GB1548764A - Photosensitive compositions - Google Patents
Photosensitive compositionsInfo
- Publication number
- GB1548764A GB1548764A GB14886/76A GB1488676A GB1548764A GB 1548764 A GB1548764 A GB 1548764A GB 14886/76 A GB14886/76 A GB 14886/76A GB 1488676 A GB1488676 A GB 1488676A GB 1548764 A GB1548764 A GB 1548764A
- Authority
- GB
- United Kingdom
- Prior art keywords
- phase
- films
- solvent
- coherent
- photosensitive compositions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/06—Silver salts
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Formation Of Insulating Films (AREA)
Abstract
The photosensitive film consists of a coherent first phase of photosensitive material and a second, particulate second phase. The first phase changes its behaviour towards a solvent by exposure with electromagnetic radiation, i.e. it becomes insoluble, and only the unexposed areas can be washed out with the solvent. By using a second, non-coherent phase, up to 75% of the proportion of the first phase can be saved. In this way, the cost can be reduced and the film properties can be controlled by the selection of the chemical properties of the second phase. Thus, films can be activated more rapidly after actinic irradiation than hitherto and the durability of the films when used on offset printing plates was considerably increased. <IMAGE>
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US58833475A | 1975-06-19 | 1975-06-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1548764A true GB1548764A (en) | 1979-07-18 |
Family
ID=24353419
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB14886/76A Expired GB1548764A (en) | 1975-06-19 | 1976-04-12 | Photosensitive compositions |
Country Status (12)
Country | Link |
---|---|
JP (1) | JPS5936731B2 (en) |
BE (1) | BE841797A (en) |
CA (1) | CA1091969A (en) |
CH (1) | CH633893A5 (en) |
DE (1) | DE2626066A1 (en) |
DK (1) | DK232276A (en) |
FR (1) | FR2315110A1 (en) |
GB (1) | GB1548764A (en) |
IT (1) | IT1061234B (en) |
NL (1) | NL7604774A (en) |
NO (1) | NO762006L (en) |
SE (1) | SE422847B (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2533227A1 (en) * | 1982-09-21 | 1984-03-23 | Polychrome Corp | COATING COMPOSITION IN THE FORM OF A PHOTOSENSITIVE LATEX AND PRINTING PLATE CONTAINING THE SAME |
US4551415A (en) * | 1982-04-22 | 1985-11-05 | E. I. Du Pont De Nemours And Company | Photosensitive coatings containing crosslinked beads |
US4601970A (en) * | 1982-04-22 | 1986-07-22 | E. I. Du Pont De Nemours And Company | Dry photosensitive film containing crosslinked beads |
US4668604A (en) * | 1982-04-22 | 1987-05-26 | E.I. Du Pont De Nemours And Company | Positive-working photosensitive elements containing crosslinked beads and process of use |
US5948599A (en) * | 1992-11-18 | 1999-09-07 | Agfa Gevaert Nv | Method of forming an image in a printing plate |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52154627A (en) * | 1976-06-18 | 1977-12-22 | Fuji Photo Film Co Ltd | Silver halide light sensitive material |
JPS52154626A (en) * | 1976-06-18 | 1977-12-22 | Fuji Photo Film Co Ltd | Silver halide light sensitive material |
JPS5518621A (en) * | 1978-07-26 | 1980-02-08 | Fuji Photo Film Co Ltd | Photosensitive lithographic printing plate |
DE2834059A1 (en) * | 1978-08-03 | 1980-02-14 | Hoechst Ag | LIGHT SENSITIVE COPY MATERIAL AND METHOD FOR THE PRODUCTION THEREOF |
JPS5823026A (en) * | 1981-08-04 | 1983-02-10 | Nippon Paint Co Ltd | Water developable material for lithographic plate |
JPS58174939A (en) * | 1982-03-18 | 1983-10-14 | Konishiroku Photo Ind Co Ltd | Image forming material |
US5688627A (en) * | 1996-07-02 | 1997-11-18 | Precision Lithograining Corp. | Light sensitive diazonium compounds having both bisulfate and zincate parts, method of making the compounds and compositions utilizing them |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3382069A (en) * | 1964-06-18 | 1968-05-07 | Azoplate Corp | Planographic printing plate |
GB1469941A (en) * | 1973-04-10 | 1977-04-06 | Andrews Paper & Chem Co Inc | Diazotype reproduction layer |
-
1976
- 1976-04-02 CA CA249,489A patent/CA1091969A/en not_active Expired
- 1976-04-12 GB GB14886/76A patent/GB1548764A/en not_active Expired
- 1976-04-28 CH CH534076A patent/CH633893A5/en not_active IP Right Cessation
- 1976-05-03 IT IT49301/76A patent/IT1061234B/en active
- 1976-05-03 FR FR7613143A patent/FR2315110A1/en active Granted
- 1976-05-04 SE SE7605083A patent/SE422847B/en unknown
- 1976-05-05 NL NL7604774A patent/NL7604774A/en not_active Application Discontinuation
- 1976-05-13 BE BE167002A patent/BE841797A/en not_active IP Right Cessation
- 1976-05-26 DK DK232276A patent/DK232276A/en not_active Application Discontinuation
- 1976-06-08 JP JP51067029A patent/JPS5936731B2/en not_active Expired
- 1976-06-10 DE DE19762626066 patent/DE2626066A1/en not_active Withdrawn
- 1976-06-10 NO NO762006A patent/NO762006L/no unknown
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4551415A (en) * | 1982-04-22 | 1985-11-05 | E. I. Du Pont De Nemours And Company | Photosensitive coatings containing crosslinked beads |
US4601970A (en) * | 1982-04-22 | 1986-07-22 | E. I. Du Pont De Nemours And Company | Dry photosensitive film containing crosslinked beads |
US4668604A (en) * | 1982-04-22 | 1987-05-26 | E.I. Du Pont De Nemours And Company | Positive-working photosensitive elements containing crosslinked beads and process of use |
FR2533227A1 (en) * | 1982-09-21 | 1984-03-23 | Polychrome Corp | COATING COMPOSITION IN THE FORM OF A PHOTOSENSITIVE LATEX AND PRINTING PLATE CONTAINING THE SAME |
US5948599A (en) * | 1992-11-18 | 1999-09-07 | Agfa Gevaert Nv | Method of forming an image in a printing plate |
Also Published As
Publication number | Publication date |
---|---|
SE7605083L (en) | 1976-12-20 |
DE2626066A1 (en) | 1977-01-20 |
CH633893A5 (en) | 1982-12-31 |
IT1061234B (en) | 1983-02-28 |
FR2315110A1 (en) | 1977-01-14 |
FR2315110B1 (en) | 1981-11-13 |
JPS5936731B2 (en) | 1984-09-05 |
BE841797A (en) | 1976-09-01 |
NO762006L (en) | 1976-12-21 |
SE422847B (en) | 1982-03-29 |
NL7604774A (en) | 1976-12-21 |
CA1091969A (en) | 1980-12-23 |
DK232276A (en) | 1976-12-20 |
JPS522520A (en) | 1977-01-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PCNP | Patent ceased through non-payment of renewal fee |