BE841797A - PHOTOSENSITIVE COMPOSITIONS AND THEIR APPLICATION - Google Patents
PHOTOSENSITIVE COMPOSITIONS AND THEIR APPLICATIONInfo
- Publication number
- BE841797A BE841797A BE167002A BE167002A BE841797A BE 841797 A BE841797 A BE 841797A BE 167002 A BE167002 A BE 167002A BE 167002 A BE167002 A BE 167002A BE 841797 A BE841797 A BE 841797A
- Authority
- BE
- Belgium
- Prior art keywords
- application
- photosensitive compositions
- photosensitive
- compositions
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/06—Silver salts
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US58833475A | 1975-06-19 | 1975-06-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE841797A true BE841797A (en) | 1976-09-01 |
Family
ID=24353419
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE167002A BE841797A (en) | 1975-06-19 | 1976-05-13 | PHOTOSENSITIVE COMPOSITIONS AND THEIR APPLICATION |
Country Status (12)
| Country | Link |
|---|---|
| JP (1) | JPS5936731B2 (en) |
| BE (1) | BE841797A (en) |
| CA (1) | CA1091969A (en) |
| CH (1) | CH633893A5 (en) |
| DE (1) | DE2626066A1 (en) |
| DK (1) | DK232276A (en) |
| FR (1) | FR2315110A1 (en) |
| GB (1) | GB1548764A (en) |
| IT (1) | IT1061234B (en) |
| NL (1) | NL7604774A (en) |
| NO (1) | NO762006L (en) |
| SE (1) | SE422847B (en) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52154627A (en) * | 1976-06-18 | 1977-12-22 | Fuji Photo Film Co Ltd | Silver halide light sensitive material |
| JPS52154626A (en) * | 1976-06-18 | 1977-12-22 | Fuji Photo Film Co Ltd | Silver halide light sensitive material |
| JPS5518621A (en) * | 1978-07-26 | 1980-02-08 | Fuji Photo Film Co Ltd | Photosensitive lithographic printing plate |
| DE2834059A1 (en) * | 1978-08-03 | 1980-02-14 | Hoechst Ag | LIGHT SENSITIVE COPY MATERIAL AND METHOD FOR THE PRODUCTION THEREOF |
| JPS5823026A (en) * | 1981-08-04 | 1983-02-10 | Nippon Paint Co Ltd | Water developable material for lithographic plate |
| JPS58174939A (en) * | 1982-03-18 | 1983-10-14 | Konishiroku Photo Ind Co Ltd | Image forming material |
| US4551415A (en) * | 1982-04-22 | 1985-11-05 | E. I. Du Pont De Nemours And Company | Photosensitive coatings containing crosslinked beads |
| US4601970A (en) * | 1982-04-22 | 1986-07-22 | E. I. Du Pont De Nemours And Company | Dry photosensitive film containing crosslinked beads |
| US4668604A (en) * | 1982-04-22 | 1987-05-26 | E.I. Du Pont De Nemours And Company | Positive-working photosensitive elements containing crosslinked beads and process of use |
| DE3328019A1 (en) * | 1982-09-21 | 1984-03-22 | Polychrome Corp., 10702 Yonkers, N.Y. | PRESSURE PLATE DEVELOPABLE WITH WATER |
| GB2273366B (en) * | 1992-11-18 | 1996-03-27 | Du Pont | Forming images on radiation-sensitive plates |
| US5688627A (en) * | 1996-07-02 | 1997-11-18 | Precision Lithograining Corp. | Light sensitive diazonium compounds having both bisulfate and zincate parts, method of making the compounds and compositions utilizing them |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3382069A (en) * | 1964-06-18 | 1968-05-07 | Azoplate Corp | Planographic printing plate |
| GB1469941A (en) * | 1973-04-10 | 1977-04-06 | Andrews Paper & Chem Co Inc | Diazotype reproduction layer |
-
1976
- 1976-04-02 CA CA249,489A patent/CA1091969A/en not_active Expired
- 1976-04-12 GB GB14886/76A patent/GB1548764A/en not_active Expired
- 1976-04-28 CH CH534076A patent/CH633893A5/en not_active IP Right Cessation
- 1976-05-03 IT IT49301/76A patent/IT1061234B/en active
- 1976-05-03 FR FR7613143A patent/FR2315110A1/en active Granted
- 1976-05-04 SE SE7605083A patent/SE422847B/en unknown
- 1976-05-05 NL NL7604774A patent/NL7604774A/en not_active Application Discontinuation
- 1976-05-13 BE BE167002A patent/BE841797A/en not_active IP Right Cessation
- 1976-05-26 DK DK232276A patent/DK232276A/en not_active Application Discontinuation
- 1976-06-08 JP JP51067029A patent/JPS5936731B2/en not_active Expired
- 1976-06-10 NO NO762006A patent/NO762006L/no unknown
- 1976-06-10 DE DE19762626066 patent/DE2626066A1/en not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| JPS522520A (en) | 1977-01-10 |
| FR2315110B1 (en) | 1981-11-13 |
| IT1061234B (en) | 1983-02-28 |
| CH633893A5 (en) | 1982-12-31 |
| DK232276A (en) | 1976-12-20 |
| GB1548764A (en) | 1979-07-18 |
| NO762006L (en) | 1976-12-21 |
| SE7605083L (en) | 1976-12-20 |
| NL7604774A (en) | 1976-12-21 |
| FR2315110A1 (en) | 1977-01-14 |
| DE2626066A1 (en) | 1977-01-20 |
| SE422847B (en) | 1982-03-29 |
| JPS5936731B2 (en) | 1984-09-05 |
| CA1091969A (en) | 1980-12-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RE | Patent lapsed |
Owner name: NAPP SYSTEMS INC. Effective date: 19860531 |