DE69111027T2 - Elektrostatische Halteplatte. - Google Patents

Elektrostatische Halteplatte.

Info

Publication number
DE69111027T2
DE69111027T2 DE69111027T DE69111027T DE69111027T2 DE 69111027 T2 DE69111027 T2 DE 69111027T2 DE 69111027 T DE69111027 T DE 69111027T DE 69111027 T DE69111027 T DE 69111027T DE 69111027 T2 DE69111027 T2 DE 69111027T2
Authority
DE
Germany
Prior art keywords
holding plate
electrostatic holding
electrostatic
plate
holding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69111027T
Other languages
English (en)
Other versions
DE69111027D1 (de
Inventor
Toshihisa Nozawa
Junichi Arami
Shinji Kubota
Isahiro Hasegawa
Katsuya Okumura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Tokyo Electron Ltd
Original Assignee
Toshiba Corp
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Electron Ltd filed Critical Toshiba Corp
Publication of DE69111027D1 publication Critical patent/DE69111027D1/de
Application granted granted Critical
Publication of DE69111027T2 publication Critical patent/DE69111027T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H01L21/6833—Details of electrostatic chucks
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T279/00—Chucks or sockets
    • Y10T279/23—Chucks or sockets with magnetic or electrostatic means
DE69111027T 1990-11-17 1991-11-15 Elektrostatische Halteplatte. Expired - Lifetime DE69111027T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31247990A JP3238925B2 (ja) 1990-11-17 1990-11-17 静電チャック

Publications (2)

Publication Number Publication Date
DE69111027D1 DE69111027D1 (de) 1995-08-10
DE69111027T2 true DE69111027T2 (de) 1996-01-04

Family

ID=18029708

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69111027T Expired - Lifetime DE69111027T2 (de) 1990-11-17 1991-11-15 Elektrostatische Halteplatte.

Country Status (6)

Country Link
US (1) US5539179A (de)
EP (1) EP0486966B1 (de)
JP (1) JP3238925B2 (de)
KR (1) KR100220212B1 (de)
DE (1) DE69111027T2 (de)
TW (1) TW212253B (de)

Families Citing this family (79)

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US5511799A (en) * 1993-06-07 1996-04-30 Applied Materials, Inc. Sealing device useful in semiconductor processing apparatus for bridging materials having a thermal expansion differential
US5885469B1 (en) * 1996-11-05 2000-08-08 Applied Materials Inc Topographical structure of an electrostatic chuck and method of fabricating same
US6278600B1 (en) * 1994-01-31 2001-08-21 Applied Materials, Inc. Electrostatic chuck with improved temperature control and puncture resistance
US5631803A (en) * 1995-01-06 1997-05-20 Applied Materials, Inc. Erosion resistant electrostatic chuck with improved cooling system
US5883778A (en) * 1994-02-28 1999-03-16 Applied Materials, Inc. Electrostatic chuck with fluid flow regulator
EP0669644B1 (de) * 1994-02-28 1997-08-20 Applied Materials, Inc. Elektrostatische Halteplatte
US5528451A (en) * 1994-11-02 1996-06-18 Applied Materials, Inc Erosion resistant electrostatic chuck
US5691876A (en) * 1995-01-31 1997-11-25 Applied Materials, Inc. High temperature polyimide electrostatic chuck
US5644467A (en) * 1995-09-28 1997-07-01 Applied Materials, Inc. Method and structure for improving gas breakdown resistance and reducing the potential of arcing in a electrostatic chuck
JPH09213781A (ja) * 1996-02-01 1997-08-15 Tokyo Electron Ltd 載置台構造及びそれを用いた処理装置
US5810933A (en) * 1996-02-16 1998-09-22 Novellus Systems, Inc. Wafer cooling device
US5761023A (en) * 1996-04-25 1998-06-02 Applied Materials, Inc. Substrate support with pressure zones having reduced contact area and temperature feedback
US6117246A (en) * 1997-01-31 2000-09-12 Applied Materials, Inc. Conductive polymer pad for supporting a workpiece upon a workpiece support surface of an electrostatic chuck
TW422892B (en) * 1997-03-27 2001-02-21 Applied Materials Inc Technique for improving chucking reproducibility
US5841624A (en) * 1997-06-09 1998-11-24 Applied Materials, Inc. Cover layer for a substrate support chuck and method of fabricating same
US6088213A (en) * 1997-07-11 2000-07-11 Applied Materials, Inc. Bipolar electrostatic chuck and method of making same
KR100291585B1 (ko) * 1997-07-25 2001-11-30 윤종용 반도체장치의금속막식각방법
JP4013386B2 (ja) 1998-03-02 2007-11-28 住友電気工業株式会社 半導体製造用保持体およびその製造方法
EP0948042A1 (de) * 1998-03-06 1999-10-06 VenTec Gesellschaft für Venturekapital und Unternehmensberatung Elektrostatische Vorrichtung zum Halten von Wafern und anderen Bauteilen
US6104596A (en) * 1998-04-21 2000-08-15 Applied Materials, Inc. Apparatus for retaining a subtrate in a semiconductor wafer processing system and a method of fabricating same
US6080272A (en) 1998-05-08 2000-06-27 Micron Technology, Inc. Method and apparatus for plasma etching a wafer
US6073577A (en) 1998-06-30 2000-06-13 Lam Research Corporation Electrode for plasma processes and method for manufacture and use thereof
US6259592B1 (en) 1998-11-19 2001-07-10 Applied Materials, Inc. Apparatus for retaining a workpiece upon a workpiece support and method of manufacturing same
DE19853588B4 (de) * 1998-11-20 2005-04-21 Leica Microsystems Lithography Gmbh Halteeinrichtung für ein Substrat
JP3990076B2 (ja) * 1999-06-30 2007-10-10 株式会社東芝 半導体装置の製造方法
JP2002057207A (ja) * 2000-01-20 2002-02-22 Sumitomo Electric Ind Ltd 半導体製造装置用ウェハ保持体およびその製造方法ならびに半導体製造装置
US6414271B2 (en) * 2000-05-25 2002-07-02 Kyocera Corporation Contact heating device
US6494958B1 (en) * 2000-06-29 2002-12-17 Applied Materials Inc. Plasma chamber support with coupled electrode
US6503368B1 (en) 2000-06-29 2003-01-07 Applied Materials Inc. Substrate support having bonded sections and method
US6780696B1 (en) * 2000-09-12 2004-08-24 Alien Technology Corporation Method and apparatus for self-assembly of functional blocks on a substrate facilitated by electrode pairs
JP4366856B2 (ja) * 2000-10-23 2009-11-18 東京エレクトロン株式会社 プラズマ処理装置
US6847014B1 (en) 2001-04-30 2005-01-25 Lam Research Corporation Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support
US7161121B1 (en) * 2001-04-30 2007-01-09 Lam Research Corporation Electrostatic chuck having radial temperature control capability
CN100401852C (zh) * 2001-04-30 2008-07-09 科林研发公司 用于控制工件支架表面上空间温度分布的方法与装置
US20050211385A1 (en) 2001-04-30 2005-09-29 Lam Research Corporation, A Delaware Corporation Method and apparatus for controlling spatial temperature distribution
DE10122036B4 (de) * 2001-05-07 2009-12-24 Karl Suss Dresden Gmbh Substrathaltevorrichtung für Prober zum Testen von Schaltungsanordnungen auf scheibenförmigen Substraten
US20040021475A1 (en) * 2001-06-06 2004-02-05 Atsushi Ito Wafer prober
US6483690B1 (en) * 2001-06-28 2002-11-19 Lam Research Corporation Ceramic electrostatic chuck assembly and method of making
US6490145B1 (en) 2001-07-18 2002-12-03 Applied Materials, Inc. Substrate support pedestal
JP4082924B2 (ja) * 2002-04-16 2008-04-30 キヤノンアネルバ株式会社 静電吸着ホルダー及び基板処理装置
KR100899292B1 (ko) * 2003-01-06 2009-05-26 주식회사 코미코 수명을 연장시키는 절연막을 갖는 반도체 장비용 정전척
TWI327336B (en) * 2003-01-13 2010-07-11 Oc Oerlikon Balzers Ag Arrangement for processing a substrate
US20040173469A1 (en) * 2003-03-04 2004-09-09 Ryujiro Udo Plasma processing apparatus and method for manufacturing electrostatic chuck
US6770852B1 (en) 2003-02-27 2004-08-03 Lam Research Corporation Critical dimension variation compensation across a wafer by means of local wafer temperature control
US7230204B2 (en) * 2003-03-28 2007-06-12 Tokyo Electron Limited Method and system for temperature control of a substrate
US7151658B2 (en) * 2003-04-22 2006-12-19 Axcelis Technologies, Inc. High-performance electrostatic clamp comprising a resistive layer, micro-grooves, and dielectric layer
CN1310285C (zh) * 2003-05-12 2007-04-11 东京毅力科创株式会社 处理装置
JP4057977B2 (ja) * 2003-08-08 2008-03-05 株式会社巴川製紙所 静電チャック装置用電極シート、静電チャック装置および吸着方法
KR100841148B1 (ko) 2003-10-27 2008-06-24 교세라 가부시키가이샤 복합재료와 웨이퍼 유지부재 및 이들의 제조방법
US6897945B1 (en) * 2003-12-15 2005-05-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7088431B2 (en) 2003-12-17 2006-08-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7595972B2 (en) * 2004-04-09 2009-09-29 Varian Semiconductor Equipment Associates, Inc. Clamp for use in processing semiconductor workpieces
US8038796B2 (en) 2004-12-30 2011-10-18 Lam Research Corporation Apparatus for spatial and temporal control of temperature on a substrate
DE102005056364B3 (de) * 2005-11-25 2007-08-16 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Bipolarer Trägerwafer und mobile, bipolare, elektrostatische Waferanordnung
KR20090107514A (ko) * 2006-12-26 2009-10-13 후지필름 디마틱스, 인크. 전도성 요소를 구비한 인쇄 시스템
JP5025576B2 (ja) * 2008-06-13 2012-09-12 新光電気工業株式会社 静電チャック及び基板温調固定装置
KR100978245B1 (ko) 2008-06-27 2010-08-26 김혜란 4중막 구조를 가지는 정전척
TWI449597B (zh) * 2008-07-09 2014-08-21 Iv Technologies Co Ltd 研磨墊及其製造方法
US8405005B2 (en) * 2009-02-04 2013-03-26 Mattson Technology, Inc. Electrostatic chuck system and process for radially tuning the temperature profile across the surface of a substrate
JP5416570B2 (ja) * 2009-12-15 2014-02-12 住友電気工業株式会社 加熱冷却デバイスおよびそれを搭載した装置
US20130015053A1 (en) * 2011-07-12 2013-01-17 Varian Semiconductor Equipment Associates, Inc. Inductively coupled rf plasma source with magnetic confinement and faraday shielding
US10224182B2 (en) 2011-10-17 2019-03-05 Novellus Systems, Inc. Mechanical suppression of parasitic plasma in substrate processing chamber
US9859142B2 (en) 2011-10-20 2018-01-02 Lam Research Corporation Edge seal for lower electrode assembly
US9869392B2 (en) 2011-10-20 2018-01-16 Lam Research Corporation Edge seal for lower electrode assembly
JP6006972B2 (ja) * 2012-04-26 2016-10-12 新光電気工業株式会社 静電チャック
US20140116622A1 (en) * 2012-10-31 2014-05-01 Semes Co. Ltd. Electrostatic chuck and substrate processing apparatus
US10090211B2 (en) 2013-12-26 2018-10-02 Lam Research Corporation Edge seal for lower electrode assembly
KR101709969B1 (ko) 2015-02-25 2017-02-27 (주)티티에스 바이폴라 정전척 제조방법
WO2016158110A1 (ja) * 2015-03-31 2016-10-06 住友大阪セメント株式会社 静電チャック装置
KR101698433B1 (ko) * 2015-04-30 2017-01-20 주식회사 에이씨엔 기상식각 및 세정을 위한 플라즈마 장치
DE102015210736B3 (de) * 2015-06-11 2016-10-27 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung mit folie zum elektrostatischen koppeln eines substrats mit einem substratträger
US20170352565A1 (en) * 2016-06-07 2017-12-07 Chunlei Zhang Workpiece carrier with gas pressure in inner cavities
KR101910347B1 (ko) 2016-12-05 2018-10-23 주식회사 글로벌스탠다드테크놀로지 반도체 제조설비의 고도화 온도제어장치
JP6905382B2 (ja) * 2017-04-14 2021-07-21 株式会社ディスコ ウェーハの搬入出方法
CN111357096A (zh) * 2017-11-24 2020-06-30 东华隆株式会社 发热部件
JP2023031603A (ja) 2021-08-25 2023-03-09 新光電気工業株式会社 基板固定装置

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US4724510A (en) * 1986-12-12 1988-02-09 Tegal Corporation Electrostatic wafer clamp
JPH01284533A (ja) * 1988-05-11 1989-11-15 Tdk Corp オレフィン樹脂の接着方法
JPH0227748A (ja) * 1988-07-16 1990-01-30 Tomoegawa Paper Co Ltd 静電チャック装置及びその作成方法
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JPH02304946A (ja) * 1989-05-19 1990-12-18 Mitsui Petrochem Ind Ltd 静電チャック
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Also Published As

Publication number Publication date
DE69111027D1 (de) 1995-08-10
EP0486966B1 (de) 1995-07-05
KR100220212B1 (ko) 1999-10-01
TW212253B (de) 1993-09-01
EP0486966A1 (de) 1992-05-27
JPH04186653A (ja) 1992-07-03
US5539179A (en) 1996-07-23
JP3238925B2 (ja) 2001-12-17
KR920010714A (ko) 1992-06-27

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