DE69530757D1 - Gitter-gitter interferometrisches ausrichtsystem - Google Patents

Gitter-gitter interferometrisches ausrichtsystem

Info

Publication number
DE69530757D1
DE69530757D1 DE69530757T DE69530757T DE69530757D1 DE 69530757 D1 DE69530757 D1 DE 69530757D1 DE 69530757 T DE69530757 T DE 69530757T DE 69530757 T DE69530757 T DE 69530757T DE 69530757 D1 DE69530757 D1 DE 69530757D1
Authority
DE
Germany
Prior art keywords
grid
alignment system
interferometric alignment
interferometric
grid interferometric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69530757T
Other languages
English (en)
Other versions
DE69530757T2 (de
Inventor
M Gallatin
L Kreuzer
L Nelson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Holding NV
Original Assignee
SVG Lithography Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SVG Lithography Systems Inc filed Critical SVG Lithography Systems Inc
Publication of DE69530757D1 publication Critical patent/DE69530757D1/de
Application granted granted Critical
Publication of DE69530757T2 publication Critical patent/DE69530757T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE69530757T 1994-01-24 1995-01-20 Gitter-gitter interferometrisches ausrichtsystem Expired - Lifetime DE69530757T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US18564494A 1994-01-24 1994-01-24
US185644 1994-01-24
PCT/US1995/000887 WO1995020139A1 (en) 1994-01-24 1995-01-20 Grating-grating interferometric alignment system

Publications (2)

Publication Number Publication Date
DE69530757D1 true DE69530757D1 (de) 2003-06-18
DE69530757T2 DE69530757T2 (de) 2004-03-18

Family

ID=22681859

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69530757T Expired - Lifetime DE69530757T2 (de) 1994-01-24 1995-01-20 Gitter-gitter interferometrisches ausrichtsystem
DE69535516T Expired - Lifetime DE69535516T2 (de) 1994-01-24 1995-01-20 Gitter-Gitter interferometrisches Ausrichtungssystem

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE69535516T Expired - Lifetime DE69535516T2 (de) 1994-01-24 1995-01-20 Gitter-Gitter interferometrisches Ausrichtungssystem

Country Status (7)

Country Link
US (1) US5559601A (de)
EP (2) EP0745211B1 (de)
JP (1) JP3841824B2 (de)
KR (1) KR100363034B1 (de)
CA (1) CA2180941A1 (de)
DE (2) DE69530757T2 (de)
WO (1) WO1995020139A1 (de)

Families Citing this family (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6078381A (en) 1993-02-01 2000-06-20 Nikon Corporation Exposure method and apparatus
US5591958A (en) * 1993-06-14 1997-01-07 Nikon Corporation Scanning exposure method and apparatus
US6034378A (en) * 1995-02-01 2000-03-07 Nikon Corporation Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus
JP3047863B2 (ja) * 1997-08-04 2000-06-05 日本電気株式会社 アライメント方法
US6136662A (en) 1999-05-13 2000-10-24 Lsi Logic Corporation Semiconductor wafer having a layer-to-layer alignment mark and method for fabricating the same
US6469793B1 (en) 1999-08-10 2002-10-22 Svg Lithography Systems, Inc. Multi-channel grating interference alignment sensor
GB2356786B (en) 1999-11-29 2003-09-03 Marconi Electronic Syst Ltd Method and apparatus for aligning a crystalline substrate
GB9928483D0 (en) 1999-12-03 2000-02-02 Renishaw Plc Opto-electronic scale reading apparatus
US6628406B1 (en) * 2000-04-20 2003-09-30 Justin L. Kreuzer Self referencing mark independent alignment sensor
US7061615B1 (en) 2001-09-20 2006-06-13 Nanometrics Incorporated Spectroscopically measured overlay target
US6803993B2 (en) * 2001-10-19 2004-10-12 Asml Netherlands-B.V. Lithographic apparatus and device manufacturing method
EP1304597A1 (de) * 2001-10-19 2003-04-23 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
US6958819B1 (en) 2002-04-04 2005-10-25 Nanometrics Incorporated Encoder with an alignment target
US7046361B1 (en) * 2002-04-04 2006-05-16 Nanometrics Incorporated Positioning two elements using an alignment target with a designed offset
US6982793B1 (en) 2002-04-04 2006-01-03 Nanometrics Incorporated Method and apparatus for using an alignment target with designed in offset
US6949462B1 (en) 2002-04-04 2005-09-27 Nanometrics Incorporated Measuring an alignment target with multiple polarization states
US7027156B2 (en) * 2002-08-01 2006-04-11 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
US7359554B2 (en) * 2002-08-26 2008-04-15 Cleveland Clinic Foundation System and method for identifying a vascular border
SG152898A1 (en) * 2002-09-20 2009-06-29 Asml Netherlands Bv Alignment systems and methods for lithographic systems
US6992764B1 (en) 2002-09-30 2006-01-31 Nanometrics Incorporated Measuring an alignment target with a single polarization state
CN100510962C (zh) 2002-12-16 2009-07-08 Asml荷兰有限公司 具有对准子系统的光刻装置和使用对准的器件制造方法
US7027163B2 (en) * 2003-01-24 2006-04-11 General Dynamics Advanced Information Systems, Inc. Grating sensor
US7445938B2 (en) * 2003-01-24 2008-11-04 General Dynamics Advanced Information Systems, Inc. System and method for detecting presence of analytes using gratings
JP4101076B2 (ja) * 2003-02-06 2008-06-11 キヤノン株式会社 位置検出方法及び装置
TWI264620B (en) * 2003-03-07 2006-10-21 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7184626B1 (en) * 2003-04-07 2007-02-27 Luxtera, Inc Wafer-level testing of optical and optoelectronic chips
US6970255B1 (en) 2003-04-23 2005-11-29 Nanometrics Incorporated Encoder measurement based on layer thickness
US20050010310A1 (en) * 2003-07-11 2005-01-13 Touzov Igor Victorovich Method of alignment for precision tools.
AU2003300005A1 (en) * 2003-12-19 2005-08-03 International Business Machines Corporation Differential critical dimension and overlay metrology apparatus and measurement method
US7508976B1 (en) 2003-12-29 2009-03-24 Nanometric Incorporated Local process variation correction for overlay measurement
EP1754016B1 (de) * 2004-05-29 2016-05-18 The General Hospital Corporation Prozess, system und softwareanordnung für eine kompensation der chromatischen dispersion unter verwendung reflektierender schichten in der bildgebenden optischen kohärenztopographie (oct)
US7359577B2 (en) * 2004-07-13 2008-04-15 Yan Wang Differential method for layer-to-layer registration
IL166453A0 (en) * 2005-01-23 2006-01-15 A method and apparatus for measurement of chromatic aberations of optical systems
DE102005016231B4 (de) * 2005-04-06 2010-09-16 Jenoptik Laser, Optik, Systeme Gmbh Optisches System und Verfahren zur Herstellung eines Verbundelementes aus transparenten, mit mikrooptischen Strukturen versehenen plattenförmigen Substraten
US20070153274A1 (en) * 2005-12-30 2007-07-05 Asml Netherlands B.V. Optical metrology system and metrology mark characterization device
US7511826B2 (en) * 2006-02-27 2009-03-31 Asml Holding N.V. Symmetrical illumination forming system and method
DE102008048844A1 (de) * 2007-09-25 2009-05-14 Carl Zeiss Smt Ag Verfahren und System zum Vermessen einer Oberfläche eines Objektes
DE102008029970A1 (de) 2008-06-26 2009-12-31 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie sowie Verfahren zum Überwachen einer lateralen Abbildungsstabilität
CN102209609B (zh) * 2008-09-09 2013-12-25 康奈尔大学 晶圆级纳米计量系统、用于感测加工元件位置的方法
DE102009019140B4 (de) 2009-04-29 2017-03-02 Carl Zeiss Smt Gmbh Verfahren zum Kalibrieren einer Positionsmessvorrichtung und Verfahren zum Vermessen einer Maske
WO2013019716A2 (en) 2011-07-29 2013-02-07 Wenxin Zheng Method and apparatus for performing interrelation profile analysis
KR101264539B1 (ko) * 2011-11-04 2013-05-14 (주)오로스 테크놀로지 회절광 패턴 분석에 의한 멀티 레이어 정렬상태 검사방법
DE102013203713A1 (de) * 2013-03-05 2014-02-13 Carl Zeiss Smt Gmbh Inkrementalgeber und Lithographievorrichtung
NL2018564A (en) 2016-03-30 2017-10-05 Asml Netherlands Bv Substrate edge detection
EP3821810A1 (de) 2019-11-13 2021-05-19 Koninklijke Philips N.V. Aktive gitterpositionsverfolgung in gitterbasierten phasenkontrast- und dunkelfeldabbildungen
TWI762417B (zh) * 2021-09-01 2022-04-21 環球晶圓股份有限公司 識別晶圓的方法
CN116560028A (zh) * 2023-05-24 2023-08-08 上海市计量测试技术研究院 背对式两光栅相互平行的调节方法及调节装置

Family Cites Families (68)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5212577A (en) * 1975-07-21 1977-01-31 Nippon Kogaku Kk <Nikon> Automatic location device
US4200395A (en) * 1977-05-03 1980-04-29 Massachusetts Institute Of Technology Alignment of diffraction gratings
FR2436967A1 (fr) * 1978-09-19 1980-04-18 Thomson Csf Procede d'alignement optique de motifs dans deux plans rapproches et dispositif d'alignement mettant en oeuvre un tel procede
US4390279A (en) * 1979-07-12 1983-06-28 Nippon Kogaku K. K. Alignment device in an IC projection exposure apparatus
JPS57142612A (en) * 1981-02-27 1982-09-03 Nippon Kogaku Kk <Nikon> Alignment optical system of projection type exposure device
JPS58112330A (ja) * 1981-12-25 1983-07-04 Nippon Kogaku Kk <Nikon> 投影型露光装置
US4629313A (en) * 1982-10-22 1986-12-16 Nippon Kogaku K.K. Exposure apparatus
EP0135597B1 (de) * 1983-09-23 1987-07-22 Ibm Deutschland Gmbh Verfahren und Einrichtung zum gegenseitigen Ausrichten von Objekten
US4631416A (en) * 1983-12-19 1986-12-23 Hewlett-Packard Company Wafer/mask alignment system using diffraction gratings
US4679942A (en) * 1984-02-24 1987-07-14 Nippon Kogaku K. K. Method of aligning a semiconductor substrate and a photomask
US4699515A (en) * 1984-02-28 1987-10-13 Nippon Kogaku K. K. Process of transfer of mask pattern onto substrate and apparatus for alignment therebetween
US4830486A (en) * 1984-03-16 1989-05-16 Goodwin Frank E Frequency modulated lasar radar
JPH0616476B2 (ja) * 1984-05-11 1994-03-02 株式会社ニコン パターン露光方法
US4702606A (en) * 1984-06-01 1987-10-27 Nippon Kogaku K.K. Position detecting system
JPH0652708B2 (ja) * 1984-11-01 1994-07-06 株式会社ニコン 投影光学装置
JPS61116837A (ja) * 1984-11-13 1986-06-04 Nippon Telegr & Teleph Corp <Ntt> 回折格子によるギヤツプ・位置合せ制御法
US4801208A (en) * 1984-11-19 1989-01-31 Nikon Corporation Projection type exposing apparatus
JPH0726803B2 (ja) * 1984-11-26 1995-03-29 株式会社ニコン 位置検出方法及び装置
JPS61183928A (ja) * 1985-02-12 1986-08-16 Nippon Kogaku Kk <Nikon> 投影光学装置
JPS61201427A (ja) * 1985-03-04 1986-09-06 Nippon Kogaku Kk <Nikon> 位置ずれ検出方法
USRE34010E (en) * 1985-03-22 1992-07-28 Nikon Corporation Position detection apparatus
US4803524A (en) * 1985-08-03 1989-02-07 Nikon Corporation Method of and apparatus for detecting the accuracy of superposition exposure in an exposure apparatus
JPS6258628A (ja) * 1985-09-09 1987-03-14 Nippon Telegr & Teleph Corp <Ntt> 位置合わせ方法および位置合わせ装置
JP2610815B2 (ja) * 1985-09-19 1997-05-14 株式会社ニコン 露光方法
US4795244A (en) * 1985-09-20 1989-01-03 Nikon Corporation Projection type exposure apparatus
JP2593440B2 (ja) * 1985-12-19 1997-03-26 株式会社ニコン 投影型露光装置
JPS62172203A (ja) * 1986-01-27 1987-07-29 Agency Of Ind Science & Technol 相対変位測定方法
JPH0669014B2 (ja) * 1986-02-24 1994-08-31 株式会社ニコン 露光装置
JPH083408B2 (ja) * 1986-06-11 1996-01-17 株式会社東芝 ギャップ設定方法
JP2661015B2 (ja) * 1986-06-11 1997-10-08 株式会社ニコン 位置合わせ方法
KR900004269B1 (ko) * 1986-06-11 1990-06-18 가부시기가이샤 도시바 제 1물체와 제 2 물체와의 위치 맞추는 방법 및 장치
US4880310A (en) * 1986-07-28 1989-11-14 Nikon Corporation Optical device for alignment in a projection exposure apparatus
JPH0821531B2 (ja) * 1986-08-29 1996-03-04 株式会社ニコン 投影光学装置
JPH0810123B2 (ja) * 1986-09-12 1996-01-31 株式会社ニコン 光学装置
JPH07123103B2 (ja) * 1986-11-26 1995-12-25 株式会社ニコン 位置合わせ装置
JP2550974B2 (ja) * 1987-03-13 1996-11-06 株式会社ニコン 露光装置
JPS63229816A (ja) * 1987-03-19 1988-09-26 Nikon Corp アライメント装置
JP2569544B2 (ja) * 1987-04-08 1997-01-08 株式会社ニコン 位置決め装置
JP2797250B2 (ja) * 1987-05-14 1998-09-17 株式会社ニコン 投影露光装置
JP2658051B2 (ja) * 1987-05-15 1997-09-30 株式会社ニコン 位置合わせ装置，該装置を用いた投影露光装置及び投影露光方法
US4943733A (en) * 1987-05-15 1990-07-24 Nikon Corporation Projection optical apparatus capable of measurement and compensation of distortion affecting reticle/wafer alignment
JPH0810124B2 (ja) * 1987-07-03 1996-01-31 株式会社ニコン 露光装置
JPS6414918A (en) * 1987-07-08 1989-01-19 Nikon Corp Stepper
JP2694868B2 (ja) * 1987-08-31 1997-12-24 株式会社ニコン 位置検出方法及び装置
US4988197A (en) * 1987-12-28 1991-01-29 Kabushiki Kaisha Toshiba Method and apparatus for aligning two objects, and method and apparatus for providing a desired gap between two objects
JP2503572B2 (ja) * 1988-03-08 1996-06-05 株式会社ニコン 露光装置及び露光方法
US4952815A (en) * 1988-04-14 1990-08-28 Nikon Corporation Focusing device for projection exposure apparatus
JP2606285B2 (ja) * 1988-06-07 1997-04-30 株式会社ニコン 露光装置および位置合わせ方法
JP2773147B2 (ja) * 1988-08-19 1998-07-09 株式会社ニコン 露光装置の位置合わせ装置及び方法
US5171999A (en) * 1989-02-28 1992-12-15 Nikon Corporation Adjustable beam and interference fringe position
US5070250A (en) * 1989-02-28 1991-12-03 Nikon Corporation Position detection apparatus with adjustable beam and interference fringe positions
US5151750A (en) * 1989-04-14 1992-09-29 Nikon Corporation Alignment apparatus
JPH032504A (ja) * 1989-05-30 1991-01-08 Nikon Corp 位置合わせ装置
US5151749A (en) * 1989-06-08 1992-09-29 Nikon Corporation Method of and apparatus for measuring coordinate position and positioning an object
JP2897276B2 (ja) * 1989-09-04 1999-05-31 株式会社ニコン 位置合わせ方法及び露光装置
US5151754A (en) * 1989-10-06 1992-09-29 Kabushiki Kaisha Toshiba Method and an apparatus for measuring a displacement between two objects and a method and an apparatus for measuring a gap distance between two objects
JP2885454B2 (ja) * 1990-02-05 1999-04-26 株式会社東芝 相対位置合せ方法及び装置
JP3077149B2 (ja) * 1990-01-22 2000-08-14 株式会社ニコン 測定装置、測定方法、及び露光装置、露光方法、及び回路パターンチップ
JP2913755B2 (ja) * 1990-04-25 1999-06-28 株式会社ニコン 位置合わせ方法及び装置
JP3033135B2 (ja) * 1990-06-13 2000-04-17 株式会社ニコン 投影露光装置及び方法
US5231467A (en) * 1990-09-20 1993-07-27 Matsushita Electric Industrial Co., Ltd. Reflective alignment position signal producing apparatus
JP3128827B2 (ja) * 1990-12-26 2001-01-29 株式会社ニコン 投影露光装置、並びに投影露光方法、及びその投影露光方法を用いたデバイス製造方法、及びそのデバイス製造方法により製造されたデバイス
US5243195A (en) * 1991-04-25 1993-09-07 Nikon Corporation Projection exposure apparatus having an off-axis alignment system and method of alignment therefor
US5204535A (en) * 1991-05-31 1993-04-20 Nikon Corporation Alignment device having irradiation and detection light correcting optical elements
JP2928834B2 (ja) * 1991-06-14 1999-08-03 日本電信電話株式会社 回折格子による位置検出方法および位置検出装置
JPH0574684A (ja) * 1991-09-13 1993-03-26 Nikon Corp 位置合わせ装置
US5402230A (en) * 1991-12-16 1995-03-28 Tsinghua University Heterodyne interferometric optical fiber displacement sensor for measuring displacement of an object
US5390022A (en) * 1992-04-07 1995-02-14 Canon Kabushiki Kaisha Displacement information detection apparatus for receiving a divergent light beam

Also Published As

Publication number Publication date
US5559601A (en) 1996-09-24
EP0745211B1 (de) 2003-05-14
KR970700857A (ko) 1997-02-12
KR100363034B1 (ko) 2003-05-16
EP0745211A1 (de) 1996-12-04
EP0745211A4 (de) 1997-02-05
EP1278104B1 (de) 2007-06-13
CA2180941A1 (en) 1995-07-27
WO1995020139A1 (en) 1995-07-27
EP1278104A1 (de) 2003-01-22
DE69530757T2 (de) 2004-03-18
JP3841824B2 (ja) 2006-11-08
DE69535516D1 (de) 2007-07-26
JPH09508463A (ja) 1997-08-26
DE69535516T2 (de) 2007-10-04

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: ASML HOLDING, N.V., VELDHOVEN, NL

8364 No opposition during term of opposition