DE69807151T2 - Rasterelektronenmikroskop - Google Patents

Rasterelektronenmikroskop

Info

Publication number
DE69807151T2
DE69807151T2 DE69807151T DE69807151T DE69807151T2 DE 69807151 T2 DE69807151 T2 DE 69807151T2 DE 69807151 T DE69807151 T DE 69807151T DE 69807151 T DE69807151 T DE 69807151T DE 69807151 T2 DE69807151 T2 DE 69807151T2
Authority
DE
Germany
Prior art keywords
electron microscope
scanning electron
scanning
microscope
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69807151T
Other languages
English (en)
Other versions
DE69807151D1 (de
Inventor
Naomasa Suzuki
Mitsugu Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE69807151D1 publication Critical patent/DE69807151D1/de
Publication of DE69807151T2 publication Critical patent/DE69807151T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0475—Changing particle velocity decelerating
DE69807151T 1997-04-25 1998-04-16 Rasterelektronenmikroskop Expired - Fee Related DE69807151T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12309697A JP3514070B2 (ja) 1997-04-25 1997-04-25 走査電子顕微鏡

Publications (2)

Publication Number Publication Date
DE69807151D1 DE69807151D1 (de) 2002-09-19
DE69807151T2 true DE69807151T2 (de) 2003-05-08

Family

ID=14852112

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69807151T Expired - Fee Related DE69807151T2 (de) 1997-04-25 1998-04-16 Rasterelektronenmikroskop

Country Status (5)

Country Link
US (1) US6025593A (de)
EP (1) EP0883158B1 (de)
JP (1) JP3514070B2 (de)
KR (1) KR100695983B1 (de)
DE (1) DE69807151T2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112017007771B4 (de) 2017-08-24 2023-03-02 Hitachi High-Technologies Corporation Vorrichtung für strahl geladener teilchen und beobachtungsverahren und elementanalyseverfahren unter verwendung derselben

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19802848B4 (de) 1998-01-26 2012-02-02 Display Products Group,Inc. Verfahren und Vorrichtung zum Testen eines Substrats
JP4302316B2 (ja) * 1998-03-09 2009-07-22 株式会社日立製作所 走査形電子顕微鏡
EP1022766B1 (de) * 1998-11-30 2004-02-04 Advantest Corporation Teilchenstrahlgerät
US6717141B1 (en) * 2001-11-27 2004-04-06 Schlumberger Technologies, Inc. Reduction of aberrations produced by Wien filter in a scanning electron microscope and the like
JP2005191017A (ja) * 2005-03-25 2005-07-14 Hitachi Ltd 走査型電子顕微鏡
US7462828B2 (en) 2005-04-28 2008-12-09 Hitachi High-Technologies Corporation Inspection method and inspection system using charged particle beam
JP4896626B2 (ja) * 2006-08-22 2012-03-14 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
DE102009028013B9 (de) * 2009-07-24 2014-04-17 Carl Zeiss Microscopy Gmbh Teilchenstrahlgerät mit einer Blendeneinheit und Verfahren zur Einstellung eines Strahlstroms in einem Teilchenstrahlgerät
JP6002470B2 (ja) * 2012-06-28 2016-10-05 株式会社日立ハイテクノロジーズ 荷電粒子線装置
AU2018273352B2 (en) 2017-05-22 2023-07-27 Howmedica Osteonics Corp. Device for in-situ fabrication process monitoring and feedback control of an electron beam additive manufacturing process
EP3597333A1 (de) 2018-07-19 2020-01-22 Howmedica Osteonics Corporation System und verfahren für prozessinterne elektronenstrahlprofil- und positionsanalysen
CN116646228B (zh) * 2023-07-20 2023-10-27 北京惠然肯来科技中心(有限合伙) 快速聚焦扫描偏转装置、扫描电子显微镜

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2856244A1 (de) * 1978-12-27 1980-07-03 Kernforschungsanlage Juelich Elektronenstosspektrometer
JPS60212953A (ja) * 1984-04-06 1985-10-25 Hitachi Ltd 電子線装置
JPH01220352A (ja) * 1988-02-26 1989-09-04 Hitachi Ltd 走査電子顕微鏡及びその類似装置
US5594245A (en) * 1990-10-12 1997-01-14 Hitachi, Ltd. Scanning electron microscope and method for dimension measuring by using the same
JP2919170B2 (ja) * 1992-03-19 1999-07-12 株式会社日立製作所 走査電子顕微鏡
JP3081393B2 (ja) * 1992-10-15 2000-08-28 株式会社日立製作所 走査電子顕微鏡
JP3291880B2 (ja) * 1993-12-28 2002-06-17 株式会社日立製作所 走査形電子顕微鏡
JP3323021B2 (ja) * 1994-12-28 2002-09-09 株式会社日立製作所 走査形電子顕微鏡及びそれを用いた試料像観察方法
JP3341226B2 (ja) * 1995-03-17 2002-11-05 株式会社日立製作所 走査電子顕微鏡
EP0769799B1 (de) * 1995-10-19 2010-02-17 Hitachi, Ltd. Rasterelektronenmikroskop
JP3376793B2 (ja) * 1995-12-20 2003-02-10 株式会社日立製作所 走査形電子顕微鏡

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112017007771B4 (de) 2017-08-24 2023-03-02 Hitachi High-Technologies Corporation Vorrichtung für strahl geladener teilchen und beobachtungsverahren und elementanalyseverfahren unter verwendung derselben

Also Published As

Publication number Publication date
JP3514070B2 (ja) 2004-03-31
EP0883158A1 (de) 1998-12-09
KR100695983B1 (ko) 2007-07-06
JPH10302705A (ja) 1998-11-13
EP0883158B1 (de) 2002-08-14
US6025593A (en) 2000-02-15
DE69807151D1 (de) 2002-09-19
KR19980081685A (ko) 1998-11-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee