DE69611739D1 - Rasterelektronenmikroskop - Google Patents

Rasterelektronenmikroskop

Info

Publication number
DE69611739D1
DE69611739D1 DE69611739T DE69611739T DE69611739D1 DE 69611739 D1 DE69611739 D1 DE 69611739D1 DE 69611739 T DE69611739 T DE 69611739T DE 69611739 T DE69611739 T DE 69611739T DE 69611739 D1 DE69611739 D1 DE 69611739D1
Authority
DE
Germany
Prior art keywords
electron microscope
scanning electron
scanning
microscope
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69611739T
Other languages
English (en)
Other versions
DE69611739T2 (de
Inventor
Noriyuki Kaneoka
Kaneo Kageyama
Atushi Mouri
Junji Takada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE69611739D1 publication Critical patent/DE69611739D1/de
Publication of DE69611739T2 publication Critical patent/DE69611739T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
    • H01J37/256—Tubes for spot-analysing by electron or ion beams; Microanalysers using scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/21—Focus adjustment
    • H01J2237/216—Automatic focusing methods
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24495—Signal processing, e.g. mixing of two or more signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/248—Components associated with the control of the tube
    • H01J2237/2485—Electric or electronic means
    • H01J2237/2487—Electric or electronic means using digital signal processors
DE69611739T 1995-04-10 1996-04-10 Rasterelektronenmikroskop Expired - Lifetime DE69611739T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP08396395A JP3201926B2 (ja) 1995-04-10 1995-04-10 走査電子顕微鏡

Publications (2)

Publication Number Publication Date
DE69611739D1 true DE69611739D1 (de) 2001-03-15
DE69611739T2 DE69611739T2 (de) 2001-09-06

Family

ID=13817217

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69611739T Expired - Lifetime DE69611739T2 (de) 1995-04-10 1996-04-10 Rasterelektronenmikroskop

Country Status (5)

Country Link
US (1) US5659174A (de)
EP (1) EP0737997B1 (de)
JP (1) JP3201926B2 (de)
KR (1) KR100402064B1 (de)
DE (1) DE69611739T2 (de)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09184715A (ja) * 1995-12-28 1997-07-15 Hitachi Ltd パターン形状検査装置
JPH09306414A (ja) * 1996-05-15 1997-11-28 Advantest Corp 走査型電子顕微鏡を備えた電子ビーム露光装置
JPH10172490A (ja) 1996-12-10 1998-06-26 Hitachi Ltd 走査電子顕微鏡
JP2000048756A (ja) * 1998-07-27 2000-02-18 Seiko Instruments Inc 荷電粒子ビーム光学系の調整を行う方法およびその装置
US6476913B1 (en) * 1998-11-30 2002-11-05 Hitachi, Ltd. Inspection method, apparatus and system for circuit pattern
JP2000162286A (ja) * 1998-12-01 2000-06-16 Advantest Corp 電子ビームテスタ及び画像処理装置
JP2000275197A (ja) * 1999-03-25 2000-10-06 Fuji Photo Optical Co Ltd Ｘ線分析装置およびこれを使用した測定方法
US6583413B1 (en) * 1999-09-01 2003-06-24 Hitachi, Ltd. Method of inspecting a circuit pattern and inspecting instrument
JP3688160B2 (ja) * 1999-09-17 2005-08-24 株式会社日立製作所 走査電子顕微鏡
US7235800B1 (en) * 2000-05-31 2007-06-26 Advanced Micro Devices, Inc. Electrical probing of SOI circuits
JP2002091416A (ja) * 2000-09-19 2002-03-27 Shimadzu Corp 画像調整装置
US6661007B1 (en) * 2000-10-26 2003-12-09 General Phosphorix Llc Method of diagnosing magnification, linearity and stability of scanning electron microscope
JP2002150987A (ja) * 2000-11-16 2002-05-24 Jeol Ltd 電子顕微鏡および電子顕微鏡における透過電子像撮影方法
JP2002329473A (ja) * 2001-02-27 2002-11-15 Jeol Ltd Ｘ線分光器を備えた透過型電子顕微鏡
US7078663B2 (en) 2001-07-04 2006-07-18 Olympus Optical Co., Ltd. Scanning laser microscope and external signal recording method
US6573500B2 (en) * 2001-08-08 2003-06-03 General Phosphorix Llc Method of precision calibration of magnification of a scanning microscope with the use of test diffraction grating
JP2003107022A (ja) * 2001-09-28 2003-04-09 Hitachi Ltd 欠陥検査装置及び検査方法
KR100489659B1 (ko) * 2003-03-17 2005-05-17 삼성전자주식회사 미세 구조의 치수 측정 방법 및 측정 장치
US7358493B2 (en) * 2005-06-08 2008-04-15 Infineon Technologies Richmond, Lp Method and apparatus for automated beam optimization in a scanning electron microscope
JP4695959B2 (ja) * 2005-10-14 2011-06-08 株式会社日立ハイテクノロジーズ 集束イオンビーム装置及び集束イオンビーム装置の加工位置設定方法
KR100858982B1 (ko) * 2007-07-23 2008-09-17 서울산업대학교 산학협력단 통합 제어형 전자현미경
KR101035061B1 (ko) * 2007-10-16 2011-05-19 주식회사 쎄크 실시간 측정 기능을 갖는 전자주사현미경 및 실시간측정방법
KR100918434B1 (ko) * 2007-10-16 2009-09-24 주식회사 쎄크 주사전자현미경
US9310598B2 (en) 2009-03-11 2016-04-12 Sakura Finetek U.S.A., Inc. Autofocus method and autofocus device
US10139613B2 (en) 2010-08-20 2018-11-27 Sakura Finetek U.S.A., Inc. Digital microscope and method of sensing an image of a tissue sample
JP5563995B2 (ja) * 2011-01-17 2014-07-30 日本電子株式会社 電子プローブマイクロアナライザにおけるデータ処理方法及び電子プローブマイクロアナライザ
KR101240290B1 (ko) * 2011-04-14 2013-03-11 (주)코셈 주사전자현미경과 ｘ선분석기의 통합장치
DE102013103971A1 (de) 2013-04-19 2014-11-06 Sensovation Ag Verfahren zum Erzeugen eines aus mehreren Teilbildern zusammengesetzten Gesamtbilds eines Objekts
US9257260B2 (en) * 2013-04-27 2016-02-09 Kla-Tencor Corporation Method and system for adaptively scanning a sample during electron beam inspection
US10007102B2 (en) 2013-12-23 2018-06-26 Sakura Finetek U.S.A., Inc. Microscope with slide clamping assembly
JP6228858B2 (ja) * 2014-02-06 2017-11-08 日本電子株式会社 粒子解析装置、およびプログラム
US11280803B2 (en) 2016-11-22 2022-03-22 Sakura Finetek U.S.A., Inc. Slide management system

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59112217A (ja) * 1982-11-29 1984-06-28 Toshiba Corp 寸法測定方法
JPS648485A (en) * 1987-07-01 1989-01-12 Hitachi Ltd Image retrieving/analyzing work station
JPS6418485A (en) 1987-07-13 1989-01-23 Hitachi Elevator Eng & Service Washer for inside of feed water pipe
JPH0346743A (ja) * 1989-07-14 1991-02-28 Hitachi Ltd 走査形電子顕微鏡等の画質調整装置
US5254857A (en) * 1991-05-31 1993-10-19 Kachina Technologies, Inc. Fast scanning electron microscope (FSEM)
JPH05128989A (ja) * 1991-11-07 1993-05-25 Jeol Ltd 立体像観察用走査電子顕微鏡
JPH05266850A (ja) * 1992-03-18 1993-10-15 Fujitsu Ltd 走査型電子顕微鏡
JP2877624B2 (ja) * 1992-07-16 1999-03-31 株式会社東芝 走査電子顕微鏡の対物レンズアライメント制御装置及び制御方法

Also Published As

Publication number Publication date
DE69611739T2 (de) 2001-09-06
EP0737997A3 (de) 1998-02-25
JP3201926B2 (ja) 2001-08-27
KR100402064B1 (ko) 2004-02-11
KR960039098A (ko) 1996-11-21
EP0737997A2 (de) 1996-10-16
JPH08287860A (ja) 1996-11-01
US5659174A (en) 1997-08-19
EP0737997B1 (de) 2001-02-07

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