FR2798511B1 - Etage pour un systeme de microscope a particules chargees - Google Patents

Etage pour un systeme de microscope a particules chargees

Info

Publication number
FR2798511B1
FR2798511B1 FR0006553A FR0006553A FR2798511B1 FR 2798511 B1 FR2798511 B1 FR 2798511B1 FR 0006553 A FR0006553 A FR 0006553A FR 0006553 A FR0006553 A FR 0006553A FR 2798511 B1 FR2798511 B1 FR 2798511B1
Authority
FR
France
Prior art keywords
stage
charged particle
microscope system
particle microscope
charged
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0006553A
Other languages
English (en)
Other versions
FR2798511A1 (fr
Inventor
Chiwoei Wayne Lo
Daniel N Bui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Schlumberger Technologies Inc
Original Assignee
Schlumberger Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schlumberger Technologies Inc filed Critical Schlumberger Technologies Inc
Publication of FR2798511A1 publication Critical patent/FR2798511A1/fr
Application granted granted Critical
Publication of FR2798511B1 publication Critical patent/FR2798511B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • GPHYSICS
    • G12INSTRUMENT DETAILS
    • G12BCONSTRUCTIONAL DETAILS OF INSTRUMENTS, OR COMPARABLE DETAILS OF OTHER APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G12B5/00Adjusting position or attitude, e.g. level, of instruments or other apparatus, or of parts thereof; Compensating for the effects of tilting or acceleration, e.g. for optical apparatus
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/20Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202Movement
    • H01J2237/20278Motorised movement
FR0006553A 1999-05-25 2000-05-23 Etage pour un systeme de microscope a particules chargees Expired - Fee Related FR2798511B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/318,400 US6252705B1 (en) 1999-05-25 1999-05-25 Stage for charged particle microscopy system

Publications (2)

Publication Number Publication Date
FR2798511A1 FR2798511A1 (fr) 2001-03-16
FR2798511B1 true FR2798511B1 (fr) 2009-09-11

Family

ID=23238042

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0006553A Expired - Fee Related FR2798511B1 (fr) 1999-05-25 2000-05-23 Etage pour un systeme de microscope a particules chargees

Country Status (6)

Country Link
US (1) US6252705B1 (fr)
JP (1) JP2000357482A (fr)
KR (1) KR100639440B1 (fr)
DE (1) DE10025589B4 (fr)
FR (1) FR2798511B1 (fr)
TW (1) TW446986B (fr)

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US6414752B1 (en) 1999-06-18 2002-07-02 Kla-Tencor Technologies Corporation Method and apparatus for scanning, stitching, and damping measurements of a double-sided metrology inspection tool
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KR100300521B1 (ko) * 1999-08-13 2001-11-01 정문술 리니어 모터가 적용된 헤드 모듈
US6666611B2 (en) * 2000-08-18 2003-12-23 Nikon Corporation Three degree of freedom joint
JP2002162644A (ja) * 2000-11-27 2002-06-07 Hitachi Ltd 液晶表示装置
US6588081B2 (en) * 2001-03-19 2003-07-08 Aerotech, Inc. Small footprint direct drive mechanical positioning stage
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JP4061044B2 (ja) * 2001-10-05 2008-03-12 住友重機械工業株式会社 基板移動装置
KR20040062609A (ko) * 2001-11-02 2004-07-07 가부시키 가이샤 에바라 세이사꾸쇼 내장형 검사장치를 구비한 반도체 제조장치 및 그것을위한 방법
JP3886777B2 (ja) * 2001-11-02 2007-02-28 日本電子株式会社 電子線照射装置および方法
FR2834566B1 (fr) * 2002-01-10 2004-04-02 Trophos Dispositif de positionnement d'une plaque d'analyse d'echantillons sur un dispositif d'observation
US6822246B2 (en) * 2002-03-27 2004-11-23 Kla-Tencor Technologies Corporation Ribbon electron beam for inspection system
US20070035856A1 (en) * 2003-01-28 2007-02-15 John Galpin Multi-axis positioner
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KR100568206B1 (ko) * 2004-02-13 2006-04-05 삼성전자주식회사 스테이지장치
US7180662B2 (en) * 2004-04-12 2007-02-20 Applied Scientific Instrumentation Inc. Stage assembly and method for optical microscope including Z-axis stage and piezoelectric actuator for rectilinear translation of Z stage
KR100534140B1 (ko) * 2004-06-23 2005-12-08 삼성전자주식회사 스테이지장치
KR100687717B1 (ko) 2004-12-16 2007-02-27 한국전자통신연구원 압전소자를 채용한 마이크로 스테이지
WO2008084242A1 (fr) * 2007-01-11 2008-07-17 Renishaw Plc Platine de positionnement d'échantillon et procédé de fonctionnement
DE102007004234A1 (de) * 2007-01-27 2008-08-07 Eppendorf Ag Verfahren zur insbesondere optischen Untersuchung der Oberfläche eines Probenträgers für biologische Objekte
US7760331B2 (en) * 2007-02-20 2010-07-20 Electro Scientific Industries, Inc. Decoupled, multiple stage positioning system
US7889322B2 (en) * 2007-02-20 2011-02-15 Electro Scientific Industries, Inc. Specimen inspection stage implemented with processing stage coupling mechanism
JP4883712B2 (ja) * 2007-11-19 2012-02-22 エスアイアイ・ナノテクノロジー株式会社 ウエハアース機構及び試料作製装置
WO2013126928A1 (fr) * 2012-02-26 2013-08-29 Caliber Imaging & Diagnostics, Inc. Platine d'échantillon de tissu pour un microscope à sectionnement optique
KR101400289B1 (ko) 2012-04-26 2014-05-28 (주)코셈 주사전자현미경 스테이지
CN102967592A (zh) * 2012-11-08 2013-03-13 清华大学 显微拉曼光谱系统偏振方向连续协同、协异调节装置
CN105765440B (zh) * 2013-06-26 2020-08-18 阿兰蒂克微科学股份有限公司 用于显微的样品处理改进装置及方法
CN105353502A (zh) * 2015-12-11 2016-02-24 海德星科技(厦门)有限公司 混合电机驱动的自动控制显微镜载物平台
US9805906B1 (en) * 2016-09-20 2017-10-31 Applied Materials Israel, Ltd. Mirror support module, a kit and a scanning electron microscope
US9817208B1 (en) * 2016-09-20 2017-11-14 Applied Materials Israel Ltd. Integrated chuck
JP6979107B2 (ja) * 2017-02-24 2021-12-08 株式会社日立ハイテク 荷電粒子線装置
JP6740448B2 (ja) 2017-02-24 2020-08-12 株式会社日立ハイテク 荷電粒子線装置
JP6906786B2 (ja) * 2017-03-27 2021-07-21 株式会社日立ハイテクサイエンス 試料保持具、部材装着用器具、および荷電粒子ビーム装置
WO2019042905A1 (fr) * 2017-08-31 2019-03-07 Asml Netherlands B.V. Outil d'inspection de faisceau d'électrons
CN107579578A (zh) * 2017-10-26 2018-01-12 成都优购科技有限公司 便于使用的音频分离器充电系统
JP7011535B2 (ja) * 2018-06-07 2022-01-26 株式会社日立ハイテク ステージ装置、及び荷電粒子線装置
CN110768572B (zh) * 2019-11-27 2020-12-04 长春大学 一种具有大推力的线性压电驱动器
CN112014964B (zh) * 2020-09-09 2022-05-24 安徽机电职业技术学院 一种大视场扫描显微镜用载物台装置
TWI779978B (zh) * 2021-12-29 2022-10-01 卓金星 載物平台裝置及包括該載物平台裝置之量測裝置
CN117637591B (zh) * 2024-01-25 2024-04-19 合肥晶合集成电路股份有限公司 晶圆金属元素分析方法及分析系统

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US3648048A (en) * 1969-10-15 1972-03-07 Thomson Houston Comp Francaise System and method for positioning a wafer coated with photoresist and for controlling the displacements of said wafer in a scanning electron apparatus
JPS4830860A (fr) * 1971-08-25 1973-04-23
JPS5795056A (en) * 1980-12-05 1982-06-12 Hitachi Ltd Appearance inspecting process
US4627009A (en) * 1983-05-24 1986-12-02 Nanometrics Inc. Microscope stage assembly and control system
JPS60116506U (ja) * 1984-01-18 1985-08-07 日本精工株式会社 テ−ブルの超精密位置決め機構
US4723086A (en) * 1986-10-07 1988-02-02 Micronix Corporation Coarse and fine motion positioning mechanism
JP2960423B2 (ja) * 1988-11-16 1999-10-06 株式会社日立製作所 試料移動装置及び半導体製造装置
JP3133307B2 (ja) * 1989-10-13 2001-02-05 株式会社日立製作所 電子顕微鏡
JP2619565B2 (ja) * 1990-11-05 1997-06-11 株式会社日立製作所 電子ビーム描画装置
US5760564A (en) * 1995-06-27 1998-06-02 Nikon Precision Inc. Dual guide beam stage mechanism with yaw control
KR19980079377A (ko) * 1997-03-25 1998-11-25 요시다쇼이치로 하전립자선 전사장치
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KR100274594B1 (ko) * 1997-10-29 2000-12-15 윤종용 반도체 웨이퍼의 검사장치 및 검사방법.
KR100280870B1 (ko) * 1998-06-24 2001-03-02 조장연 원자간력 현미경용 초정밀 3축 스테이지

Also Published As

Publication number Publication date
US6252705B1 (en) 2001-06-26
DE10025589A1 (de) 2000-11-30
JP2000357482A (ja) 2000-12-26
KR20010029736A (ko) 2001-04-16
TW446986B (en) 2001-07-21
FR2798511A1 (fr) 2001-03-16
KR100639440B1 (ko) 2006-10-26
DE10025589B4 (de) 2012-07-05

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Legal Events

Date Code Title Description
TP Transmission of property
ST Notification of lapse

Effective date: 20140131