DE69834020D1 - Kapazitiv gekoppelter rf plasmareaktor und verfahren zur herstellung von werkstücken - Google Patents

Kapazitiv gekoppelter rf plasmareaktor und verfahren zur herstellung von werkstücken

Info

Publication number
DE69834020D1
DE69834020D1 DE69834020T DE69834020T DE69834020D1 DE 69834020 D1 DE69834020 D1 DE 69834020D1 DE 69834020 T DE69834020 T DE 69834020T DE 69834020 T DE69834020 T DE 69834020T DE 69834020 D1 DE69834020 D1 DE 69834020D1
Authority
DE
Germany
Prior art keywords
capacitively coupled
plasma reactor
producing workpieces
workpieces
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69834020T
Other languages
English (en)
Other versions
DE69834020T2 (de
Inventor
Jerome Perrin
Mustapha Elyaakoubi
Jacques Schmitt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OC Oerlikon Balzers AG
Original Assignee
Unaxis Balzers AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Unaxis Balzers AG filed Critical Unaxis Balzers AG
Application granted granted Critical
Publication of DE69834020D1 publication Critical patent/DE69834020D1/de
Publication of DE69834020T2 publication Critical patent/DE69834020T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32541—Shape

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
DE69834020T 1997-01-17 1998-01-13 Kapazitiv gekoppelter rf plasmareaktor und verfahren zur herstellung von werkstücken Expired - Lifetime DE69834020T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US784578 1997-01-17
US08/784,578 US5981899A (en) 1997-01-17 1997-01-17 Capacitively coupled RF-plasma reactor
PCT/IB1998/000043 WO1998032154A1 (en) 1997-01-17 1998-01-13 Capacitively coupled rf-plasma reactor

Publications (2)

Publication Number Publication Date
DE69834020D1 true DE69834020D1 (de) 2006-05-18
DE69834020T2 DE69834020T2 (de) 2006-09-14

Family

ID=25132884

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69834020T Expired - Lifetime DE69834020T2 (de) 1997-01-17 1998-01-13 Kapazitiv gekoppelter rf plasmareaktor und verfahren zur herstellung von werkstücken

Country Status (8)

Country Link
US (2) US5981899A (de)
EP (1) EP0953204B1 (de)
JP (1) JP4773591B2 (de)
KR (1) KR100523766B1 (de)
DE (1) DE69834020T2 (de)
ES (1) ES2262218T3 (de)
TW (1) TW423045B (de)
WO (1) WO1998032154A1 (de)

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Also Published As

Publication number Publication date
JP4773591B2 (ja) 2011-09-14
JP2001508923A (ja) 2001-07-03
DE69834020T2 (de) 2006-09-14
EP0953204B1 (de) 2006-03-29
US5981899A (en) 1999-11-09
KR20000070265A (ko) 2000-11-25
TW423045B (en) 2001-02-21
US6281469B1 (en) 2001-08-28
EP0953204A1 (de) 1999-11-03
ES2262218T3 (es) 2006-11-16
WO1998032154A1 (en) 1998-07-23
KR100523766B1 (ko) 2005-10-25

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