JPS57192267A - Dry etching apparatus - Google Patents
Dry etching apparatusInfo
- Publication number
- JPS57192267A JPS57192267A JP7422881A JP7422881A JPS57192267A JP S57192267 A JPS57192267 A JP S57192267A JP 7422881 A JP7422881 A JP 7422881A JP 7422881 A JP7422881 A JP 7422881A JP S57192267 A JPS57192267 A JP S57192267A
- Authority
- JP
- Japan
- Prior art keywords
- cathode
- magnetic
- section
- sample
- closed loop
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE: To increase the dry etching speed of the titled apparatus, by tapering off the upper surface outer peripheral section of a permanent magnet provided outside a magnetic field closed loop.
CONSTITUTION: A cathode 2 (a discharge electrode) of a non-magnetic material, or stainless steel, is opposed to a wall of a stainless decompression apparatus 1, and is connected via a matching circuit 3 with a high-frequency electric source 4. A magnetic means is provided in a non-contact state to the undersurface of the cathode 2, i.e. permanent magnets 10-aWe supported by iron pole piece 9 are arranged. The upper surface outer periphery section 37, that is, part of the magnetic means, of the permanent magnet outside the orthogonal magnetic field is tapered off. As a result, the electromagnetic field normal to the electric field at the section 37 becomes almost zero, the high-frequency electric power is predominantly consumed on the gap 15 to generate a lot of ions, and an arcuate magnetic line closed loop is formed over the surface of the cathode 2. The piece 9 is reciprocated by a motor 11 for a sample 12 on the cathode 2 to etch the desired whole surface of the sample 12.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7422881A JPS57192267A (en) | 1981-05-19 | 1981-05-19 | Dry etching apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7422881A JPS57192267A (en) | 1981-05-19 | 1981-05-19 | Dry etching apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57192267A true JPS57192267A (en) | 1982-11-26 |
Family
ID=13541101
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7422881A Pending JPS57192267A (en) | 1981-05-19 | 1981-05-19 | Dry etching apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57192267A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6339170U (en) * | 1986-08-27 | 1988-03-14 | ||
JPS63109181A (en) * | 1986-10-23 | 1988-05-13 | Anelva Corp | Method and device for taper etching |
-
1981
- 1981-05-19 JP JP7422881A patent/JPS57192267A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6339170U (en) * | 1986-08-27 | 1988-03-14 | ||
JPS63109181A (en) * | 1986-10-23 | 1988-05-13 | Anelva Corp | Method and device for taper etching |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5782955A (en) | Microwave plasma generating apparatus | |
EP0247397A3 (en) | Apparatus for the surface treatment of work pieces | |
JPS57192268A (en) | Dry etching apparatus | |
JPS57164986A (en) | Microwave plasma etching device | |
JPS5728553A (en) | Induction motor | |
JPS5571162A (en) | Rotary electric machine | |
JPS57203781A (en) | Plasma working device | |
JPS57192267A (en) | Dry etching apparatus | |
JPS57159025A (en) | Method and device for dry etching | |
JPS6432631A (en) | Etching device | |
JPS5743986A (en) | Film forming apparatus | |
JPS648624A (en) | Plasma apparatus | |
JPS53142139A (en) | Magnetic circuit for magnetic bubble | |
JPS6442130A (en) | Sputter etching device | |
JPS6457622A (en) | Reactive ion etching system | |
JPS57190321A (en) | Dry etching method | |
JPS5566269A (en) | Rotating apparatus | |
JPS5561274A (en) | Magnetic power machine | |
SU732128A1 (en) | Device for magnetoabrasive treatment | |
JPS58170016A (en) | Plasma etching device | |
RU1808610C (en) | Magnetic plate | |
JPS642321A (en) | Plasma etching device | |
SU1363388A1 (en) | Field structure of electric machine | |
JPS53107821A (en) | Electromagnetic drive device for cameras | |
JPS5240026A (en) | High-speed printing equipment |