FR2116931A5 - Dispositif de protection d'appareillages d'etude d'echantillons a l'aide d'un pinceau d'electrons - Google Patents
Dispositif de protection d'appareillages d'etude d'echantillons a l'aide d'un pinceau d'electronsInfo
- Publication number
- FR2116931A5 FR2116931A5 FR7044739A FR7044739A FR2116931A5 FR 2116931 A5 FR2116931 A5 FR 2116931A5 FR 7044739 A FR7044739 A FR 7044739A FR 7044739 A FR7044739 A FR 7044739A FR 2116931 A5 FR2116931 A5 FR 2116931A5
- Authority
- FR
- France
- Prior art keywords
- protection device
- study equipment
- sample study
- brush
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
- H01J37/228—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object whereby illumination or light collection take place in the same area of the discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
- H01J37/256—Tubes for spot-analysing by electron or ion beams; Microanalysers using scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7044739A FR2116931A5 (fr) | 1970-12-11 | 1970-12-11 | Dispositif de protection d'appareillages d'etude d'echantillons a l'aide d'un pinceau d'electrons |
GB5619871A GB1363900A (en) | 1970-12-11 | 1971-12-03 | System to protect equipment for studying samples by means of an electron beam |
US00206601A US3800152A (en) | 1970-12-11 | 1971-12-10 | Electron analysis apparatus with heat-protective shield means spacedly overlying a sample supporting surface |
JP71100607A JPS52666B1 (fr) | 1970-12-11 | 1971-12-11 | |
DE19712161622 DE2161622C3 (de) | 1970-12-11 | 1971-12-11 | Vorrichtung zur Untersuchung einer Probe be! erhöhter Temperatur |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7044739A FR2116931A5 (fr) | 1970-12-11 | 1970-12-11 | Dispositif de protection d'appareillages d'etude d'echantillons a l'aide d'un pinceau d'electrons |
Publications (1)
Publication Number | Publication Date |
---|---|
FR2116931A5 true FR2116931A5 (fr) | 1972-07-21 |
Family
ID=9065646
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7044739A Expired FR2116931A5 (fr) | 1970-12-11 | 1970-12-11 | Dispositif de protection d'appareillages d'etude d'echantillons a l'aide d'un pinceau d'electrons |
Country Status (4)
Country | Link |
---|---|
US (1) | US3800152A (fr) |
JP (1) | JPS52666B1 (fr) |
FR (1) | FR2116931A5 (fr) |
GB (1) | GB1363900A (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2875940B2 (ja) * | 1993-08-26 | 1999-03-31 | 株式会社日立製作所 | 試料の高さ計測手段を備えた電子ビーム装置 |
JP3216474B2 (ja) * | 1995-03-30 | 2001-10-09 | 株式会社日立製作所 | 走査型電子顕微鏡 |
EP1724809A1 (fr) * | 2005-05-18 | 2006-11-22 | FEI Company | Appareil optique à particules d'irradiation d' un échantillon |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2899556A (en) * | 1952-10-17 | 1959-08-11 | Apparatus for the treatment of substances | |
US3005099A (en) * | 1957-10-26 | 1961-10-17 | Centre Nat Rech Scient | X-ray diffractograph enabling diagrams to be taken at very high temperatures |
NL271119A (fr) * | 1961-07-10 | |||
US3346736A (en) * | 1964-09-22 | 1967-10-10 | Applied Res Lab Inc | Electron probe apparatus having an objective lens with an aperture for restricting fluid flow |
US3374349A (en) * | 1966-11-14 | 1968-03-19 | Victor G. Macres | Electron probe having a specific shortfocal length magnetic lens and light microscope |
US3549999A (en) * | 1968-06-05 | 1970-12-22 | Gen Electric | Method and apparatus for testing circuits by measuring secondary emission electrons generated by electron beam bombardment of the pulsed circuit |
JPS491058B1 (fr) * | 1969-09-24 | 1974-01-11 | ||
US3629579A (en) * | 1970-01-16 | 1971-12-21 | Hitachi Ltd | Electron probe specimen stage with a scattered electron detector mounted thereon |
-
1970
- 1970-12-11 FR FR7044739A patent/FR2116931A5/fr not_active Expired
-
1971
- 1971-12-03 GB GB5619871A patent/GB1363900A/en not_active Expired
- 1971-12-10 US US00206601A patent/US3800152A/en not_active Expired - Lifetime
- 1971-12-11 JP JP71100607A patent/JPS52666B1/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JPS52666B1 (fr) | 1977-01-10 |
GB1363900A (en) | 1974-08-21 |
US3800152A (en) | 1974-03-26 |
DE2161622A1 (de) | 1972-06-15 |
DE2161622B2 (de) | 1976-10-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |