DK232276A - LIGHT SENSITIVE UNDER HIND STRUCTURE - Google Patents

LIGHT SENSITIVE UNDER HIND STRUCTURE

Info

Publication number
DK232276A
DK232276A DK232276A DK232276A DK232276A DK 232276 A DK232276 A DK 232276A DK 232276 A DK232276 A DK 232276A DK 232276 A DK232276 A DK 232276A DK 232276 A DK232276 A DK 232276A
Authority
DK
Denmark
Prior art keywords
light sensitive
sensitive under
hind
under hind
light
Prior art date
Application number
DK232276A
Other languages
Danish (da)
Inventor
R W Hallman
Original Assignee
Napp Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Napp Systems Inc filed Critical Napp Systems Inc
Publication of DK232276A publication Critical patent/DK232276A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/06—Silver salts

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Formation Of Insulating Films (AREA)
DK232276A 1975-06-19 1976-05-26 LIGHT SENSITIVE UNDER HIND STRUCTURE DK232276A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US58833475A 1975-06-19 1975-06-19

Publications (1)

Publication Number Publication Date
DK232276A true DK232276A (en) 1976-12-20

Family

ID=24353419

Family Applications (1)

Application Number Title Priority Date Filing Date
DK232276A DK232276A (en) 1975-06-19 1976-05-26 LIGHT SENSITIVE UNDER HIND STRUCTURE

Country Status (12)

Country Link
JP (1) JPS5936731B2 (en)
BE (1) BE841797A (en)
CA (1) CA1091969A (en)
CH (1) CH633893A5 (en)
DE (1) DE2626066A1 (en)
DK (1) DK232276A (en)
FR (1) FR2315110A1 (en)
GB (1) GB1548764A (en)
IT (1) IT1061234B (en)
NL (1) NL7604774A (en)
NO (1) NO762006L (en)
SE (1) SE422847B (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52154626A (en) * 1976-06-18 1977-12-22 Fuji Photo Film Co Ltd Silver halide light sensitive material
JPS52154627A (en) * 1976-06-18 1977-12-22 Fuji Photo Film Co Ltd Silver halide light sensitive material
JPS5518621A (en) * 1978-07-26 1980-02-08 Fuji Photo Film Co Ltd Photosensitive lithographic printing plate
DE2834059A1 (en) * 1978-08-03 1980-02-14 Hoechst Ag LIGHT SENSITIVE COPY MATERIAL AND METHOD FOR THE PRODUCTION THEREOF
JPS5823026A (en) * 1981-08-04 1983-02-10 Nippon Paint Co Ltd Water developable material for lithographic plate
JPS58174939A (en) * 1982-03-18 1983-10-14 Konishiroku Photo Ind Co Ltd Image forming material
US4551415A (en) * 1982-04-22 1985-11-05 E. I. Du Pont De Nemours And Company Photosensitive coatings containing crosslinked beads
US4601970A (en) * 1982-04-22 1986-07-22 E. I. Du Pont De Nemours And Company Dry photosensitive film containing crosslinked beads
US4668604A (en) * 1982-04-22 1987-05-26 E.I. Du Pont De Nemours And Company Positive-working photosensitive elements containing crosslinked beads and process of use
DE3328019A1 (en) * 1982-09-21 1984-03-22 Polychrome Corp., 10702 Yonkers, N.Y. PRESSURE PLATE DEVELOPABLE WITH WATER
GB2273366B (en) * 1992-11-18 1996-03-27 Du Pont Forming images on radiation-sensitive plates
US5688627A (en) * 1996-07-02 1997-11-18 Precision Lithograining Corp. Light sensitive diazonium compounds having both bisulfate and zincate parts, method of making the compounds and compositions utilizing them

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3382069A (en) * 1964-06-18 1968-05-07 Azoplate Corp Planographic printing plate
GB1469941A (en) * 1973-04-10 1977-04-06 Andrews Paper & Chem Co Inc Diazotype reproduction layer

Also Published As

Publication number Publication date
FR2315110A1 (en) 1977-01-14
NL7604774A (en) 1976-12-21
FR2315110B1 (en) 1981-11-13
NO762006L (en) 1976-12-21
SE7605083L (en) 1976-12-20
JPS5936731B2 (en) 1984-09-05
DE2626066A1 (en) 1977-01-20
IT1061234B (en) 1983-02-28
JPS522520A (en) 1977-01-10
CA1091969A (en) 1980-12-23
BE841797A (en) 1976-09-01
GB1548764A (en) 1979-07-18
SE422847B (en) 1982-03-29
CH633893A5 (en) 1982-12-31

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Legal Events

Date Code Title Description
AHB Application shelved due to non-payment