DE69331979T2 - Optische integrierte Halbleitervorrichtung und Verfahren zur Herstellung und Verwendung in einem Lichtempfänger - Google Patents
Optische integrierte Halbleitervorrichtung und Verfahren zur Herstellung und Verwendung in einem LichtempfängerInfo
- Publication number
- DE69331979T2 DE69331979T2 DE69331979T DE69331979T DE69331979T2 DE 69331979 T2 DE69331979 T2 DE 69331979T2 DE 69331979 T DE69331979 T DE 69331979T DE 69331979 T DE69331979 T DE 69331979T DE 69331979 T2 DE69331979 T2 DE 69331979T2
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing
- semiconductor device
- light receiver
- integrated semiconductor
- optical integrated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 230000003287 optical effect Effects 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/015—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements having potential barriers, e.g. having a PN or PIN junction
- G02F1/017—Structures with periodic or quasi periodic potential variation, e.g. superlattices, quantum wells
- G02F1/01708—Structures with periodic or quasi periodic potential variation, e.g. superlattices, quantum wells in an optical wavequide structure
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035236—Superlattices; Multiple quantum well structures
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0062—Processes for devices with an active region comprising only III-V compounds
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
- H01S5/0265—Intensity modulators
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/11—Comprising a photonic bandgap structure
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2203/00—Function characteristic
- G02F2203/07—Polarisation dependent
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1053—Comprising an active region having a varying composition or cross-section in a specific direction
- H01S5/106—Comprising an active region having a varying composition or cross-section in a specific direction varying thickness along the optical axis
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
- H01S5/2272—Buried mesa structure ; Striped active layer grown by a mask induced selective growth
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/3403—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers having a strained layer structure in which the strain performs a special function, e.g. general strain effects, strain versus polarisation
- H01S5/3404—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers having a strained layer structure in which the strain performs a special function, e.g. general strain effects, strain versus polarisation influencing the polarisation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34306—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000nm, e.g. InP based 1300 and 1500nm lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34313—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer having only As as V-compound, e.g. AlGaAs, InGaAs
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
- H01S5/4031—Edge-emitting structures
- H01S5/4068—Edge-emitting structures with lateral coupling by axially offset or by merging waveguides, e.g. Y-couplers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/50—Amplifier structures not provided for in groups H01S5/02 - H01S5/30
- H01S5/5036—Amplifier structures not provided for in groups H01S5/02 - H01S5/30 the arrangement being polarisation-selective
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Chemical & Material Sciences (AREA)
- Nonlinear Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Nanotechnology (AREA)
- Manufacturing & Machinery (AREA)
- Biophysics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Geometry (AREA)
- Optical Integrated Circuits (AREA)
- Semiconductor Lasers (AREA)
- Light Receiving Elements (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4283192A JP3306892B2 (ja) | 1992-02-28 | 1992-02-28 | 半導体光集積素子およびその製造方法 |
JP4061774A JPH05267709A (ja) | 1992-03-18 | 1992-03-18 | 導波路型受光器 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69331979D1 DE69331979D1 (de) | 2002-07-11 |
DE69331979T2 true DE69331979T2 (de) | 2003-01-23 |
Family
ID=26382578
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69331979T Expired - Lifetime DE69331979T2 (de) | 1992-02-28 | 1993-02-26 | Optische integrierte Halbleitervorrichtung und Verfahren zur Herstellung und Verwendung in einem Lichtempfänger |
Country Status (3)
Country | Link |
---|---|
US (1) | US5574289A (de) |
EP (1) | EP0558089B1 (de) |
DE (1) | DE69331979T2 (de) |
Families Citing this family (50)
Publication number | Priority date | Publication date | Assignee | Title |
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JP3285426B2 (ja) * | 1993-08-04 | 2002-05-27 | 株式会社日立製作所 | 半導体光集積素子及びその製造方法 |
JPH07104222A (ja) * | 1993-10-05 | 1995-04-21 | Mitsubishi Electric Corp | 半導体光変調器 |
JP2682421B2 (ja) * | 1993-12-28 | 1997-11-26 | 日本電気株式会社 | 半導体光集積回路の製造方法 |
JP2937751B2 (ja) * | 1994-04-28 | 1999-08-23 | 日本電気株式会社 | 光半導体装置の製造方法 |
JPH07318986A (ja) * | 1994-05-25 | 1995-12-08 | Nec Corp | 導波路型光スイッチ |
JP2842292B2 (ja) * | 1994-09-16 | 1998-12-24 | 日本電気株式会社 | 半導体光集積装置および製造方法 |
JPH08172241A (ja) * | 1994-12-16 | 1996-07-02 | Furukawa Electric Co Ltd:The | AlGaInAs系多重量子井戸を有する半導体発光素子 |
US5937273A (en) * | 1994-12-27 | 1999-08-10 | Fujitsu Limited | Fabricating compound semiconductor by varying ratio of stagnant layer thickness and mean free path of seed material |
JP3303631B2 (ja) * | 1995-01-04 | 2002-07-22 | キヤノン株式会社 | 半導体量子井戸構造 |
JPH0964399A (ja) * | 1995-08-29 | 1997-03-07 | Furukawa Electric Co Ltd:The | 導波路型受光素子 |
US5767507A (en) * | 1996-07-15 | 1998-06-16 | Trustees Of Boston University | Polarization sensitive photodetectors and detector arrays |
US5757833A (en) * | 1995-11-06 | 1998-05-26 | The Furukawa Electric Co., Ltd. | Semiconductor laser having a transparent light emitting section, and a process of producing the same |
CN1264262C (zh) * | 1995-11-06 | 2006-07-12 | 日亚化学工业株式会社 | 氮化物半导体器件 |
DE19605794A1 (de) * | 1996-02-16 | 1997-08-21 | Sel Alcatel Ag | Monolithisch integriertes optisches oder optoelektronisches Halbleiterbauelement und Herstellungsverfahren |
JPH09232625A (ja) * | 1996-02-27 | 1997-09-05 | Oki Electric Ind Co Ltd | 端面発光型光半導体素子及びその製造方法 |
US5682455A (en) * | 1996-02-29 | 1997-10-28 | Northern Telecom Limited | Semiconductor optical waveguide |
FR2745961B1 (fr) * | 1996-03-05 | 1998-04-10 | Alcatel Optronics | Amplificateur optique a semi-conducteur |
JPH09311220A (ja) * | 1996-03-19 | 1997-12-02 | Canon Inc | 異なる偏光依存性を持つ領域が交互に配置された回折格子、及びそれを用いた光半導体デバイス |
JP2955986B2 (ja) * | 1996-05-22 | 1999-10-04 | 日本電気株式会社 | 半導体光変調器及びその製造方法 |
JP2917913B2 (ja) * | 1996-06-10 | 1999-07-12 | 日本電気株式会社 | 半導体光素子の製造方法 |
JP2970580B2 (ja) * | 1997-03-21 | 1999-11-02 | 日本電気株式会社 | 半導体チップ、光受信モジュールおよび光受信モジュールの製造方法 |
DE19727233A1 (de) | 1997-06-26 | 1999-01-07 | Siemens Ag | Strahlungsemittierendes optoelektronisches Bauelement |
JPH11307862A (ja) * | 1998-04-21 | 1999-11-05 | Nec Corp | 半導体レーザ |
US6175446B1 (en) * | 1998-09-23 | 2001-01-16 | Sarnoff Corporation | Polarization-independent semiconductor optical amplifier |
US6222200B1 (en) | 1999-04-19 | 2001-04-24 | Nortel Networks Limited | Photodetector with spectrally extended responsivity |
KR100353419B1 (ko) * | 2000-03-10 | 2002-09-18 | 삼성전자 주식회사 | 편광 무의존 반도체 광증폭기 |
JP2002026370A (ja) * | 2000-07-06 | 2002-01-25 | Fujitsu Ltd | 半導体受光装置 |
FR2813449B1 (fr) * | 2000-08-22 | 2003-01-17 | Cit Alcatel | Dispositif optique amplificateur |
JP2002203983A (ja) * | 2000-10-27 | 2002-07-19 | Oki Electric Ind Co Ltd | 受光素子 |
US6573163B2 (en) | 2001-01-29 | 2003-06-03 | Sharp Laboratories Of America, Inc. | Method of optimizing channel characteristics using multiple masks to form laterally crystallized ELA poly-Si films |
JP4105403B2 (ja) * | 2001-04-26 | 2008-06-25 | 日本オプネクスト株式会社 | 半導体光集積素子の製造方法 |
US7120183B2 (en) * | 2001-07-11 | 2006-10-10 | Optium Corporation | Electro-absorption modulated laser with high operating temperature tolerance |
EP1282208A1 (de) * | 2001-07-30 | 2003-02-05 | Agilent Technologies, Inc. (a Delaware corporation) | Halbleiterlaserstruktur und Herstellungsverfahren |
US6483161B1 (en) * | 2001-08-14 | 2002-11-19 | Sumitomo Electric Industries, Ltd. | Submount with filter layers for mounting a bottom-incidence type photodiode |
US20040001521A1 (en) * | 2002-06-27 | 2004-01-01 | Ashish Tandon | Laser having active region formed above substrate |
US6807214B2 (en) * | 2002-08-01 | 2004-10-19 | Agilent Technologies, Inc. | Integrated laser and electro-absorption modulator with improved extinction |
KR20060028479A (ko) * | 2003-07-02 | 2006-03-29 | 코닌클리즈케 필립스 일렉트로닉스 엔.브이. | 반도체 장치 및 제조 방법, 양자 우물 구조체 제조 방법 |
KR20050073740A (ko) * | 2004-01-10 | 2005-07-18 | 삼성전자주식회사 | 이중 장벽층을 구비하는 양자우물 구조체를 포함하는반도체 소자 및 이를 채용한 반도체 레이저 및 그 제조 방법 |
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CN100384038C (zh) * | 2004-09-16 | 2008-04-23 | 中国科学院半导体研究所 | 选择区域外延生长叠层电吸收调制激光器结构的制作方法 |
CN100461472C (zh) * | 2005-04-04 | 2009-02-11 | 中国科学院半导体研究所 | 宽光谱、大功率的半导体超辐射发光二极管及制作方法 |
JP2010118454A (ja) * | 2008-11-12 | 2010-05-27 | Sumitomo Electric Device Innovations Inc | 半導体レーザ |
JP2011091163A (ja) * | 2009-10-21 | 2011-05-06 | Sumitomo Electric Ind Ltd | 半導体集積素子 |
US8558257B2 (en) | 2009-11-24 | 2013-10-15 | University Of Seoul Industry Cooperation Foundation | Coupled asymmetric quantum confinement structures |
US8098969B2 (en) * | 2009-12-08 | 2012-01-17 | Onechip Photonics Inc. | Waveguide optically pre-amplified detector with passband wavelength filtering |
US20110217045A1 (en) * | 2010-03-02 | 2011-09-08 | Onechip Photonics Inc. | Crosstalk mitigation in optical transceivers |
DE102012220548A1 (de) * | 2012-11-12 | 2014-02-27 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Empfänger und Verfahren für den Empfang optischer Signale |
WO2015162083A1 (en) | 2014-04-22 | 2015-10-29 | Wintershall Holding Ag | Process for recovery of oil |
US10962810B2 (en) * | 2018-09-27 | 2021-03-30 | Massachusetts Institute Of Technology | Strained germanium silicon optical modulator array including stress materials |
CN110336184B (zh) * | 2019-07-16 | 2021-03-12 | 山东大学 | 一种低噪声的soa-pin集成光探测器 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1330242C (en) * | 1987-11-30 | 1994-06-14 | Gte Laboratories Incorporated | Subcarrier-multiplexed optical transmission systems using optical channel selection |
US4846540A (en) * | 1988-01-25 | 1989-07-11 | Bell Communications Research, Inc. | Optical wavegide junction |
EP0361035A3 (de) * | 1988-09-27 | 1990-10-31 | Siemens Aktiengesellschaft | Halbleiterlaseranordnung und Verfahren zu ihrem Betrieb |
GB2237654B (en) * | 1989-11-02 | 1993-11-10 | Stc Plc | Semiconductor optical source |
JPH03289631A (ja) * | 1990-04-06 | 1991-12-19 | Nec Corp | 半導体光アンプ |
US5090790A (en) * | 1990-06-29 | 1992-02-25 | At&T Bell Laboratories | Polarization-independent semiconductor waveguide |
EP0469681B1 (de) * | 1990-08-03 | 1994-10-12 | Koninklijke Philips Electronics N.V. | Optischer Verstärker |
US5250462A (en) * | 1990-08-24 | 1993-10-05 | Nec Corporation | Method for fabricating an optical semiconductor device |
US5117469A (en) * | 1991-02-01 | 1992-05-26 | Bell Communications Research, Inc. | Polarization-dependent and polarization-diversified opto-electronic devices using a strained quantum well |
US5298108A (en) * | 1991-07-05 | 1994-03-29 | The University Of California | Serpentine superlattice methods and devices |
-
1993
- 1993-02-26 EP EP93103158A patent/EP0558089B1/de not_active Expired - Lifetime
- 1993-02-26 DE DE69331979T patent/DE69331979T2/de not_active Expired - Lifetime
- 1993-03-01 US US08/024,084 patent/US5574289A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0558089B1 (de) | 2002-06-05 |
US5574289A (en) | 1996-11-12 |
DE69331979D1 (de) | 2002-07-11 |
EP0558089A2 (de) | 1993-09-01 |
EP0558089A3 (en) | 1995-01-18 |
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