DE69112505D1 - Herstellung eines Glastiegels aus Quarz zur Verwendung in der Herstellung von Einkristall-Silizium. - Google Patents
Herstellung eines Glastiegels aus Quarz zur Verwendung in der Herstellung von Einkristall-Silizium.Info
- Publication number
- DE69112505D1 DE69112505D1 DE69112505T DE69112505T DE69112505D1 DE 69112505 D1 DE69112505 D1 DE 69112505D1 DE 69112505 T DE69112505 T DE 69112505T DE 69112505 T DE69112505 T DE 69112505T DE 69112505 D1 DE69112505 D1 DE 69112505D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacture
- single crystal
- quartz glass
- crystal silicon
- glass crucible
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
- C03B19/095—Other methods of shaping glass by fusing powdered glass in a shaping mould by centrifuging, e.g. arc discharge in rotating mould
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/002—Crucibles or containers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
- C03B2201/04—Hydroxyl ion (OH)
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S65/00—Glass manufacturing
- Y10S65/90—Drying, dehydration, minimizing oh groups
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Metallurgy (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Glass Melting And Manufacturing (AREA)
- Glass Compositions (AREA)
- Surface Treatment Of Glass (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16625290 | 1990-06-25 | ||
JP3093861A JP2933404B2 (ja) | 1990-06-25 | 1991-04-24 | シリコン単結晶引き上げ用石英ガラスルツボとその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69112505D1 true DE69112505D1 (de) | 1995-10-05 |
DE69112505T2 DE69112505T2 (de) | 1996-04-25 |
Family
ID=26435142
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69112505T Expired - Lifetime DE69112505T2 (de) | 1990-06-25 | 1991-06-18 | Herstellung eines Glastiegels aus Quarz zur Verwendung in der Herstellung von Einkristall-Silizium. |
Country Status (4)
Country | Link |
---|---|
US (1) | US5174801A (de) |
EP (1) | EP0463543B1 (de) |
JP (1) | JP2933404B2 (de) |
DE (1) | DE69112505T2 (de) |
Families Citing this family (62)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2888079B2 (ja) * | 1993-02-04 | 1999-05-10 | 信越半導体株式会社 | シリコン単結晶引上げ用ルツボ |
DE69508473T2 (de) * | 1994-07-06 | 1999-10-28 | Shinetsu Handotai Kk | Verfahren zur Herstellung von Silizium-Einkristall und Tiegel aus geschmolzenem Silika dafür |
JP2830987B2 (ja) * | 1994-07-19 | 1998-12-02 | 信越石英株式会社 | 石英ガラスルツボ及びその製造方法 |
US5772714A (en) * | 1995-01-25 | 1998-06-30 | Shin-Etsu Quartz Products Co., Ltd. | Process for producing opaque silica glass |
US5976247A (en) * | 1995-06-14 | 1999-11-02 | Memc Electronic Materials, Inc. | Surface-treated crucibles for improved zero dislocation performance |
US5980629A (en) * | 1995-06-14 | 1999-11-09 | Memc Electronic Materials, Inc. | Methods for improving zero dislocation yield of single crystals |
JP3533416B2 (ja) * | 1996-02-06 | 2004-05-31 | 三菱住友シリコン株式会社 | 単結晶引上装置 |
JP3764776B2 (ja) * | 1996-03-18 | 2006-04-12 | 信越石英株式会社 | 単結晶引き上げ用石英ガラスるつぼ及びその製造方法 |
EP0911429A1 (de) * | 1997-09-30 | 1999-04-28 | Heraeus Quarzglas GmbH | Quarzglastiegel zum Herstellen Siliciumeinkristall sowie Verfahren zu seiner Herstellung |
US5913975A (en) * | 1998-02-03 | 1999-06-22 | Memc Electronic Materials, Inc. | Crucible and method of preparation thereof |
DE69912668T2 (de) | 1998-02-26 | 2004-09-30 | Mitsubishi Materials Corp. | Kokille und Verfahren zur Herstellung von Siliziumstäben |
JP4398527B2 (ja) * | 1998-05-25 | 2010-01-13 | 信越石英株式会社 | シリコン単結晶引き上げ用石英ガラスるつぼ |
JP4138959B2 (ja) * | 1998-08-28 | 2008-08-27 | 信越石英株式会社 | シリコン単結晶引き上げ用大口径石英ガラスるつぼ及びその製造方法 |
US6187089B1 (en) | 1999-02-05 | 2001-02-13 | Memc Electronic Materials, Inc. | Tungsten doped crucible and method for preparing same |
JP3765368B2 (ja) * | 1999-06-01 | 2006-04-12 | 東芝セラミックス株式会社 | 石英ガラスルツボおよびその製造方法 |
US6193926B1 (en) | 1999-09-03 | 2001-02-27 | Heraeus Amersil, Inc. | Process for making molded glass and ceramic articles |
DE19962449C2 (de) * | 1999-12-22 | 2003-09-25 | Heraeus Quarzglas | Quarzglastiegel und Verfahren für seine Herstellung |
AUPR054000A0 (en) * | 2000-10-04 | 2000-10-26 | Austai Motors Designing Pty Ltd | A planetary gear apparatus |
US6510707B2 (en) * | 2001-03-15 | 2003-01-28 | Heraeus Shin-Etsu America, Inc. | Methods for making silica crucibles |
JP3983054B2 (ja) * | 2002-01-17 | 2007-09-26 | 信越石英株式会社 | シリコン単結晶引上げ用石英ガラスるつぼ及びその製造方法 |
JP4086283B2 (ja) | 2002-07-31 | 2008-05-14 | 信越石英株式会社 | シリコン単結晶引上げ用石英ガラスルツボおよびその製造方法 |
JP4453954B2 (ja) | 2003-02-28 | 2010-04-21 | 信越石英株式会社 | シリコン単結晶引上げ用石英ガラスルツボの製造方法および該製造方法で製造された石英ガラスルツボ |
EP1632592B1 (de) | 2003-05-01 | 2012-06-20 | Shin-Etsu Quartz Products Co., Ltd. | Quarzglastiegel zum hochziehen von siliciumeinkristall und herstellungsverfahren dafür |
WO2004106247A1 (ja) | 2003-05-30 | 2004-12-09 | Shin-Etsu Quartz Products Co., Ltd. | シリコン単結晶引上げ用石英ガラスルツボ |
JP4994568B2 (ja) * | 2003-12-03 | 2012-08-08 | コバレントマテリアル株式会社 | シリカガラスルツボ |
US8105457B2 (en) * | 2003-12-22 | 2012-01-31 | Asml Netherlands B.V. | Method for joining at least a first member and a second member, lithographic apparatus and device manufacturing method, as well as a device manufactured thereby |
JP4781020B2 (ja) * | 2005-06-29 | 2011-09-28 | 信越半導体株式会社 | シリコン単結晶引き上げ用石英ガラスルツボおよびシリコン単結晶引き上げ用石英ガラスルツボの製造方法 |
JP4931106B2 (ja) * | 2005-09-29 | 2012-05-16 | コバレントマテリアル株式会社 | シリカガラスルツボ |
JP4651119B2 (ja) * | 2007-02-22 | 2011-03-16 | 信越石英株式会社 | シリコン単結晶引き上げ用大口径石英ガラスるつぼ |
JP5245129B2 (ja) * | 2007-07-27 | 2013-07-24 | 株式会社Sumco | 石英ガラスルツボの製造方法 |
JP5273512B2 (ja) * | 2007-10-25 | 2013-08-28 | 株式会社Sumco | 石英ガラスルツボとその製造方法および用途 |
JP5058138B2 (ja) | 2008-12-09 | 2012-10-24 | ジャパンスーパークォーツ株式会社 | シリコン単結晶引き上げ用石英ガラスルツボ |
JP4975012B2 (ja) * | 2008-12-29 | 2012-07-11 | ジャパンスーパークォーツ株式会社 | シリコン単結晶引き上げ用石英ガラスルツボ及びその製造方法 |
US8420191B2 (en) | 2009-04-28 | 2013-04-16 | Shin-Etsu Quartz Products Co., Ltd. | Silica container and method for producing the same |
KR101315684B1 (ko) * | 2009-05-26 | 2013-10-10 | 신에쯔 세끼에이 가부시키가이샤 | 실리카 용기 및 그 제조방법 |
JP5047227B2 (ja) | 2009-05-27 | 2012-10-10 | ジャパンスーパークォーツ株式会社 | シリコン単結晶の製造方法及びシリコン単結晶引き上げ装置 |
JP4951040B2 (ja) * | 2009-08-05 | 2012-06-13 | 信越石英株式会社 | シリカ容器及びその製造方法 |
JP5713903B2 (ja) | 2009-08-12 | 2015-05-07 | 株式会社Sumco | シリカガラスルツボの製造装置及びシリカガラスルツボの製造方法 |
JP5453679B2 (ja) | 2009-10-02 | 2014-03-26 | 株式会社Sumco | シリカガラスルツボの製造装置及びシリカガラスルツボの製造方法 |
WO2011074568A1 (ja) | 2009-12-14 | 2011-06-23 | ジャパンスーパークォーツ株式会社 | シリカガラスルツボおよびその製造方法 |
DE102010008162B4 (de) * | 2010-02-16 | 2017-03-16 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung von Quarzglas für einen Quarzglastiegel |
JP5130323B2 (ja) * | 2010-05-07 | 2013-01-30 | 信越石英株式会社 | 多結晶シリコンインゴット製造用角形シリカ容器及びその製造方法 |
JP5130334B2 (ja) * | 2010-08-06 | 2013-01-30 | 信越石英株式会社 | 多結晶シリコンインゴット製造用角形シリカ容器並びに多孔質シリカ板体及びその製造方法 |
JP5226754B2 (ja) * | 2010-10-08 | 2013-07-03 | 信越石英株式会社 | シリコン単結晶引き上げ用大口径石英ガラスるつぼの製造方法 |
JP5605902B2 (ja) * | 2010-12-01 | 2014-10-15 | 株式会社Sumco | シリカガラスルツボの製造方法、シリカガラスルツボ |
JP5500689B2 (ja) * | 2010-12-03 | 2014-05-21 | 株式会社Sumco | シリカガラスルツボ |
JP5749147B2 (ja) | 2010-12-31 | 2015-07-15 | 株式会社Sumco | シリカガラスルツボの製造方法 |
JP5714476B2 (ja) | 2010-12-31 | 2015-05-07 | 株式会社Sumco | シリカガラスルツボの製造方法 |
JP5777881B2 (ja) | 2010-12-31 | 2015-09-09 | 株式会社Sumco | シリカガラスルツボの製造方法 |
JP5777880B2 (ja) | 2010-12-31 | 2015-09-09 | 株式会社Sumco | シリカガラスルツボの製造方法 |
JP5781303B2 (ja) | 2010-12-31 | 2015-09-16 | 株式会社Sumco | シリカガラスルツボ製造方法およびシリカガラスルツボ製造装置 |
JP5762777B2 (ja) * | 2011-02-01 | 2015-08-12 | 信越石英株式会社 | 多結晶シリコンインゴット製造用角形シリカ容器並びに多孔質シリカ板体及びその製造方法 |
JP5762784B2 (ja) * | 2011-03-25 | 2015-08-12 | 信越石英株式会社 | 多結晶シリコンインゴット製造用角形シリカ容器並びに多孔質シリカ板体及びその製造方法 |
JP5762945B2 (ja) * | 2011-12-30 | 2015-08-12 | 株式会社Sumco | シリカガラスルツボ |
KR101623178B1 (ko) * | 2011-12-31 | 2016-05-20 | 가부시키가이샤 섬코 | 실리카 유리 도가니의 제조 조건의 설정을 지원하는 장치, 실리카 유리 도가니 제조용 몰드의 제조 조건의 설정을 지원하는 장치, 실리카 유리 도가니를 이용한 실리콘 단결정 인상의 조건 설정을 지원하는 장치 |
WO2013140706A1 (ja) * | 2012-03-23 | 2013-09-26 | 信越石英株式会社 | 単結晶シリコン引き上げ用シリカ容器及びその製造方法 |
JP5668717B2 (ja) * | 2012-04-19 | 2015-02-12 | 信越半導体株式会社 | シリコン単結晶の製造方法 |
FR2993580B1 (fr) * | 2012-07-23 | 2016-12-23 | Univ Pierre Et Marie Curie (Paris 6) | Procede de preparation d'une couche de quartz-alpha epitaxiee sur support solide, materiau obtenu et applications |
JP5487259B2 (ja) * | 2012-08-07 | 2014-05-07 | 信越石英株式会社 | シリカ容器 |
US9587324B2 (en) | 2014-05-12 | 2017-03-07 | Varian Semiconductor Equipment Associates, Inc. | Apparatus for processing a melt |
JP2019167263A (ja) * | 2018-03-23 | 2019-10-03 | クアーズテック株式会社 | 石英ガラスルツボおよび石英ガラスルツボの製造方法 |
CN112779600B (zh) * | 2019-11-08 | 2022-04-19 | 徐晓军 | 一种石英坩埚及其制备方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5849519B2 (ja) * | 1977-03-17 | 1983-11-04 | 東芝セラミツクス株式会社 | シリコン単結晶引上用石英ガラスルツボ |
DE2928089C3 (de) * | 1979-07-12 | 1982-03-04 | Heraeus Quarzschmelze Gmbh, 6450 Hanau | Verbundtiegel für halbleitertechnologische Zwecke und Verfahren zur Herstellung |
JPS59129421A (ja) * | 1983-01-14 | 1984-07-25 | Toshiba Ceramics Co Ltd | 半導体熱処理用部材 |
JPS59213697A (ja) * | 1983-05-20 | 1984-12-03 | Toshiba Ceramics Co Ltd | 単結晶半導体引上装置 |
JPS6144793A (ja) * | 1984-08-09 | 1986-03-04 | Toshiba Ceramics Co Ltd | シリコン単結晶引上げ用石英ガラスルツボ |
JPS6236974A (ja) * | 1985-08-09 | 1987-02-17 | Canon Inc | デ−タ通信装置 |
US4632686A (en) * | 1986-02-24 | 1986-12-30 | Gte Products Corporation | Method of manufacturing quartz glass crucibles with low bubble content |
US4713104A (en) * | 1986-03-31 | 1987-12-15 | Gte Products Corporation | Quartz glass crucibles |
JPH068181B2 (ja) * | 1987-03-26 | 1994-02-02 | 信越石英株式会社 | 半導体工業用石英ガラス製品 |
JPH01148718A (ja) * | 1987-12-03 | 1989-06-12 | Shin Etsu Handotai Co Ltd | 石英るつぼの製造方法 |
US4935046A (en) * | 1987-12-03 | 1990-06-19 | Shin-Etsu Handotai Company, Limited | Manufacture of a quartz glass vessel for the growth of single crystal semiconductor |
JPH01148783A (ja) * | 1987-12-03 | 1989-06-12 | Shin Etsu Handotai Co Ltd | 単結晶引き上げ用石英ルツボ |
JPH01261293A (ja) * | 1988-04-12 | 1989-10-18 | Mitsubishi Metal Corp | シリコン単結晶引上げ用石英ルツボ |
JPH068237B2 (ja) * | 1988-04-28 | 1994-02-02 | 三菱マテリアル株式会社 | シリコン単結晶引上げ用石英ルツボ |
US4979973A (en) * | 1988-09-13 | 1990-12-25 | Shin-Etsu Chemical Co., Ltd. | Preparation of fused silica glass by hydrolysis of methyl silicate |
-
1991
- 1991-04-24 JP JP3093861A patent/JP2933404B2/ja not_active Expired - Lifetime
- 1991-06-18 EP EP91109973A patent/EP0463543B1/de not_active Expired - Lifetime
- 1991-06-18 DE DE69112505T patent/DE69112505T2/de not_active Expired - Lifetime
- 1991-06-19 US US07/717,541 patent/US5174801A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0463543A1 (de) | 1992-01-02 |
EP0463543B1 (de) | 1995-08-30 |
JP2933404B2 (ja) | 1999-08-16 |
DE69112505T2 (de) | 1996-04-25 |
JPH05105577A (ja) | 1993-04-27 |
US5174801A (en) | 1992-12-29 |
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