GB1509314A - Radiation-sensitive resist-forming composition - Google Patents

Radiation-sensitive resist-forming composition

Info

Publication number
GB1509314A
GB1509314A GB2157175A GB2157175A GB1509314A GB 1509314 A GB1509314 A GB 1509314A GB 2157175 A GB2157175 A GB 2157175A GB 2157175 A GB2157175 A GB 2157175A GB 1509314 A GB1509314 A GB 1509314A
Authority
GB
United Kingdom
Prior art keywords
composition
radiation
coated
forming composition
sensitive resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2157175A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Ltd
Original Assignee
Kodak Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Ltd filed Critical Kodak Ltd
Priority to GB2157175A priority Critical patent/GB1509314A/en
Publication of GB1509314A publication Critical patent/GB1509314A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

1509314 Photo-sensitive materials KODAK Ltd 20 May 1975 21571/75 Addition to 1463816 Heading G2C A radiation sensitive composition comprises (i) the polymers of Specification 1463816 and (ii) a triphenyl derivative of formula ph 3 M wherein M is nitrogen, phosphorous, arsenic, antimony or bismith. The composition may be coated on to a hydrophilic lithographic support or a support comprising a metal layer, on the composition is coated, carried by an electrically insulating sheet. The composition may also comprise a coating solvent and polyunsaturated monomeric plasticizer, and the layer may be used to obtain a resist image by exposure to actinic radiation, and treatment of the exposed material with a solvent which removes the unexposed composition. In the Examples, triphenylarsine triphenylbismuthine and triphenylamine are used.
GB2157175A 1975-05-20 1975-05-20 Radiation-sensitive resist-forming composition Expired GB1509314A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB2157175A GB1509314A (en) 1975-05-20 1975-05-20 Radiation-sensitive resist-forming composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB2157175A GB1509314A (en) 1975-05-20 1975-05-20 Radiation-sensitive resist-forming composition

Publications (1)

Publication Number Publication Date
GB1509314A true GB1509314A (en) 1978-05-04

Family

ID=10165159

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2157175A Expired GB1509314A (en) 1975-05-20 1975-05-20 Radiation-sensitive resist-forming composition

Country Status (1)

Country Link
GB (1) GB1509314A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0304313A2 (en) * 1987-08-21 1989-02-22 Oki Electric Industry Company, Limited Pattern forming material
AU584924B2 (en) * 1984-10-23 1989-06-08 Mitsubishi Chemical Corporation Photosensitive planographic printing plate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU584924B2 (en) * 1984-10-23 1989-06-08 Mitsubishi Chemical Corporation Photosensitive planographic printing plate
EP0304313A2 (en) * 1987-08-21 1989-02-22 Oki Electric Industry Company, Limited Pattern forming material
EP0304313A3 (en) * 1987-08-21 1990-08-22 Oki Electric Industry Company, Limited Pattern forming material

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee