DE60139535D1 - Raster Ladungsträgerstrahlmikroskop - Google Patents

Raster Ladungsträgerstrahlmikroskop

Info

Publication number
DE60139535D1
DE60139535D1 DE60139535T DE60139535T DE60139535D1 DE 60139535 D1 DE60139535 D1 DE 60139535D1 DE 60139535 T DE60139535 T DE 60139535T DE 60139535 T DE60139535 T DE 60139535T DE 60139535 D1 DE60139535 D1 DE 60139535D1
Authority
DE
Germany
Prior art keywords
raster
charged particle
particle beam
beam microscope
microscope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60139535T
Other languages
English (en)
Inventor
Tohru Ishitani
Hideo Todokoro
Mitsugu Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE60139535D1 publication Critical patent/DE60139535D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
DE60139535T 2000-10-12 2001-08-29 Raster Ladungsträgerstrahlmikroskop Expired - Lifetime DE60139535D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000316843A JP3987276B2 (ja) 2000-10-12 2000-10-12 試料像形成方法

Publications (1)

Publication Number Publication Date
DE60139535D1 true DE60139535D1 (de) 2009-09-24

Family

ID=18795732

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60139535T Expired - Lifetime DE60139535D1 (de) 2000-10-12 2001-08-29 Raster Ladungsträgerstrahlmikroskop

Country Status (4)

Country Link
US (1) US7186975B2 (de)
EP (1) EP1197985B1 (de)
JP (1) JP3987276B2 (de)
DE (1) DE60139535D1 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10301579A1 (de) 2003-01-16 2004-07-29 Leo Elektronenmikroskopie Gmbh Elektronenstrahlgerät und Detektoranordnung
EP1577926A1 (de) * 2004-03-19 2005-09-21 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh Teilchenstrahlsystem mit hoher Stromdichte
US7173259B2 (en) * 2004-06-09 2007-02-06 Taiwan Semiconductor Manufacturing Co., Ltd. Automatically aligning objective aperture for a scanning electron microscope
JP4445893B2 (ja) * 2005-04-06 2010-04-07 株式会社日立ハイテクノロジーズ 走査形電子顕微鏡
JP4708854B2 (ja) * 2005-05-13 2011-06-22 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US8026491B2 (en) * 2006-03-08 2011-09-27 Hitachi High-Technologies Corporation Charged particle beam apparatus and method for charged particle beam adjustment
JP2009531855A (ja) * 2006-03-27 2009-09-03 マルチビーム システムズ インコーポレイテッド 高電流密度パターン化荷電粒子ビーム生成のための光学系
JP5097512B2 (ja) * 2006-11-21 2012-12-12 株式会社日立ハイテクノロジーズ 荷電粒子ビーム用軌道補正器、及び荷電粒子ビーム装置
JP5438937B2 (ja) * 2008-09-05 2014-03-12 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置
US8581190B2 (en) * 2008-09-25 2013-11-12 Hitachi High-Technologies Corporation Charged particle beam apparatus and geometrical aberration measurement method therefor
JP5208910B2 (ja) * 2009-12-07 2013-06-12 株式会社日立ハイテクノロジーズ 透過型電子顕微鏡及び試料観察方法
JP5677081B2 (ja) 2010-12-28 2015-02-25 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5581248B2 (ja) * 2011-03-08 2014-08-27 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
EP2704177B1 (de) * 2012-09-04 2014-11-26 Fei Company Verfahren zur Untersuchung und Korrektur von Aberrationen in einem Linsensystem mit geladenen Teilchen
JP6470654B2 (ja) 2015-07-24 2019-02-13 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US10460905B2 (en) * 2015-09-23 2019-10-29 Kla-Tencor Corporation Backscattered electrons (BSE) imaging using multi-beam tools
JP6568646B2 (ja) 2016-03-29 2019-08-28 株式会社日立ハイテクノロジーズ 電子顕微鏡
JP6900026B2 (ja) * 2017-03-27 2021-07-07 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
JP6913344B2 (ja) * 2017-03-27 2021-08-04 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
JP2020181629A (ja) 2017-07-27 2020-11-05 株式会社日立ハイテク 電子線観察装置、電子線観察システム及び電子線観察装置の制御方法
EP3550585B1 (de) * 2018-04-05 2021-06-23 FEI Company Untersuchung dynamischer proben in einem transmissionsteilchenmikroskop
JP7106685B2 (ja) 2019-01-28 2022-07-26 株式会社日立ハイテク 電子線応用装置

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3714422A (en) * 1970-04-06 1973-01-30 Hitachi Ltd Scanning stereoscopic electron microscope
DE2043749C3 (de) * 1970-08-31 1975-08-21 Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V., 3400 Goettingen Raster-Korpuskularstrahlmikroskop
GB1416043A (en) 1972-01-28 1975-12-03 Nasa Electron microscope aperture system
US3996468A (en) * 1972-01-28 1976-12-07 Nasa Electron microscope aperture system
JPS60105149A (ja) * 1983-11-11 1985-06-10 Jeol Ltd 電子線装置
JPH09167591A (ja) * 1995-12-15 1997-06-24 Hitachi Ltd 走査透過電子顕微鏡
US5866905A (en) * 1991-05-15 1999-02-02 Hitachi, Ltd. Electron microscope
JPH0594798A (ja) 1991-05-21 1993-04-16 Jeol Ltd 焦点深度切り換え可能な電子顕微鏡等の電子光学観察装置
JPH05258700A (ja) 1992-03-13 1993-10-08 Jeol Ltd 走査像観察方法および走査電子顕微鏡
JP3416270B2 (ja) 1994-07-01 2003-06-16 三洋電機株式会社 マイクロスポット形成方法及びその実施装置
JPH08138600A (ja) 1994-11-04 1996-05-31 Shimadzu Corp 荷電粒子光学系
EP0769799B1 (de) * 1995-10-19 2010-02-17 Hitachi, Ltd. Rasterelektronenmikroskop
US5821542A (en) * 1996-06-26 1998-10-13 International Business Machines Corporation Particle beam imaging system having hollow beam illumination
JPH11186150A (ja) 1997-12-16 1999-07-09 Nikon Corp 荷電粒子線露光装置並びにそのマスクアライメント方法及び装置較正方法
JPH11297610A (ja) * 1998-04-08 1999-10-29 Nikon Corp 荷電粒子線露光装置
JP2000012454A (ja) 1998-06-25 2000-01-14 Nikon Corp 電子線露光装置
JP2000299081A (ja) * 1999-04-14 2000-10-24 Jeol Ltd 透過型電子顕微鏡

Also Published As

Publication number Publication date
EP1197985A2 (de) 2002-04-17
US20020079448A1 (en) 2002-06-27
JP3987276B2 (ja) 2007-10-03
US7186975B2 (en) 2007-03-06
EP1197985B1 (de) 2009-08-12
EP1197985A3 (de) 2006-07-26
JP2002124205A (ja) 2002-04-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition