JPS5465037A - Developing method for photosensitive resin by oxygen plasma - Google Patents
Developing method for photosensitive resin by oxygen plasmaInfo
- Publication number
- JPS5465037A JPS5465037A JP13073477A JP13073477A JPS5465037A JP S5465037 A JPS5465037 A JP S5465037A JP 13073477 A JP13073477 A JP 13073477A JP 13073477 A JP13073477 A JP 13073477A JP S5465037 A JPS5465037 A JP S5465037A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive resin
- oxygen plasma
- tetrazonium
- salt
- polyvinylalcohol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Drying Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To easily form a pattern in a finely divided resin, by developing a photosensitive resin consisting of polyvinylalcohol and a tetrazonium salt (or a diazonium salt) after exposure using oxygen plasma. CONSTITUTION:A photosensitive resin is formed by mixing a tetrazonium salt such as o-dianisidine-tetrazonium chloride represented by formula I or a diazonium salt such as o-dimethoxydiazonium sulfate represented by formula II with polyvinylalcohol saponified to about 80 % in an amount of about 2-5 wt.% based on the total wt. of photosensitive resin. The photosensitive resin film thus prepared is exposed to light and then developed by selectively converting the unexposed parts into ash using oxygen plasma excited with a power of about 100 watts in a vacuum of 3 Torrs, for example, in a plasma machine with a tunnel.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13073477A JPS6030932B2 (en) | 1977-11-02 | 1977-11-02 | Method for developing photosensitive resin using oxygen plasma |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13073477A JPS6030932B2 (en) | 1977-11-02 | 1977-11-02 | Method for developing photosensitive resin using oxygen plasma |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5465037A true JPS5465037A (en) | 1979-05-25 |
JPS6030932B2 JPS6030932B2 (en) | 1985-07-19 |
Family
ID=15041343
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13073477A Expired JPS6030932B2 (en) | 1977-11-02 | 1977-11-02 | Method for developing photosensitive resin using oxygen plasma |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6030932B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS582025A (en) * | 1981-06-29 | 1983-01-07 | Fujitsu Ltd | Pattern formation |
EP3367164A1 (en) * | 2017-02-22 | 2018-08-29 | Shin-Etsu Chemical Co., Ltd. | Pattern forming process |
-
1977
- 1977-11-02 JP JP13073477A patent/JPS6030932B2/en not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS582025A (en) * | 1981-06-29 | 1983-01-07 | Fujitsu Ltd | Pattern formation |
JPS6364773B2 (en) * | 1981-06-29 | 1988-12-13 | ||
EP3367164A1 (en) * | 2017-02-22 | 2018-08-29 | Shin-Etsu Chemical Co., Ltd. | Pattern forming process |
US11256174B2 (en) | 2017-02-22 | 2022-02-22 | Shin-Etsu Chemical Co., Ltd. | Pattern forming process |
Also Published As
Publication number | Publication date |
---|---|
JPS6030932B2 (en) | 1985-07-19 |
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