DE602006013328D1 - Plasmaquelle mit Vielzahl phasenversetzter Elektroden - Google Patents

Plasmaquelle mit Vielzahl phasenversetzter Elektroden

Info

Publication number
DE602006013328D1
DE602006013328D1 DE602006013328T DE602006013328T DE602006013328D1 DE 602006013328 D1 DE602006013328 D1 DE 602006013328D1 DE 602006013328 T DE602006013328 T DE 602006013328T DE 602006013328 T DE602006013328 T DE 602006013328T DE 602006013328 D1 DE602006013328 D1 DE 602006013328D1
Authority
DE
Germany
Prior art keywords
phase
electrodes
plasma source
large number
shifted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006013328T
Other languages
English (en)
Inventor
Albert Rogers Ellingboe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dublin City University
Original Assignee
Dublin City University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dublin City University filed Critical Dublin City University
Publication of DE602006013328D1 publication Critical patent/DE602006013328D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H01J37/32165—Plural frequencies
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Preliminary Treatment Of Fibers (AREA)
DE602006013328T 2006-11-10 2006-11-10 Plasmaquelle mit Vielzahl phasenversetzter Elektroden Active DE602006013328D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP06123896A EP1921655B1 (de) 2006-11-10 2006-11-10 Plasmaquelle mit Vielzahl phasenversetzter Elektroden

Publications (1)

Publication Number Publication Date
DE602006013328D1 true DE602006013328D1 (de) 2010-05-12

Family

ID=37908152

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006013328T Active DE602006013328D1 (de) 2006-11-10 2006-11-10 Plasmaquelle mit Vielzahl phasenversetzter Elektroden

Country Status (6)

Country Link
EP (1) EP1921655B1 (de)
AT (1) ATE463042T1 (de)
DE (1) DE602006013328D1 (de)
ES (1) ES2343264T3 (de)
MY (1) MY147816A (de)
WO (1) WO2008055993A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2466836A (en) 2009-01-12 2010-07-14 Phive Plasma Technologies Ltd Plasma source tile electrode
KR101842675B1 (ko) 2009-07-08 2018-03-27 플라즈마시, 인크. 플라즈마 처리를 위한 장치 및 방법
US8765232B2 (en) 2011-01-10 2014-07-01 Plasmasi, Inc. Apparatus and method for dielectric deposition
US9299956B2 (en) 2012-06-13 2016-03-29 Aixtron, Inc. Method for deposition of high-performance coatings and encapsulated electronic devices
US10526708B2 (en) 2012-06-19 2020-01-07 Aixtron Se Methods for forming thin protective and optical layers on substrates
US10354838B1 (en) 2018-10-10 2019-07-16 Lam Research Corporation RF antenna producing a uniform near-field Poynting vector

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07226395A (ja) * 1994-02-15 1995-08-22 Matsushita Electric Ind Co Ltd 真空プラズマ処理装置
US6042686A (en) * 1995-06-30 2000-03-28 Lam Research Corporation Power segmented electrode
US5981899A (en) * 1997-01-17 1999-11-09 Balzers Aktiengesellschaft Capacitively coupled RF-plasma reactor
WO2001012350A1 (en) * 1999-08-16 2001-02-22 The University Of Tennessee Research Corporation Cleaning surfaces with a thermal-non-equilibrium glow discharge plasma at high pressure
US6706138B2 (en) * 2001-08-16 2004-03-16 Applied Materials Inc. Adjustable dual frequency voltage dividing plasma reactor
IES20050301A2 (en) * 2005-05-11 2006-11-15 Univ Dublin City Plasma source

Also Published As

Publication number Publication date
MY147816A (en) 2013-01-31
WO2008055993A1 (en) 2008-05-15
EP1921655B1 (de) 2010-03-31
ES2343264T3 (es) 2010-07-27
ATE463042T1 (de) 2010-04-15
EP1921655A1 (de) 2008-05-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition