DE69327355D1 - Rasterelektronenmikroskop - Google Patents
RasterelektronenmikroskopInfo
- Publication number
- DE69327355D1 DE69327355D1 DE69327355T DE69327355T DE69327355D1 DE 69327355 D1 DE69327355 D1 DE 69327355D1 DE 69327355 T DE69327355 T DE 69327355T DE 69327355 T DE69327355 T DE 69327355T DE 69327355 D1 DE69327355 D1 DE 69327355D1
- Authority
- DE
- Germany
- Prior art keywords
- electron microscope
- scanning electron
- scanning
- microscope
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/004—Charge control of objects or beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/026—Shields
- H01J2237/0268—Liner tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/047—Changing particle velocity
- H01J2237/0475—Changing particle velocity decelerating
- H01J2237/04756—Changing particle velocity decelerating with electrostatic means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/24435—Microchannel plates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2448—Secondary particle detectors
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4092441A JP2919170B2 (ja) | 1992-03-19 | 1992-03-19 | 走査電子顕微鏡 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69327355D1 true DE69327355D1 (de) | 2000-01-27 |
DE69327355T2 DE69327355T2 (de) | 2000-08-10 |
Family
ID=14054509
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69334284T Expired - Lifetime DE69334284D1 (de) | 1992-03-19 | 1993-03-15 | Rasterelektronenmikroskop |
DE69327355T Expired - Lifetime DE69327355T2 (de) | 1992-03-19 | 1993-03-15 | Rasterelektronenmikroskop |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69334284T Expired - Lifetime DE69334284D1 (de) | 1992-03-19 | 1993-03-15 | Rasterelektronenmikroskop |
Country Status (5)
Country | Link |
---|---|
US (1) | US5424541A (de) |
EP (2) | EP0561584B1 (de) |
JP (1) | JP2919170B2 (de) |
KR (1) | KR100309323B1 (de) |
DE (2) | DE69334284D1 (de) |
Families Citing this family (47)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2927627B2 (ja) * | 1992-10-20 | 1999-07-28 | 株式会社日立製作所 | 走査電子顕微鏡 |
JP3291880B2 (ja) * | 1993-12-28 | 2002-06-17 | 株式会社日立製作所 | 走査形電子顕微鏡 |
JP3323021B2 (ja) * | 1994-12-28 | 2002-09-09 | 株式会社日立製作所 | 走査形電子顕微鏡及びそれを用いた試料像観察方法 |
JP3372138B2 (ja) * | 1995-06-26 | 2003-01-27 | 株式会社日立製作所 | 走査形電子顕微鏡 |
JPH09106777A (ja) * | 1995-10-11 | 1997-04-22 | Hamamatsu Photonics Kk | 電子顕微鏡用電子増倍器 |
JP4179390B2 (ja) * | 1995-10-19 | 2008-11-12 | 株式会社日立製作所 | 走査形電子顕微鏡 |
JP3774953B2 (ja) * | 1995-10-19 | 2006-05-17 | 株式会社日立製作所 | 走査形電子顕微鏡 |
JP3966350B2 (ja) * | 1995-10-19 | 2007-08-29 | 株式会社日立製作所 | 走査形電子顕微鏡 |
EP0769799B1 (de) * | 1995-10-19 | 2010-02-17 | Hitachi, Ltd. | Rasterelektronenmikroskop |
GB2314926B (en) * | 1996-07-01 | 1999-08-25 | K E Developments Ltd | Detector devices |
JP3432091B2 (ja) * | 1996-11-05 | 2003-07-28 | 日本電子株式会社 | 走査電子顕微鏡 |
JP3434165B2 (ja) * | 1997-04-18 | 2003-08-04 | 株式会社日立製作所 | 走査電子顕微鏡 |
JP3514070B2 (ja) * | 1997-04-25 | 2004-03-31 | 株式会社日立製作所 | 走査電子顕微鏡 |
EP0988646A1 (de) * | 1997-06-13 | 2000-03-29 | Gatan, Inc. | Verfahren und gerät zur auflösungerhöhung und rauschenreduzierung in einem abbildungs-detektor für elektronenmikroskop |
DE19732093B4 (de) * | 1997-07-25 | 2008-09-25 | Carl Zeiss Nts Gmbh | Korpuskularstrahlgerät |
JPH1167139A (ja) * | 1997-08-25 | 1999-03-09 | Hitachi Ltd | 走査電子顕微鏡 |
GB9719417D0 (en) * | 1997-09-13 | 1997-11-12 | Univ York | Electron microscope |
JP4302316B2 (ja) | 1998-03-09 | 2009-07-22 | 株式会社日立製作所 | 走査形電子顕微鏡 |
US6661008B2 (en) | 1998-06-22 | 2003-12-09 | Nikon Corporation | Electron-optical system and inspection method using the same |
US6300629B1 (en) | 1998-09-30 | 2001-10-09 | Applied Materials, Inc. | Defect review SEM with automatically switchable detector |
EP1022766B1 (de) * | 1998-11-30 | 2004-02-04 | Advantest Corporation | Teilchenstrahlgerät |
WO2000079565A1 (en) * | 1999-06-22 | 2000-12-28 | Philips Electron Optics B.V. | Particle-optical apparatus including a particle source that can be switched between high brightness and large beam current |
US6960766B2 (en) * | 2000-02-25 | 2005-11-01 | Hermes-Microvision, Inc. | Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and method |
US6392231B1 (en) | 2000-02-25 | 2002-05-21 | Hermes-Microvision, Inc. | Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and method |
DE10012314A1 (de) * | 2000-03-14 | 2001-09-20 | Leo Elektronenmikroskopie Gmbh | Detektorsystem für ein Korpuskularstrahlgerät und Korpuskularstrahlgerät mit einem solchen Detektorsystem |
US6847038B2 (en) | 2002-07-15 | 2005-01-25 | Hitachi, Ltd. | Scanning electron microscope |
JP4069624B2 (ja) * | 2000-03-31 | 2008-04-02 | 株式会社日立製作所 | 走査電子顕微鏡 |
EP1296352A4 (de) | 2000-06-27 | 2007-04-18 | Ebara Corp | Untersuchungsvorrichtung für geladene teilchenstrahlen und verfahren zur herstellung eines bauelements mit dieser untersuchungsvorrichtung |
TW579536B (en) * | 2001-07-02 | 2004-03-11 | Zeiss Carl Semiconductor Mfg | Examining system for the particle-optical imaging of an object, deflector for charged particles as well as method for the operation of the same |
US6717141B1 (en) * | 2001-11-27 | 2004-04-06 | Schlumberger Technologies, Inc. | Reduction of aberrations produced by Wien filter in a scanning electron microscope and the like |
JP3794983B2 (ja) * | 2002-05-27 | 2006-07-12 | 川崎重工業株式会社 | X線顕微鏡の電子加速空間構造 |
JP4616938B2 (ja) * | 2002-09-18 | 2011-01-19 | エフ・イ−・アイ・カンパニー | 環境走査電子顕微鏡および検出器 |
PL207238B1 (pl) * | 2003-10-14 | 2010-11-30 | Politechnika Wroclawska | Układ detekcyjny elektronów wtórnych i wstecznie rozproszonych do skaningowego mikroskopu elektronowego |
US7212017B2 (en) * | 2003-12-25 | 2007-05-01 | Ebara Corporation | Electron beam apparatus with detailed observation function and sample inspecting and observing method using electron beam apparatus |
EP1605492B1 (de) | 2004-06-11 | 2015-11-18 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Teilchenstrahlgerät mit Gegenfeldspektrometer |
JP4519567B2 (ja) * | 2004-08-11 | 2010-08-04 | 株式会社日立ハイテクノロジーズ | 走査型電子顕微鏡およびこれを用いた試料観察方法 |
US7141791B2 (en) * | 2004-09-07 | 2006-11-28 | Kla-Tencor Technologies Corporation | Apparatus and method for E-beam dark field imaging |
US7525090B1 (en) | 2007-03-16 | 2009-04-28 | Kla-Tencor Technologies Corporation | Dynamic centering for behind-the-lens dark field imaging |
US7714287B1 (en) | 2008-06-05 | 2010-05-11 | Kla-Tencor Corporation | Apparatus and method for obtaining topographical dark-field images in a scanning electron microscope |
CZ307557B6 (cs) | 2010-10-07 | 2018-12-05 | Tescan Orsay Holding, A.S. | Scintilační detekční jednotka pro detekci zpětně odražených elektronů pro elektronové nebo iontové mikroskopy |
JP5860642B2 (ja) | 2011-09-07 | 2016-02-16 | 株式会社日立ハイテクノロジーズ | 走査電子顕微鏡 |
JP6307315B2 (ja) * | 2013-03-28 | 2018-04-04 | 株式会社荏原製作所 | 電子線検査装置 |
JP6178296B2 (ja) * | 2014-10-20 | 2017-08-09 | 株式会社 テクネックス工房 | 電子線放射管 |
WO2016125864A1 (ja) * | 2015-02-05 | 2016-08-11 | 株式会社荏原製作所 | 検査装置 |
JP6573835B2 (ja) * | 2016-01-12 | 2019-09-11 | 株式会社荏原製作所 | 検査装置及び高圧基準管の製造方法 |
DE102021122390B3 (de) | 2021-08-30 | 2023-01-26 | Carl Zeiss Microscopy Gmbh | Teilchenstrahlgerät, Verfahren zum Betreiben des Teilchenstrahlgeräts und Computerprogrammprodukt |
EP4156227A1 (de) * | 2021-09-27 | 2023-03-29 | ASML Netherlands B.V. | Ladungsteilchenvorrichtung und -verfahren |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3787696A (en) * | 1972-03-15 | 1974-01-22 | Etec Corp | Scanning electron microscope electron-optical column construction |
JPS5910688Y2 (ja) * | 1977-09-14 | 1984-04-03 | 富士通株式会社 | 電子検出器 |
FR2499314A1 (fr) * | 1981-02-04 | 1982-08-06 | Centre Nat Rech Scient | Ensemble de microscope electronique a balayage a fonctionnement in situ |
GB8327737D0 (en) * | 1983-10-17 | 1983-11-16 | Texas Instruments Ltd | Electron detector |
US4675524A (en) * | 1985-03-11 | 1987-06-23 | Siemens Aktiengesellschaft | Scanning particle microscope with diminished boersch effect |
JPH0736321B2 (ja) * | 1985-06-14 | 1995-04-19 | イーツエーテー、インテグレイテツド、サーキツト、テスチング、ゲゼルシヤフト、フユア、ハルプライタープリユーフテヒニク、ミツト、ベシユレンクテル、ハフツング | 定量的電位測定用スペクトロメ−タ−対物レンズ装置 |
DE3532781A1 (de) * | 1985-09-13 | 1987-03-19 | Siemens Ag | Anordnung zur detektion von sekundaer- und/oder rueckstreuelektronen in einem elektronenstrahlgeraet |
GB2201288B (en) * | 1986-12-12 | 1990-08-22 | Texas Instruments Ltd | Electron beam apparatus |
US4766372A (en) * | 1987-02-10 | 1988-08-23 | Intel Corporation | Electron beam tester |
JPS6452370A (en) * | 1987-08-24 | 1989-02-28 | Hitachi Ltd | Potential measuring apparatus |
US4926054A (en) * | 1988-03-17 | 1990-05-15 | Ict Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh | Objective lens for focusing charged particles in an electron microscope |
JPH0221551A (ja) * | 1988-07-08 | 1990-01-24 | Jeol Ltd | 電子線を用いた電位測定装置 |
JP2636381B2 (ja) * | 1988-11-11 | 1997-07-30 | 日本電子株式会社 | 電子線装置 |
JP2934707B2 (ja) * | 1989-06-19 | 1999-08-16 | 株式会社ニコン | 走査電子顕微鏡 |
DE3925949A1 (de) * | 1989-08-05 | 1991-02-07 | Herbert Dr Specht | Elektronenrastermikroskop mit nachruestmodul |
US5146090A (en) * | 1990-06-11 | 1992-09-08 | Siemens Aktiengesellschaft | Particle beam apparatus having an immersion lens arranged in an intermediate image of the beam |
-
1992
- 1992-03-19 JP JP4092441A patent/JP2919170B2/ja not_active Expired - Lifetime
-
1993
- 1993-03-15 EP EP93301932A patent/EP0561584B1/de not_active Expired - Lifetime
- 1993-03-15 DE DE69334284T patent/DE69334284D1/de not_active Expired - Lifetime
- 1993-03-15 DE DE69327355T patent/DE69327355T2/de not_active Expired - Lifetime
- 1993-03-15 EP EP99101878A patent/EP0918350B1/de not_active Expired - Lifetime
- 1993-03-18 KR KR1019930004149A patent/KR100309323B1/ko not_active IP Right Cessation
-
1994
- 1994-09-26 US US08/312,181 patent/US5424541A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0918350A1 (de) | 1999-05-26 |
KR930020553A (ko) | 1993-10-20 |
EP0561584B1 (de) | 1999-12-22 |
DE69327355T2 (de) | 2000-08-10 |
JP2919170B2 (ja) | 1999-07-12 |
EP0561584A1 (de) | 1993-09-22 |
KR100309323B1 (ko) | 2001-12-15 |
JPH05266855A (ja) | 1993-10-15 |
US5424541A (en) | 1995-06-13 |
EP0918350B1 (de) | 2009-05-06 |
DE69334284D1 (de) | 2009-06-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |