981-05-13 1982-05-12 릴리이프(relief) 복사물의 제조방법 KR880001436B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19813118884 DE3118884A1 (de) 1981-05-13 1981-05-13 Verfahren zur herstellung von reliefkopien
DE3118884.2 1981-05-13

Publications (2)

Publication Number Publication Date
KR830010405A true KR830010405A (ko) 1983-12-30
KR880001436B1 KR880001436B1 (ko) 1988-08-08

Family

ID=6132126

Family Applications (1)

Application Number Title Priority Date Filing Date
KR828202068A KR880001436B1 (ko) 1981-05-13 1982-05-12 릴리이프(relief) 복사물의 제조방법

Country Status (13)

Country Link
US (1) US4447510A (ko)
EP (1) EP0064733B1 (ko)
JP (1) JPS57195250A (ko)
KR (1) KR880001436B1 (ko)
AT (1) ATE14945T1 (ko)
AU (1) AU549198B2 (ko)
BR (1) BR8202749A (ko)
CA (1) CA1183382A (ko)
DE (2) DE3118884A1 (ko)
HK (1) HK54086A (ko)
IL (1) IL65736A (ko)
MY (1) MY8600738A (ko)
ZA (1) ZA823008B (ko)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3418856A1 (de) * 1984-05-21 1985-11-21 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Verfahren zur beeinflussung von strukturprofilen in resistschichten
DE3418854A1 (de) * 1984-05-21 1985-11-21 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Verfahren zur erzeugung von strukturen in resistschichten
US5143814A (en) * 1984-06-11 1992-09-01 Hoechst Celanese Corporation Positive photoresist compositions with o-quinone diazide, novolak and propylene glycol alkyl ether acetate
US5066561A (en) * 1984-06-11 1991-11-19 Hoechst Celanese Corporation Method for producing and using a positive photoresist with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
JPH0766186B2 (ja) * 1985-07-02 1995-07-19 富士写真フイルム株式会社 感光性組成物
JP2758604B2 (ja) * 1988-04-27 1998-05-28 本田技研工業株式会社 排気消音器
JPH0299953A (ja) * 1988-10-06 1990-04-11 Matsushita Electric Ind Co Ltd パターン形成材料
JPH02106753A (ja) * 1988-10-14 1990-04-18 Matsushita Electric Ind Co Ltd パターン形成方法
JP2903159B2 (ja) * 1989-03-27 1999-06-07 コニカ株式会社 光重合開始剤含有感光材料の現像方法
JPH0418564A (ja) * 1990-01-22 1992-01-22 Asahi Chem Ind Co Ltd 感光性エラストマー組成物用現像剤
JP3002255B2 (ja) * 1990-11-28 2000-01-24 三菱電機株式会社 パターン形成方法
US7029798B1 (en) 2002-06-28 2006-04-18 Seagate Technology Llc Ultrasonic agitation-assisted development of resist layer of master stamper/imprinter

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3661660A (en) * 1968-02-21 1972-05-09 Grace W R & Co Method for ultrasonic etching of polymeric printing plates
IL39449A (en) * 1971-05-17 1976-01-30 Energy Conversion Devices Inc Method for producing images
BE792499A (fr) * 1971-12-10 1973-03-30 Siemens Ag Procede de traitement pour le blanchiment par attaque chimique de plaques photographiques et de films exposes et
GB1420958A (en) * 1972-06-30 1976-01-14 Ici Ltd Photo-polymerisable composition
DE2724091A1 (de) * 1976-05-28 1977-12-15 Sumitomo Chemical Co Verfahren zum reinigen und/oder tauchbeschichten von kunstharzgegenstaenden und vorrichtung zur durchfuehrung des verfahrens
DK156099C (da) * 1980-05-07 1989-11-06 Eskofot As Fremgangsmaade ved fremkaldelse

Also Published As

Publication number Publication date
EP0064733B1 (de) 1985-08-14
JPH0148534B2 (ko) 1989-10-19
DE3265385D1 (en) 1985-09-19
IL65736A (en) 1985-03-31
AU549198B2 (en) 1986-01-16
IL65736A0 (en) 1982-08-31
US4447510A (en) 1984-05-08
ZA823008B (en) 1983-03-30
JPS57195250A (en) 1982-11-30
BR8202749A (pt) 1983-04-19
AU8320482A (en) 1982-11-18
DE3118884A1 (de) 1982-12-02
MY8600738A (en) 1986-12-31
CA1183382A (en) 1985-03-05
ATE14945T1 (de) 1985-08-15
KR880001436B1 (ko) 1988-08-08
EP0064733A1 (de) 1982-11-17
HK54086A (en) 1986-07-25

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