DE69624192T2 - Rasterelektronenmikroskop - Google Patents

Rasterelektronenmikroskop

Info

Publication number
DE69624192T2
DE69624192T2 DE69624192T DE69624192T DE69624192T2 DE 69624192 T2 DE69624192 T2 DE 69624192T2 DE 69624192 T DE69624192 T DE 69624192T DE 69624192 T DE69624192 T DE 69624192T DE 69624192 T2 DE69624192 T2 DE 69624192T2
Authority
DE
Germany
Prior art keywords
electron microscope
scanning electron
scanning
microscope
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69624192T
Other languages
English (en)
Other versions
DE69624192D1 (de
Inventor
Mitsugu Sato
Ryuji Hoya
Yoichi Ose
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE69624192D1 publication Critical patent/DE69624192D1/de
Publication of DE69624192T2 publication Critical patent/DE69624192T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/302—Contactless testing
    • G01R31/305—Contactless testing using electron beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
DE69624192T 1995-06-26 1996-06-25 Rasterelektronenmikroskop Expired - Lifetime DE69624192T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15944495A JP3372138B2 (ja) 1995-06-26 1995-06-26 走査形電子顕微鏡

Publications (2)

Publication Number Publication Date
DE69624192D1 DE69624192D1 (de) 2002-11-14
DE69624192T2 true DE69624192T2 (de) 2003-06-12

Family

ID=15693894

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69624192T Expired - Lifetime DE69624192T2 (de) 1995-06-26 1996-06-25 Rasterelektronenmikroskop

Country Status (5)

Country Link
US (1) US5677530A (de)
EP (1) EP0762468B1 (de)
JP (1) JP3372138B2 (de)
KR (1) KR100406895B1 (de)
DE (1) DE69624192T2 (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102018131609B3 (de) * 2018-12-10 2020-02-06 Carl Zeiss Microscopy Gmbh Partikelstrahlsystem und Verfahren zum Betreiben eines Partikelstrahlsystems
DE102018131614B3 (de) * 2018-12-10 2020-02-06 Carl Zeiss Microscopy Gmbh Partikelstrahlsystem und Verfahren zum Betreiben eines Partikelstrahlsystems

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5894124A (en) * 1995-03-17 1999-04-13 Hitachi, Ltd. Scanning electron microscope and its analogous device
US6037589A (en) * 1997-01-16 2000-03-14 Seiko Instruments Inc. Electron beam device
DE69806897T2 (de) * 1998-04-24 2002-11-28 Advantest Corp Dynamisch kompensierte Objektivlinse-Detektor-Vorrichtung und Verfahren
DE69933921T2 (de) * 1999-05-06 2007-03-01 Advantest Corp. Korpuskularstrahlgerät
EP1120809B1 (de) * 2000-01-27 2012-02-22 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Objektivlinse für eine Ladungsträgerstrahl-Vorrichtung
DE10233002B4 (de) * 2002-07-19 2006-05-04 Leo Elektronenmikroskopie Gmbh Objektivlinse für ein Elektronenmikroskopiesystem und Elektronenmikroskopiesystem
DE10317894B9 (de) * 2003-04-17 2007-03-22 Leo Elektronenmikroskopie Gmbh Fokussiersystem für geladene Teilchen, Elektronenmikroskopiesystem und Elektronenmikroskopieverfahren
JP2005005125A (ja) * 2003-06-11 2005-01-06 Hitachi High-Technologies Corp 荷電粒子線装置
DE602004012056T2 (de) * 2004-01-21 2009-03-12 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Fokussierlinse für Strahlen geladener Teilchen
JP2006216396A (ja) * 2005-02-04 2006-08-17 Hitachi High-Technologies Corp 荷電粒子線装置
WO2007119873A1 (ja) * 2006-04-12 2007-10-25 Hitachi High-Technologies Corporation 走査型電子顕微鏡
DE102006059162B4 (de) * 2006-12-14 2009-07-09 Carl Zeiss Nts Gmbh Teilchenoptische Anordnung
DE112017007822B4 (de) 2017-09-29 2023-06-01 Hitachi High-Technologies Corporation Rasterelektronenmikroskop
JP7051655B2 (ja) * 2018-09-27 2022-04-11 株式会社日立ハイテク 荷電粒子線装置
US11417493B2 (en) * 2020-12-18 2022-08-16 Fei Company Counter pole with permanent magnets

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2922325A1 (de) * 1979-06-01 1980-12-11 Philips Patentverwaltung Rasterelektronenmikroskop
US4713543A (en) * 1984-08-13 1987-12-15 Siemens Aktiengesellschaft Scanning particle microscope
DE3638682A1 (de) * 1986-11-13 1988-05-19 Siemens Ag Spektrometerobjektiv fuer korpuskularstrahlmesstechnik
EP0274622B1 (de) * 1986-12-12 1990-11-07 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Detektoranordnung mit einem Detektorobjektiv für Korpuskularstrahlgeräte
JPH0221551A (ja) * 1988-07-08 1990-01-24 Jeol Ltd 電子線を用いた電位測定装置
JP2919170B2 (ja) * 1992-03-19 1999-07-12 株式会社日立製作所 走査電子顕微鏡
JP3081393B2 (ja) * 1992-10-15 2000-08-28 株式会社日立製作所 走査電子顕微鏡
JPH06325719A (ja) * 1993-05-14 1994-11-25 Nikon Corp 荷電粒子線装置
JPH06338281A (ja) * 1993-05-27 1994-12-06 Hitachi Ltd 走査電子顕微鏡
JPH0773841A (ja) * 1993-09-03 1995-03-17 Hitachi Ltd 走査電子顕微鏡と二次電子検出系

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102018131609B3 (de) * 2018-12-10 2020-02-06 Carl Zeiss Microscopy Gmbh Partikelstrahlsystem und Verfahren zum Betreiben eines Partikelstrahlsystems
DE102018131614B3 (de) * 2018-12-10 2020-02-06 Carl Zeiss Microscopy Gmbh Partikelstrahlsystem und Verfahren zum Betreiben eines Partikelstrahlsystems
US10984977B2 (en) 2018-12-10 2021-04-20 Carl Zeiss Microscopy Gmbh Particle beam system and method for operating a particle beam system
US10984983B2 (en) 2018-12-10 2021-04-20 Carl Zeiss Microscopy Gmbh Particle beam system and method for operating a particle beam system

Also Published As

Publication number Publication date
EP0762468B1 (de) 2002-10-09
JPH0917369A (ja) 1997-01-17
US5677530A (en) 1997-10-14
DE69624192D1 (de) 2002-11-14
EP0762468A1 (de) 1997-03-12
KR100406895B1 (ko) 2004-04-13
KR970003383A (ko) 1997-01-28
JP3372138B2 (ja) 2003-01-27

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition