DE602006015126D1 - Randbelichtungsapparat, Beschichtungs- und Entwicklungsapparat und Randbelichtungsmethode - Google Patents

Randbelichtungsapparat, Beschichtungs- und Entwicklungsapparat und Randbelichtungsmethode

Info

Publication number
DE602006015126D1
DE602006015126D1 DE602006015126T DE602006015126T DE602006015126D1 DE 602006015126 D1 DE602006015126 D1 DE 602006015126D1 DE 602006015126 T DE602006015126 T DE 602006015126T DE 602006015126 T DE602006015126 T DE 602006015126T DE 602006015126 D1 DE602006015126 D1 DE 602006015126D1
Authority
DE
Germany
Prior art keywords
edge exposure
coating
developing apparatus
exposure method
developing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE602006015126T
Other languages
German (de)
English (en)
Inventor
Yasuharu Iwashita
Ichiro Shimomura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of DE602006015126D1 publication Critical patent/DE602006015126D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2026—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2026—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction
    • G03F7/2028—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction of an edge bead on wafers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0448—Apparatus for applying a liquid, a resin, an ink or the like

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE602006015126T 2005-05-09 2006-05-08 Randbelichtungsapparat, Beschichtungs- und Entwicklungsapparat und Randbelichtungsmethode Expired - Lifetime DE602006015126D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005136575A JP4642543B2 (ja) 2005-05-09 2005-05-09 周縁露光装置、塗布、現像装置及び周縁露光方法

Publications (1)

Publication Number Publication Date
DE602006015126D1 true DE602006015126D1 (de) 2010-08-12

Family

ID=36808766

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006015126T Expired - Lifetime DE602006015126D1 (de) 2005-05-09 2006-05-08 Randbelichtungsapparat, Beschichtungs- und Entwicklungsapparat und Randbelichtungsmethode

Country Status (7)

Country Link
US (1) US7573054B2 (https=)
EP (1) EP1722402B1 (https=)
JP (1) JP4642543B2 (https=)
KR (1) KR101105568B1 (https=)
CN (1) CN100465795C (https=)
DE (1) DE602006015126D1 (https=)
TW (1) TW200710583A (https=)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100733137B1 (ko) * 2006-06-14 2007-06-28 삼성전자주식회사 웨이퍼 에지 노광 장치
US7659965B2 (en) * 2006-10-06 2010-02-09 Wafertech, Llc High throughput wafer stage design for optical lithography exposure apparatus
CN101216679B (zh) * 2007-12-28 2011-03-30 上海微电子装备有限公司 一种边缘曝光装置
US7901854B2 (en) * 2009-05-08 2011-03-08 Taiwan Semiconductor Manufacturing Co., Ltd. Wafer edge exposure unit
US8625076B2 (en) * 2010-02-09 2014-01-07 Taiwan Semiconductor Manufacturing Co., Ltd. Wafer edge exposure module
JP5327135B2 (ja) * 2010-05-11 2013-10-30 東京エレクトロン株式会社 周縁露光装置及び周縁露光方法
CN103034062B (zh) * 2011-09-29 2014-11-26 中芯国际集成电路制造(北京)有限公司 用于晶片边缘曝光的方法、光学模块和自动聚焦系统
US9196515B2 (en) 2012-03-26 2015-11-24 Taiwan Semiconductor Manufacturing Co., Ltd. Litho cluster and modulization to enhance productivity
US8903532B2 (en) * 2012-03-26 2014-12-02 Taiwan Semiconductor Manufacturing Co., Ltd. Litho cluster and modulization to enhance productivity
JP5873907B2 (ja) * 2013-09-03 2016-03-01 キヤノン・コンポーネンツ株式会社 照明装置、イメージセンサユニット、画像読取装置および画像形成装置
US9287151B2 (en) * 2014-01-10 2016-03-15 Taiwan Semiconductor Manufacturing Co., Ltd Systems and method for transferring a semiconductor substrate
US9891529B2 (en) * 2014-03-28 2018-02-13 Taiwan Semiconductor Manufacturing Co., Ltd Light transmission device and method for semiconductor manufacturing process
JP6661270B2 (ja) * 2015-01-16 2020-03-11 キヤノン株式会社 露光装置、露光システム、および物品の製造方法
JP6444909B2 (ja) * 2016-02-22 2018-12-26 東京エレクトロン株式会社 基板処理方法、基板処理装置及びコンピュータ読み取り可能な記録媒体
US10558125B2 (en) * 2016-11-17 2020-02-11 Tokyo Electron Limited Exposure apparatus, exposure apparatus adjustment method and storage medium
US10747121B2 (en) * 2016-12-13 2020-08-18 Tokyo Electron Limited Optical processing apparatus and substrate processing apparatus
JP7124277B2 (ja) * 2016-12-13 2022-08-24 東京エレクトロン株式会社 光処理装置及び基板処理装置
CN108803245B (zh) * 2017-04-28 2020-04-10 上海微电子装备（集团）股份有限公司 硅片处理装置及方法
US10295909B2 (en) 2017-09-26 2019-05-21 Taiwan Semiconductor Manufacturing Co., Ltd. Edge-exposure tool with an ultraviolet (UV) light emitting diode (LED)
JP7312692B2 (ja) * 2019-12-25 2023-07-21 株式会社Ｓｃｒｅｅｎホールディングス エッジ露光装置およびエッジ露光方法
CN111427231A (zh) * 2020-04-09 2020-07-17 深圳市华星光电半导体显示技术有限公司 掩膜板和新型产线
CN112799282A (zh) * 2020-12-30 2021-05-14 六安优云通信技术有限公司 一种电源芯片制造用晶圆光刻显影蚀刻装置及其制备工艺
KR102951220B1 (ko) * 2023-05-19 2026-04-10 세메스 주식회사 기판 처리 장치 및 기판 처리 방법

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH053214Y2 (https=) * 1987-01-06 1993-01-26
KR960016175B1 (en) * 1987-08-28 1996-12-04 Tokyo Electron Ltd Exposing method and apparatus thereof
JPH0750680B2 (ja) * 1988-12-28 1995-05-31 ウシオ電機株式会社 ウエハ周辺露光装置
JPH0775220B2 (ja) * 1991-03-20 1995-08-09 ウシオ電機株式会社 ウエハ上の不要レジスト露光方法
JPH06112103A (ja) * 1992-09-24 1994-04-22 Mitsubishi Electric Corp 露光装置および露光方法
KR0179163B1 (ko) * 1995-12-26 1999-03-20 문정환 비휘발성 메모리 셀 및 그 제조방법
JP3237522B2 (ja) 1996-02-05 2001-12-10 ウシオ電機株式会社 ウエハ周辺露光方法および装置
JPH09283396A (ja) * 1996-04-08 1997-10-31 Sony Corp 周辺露光装置および周辺露光方法
JP2924881B2 (ja) * 1997-01-27 1999-07-26 住友電気工業株式会社 波長可変光源およびｏｔｄｒ装置
JPH10233354A (ja) * 1997-02-20 1998-09-02 Ushio Inc 紫外線照射装置
JPH10335216A (ja) 1997-05-30 1998-12-18 Dainippon Screen Mfg Co Ltd 基板処理方法
KR100250152B1 (ko) * 1997-11-15 2000-03-15 유무성 노광장치
JP3356047B2 (ja) 1997-11-26 2002-12-09 ウシオ電機株式会社 ウエハ周辺露光装置
JP2000077299A (ja) * 1998-08-28 2000-03-14 Dainippon Screen Mfg Co Ltd 基板端縁露光装置
US6240874B1 (en) * 1999-05-27 2001-06-05 Advanced Micro Devices, Inc. Integrated edge exposure and hot/cool plate for a wafer track system
JP2001007012A (ja) * 1999-06-24 2001-01-12 Dainippon Screen Mfg Co Ltd 露光装置
WO2001011396A1 (en) * 1999-08-11 2001-02-15 Luckoff Display Corporation Direction of optical signals by a movable diffractive optical element
KR100597043B1 (ko) * 2001-05-08 2006-07-04 에이에스엠엘 네델란즈 비.브이. 광학적 노광방법, 디바이스제조방법 및 리소그래피투영장치
KR100387418B1 (ko) 2001-05-23 2003-06-18 한국디엔에스 주식회사 반도체 제조 공정에서 사용되는 스피너 시스템
KR20020094504A (ko) 2001-06-12 2002-12-18 삼성전자 주식회사 웨이퍼 에지 노광 장치
JP4090273B2 (ja) 2002-05-23 2008-05-28 株式会社Ｓｏｋｕｄｏ エッジ露光装置
KR100478730B1 (ko) * 2002-07-30 2005-03-24 주식회사 제일 기판 주변 노광 장치
KR20040024165A (ko) 2002-09-13 2004-03-20 삼성전자주식회사 웨이퍼 에지 노광 장치
JP4318913B2 (ja) * 2002-12-26 2009-08-26 東京エレクトロン株式会社 塗布処理装置
JP4083100B2 (ja) * 2003-09-22 2008-04-30 株式会社Ｓｏｋｕｄｏ 周縁部露光装置
KR100585170B1 (ko) * 2004-12-27 2006-06-02 삼성전자주식회사 트윈 기판 스테이지를 구비한 스캐너 장치, 이를 포함하는반도체 사진 설비 및 상기 설비를 이용한 반도체 소자의제조방법

Also Published As

Publication number Publication date
CN100465795C (zh) 2009-03-04
TWI334061B (https=) 2010-12-01
US20060250594A1 (en) 2006-11-09
US7573054B2 (en) 2009-08-11
EP1722402A2 (en) 2006-11-15
EP1722402B1 (en) 2010-06-30
CN1862387A (zh) 2006-11-15
KR101105568B1 (ko) 2012-01-17
JP2006313862A (ja) 2006-11-16
JP4642543B2 (ja) 2011-03-02
EP1722402A3 (en) 2007-08-01
TW200710583A (en) 2007-03-16
KR20060116167A (ko) 2006-11-14

Similar Documents

Publication Publication Date Title
DE602006015126D1 (de) Randbelichtungsapparat, Beschichtungs- und Entwicklungsapparat und Randbelichtungsmethode
TWI348596B (en) Exposure apparatus and method
NL1028549A1 (nl) Patroonbelichtingswerkwijze en patroonbelichtingsinrichting.
DE602006012746D1 (de) Lithografische Vorrichtung und Herstellungsverfahren
DE602006020651D1 (de) Kalibrierverfahren und -vorrichtung
EP1986221A4 (en) EXPOSURE METHOD, EXPOSURE DEVICE, PHOTOMASK AND PHOTO MASK MANUFACTURING METHOD
DE602005010658D1 (de) Lithografische Vorrichtung und Herstellungsverfahren
SG124385A1 (en) Coating and developing system and coating and developing method
NL2002016A1 (nl) Exposure apparatus and method for photolithography process.
SG124420A1 (en) Coating and developing system and coating and developing method
DE602005016740D1 (de) Elektronenstrahlbelichtungsapparat
NL1031119A1 (nl) Blootstellingswerkwijze van een patroon en inrichting.
EP2006899A4 (en) Stage apparatus, exposure apparatus, stage control method, exposure method and device manufacturing method
IL186919A0 (en) Exposure method, exposure apparatus, and device manufacturing method
EP1796144A4 (en) PLATINUM APPARATUS AND EXPOSURE APPARATUS
DE602005009246D1 (de) Lithografische Vorrichtung und Herstellungsverfahren dafür
DE602005023094D1 (de) Entwickler und Bilderzeugungsmethode
DE602004023663D1 (de) Projektionsbelichtungsmaske, Projektionsbelichtungsvorrichtung und Projektionsbelichtungsmethode
NL2003204A1 (nl) Lithographic apparatus and method.
EP1895570A4 (en) EXPOSURE METHOD AND APPARATUS, AND DEVICE MANUFACTURING METHOD
DE602006008680D1 (de) Bildverarbeitungsvorrichtung und -verfahren
FI20055280A0 (fi) Menetelmä ja laitteisto kaasun poistamiseksi päällystysaineesta
DE602004009843D1 (de) Projektionsbelichtungsapparat
NL1032675A1 (nl) Bestralingswerkwijze en apparaat voor onderdompelingslithografie.
DE602006005749D1 (de) Bildverarbeitungsvorrichtung, Bildverarbeitungsverfahren und Bildverarbeitungsprogramm