JPS57192267A - Dry etching apparatus - Google Patents

Dry etching apparatus

Info

Publication number
JPS57192267A
JPS57192267A JP7422881A JP7422881A JPS57192267A JP S57192267 A JPS57192267 A JP S57192267A JP 7422881 A JP7422881 A JP 7422881A JP 7422881 A JP7422881 A JP 7422881A JP S57192267 A JPS57192267 A JP S57192267A
Authority
JP
Japan
Prior art keywords
cathode
magnetic
section
sample
closed loop
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7422881A
Other languages
Japanese (ja)
Inventor
Haruo Okano
Yasuhiro Horiike
Hiromichi Horie
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP7422881A priority Critical patent/JPS57192267A/en
Publication of JPS57192267A publication Critical patent/JPS57192267A/en
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To increase the dry etching speed of the titled apparatus, by tapering off the upper surface outer peripheral section of a permanent magnet provided outside a magnetic field closed loop.
CONSTITUTION: A cathode 2 (a discharge electrode) of a non-magnetic material, or stainless steel, is opposed to a wall of a stainless decompression apparatus 1, and is connected via a matching circuit 3 with a high-frequency electric source 4. A magnetic means is provided in a non-contact state to the undersurface of the cathode 2, i.e. permanent magnets 10-aWe supported by iron pole piece 9 are arranged. The upper surface outer periphery section 37, that is, part of the magnetic means, of the permanent magnet outside the orthogonal magnetic field is tapered off. As a result, the electromagnetic field normal to the electric field at the section 37 becomes almost zero, the high-frequency electric power is predominantly consumed on the gap 15 to generate a lot of ions, and an arcuate magnetic line closed loop is formed over the surface of the cathode 2. The piece 9 is reciprocated by a motor 11 for a sample 12 on the cathode 2 to etch the desired whole surface of the sample 12.
COPYRIGHT: (C)1982,JPO&Japio
JP7422881A 1981-05-19 1981-05-19 Dry etching apparatus Pending JPS57192267A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7422881A JPS57192267A (en) 1981-05-19 1981-05-19 Dry etching apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7422881A JPS57192267A (en) 1981-05-19 1981-05-19 Dry etching apparatus

Publications (1)

Publication Number Publication Date
JPS57192267A true JPS57192267A (en) 1982-11-26

Family

ID=13541101

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7422881A Pending JPS57192267A (en) 1981-05-19 1981-05-19 Dry etching apparatus

Country Status (1)

Country Link
JP (1) JPS57192267A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6339170U (en) * 1986-08-27 1988-03-14
JPS63109181A (en) * 1986-10-23 1988-05-13 Anelva Corp Method and device for taper etching

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6339170U (en) * 1986-08-27 1988-03-14
JPS63109181A (en) * 1986-10-23 1988-05-13 Anelva Corp Method and device for taper etching

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