JPS57192268A - Dry etching apparatus - Google Patents
Dry etching apparatusInfo
- Publication number
- JPS57192268A JPS57192268A JP7624381A JP7624381A JPS57192268A JP S57192268 A JPS57192268 A JP S57192268A JP 7624381 A JP7624381 A JP 7624381A JP 7624381 A JP7624381 A JP 7624381A JP S57192268 A JPS57192268 A JP S57192268A
- Authority
- JP
- Japan
- Prior art keywords
- cathode
- magnetic
- section
- sample
- closed loop
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To increase the dry etching speed of the titled apparatus, by tapering off the upper surface outer peripheral section of a permanent magnet provided outside a magnetic field closed loop.
CONSTITUTION: A cathode 2 (a discharge electrode) of a non-magnetic material, or stainless steel, is opposed to a wall of a stainless decompression apparatus 1, and is connected via a matching circuit 3 with a high-frequency electric source 4. A magnetic means is provided in a non-contact state to the undersurface of the cathode 2, i.e. permanent magnets 10-aWe supported by iron pole piece 9 are arranged. The upper surface outer periphery section 37, that is, part of the magnetic means, of the permanent magnet outside the orthogonal magnetic field is tapered off. As a result, the electromagnetic field normal to the electric field at the section 37 becomes almost zero, the high-frequency electric power is predominantly consumed on the gap 15 to generate a lot of ions, and an arcuate magnetic line closed loop is formed over the surface of the cathode 2. The piece 9 is reciprocated by a motor 11 for a sample 12 on the cathode 2 to etch the desired whole surface of the sample 12.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7624381A JPS57192268A (en) | 1981-05-19 | 1981-05-19 | Dry etching apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7624381A JPS57192268A (en) | 1981-05-19 | 1981-05-19 | Dry etching apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57192268A true JPS57192268A (en) | 1982-11-26 |
Family
ID=13599733
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7624381A Pending JPS57192268A (en) | 1981-05-19 | 1981-05-19 | Dry etching apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57192268A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5810830A (en) * | 1981-07-10 | 1983-01-21 | Seiko Epson Corp | Dry etching device |
JPH04137926U (en) * | 1991-06-18 | 1992-12-22 | アラコ株式会社 | infant seat |
JP2001508923A (en) * | 1997-01-17 | 2001-07-03 | ユナキス・バルツェルス・アクチェンゲゼルシャフト | Capacitively coupled RF plasma reaction chamber |
JP2005026233A (en) * | 1996-10-02 | 2005-01-27 | Tokyo Electron Ltd | Plasma processing device |
JP2009231692A (en) * | 2008-03-25 | 2009-10-08 | Tokyo Electron Ltd | Plasma processing apparatus |
-
1981
- 1981-05-19 JP JP7624381A patent/JPS57192268A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5810830A (en) * | 1981-07-10 | 1983-01-21 | Seiko Epson Corp | Dry etching device |
JPH04137926U (en) * | 1991-06-18 | 1992-12-22 | アラコ株式会社 | infant seat |
JP2005026233A (en) * | 1996-10-02 | 2005-01-27 | Tokyo Electron Ltd | Plasma processing device |
JP2001508923A (en) * | 1997-01-17 | 2001-07-03 | ユナキス・バルツェルス・アクチェンゲゼルシャフト | Capacitively coupled RF plasma reaction chamber |
JP2009231692A (en) * | 2008-03-25 | 2009-10-08 | Tokyo Electron Ltd | Plasma processing apparatus |
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