DE69535516D1 - Gitter-Gitter interferometrisches Ausrichtungssystem - Google Patents

Gitter-Gitter interferometrisches Ausrichtungssystem

Info

Publication number
DE69535516D1
DE69535516D1 DE69535516T DE69535516T DE69535516D1 DE 69535516 D1 DE69535516 D1 DE 69535516D1 DE 69535516 T DE69535516 T DE 69535516T DE 69535516 T DE69535516 T DE 69535516T DE 69535516 D1 DE69535516 D1 DE 69535516D1
Authority
DE
Germany
Prior art keywords
alignment system
lattice grating
interferometric alignment
grating interferometric
lattice
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69535516T
Other languages
English (en)
Other versions
DE69535516T2 (de
Inventor
Gregg M Gallatin
Justin L Kreuzer
Michael L Nelson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Holding NV
Original Assignee
ASML Holding NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Holding NV filed Critical ASML Holding NV
Application granted granted Critical
Publication of DE69535516D1 publication Critical patent/DE69535516D1/de
Publication of DE69535516T2 publication Critical patent/DE69535516T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE69535516T 1994-01-24 1995-01-20 Gitter-Gitter interferometrisches Ausrichtungssystem Expired - Lifetime DE69535516T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US18564494A 1994-01-24 1994-01-24
US185644 1994-01-24

Publications (2)

Publication Number Publication Date
DE69535516D1 true DE69535516D1 (de) 2007-07-26
DE69535516T2 DE69535516T2 (de) 2007-10-04

Family

ID=22681859

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69535516T Expired - Lifetime DE69535516T2 (de) 1994-01-24 1995-01-20 Gitter-Gitter interferometrisches Ausrichtungssystem
DE69530757T Expired - Lifetime DE69530757T2 (de) 1994-01-24 1995-01-20 Gitter-gitter interferometrisches ausrichtsystem

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE69530757T Expired - Lifetime DE69530757T2 (de) 1994-01-24 1995-01-20 Gitter-gitter interferometrisches ausrichtsystem

Country Status (7)

Country Link
US (1) US5559601A (de)
EP (2) EP1278104B1 (de)
JP (1) JP3841824B2 (de)
KR (1) KR100363034B1 (de)
CA (1) CA2180941A1 (de)
DE (2) DE69535516T2 (de)
WO (1) WO1995020139A1 (de)

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CN100337089C (zh) * 2002-09-20 2007-09-12 Asml荷兰有限公司 器件检验
US6992764B1 (en) 2002-09-30 2006-01-31 Nanometrics Incorporated Measuring an alignment target with a single polarization state
SG124270A1 (en) 2002-12-16 2006-08-30 Asml Netherlands Bv Lithographic apparatus with alignment subsystem, device manufacturing method using alignment, and alignment structure
US7027163B2 (en) * 2003-01-24 2006-04-11 General Dynamics Advanced Information Systems, Inc. Grating sensor
US7445938B2 (en) * 2003-01-24 2008-11-04 General Dynamics Advanced Information Systems, Inc. System and method for detecting presence of analytes using gratings
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TWI264620B (en) * 2003-03-07 2006-10-21 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7184626B1 (en) * 2003-04-07 2007-02-27 Luxtera, Inc Wafer-level testing of optical and optoelectronic chips
US6970255B1 (en) 2003-04-23 2005-11-29 Nanometrics Incorporated Encoder measurement based on layer thickness
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DE60333688D1 (de) * 2003-12-19 2010-09-16 Ibm Differentielle metrologie für kritische abmessung und überlagerung
US7508976B1 (en) 2003-12-29 2009-03-24 Nanometric Incorporated Local process variation correction for overlay measurement
JP4750786B2 (ja) * 2004-05-29 2011-08-17 ザ ジェネラル ホスピタル コーポレイション 光コヒーレンストモグラフィ（ｏｃｔ）イメージングにおける屈折層を用いた色分散補償プロセス、システム及びソフトウェア構成
US7359577B2 (en) * 2004-07-13 2008-04-15 Yan Wang Differential method for layer-to-layer registration
IL166453A0 (en) * 2005-01-23 2006-01-15 A method and apparatus for measurement of chromatic aberations of optical systems
DE102005016231B4 (de) * 2005-04-06 2010-09-16 Jenoptik Laser, Optik, Systeme Gmbh Optisches System und Verfahren zur Herstellung eines Verbundelementes aus transparenten, mit mikrooptischen Strukturen versehenen plattenförmigen Substraten
US20070153274A1 (en) * 2005-12-30 2007-07-05 Asml Netherlands B.V. Optical metrology system and metrology mark characterization device
US7511826B2 (en) * 2006-02-27 2009-03-31 Asml Holding N.V. Symmetrical illumination forming system and method
DE102008048844A1 (de) 2007-09-25 2009-05-14 Carl Zeiss Smt Ag Verfahren und System zum Vermessen einer Oberfläche eines Objektes
DE102008029970A1 (de) * 2008-06-26 2009-12-31 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie sowie Verfahren zum Überwachen einer lateralen Abbildungsstabilität
US8456650B2 (en) 2008-09-09 2013-06-04 Cornell University Optical grid for high precision and high resolution method of wafer-scale nanofabrication
DE102009019140B4 (de) 2009-04-29 2017-03-02 Carl Zeiss Smt Gmbh Verfahren zum Kalibrieren einer Positionsmessvorrichtung und Verfahren zum Vermessen einer Maske
JP2014522987A (ja) 2011-07-29 2014-09-08 エーエフエル・テレコミュニケーションズ・エルエルシー 相互関係プロファイル分析を実行するための方法および装置
KR101264539B1 (ko) * 2011-11-04 2013-05-14 (주)오로스 테크놀로지 회절광 패턴 분석에 의한 멀티 레이어 정렬상태 검사방법
DE102013203713A1 (de) * 2013-03-05 2014-02-13 Carl Zeiss Smt Gmbh Inkrementalgeber und Lithographievorrichtung
WO2017167637A1 (en) 2016-03-30 2017-10-05 Asml Netherlands B.V. Substrate edge detection
EP3821810A1 (de) 2019-11-13 2021-05-19 Koninklijke Philips N.V. Aktive gitterpositionsverfolgung in gitterbasierten phasenkontrast- und dunkelfeldabbildungen
TWI762417B (zh) * 2021-09-01 2022-04-21 環球晶圓股份有限公司 識別晶圓的方法

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Also Published As

Publication number Publication date
DE69535516T2 (de) 2007-10-04
DE69530757D1 (de) 2003-06-18
EP0745211A1 (de) 1996-12-04
KR100363034B1 (ko) 2003-05-16
JPH09508463A (ja) 1997-08-26
CA2180941A1 (en) 1995-07-27
EP0745211A4 (de) 1997-02-05
DE69530757T2 (de) 2004-03-18
EP1278104B1 (de) 2007-06-13
EP1278104A1 (de) 2003-01-22
JP3841824B2 (ja) 2006-11-08
US5559601A (en) 1996-09-24
EP0745211B1 (de) 2003-05-14
WO1995020139A1 (en) 1995-07-27
KR970700857A (ko) 1997-02-12

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