JPS5465037A - Developing method for photosensitive resin by oxygen plasma - Google Patents

Developing method for photosensitive resin by oxygen plasma

Info

Publication number
JPS5465037A
JPS5465037A JP13073477A JP13073477A JPS5465037A JP S5465037 A JPS5465037 A JP S5465037A JP 13073477 A JP13073477 A JP 13073477A JP 13073477 A JP13073477 A JP 13073477A JP S5465037 A JPS5465037 A JP S5465037A
Authority
JP
Japan
Prior art keywords
photosensitive resin
oxygen plasma
tetrazonium
salt
polyvinylalcohol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13073477A
Other languages
Japanese (ja)
Other versions
JPS6030932B2 (en
Inventor
Masao Kanazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13073477A priority Critical patent/JPS6030932B2/en
Publication of JPS5465037A publication Critical patent/JPS5465037A/en
Publication of JPS6030932B2 publication Critical patent/JPS6030932B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To easily form a pattern in a finely divided resin, by developing a photosensitive resin consisting of polyvinylalcohol and a tetrazonium salt (or a diazonium salt) after exposure using oxygen plasma. CONSTITUTION:A photosensitive resin is formed by mixing a tetrazonium salt such as o-dianisidine-tetrazonium chloride represented by formula I or a diazonium salt such as o-dimethoxydiazonium sulfate represented by formula II with polyvinylalcohol saponified to about 80 % in an amount of about 2-5 wt.% based on the total wt. of photosensitive resin. The photosensitive resin film thus prepared is exposed to light and then developed by selectively converting the unexposed parts into ash using oxygen plasma excited with a power of about 100 watts in a vacuum of 3 Torrs, for example, in a plasma machine with a tunnel.
JP13073477A 1977-11-02 1977-11-02 Method for developing photosensitive resin using oxygen plasma Expired JPS6030932B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13073477A JPS6030932B2 (en) 1977-11-02 1977-11-02 Method for developing photosensitive resin using oxygen plasma

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13073477A JPS6030932B2 (en) 1977-11-02 1977-11-02 Method for developing photosensitive resin using oxygen plasma

Publications (2)

Publication Number Publication Date
JPS5465037A true JPS5465037A (en) 1979-05-25
JPS6030932B2 JPS6030932B2 (en) 1985-07-19

Family

ID=15041343

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13073477A Expired JPS6030932B2 (en) 1977-11-02 1977-11-02 Method for developing photosensitive resin using oxygen plasma

Country Status (1)

Country Link
JP (1) JPS6030932B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS582025A (en) * 1981-06-29 1983-01-07 Fujitsu Ltd Pattern formation
EP3367164A1 (en) * 2017-02-22 2018-08-29 Shin-Etsu Chemical Co., Ltd. Pattern forming process

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS582025A (en) * 1981-06-29 1983-01-07 Fujitsu Ltd Pattern formation
JPS6364773B2 (en) * 1981-06-29 1988-12-13
EP3367164A1 (en) * 2017-02-22 2018-08-29 Shin-Etsu Chemical Co., Ltd. Pattern forming process
US11256174B2 (en) 2017-02-22 2022-02-22 Shin-Etsu Chemical Co., Ltd. Pattern forming process

Also Published As

Publication number Publication date
JPS6030932B2 (en) 1985-07-19

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