DE69623841D1 - Rasterelektronenmikroskop - Google Patents

Rasterelektronenmikroskop

Info

Publication number
DE69623841D1
DE69623841D1 DE69623841T DE69623841T DE69623841D1 DE 69623841 D1 DE69623841 D1 DE 69623841D1 DE 69623841 T DE69623841 T DE 69623841T DE 69623841 T DE69623841 T DE 69623841T DE 69623841 D1 DE69623841 D1 DE 69623841D1
Authority
DE
Germany
Prior art keywords
electron microscope
scanning electron
scanning
microscope
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69623841T
Other languages
English (en)
Other versions
DE69623841T2 (de
Inventor
Atsushi Kobaru
Tadashi Otaka
Tatsuya Maeda
Katsuhiro Sasada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE69623841D1 publication Critical patent/DE69623841D1/de
Publication of DE69623841T2 publication Critical patent/DE69623841T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/21—Focus adjustment
    • H01J2237/216—Automatic focusing methods
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/248—Components associated with the control of the tube
    • H01J2237/2482—Optical means
DE69623841T 1995-03-30 1996-03-29 Rasterelektronenmikroskop Expired - Lifetime DE69623841T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP07277095A JP3216474B2 (ja) 1995-03-30 1995-03-30 走査型電子顕微鏡

Publications (2)

Publication Number Publication Date
DE69623841D1 true DE69623841D1 (de) 2002-10-31
DE69623841T2 DE69623841T2 (de) 2003-05-22

Family

ID=13498951

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69623841T Expired - Lifetime DE69623841T2 (de) 1995-03-30 1996-03-29 Rasterelektronenmikroskop

Country Status (5)

Country Link
US (1) US5614713A (de)
EP (1) EP0735563B1 (de)
JP (1) JP3216474B2 (de)
KR (1) KR100416200B1 (de)
DE (1) DE69623841T2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6172363B1 (en) 1996-03-05 2001-01-09 Hitachi, Ltd. Method and apparatus for inspecting integrated circuit pattern
JP3424512B2 (ja) 1997-07-18 2003-07-07 株式会社日立製作所 粒子ビーム検査装置および検査方法並びに粒子ビーム応用装置
US6107637A (en) * 1997-08-11 2000-08-22 Hitachi, Ltd. Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus
EP1979926A2 (de) * 2006-02-03 2008-10-15 Carl Zeiss NTS GmbH Fokussier- und positionierhilfseinrichtung für ein teilchenoptisches rastermikroskop
US8314627B2 (en) * 2006-10-13 2012-11-20 Ricoh Company, Limited Latent-image measuring device and latent-image carrier
KR100844280B1 (ko) * 2006-12-26 2008-07-07 한국기초과학지원연구원 투과전자현미경용 홀더의 오차측정 장치 및 방법
DE102008001812B4 (de) * 2008-05-15 2013-05-29 Carl Zeiss Microscopy Gmbh Positioniereinrichtung für ein Teilchenstrahlgerät
JP4974121B2 (ja) * 2008-09-22 2012-07-11 東芝エレベータ株式会社 昇降機システム
JP5554620B2 (ja) * 2010-04-14 2014-07-23 株式会社ニューフレアテクノロジー 描画装置、描画方法および描画装置の異常診断方法
US9378921B2 (en) * 2012-09-14 2016-06-28 Delmic B.V. Integrated optical and charged particle inspection apparatus

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2116931A5 (fr) * 1970-12-11 1972-07-21 Onera (Off Nat Aerospatiale) Dispositif de protection d'appareillages d'etude d'echantillons a l'aide d'un pinceau d'electrons
FR2498767A1 (fr) * 1981-01-23 1982-07-30 Cameca Micro-analyseur a sonde electronique comportant un systeme d'observation a double grandissement
US4468565A (en) * 1981-12-31 1984-08-28 International Business Machines Corporation Automatic focus and deflection correction in E-beam system using optical target height measurements
US4616209A (en) * 1983-05-18 1986-10-07 Eaton Corporation "Keep warm" control
US4821196A (en) * 1987-02-20 1989-04-11 International Business Machines Corporation High resolution automatic focus correction electronic subsystem for E-beam lithography
JPH077653B2 (ja) * 1987-04-11 1995-01-30 株式会社日立製作所 走査電子顕微鏡による観察装置
JPH0754684B2 (ja) * 1987-08-28 1995-06-07 株式会社日立製作所 電子顕微鏡
JPH01120749A (ja) * 1987-11-02 1989-05-12 Hitachi Ltd 電子顕微鏡の自動焦点合せ装置
JPH0264643A (ja) * 1988-08-31 1990-03-05 Seiko Instr Inc 集束イオンビーム装置
CA1308203C (en) * 1989-06-01 1992-09-29 Nanoquest (Canada) Inc. Magnification compensation apparatus
JPH0367450A (ja) * 1989-08-07 1991-03-22 Jeol Ltd ウエハ移動時の自動焦点合わせ方法
JP2788091B2 (ja) * 1990-03-02 1998-08-20 株式会社佐竹製作所 無洗米化のための白米処理方法及びその装置
US5216235A (en) * 1992-04-24 1993-06-01 Amray, Inc. Opto-mechanical automatic focusing system and method
JP2875940B2 (ja) * 1993-08-26 1999-03-31 株式会社日立製作所 試料の高さ計測手段を備えた電子ビーム装置
JP3231516B2 (ja) * 1993-10-12 2001-11-26 セイコーインスツルメンツ株式会社 電子線マイクロアナライザ
JPH07139607A (ja) * 1993-11-15 1995-05-30 Smc Corp 回転揺動軸による回転体の間欠回転装置

Also Published As

Publication number Publication date
KR100416200B1 (ko) 2004-05-10
EP0735563A2 (de) 1996-10-02
JP3216474B2 (ja) 2001-10-09
JPH08273575A (ja) 1996-10-18
KR960035741A (ko) 1996-10-24
DE69623841T2 (de) 2003-05-22
EP0735563A3 (de) 1997-03-19
US5614713A (en) 1997-03-25
EP0735563B1 (de) 2002-09-25

Similar Documents

Publication Publication Date Title
DE69638126D1 (de) Rasterelektronenmikroskop
DE69611739D1 (de) Rasterelektronenmikroskop
DE69433937D1 (de) Rasterelektronenmikroskop
DE69840533D1 (de) Rasterelektronenmikroskop
DE69332995D1 (de) Raster-Elektronenmikroskop
DE69327355T2 (de) Rasterelektronenmikroskop
DE69317847D1 (de) Raster-Elektronenmikroskop
DE59609547D1 (de) Mikroskop
DE69717538D1 (de) Konfokales Rastermikroskop
DE69422092D1 (de) Rastersondenmikroskop
DE69624192T2 (de) Rasterelektronenmikroskop
DE69131593D1 (de) Rasterelektronenmikroskop
DE69621540D1 (de) Elektronenmikroskop
DE69602140D1 (de) Elektronenmikroskopprobenträger
DE69807151T2 (de) Rasterelektronenmikroskop
DE69628367D1 (de) Rasterelektronenmikroskop
DE69623841T2 (de) Rasterelektronenmikroskop
DE69620986D1 (de) Rasterelektronenmikroskop
DE19882512T1 (de) Abtastmikroskop mit Miniaturkopf
DE69634461D1 (de) Elektronenmikroskop
DE59912305D1 (de) Rasterelektronenmikroskop
DE69608067D1 (de) Elektronenvervielfacher für Rasterelektronenmikroskope
DE59710481D1 (de) Mikroskop
NL1007374A1 (nl) Aftastende omgevings-elektronenmicroscoop.
DE69123668D1 (de) Rasterelektronenmikroskop

Legal Events

Date Code Title Description
8364 No opposition during term of opposition