DE60045439D1 - Saüle für eine Ladungsträgerstrahlvorrichtung - Google Patents

Saüle für eine Ladungsträgerstrahlvorrichtung

Info

Publication number
DE60045439D1
DE60045439D1 DE60045439T DE60045439T DE60045439D1 DE 60045439 D1 DE60045439 D1 DE 60045439D1 DE 60045439 T DE60045439 T DE 60045439T DE 60045439 T DE60045439 T DE 60045439T DE 60045439 D1 DE60045439 D1 DE 60045439D1
Authority
DE
Germany
Prior art keywords
bowl
charged particle
particle beam
beam device
charged
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60045439T
Other languages
English (en)
Inventor
Pavel Adamec
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Original Assignee
ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH filed Critical ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Application granted granted Critical
Publication of DE60045439D1 publication Critical patent/DE60045439D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0473—Changing particle velocity accelerating
    • H01J2237/04735—Changing particle velocity accelerating with electrostatic means
    • H01J2237/04737—Changing particle velocity accelerating with electrostatic means radio-frequency quadrupole [RFQ]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/049—Focusing means
    • H01J2237/0492—Lens systems
    • H01J2237/04924—Lens systems electrostatic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
DE60045439T 2000-01-24 2000-01-24 Saüle für eine Ladungsträgerstrahlvorrichtung Expired - Lifetime DE60045439D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP00101373A EP1120810B1 (de) 2000-01-24 2000-01-24 Saüle für eine Ladungsträgerstrahlvorrichtung

Publications (1)

Publication Number Publication Date
DE60045439D1 true DE60045439D1 (de) 2011-02-10

Family

ID=8167690

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60045439T Expired - Lifetime DE60045439D1 (de) 2000-01-24 2000-01-24 Saüle für eine Ladungsträgerstrahlvorrichtung

Country Status (8)

Country Link
US (1) US6825476B2 (de)
EP (1) EP1120810B1 (de)
JP (1) JP3787091B2 (de)
KR (1) KR100543382B1 (de)
CN (1) CN1229849C (de)
AU (1) AU2001250306A1 (de)
DE (1) DE60045439D1 (de)
WO (1) WO2001054162A1 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3968334B2 (ja) * 2002-09-11 2007-08-29 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び荷電粒子線照射方法
US6949895B2 (en) * 2003-09-03 2005-09-27 Axcelis Technologies, Inc. Unipolar electrostatic quadrupole lens and switching methods for charged beam transport
US7375326B2 (en) * 2004-06-21 2008-05-20 Applied Materials, Israel, Ltd. Method and system for focusing a charged particle beam
US7315029B2 (en) * 2005-09-30 2008-01-01 Applied Materials, Inc. Electrostatic deflection system with low aberrations and vertical beam incidence
KR101251432B1 (ko) * 2005-11-16 2013-04-05 전자빔기술센터 주식회사 전자 칼럼용 자기장 디플렉터
EP1801838B1 (de) * 2005-12-20 2012-05-09 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Vorrichtung für die Emission von Teilchenstrahlen und Verfahren zu deren Betrieb
EP1830385A1 (de) * 2006-03-01 2007-09-05 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Ionenstrahlgerät und Methode zum Ausrichten desselben
KR100946270B1 (ko) * 2008-08-12 2010-03-09 주식회사 메가젠임플란트 연조직 절단 치과용 공구
US20110180722A1 (en) * 2008-09-30 2011-07-28 Carl Zeiss Nts, Llc Aligning charged particle beams
WO2011148486A1 (ja) * 2010-05-27 2011-12-01 三菱電機株式会社 粒子線照射システムおよび粒子線照射システムの制御方法
US9171694B2 (en) * 2013-11-26 2015-10-27 Kla-Tencor Corporation Asymmetric electrostatic quadrupole deflector for improved field uniformity
EP2879155B1 (de) * 2013-12-02 2018-04-25 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Mehrstrahlsystem mit Hochdurchsatz-EBI
CN109637692B (zh) * 2019-01-23 2023-12-19 深圳铭杰医疗科技有限公司 适用于带电粒子束的轨迹矫正器
CN112086332A (zh) * 2020-09-27 2020-12-15 北京中科科仪股份有限公司 一种静电偏转装置及其偏转方法
CN116246923B (zh) * 2022-12-30 2023-11-14 广东省科学院半导体研究所 电子束聚焦偏转系统及电子束光柱体

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2584234B1 (fr) * 1985-06-28 1988-12-09 Cameca Testeur de circuit integre a faisceau d'electrons
US4725736A (en) * 1986-08-11 1988-02-16 Electron Beam Memories Electrostatic electron gun with integrated electron beam deflection and/or stigmating system
JP2706192B2 (ja) * 1991-11-06 1998-01-28 富士通株式会社 電子ビーム露光装置
US5393985A (en) * 1992-11-26 1995-02-28 Shimadzu Corporation Apparatus for focusing an ion beam
JP3356270B2 (ja) * 1997-11-27 2002-12-16 株式会社日立製作所 走査電子顕微鏡
US6614026B1 (en) * 1999-04-15 2003-09-02 Applied Materials, Inc. Charged particle beam column
US6452175B1 (en) * 1999-04-15 2002-09-17 Applied Materials, Inc. Column for charged particle beam device

Also Published As

Publication number Publication date
KR20020070354A (ko) 2002-09-05
WO2001054162A1 (en) 2001-07-26
KR100543382B1 (ko) 2006-01-20
EP1120810A1 (de) 2001-08-01
EP1120810B1 (de) 2010-12-29
US6825476B2 (en) 2004-11-30
JP2003520408A (ja) 2003-07-02
CN1404618A (zh) 2003-03-19
US20030075686A1 (en) 2003-04-24
AU2001250306A1 (en) 2001-07-31
CN1229849C (zh) 2005-11-30
JP3787091B2 (ja) 2006-06-21

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