DE69840533D1 - Rasterelektronenmikroskop - Google Patents

Rasterelektronenmikroskop

Info

Publication number
DE69840533D1
DE69840533D1 DE69840533T DE69840533T DE69840533D1 DE 69840533 D1 DE69840533 D1 DE 69840533D1 DE 69840533 T DE69840533 T DE 69840533T DE 69840533 T DE69840533 T DE 69840533T DE 69840533 D1 DE69840533 D1 DE 69840533D1
Authority
DE
Germany
Prior art keywords
electron microscope
scanning electron
scanning
microscope
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69840533T
Other languages
English (en)
Inventor
Hideo Todokoro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE69840533D1 publication Critical patent/DE69840533D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
DE69840533T 1997-04-18 1998-04-16 Rasterelektronenmikroskop Expired - Lifetime DE69840533D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10165297A JP3434165B2 (ja) 1997-04-18 1997-04-18 走査電子顕微鏡

Publications (1)

Publication Number Publication Date
DE69840533D1 true DE69840533D1 (de) 2009-03-26

Family

ID=14306325

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69840533T Expired - Lifetime DE69840533D1 (de) 1997-04-18 1998-04-16 Rasterelektronenmikroskop

Country Status (5)

Country Link
US (1) US5939720A (de)
EP (1) EP0872873B1 (de)
JP (1) JP3434165B2 (de)
KR (1) KR100494298B1 (de)
DE (1) DE69840533D1 (de)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6498349B1 (en) * 1997-02-05 2002-12-24 Ut-Battelle Electrostatically focused addressable field emission array chips (AFEA's) for high-speed massively parallel maskless digital E-beam direct write lithography and scanning electron microscopy
US6353231B1 (en) * 1998-08-31 2002-03-05 Nikon Corporation Pinhole detector for electron intensity distribution
JP4236742B2 (ja) * 1998-10-29 2009-03-11 株式会社日立製作所 走査形電子顕微鏡
KR20000034962A (ko) * 1998-11-19 2000-06-26 하이든 마틴 하전입자의 이중-모드 검출 장치 및 방법
WO2000031769A2 (en) * 1998-11-24 2000-06-02 Applied Materials, Inc. Detector configuration for efficient secondary electron collection in microcolumns
JP3688160B2 (ja) * 1999-09-17 2005-08-24 株式会社日立製作所 走査電子顕微鏡
JP2001110351A (ja) * 1999-10-05 2001-04-20 Hitachi Ltd 走査電子顕微鏡
JP2003524867A (ja) * 2000-02-09 2003-08-19 エフ・イ−・アイ・カンパニー 集束イオンビームシステムのための二次粒子のレンズ通過捕捉
JP4613405B2 (ja) * 2000-09-06 2011-01-19 株式会社日立製作所 走査型電子顕微鏡
US6717141B1 (en) * 2001-11-27 2004-04-06 Schlumberger Technologies, Inc. Reduction of aberrations produced by Wien filter in a scanning electron microscope and the like
FR2837931B1 (fr) * 2002-03-29 2004-12-10 Cameca Dispositif de mesure de l'emission de rayons x produite par un objet soumis a un faisceau d'electrons
US6674075B2 (en) * 2002-05-13 2004-01-06 Applied Materials, Inc. Charged particle beam apparatus and method for inspecting samples
JP2003331770A (ja) * 2002-05-15 2003-11-21 Seiko Instruments Inc 電子線装置
WO2005017511A1 (en) * 2003-07-30 2005-02-24 Applied Materials Israel, Ltd. Scanning electron microscope having multiple detectors and a method for multiple detector based imaging
US7842933B2 (en) * 2003-10-22 2010-11-30 Applied Materials Israel, Ltd. System and method for measuring overlay errors
JP4828834B2 (ja) * 2004-02-04 2011-11-30 エスアイアイ・ナノテクノロジー株式会社 荷電粒子ビーム装置のガス吹き付けノズル及び荷電粒子ビーム装置
EP1619495A1 (de) * 2004-07-23 2006-01-25 Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO Verfahren und Vorrichtung zur Kontrolle einer Probenoberfläche und Verwendung von fluoreszierenden Materialien
DE602005006967D1 (de) 2005-03-17 2008-07-03 Integrated Circuit Testing Analyse-System und Teilchenstrahlgerät
US20070090288A1 (en) * 2005-10-20 2007-04-26 Dror Shemesh Method and system for enhancing resolution of a scanning electron microscope
JP4719699B2 (ja) * 2006-02-09 2011-07-06 株式会社日立ハイテクノロジーズ 走査型電子顕微鏡
DE602006021746D1 (de) 2006-09-07 2011-06-16 Integrated Circuit Testing Asymmetrischer ringförmiger Detektor
JP5373297B2 (ja) * 2008-02-27 2013-12-18 日本電子株式会社 ２次電子・反射電子検出装置及び２次電子・反射電子検出装置を有する走査電子顕微鏡
US7952073B2 (en) * 2008-08-01 2011-05-31 Direct Electron, Lp Apparatus and method including a direct bombardment detector and a secondary detector for use in electron microscopy
JP5280174B2 (ja) * 2008-12-10 2013-09-04 日本電子株式会社 電子線装置及び電子線装置の動作方法
WO2010070837A1 (ja) * 2008-12-16 2010-06-24 株式会社日立ハイテクノロジーズ 電子線装置およびそれを用いた電子線応用装置
US9046475B2 (en) 2011-05-19 2015-06-02 Applied Materials Israel, Ltd. High electron energy based overlay error measurement methods and systems
EP2555220A1 (de) * 2011-08-03 2013-02-06 Fei Company Detektionssystem für geladene Teilchen mit einer Wandlerelektrode
JP5860642B2 (ja) * 2011-09-07 2016-02-16 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
JP5890652B2 (ja) * 2011-10-28 2016-03-22 株式会社荏原製作所 試料観察装置及び試料観察方法
JP6309194B2 (ja) * 2013-02-01 2018-04-11 株式会社ホロン ノイズ低減電子ビーム装置および電子ビームノイズ低減方法
KR101321049B1 (ko) * 2013-02-22 2013-10-23 한국기계연구원 전자 검출기
DE112014002043T5 (de) * 2013-05-30 2016-01-14 Hitachi High-Technologies Corporation Mit einem Strahl geladener Teilchen arbeitende Vorrichtung und Probenbeobachtungsverfahren
WO2015016040A1 (ja) * 2013-08-02 2015-02-05 株式会社 日立ハイテクノロジーズ 走査電子顕微鏡
JP6169506B2 (ja) * 2014-02-19 2017-07-26 株式会社日立ハイテクノロジーズ 試料ホルダ、観察システム、および画像生成方法
JP6419849B2 (ja) * 2015-01-26 2018-11-07 株式会社日立製作所 荷電粒子線装置
JP2017053823A (ja) * 2015-09-11 2017-03-16 株式会社東芝 電子線照射装置
DE102016008291B3 (de) * 2016-07-01 2017-11-02 Evonta-Technology Gmbh Verfahren und Vorrichtung zur Behandlung von Eiern von Geflügel mit Elektronenstrahlen für eine Sterilisation der Kalkschale
KR102288146B1 (ko) * 2017-03-06 2021-08-11 주식회사 히타치하이테크 하전입자선 장치
KR102385025B1 (ko) * 2020-03-18 2022-04-11 주식회사 모듈싸이 전자현미경의 이차전자와 후방산란전자 분리검출 시스템
CN113495082B (zh) * 2020-03-19 2022-10-18 清华大学 二次电子发射系数测量装置
CN114220725A (zh) * 2020-12-02 2022-03-22 聚束科技（北京）有限公司 一种电子显微镜
JP2022112137A (ja) 2021-01-21 2022-08-02 株式会社日立ハイテク 荷電粒子ビーム装置
EP4117017A1 (de) * 2021-07-05 2023-01-11 ASML Netherlands B.V. Detektor für geladene teilchen
EP4117015A1 (de) * 2021-07-05 2023-01-11 ASML Netherlands B.V. Vorrichtung detektor und verfahren für geladene teilchen
CN116646229B (zh) * 2023-07-20 2023-11-03 北京惠然肯来科技中心(有限合伙) 带电粒子探测系统、探测方法及扫描电子显微镜

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2247345B (en) * 1990-07-05 1995-04-05 Haroon Ahmed Integrated circuit structure analysis
JP2919170B2 (ja) * 1992-03-19 1999-07-12 株式会社日立製作所 走査電子顕微鏡
JP2927627B2 (ja) * 1992-10-20 1999-07-28 株式会社日立製作所 走査電子顕微鏡
EP0769799B1 (de) * 1995-10-19 2010-02-17 Hitachi, Ltd. Rasterelektronenmikroskop

Also Published As

Publication number Publication date
EP0872873A2 (de) 1998-10-21
EP0872873B1 (de) 2009-02-11
JP3434165B2 (ja) 2003-08-04
KR100494298B1 (ko) 2005-09-14
JPH10294074A (ja) 1998-11-04
KR19980081497A (ko) 1998-11-25
US5939720A (en) 1999-08-17
EP0872873A3 (de) 2002-01-30

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