DE845732C - Bad fuer die galvanische Vernickelung - Google Patents
Bad fuer die galvanische VernickelungInfo
- Publication number
- DE845732C DE845732C DEU622A DEU0000622A DE845732C DE 845732 C DE845732 C DE 845732C DE U622 A DEU622 A DE U622A DE U0000622 A DEU0000622 A DE U0000622A DE 845732 C DE845732 C DE 845732C
- Authority
- DE
- Germany
- Prior art keywords
- nickel
- bath
- sulfonic acids
- acid
- acids
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims description 54
- 229910052759 nickel Inorganic materials 0.000 title claims description 31
- 238000007747 plating Methods 0.000 title claims description 5
- -1 Nickel salt Chemical class 0.000 claims description 15
- 239000002244 precipitate Substances 0.000 claims description 14
- 150000003839 salts Chemical class 0.000 claims description 12
- 229910052708 sodium Inorganic materials 0.000 claims description 11
- 239000011734 sodium Substances 0.000 claims description 11
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 claims description 10
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 claims description 10
- 230000002378 acidificating effect Effects 0.000 claims description 8
- 125000001931 aliphatic group Chemical group 0.000 claims description 8
- 239000002253 acid Substances 0.000 claims description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 6
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 claims description 6
- BDAGIHXWWSANSR-UHFFFAOYSA-N Formic acid Chemical compound OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims description 5
- 230000009286 beneficial effect Effects 0.000 claims description 5
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 claims description 5
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 claims description 5
- 238000001556 precipitation Methods 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- UIIIBRHUICCMAI-UHFFFAOYSA-N prop-2-ene-1-sulfonic acid Chemical compound OS(=O)(=O)CC=C UIIIBRHUICCMAI-UHFFFAOYSA-N 0.000 claims description 4
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 claims description 3
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 2
- 239000004327 boric acid Substances 0.000 claims description 2
- 235000019253 formic acid Nutrition 0.000 claims description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 2
- 229920002554 vinyl polymer Polymers 0.000 claims description 2
- 150000007513 acids Chemical class 0.000 claims 3
- 238000005868 electrolysis reaction Methods 0.000 claims 3
- 229910052739 hydrogen Inorganic materials 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 3
- 150000002894 organic compounds Chemical class 0.000 claims 3
- 230000037390 scarring Effects 0.000 claims 3
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical class C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 claims 2
- 150000003460 sulfonic acids Chemical class 0.000 claims 2
- YKNMZQYYTVPBGI-UHFFFAOYSA-N 2-bromoethenesulfonic acid Chemical compound OS(=O)(=O)C=CBr YKNMZQYYTVPBGI-UHFFFAOYSA-N 0.000 claims 1
- GDCLCDLNVCJAMI-UHFFFAOYSA-N 2-chloroethenesulfonic acid Chemical compound OS(=O)(=O)C=CCl GDCLCDLNVCJAMI-UHFFFAOYSA-N 0.000 claims 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 241000080590 Niso Species 0.000 claims 1
- 239000000654 additive Substances 0.000 claims 1
- 125000005228 aryl sulfonate group Chemical group 0.000 claims 1
- 150000008107 benzenesulfonic acids Chemical class 0.000 claims 1
- 239000006260 foam Substances 0.000 claims 1
- 150000002431 hydrogen Chemical class 0.000 claims 1
- 150000002815 nickel Chemical class 0.000 claims 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 claims 1
- 239000011780 sodium chloride Substances 0.000 claims 1
- 230000001629 suppression Effects 0.000 claims 1
- 239000000080 wetting agent Substances 0.000 claims 1
- 230000000694 effects Effects 0.000 description 6
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- VVJKKWFAADXIJK-UHFFFAOYSA-N Allylamine Chemical compound NCC=C VVJKKWFAADXIJK-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 239000000872 buffer Substances 0.000 description 2
- 229910052793 cadmium Inorganic materials 0.000 description 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- XTEGVFVZDVNBPF-UHFFFAOYSA-N naphthalene-1,5-disulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1S(O)(=O)=O XTEGVFVZDVNBPF-UHFFFAOYSA-N 0.000 description 2
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- RILZRCJGXSFXNE-UHFFFAOYSA-N 2-[4-(trifluoromethoxy)phenyl]ethanol Chemical compound OCCC1=CC=C(OC(F)(F)F)C=C1 RILZRCJGXSFXNE-UHFFFAOYSA-N 0.000 description 1
- OQFSYHWITGFERZ-UHFFFAOYSA-N 2-bromoethanesulfonic acid Chemical class OS(=O)(=O)CCBr OQFSYHWITGFERZ-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 229910003251 Na K Inorganic materials 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 229940000488 arsenic acid Drugs 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-N ethanesulfonic acid Chemical class CCS(O)(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-N 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000010985 leather Substances 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 150000002730 mercury Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 1
- QFVGCVZHAQQIMT-UHFFFAOYSA-L nickel(2+);prop-2-enoate Chemical compound [Ni+2].[O-]C(=O)C=C.[O-]C(=O)C=C QFVGCVZHAQQIMT-UHFFFAOYSA-L 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- VPJDULFXCAQHRC-UHFFFAOYSA-N prop-2-enylurea Chemical compound NC(=O)NCC=C VPJDULFXCAQHRC-UHFFFAOYSA-N 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- CESKLHVYGRFMFP-UHFFFAOYSA-N sulfonmethane Chemical compound CCS(=O)(=O)C(C)(C)S(=O)(=O)CC CESKLHVYGRFMFP-UHFFFAOYSA-N 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US603753A US2523190A (en) | 1945-07-07 | 1945-07-07 | Electrodeposition of nickel from an acid bath |
Publications (1)
Publication Number | Publication Date |
---|---|
DE845732C true DE845732C (de) | 1952-08-04 |
Family
ID=24416763
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DEU622A Expired DE845732C (de) | 1945-07-07 | 1950-09-24 | Bad fuer die galvanische Vernickelung |
Country Status (4)
Country | Link |
---|---|
US (1) | US2523190A (en:Method) |
DE (1) | DE845732C (en:Method) |
FR (1) | FR955898A (en:Method) |
GB (1) | GB611483A (en:Method) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1204044B (de) * | 1958-04-26 | 1965-10-28 | Dehydag Gmbh | Glanzgebende galvanische Metallbaeder |
DE4221970A1 (de) * | 1992-06-30 | 1994-01-05 | Schering Ag | Verwendung von Alkenylen und Alkinylen als Zusätze in galvanischen Metallabscheidungsbädern |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE511322A (en:Method) * | 1946-04-20 | |||
DE1004009B (de) * | 1953-08-13 | 1957-03-07 | Dehydag Gmbh | Galvanische Baeder zur Herstellung von Metallueberzuegen |
US3109784A (en) * | 1960-11-21 | 1963-11-05 | Incar Inc | Copper plating composition and process |
US3095362A (en) * | 1960-11-21 | 1963-06-25 | Incar Inc | Zinc plating composition and process |
US3152975A (en) * | 1961-02-07 | 1964-10-13 | Hanson Van Winkle Munning Co | Electrodeposition of nickel |
US3417005A (en) * | 1965-12-27 | 1968-12-17 | Gen Motors Corp | Neutral nickel-plating process and bath therefor |
GB2171114A (en) * | 1985-02-06 | 1986-08-20 | Canning W Materials Ltd | Trivalent chromium electroplating baths and rejuvenation thereof |
US6045682A (en) * | 1998-03-24 | 2000-04-04 | Enthone-Omi, Inc. | Ductility agents for nickel-tungsten alloys |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1818229A (en) * | 1928-02-23 | 1931-08-11 | Grasselli Chemical Co | Electroplating |
US2029387A (en) * | 1934-03-14 | 1936-02-04 | Harshaw Chem Corp | Method and means of electrodeposition |
US2112818A (en) * | 1934-08-15 | 1938-03-29 | Mcgean Chem Co Inc | Electrodeposition of metals |
US2125229A (en) * | 1936-04-14 | 1938-07-26 | Harshaw Chem Corp | Electrodeposition of metals |
US2171842A (en) * | 1936-07-13 | 1939-09-05 | Du Pont | Electroplating |
US2198267A (en) * | 1939-12-14 | 1940-04-23 | Harshaw Chem Corp | Electrodeposition of metals |
-
0
- FR FR955898D patent/FR955898A/fr not_active Expired
-
1945
- 1945-07-07 US US603753A patent/US2523190A/en not_active Expired - Lifetime
-
1946
- 1946-05-02 GB GB13288/46A patent/GB611483A/en not_active Expired
-
1950
- 1950-09-24 DE DEU622A patent/DE845732C/de not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1204044B (de) * | 1958-04-26 | 1965-10-28 | Dehydag Gmbh | Glanzgebende galvanische Metallbaeder |
DE4221970A1 (de) * | 1992-06-30 | 1994-01-05 | Schering Ag | Verwendung von Alkenylen und Alkinylen als Zusätze in galvanischen Metallabscheidungsbädern |
Also Published As
Publication number | Publication date |
---|---|
US2523190A (en) | 1950-09-19 |
GB611483A (en) | 1948-10-29 |
FR955898A (en:Method) | 1950-01-20 |
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