DE60038007D1 - Teilchenstrahlgerät - Google Patents

Teilchenstrahlgerät

Info

Publication number
DE60038007D1
DE60038007D1 DE60038007T DE60038007T DE60038007D1 DE 60038007 D1 DE60038007 D1 DE 60038007D1 DE 60038007 T DE60038007 T DE 60038007T DE 60038007 T DE60038007 T DE 60038007T DE 60038007 D1 DE60038007 D1 DE 60038007D1
Authority
DE
Germany
Prior art keywords
particle beam
particle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60038007T
Other languages
English (en)
Other versions
DE60038007T2 (de
Inventor
Juergen Dr Frosien
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advantest Corp
Original Assignee
Advantest Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advantest Corp filed Critical Advantest Corp
Application granted granted Critical
Publication of DE60038007D1 publication Critical patent/DE60038007D1/de
Publication of DE60038007T2 publication Critical patent/DE60038007T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Measurement Of Radiation (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Measuring Leads Or Probes (AREA)
  • Tests Of Electronic Circuits (AREA)
DE60038007T 2000-05-31 2000-05-31 Teilchenstrahlgerät Expired - Fee Related DE60038007T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP00111712A EP1160825B1 (de) 2000-05-31 2000-05-31 Teilchenstrahlgerät

Publications (2)

Publication Number Publication Date
DE60038007D1 true DE60038007D1 (de) 2008-03-27
DE60038007T2 DE60038007T2 (de) 2008-05-29

Family

ID=8168884

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60038007T Expired - Fee Related DE60038007T2 (de) 2000-05-31 2000-05-31 Teilchenstrahlgerät

Country Status (4)

Country Link
US (1) US6720557B2 (de)
EP (1) EP1160825B1 (de)
JP (1) JP4562945B2 (de)
DE (1) DE60038007T2 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1288996B1 (de) * 2001-09-04 2006-03-22 Advantest Corporation Teilchenstrahlgerät
US6858843B1 (en) * 2002-06-21 2005-02-22 Kla-Tencor Technologies Corporation Immersion objective lens for e-beam inspection
JP4632407B2 (ja) * 2004-06-21 2011-02-16 株式会社トプコン 電子線装置
JP2006114225A (ja) * 2004-10-12 2006-04-27 Hitachi High-Technologies Corp 荷電粒子線装置
US7446320B1 (en) 2005-08-17 2008-11-04 Kla-Tencor Technologies Corproation Electronically-variable immersion electrostatic lens
US8698093B1 (en) 2007-01-19 2014-04-15 Kla-Tencor Corporation Objective lens with deflector plates immersed in electrostatic lens field
DE602007005631D1 (de) * 2007-07-27 2010-05-12 Integrated Circuit Testing Elektrostatische Linsenanordnung
JP5680073B2 (ja) * 2009-06-24 2015-03-04 カール ツァイス マイクロスコーピー エルエルシー 荷電粒子検出器
DE112011100306B4 (de) * 2010-01-20 2019-06-19 Hitachi High-Technologies Corporation Ladungsteilchenstrahlvorrichtung
US9099276B1 (en) * 2014-01-24 2015-08-04 Keysight Technologies, Inc. High-voltage energy-dispersive spectroscopy using a low-voltage scanning electron microscope
WO2017006408A1 (ja) * 2015-07-06 2017-01-12 株式会社 日立ハイテクノロジーズ 荷電粒子線装置
US10245448B2 (en) * 2017-07-21 2019-04-02 Varian Medical Systems Particle Therapy Gmbh Particle beam monitoring systems and methods

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3819941A (en) * 1973-10-15 1974-06-25 Bendix Corp Mass dependent ion microscope having an array of small mass filters
DE2921151C2 (de) * 1979-05-25 1982-12-02 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Vorrichtung zum Nachweis von in einem Abtast-Elektronenstrahlmikroskop von einer Probe ausgehenden Rückstreuelektronen
US4926054A (en) * 1988-03-17 1990-05-15 Ict Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh Objective lens for focusing charged particles in an electron microscope
US5444242A (en) * 1992-09-29 1995-08-22 Physical Electronics Inc. Scanning and high resolution electron spectroscopy and imaging
JP3291880B2 (ja) * 1993-12-28 2002-06-17 株式会社日立製作所 走査形電子顕微鏡
US5644132A (en) 1994-06-20 1997-07-01 Opan Technologies Ltd. System for high resolution imaging and measurement of topographic and material features on a specimen
US5466940A (en) 1994-06-20 1995-11-14 Opal Technologies Ltd. Electron detector with high backscattered electron acceptance for particle beam apparatus
US5828064A (en) * 1995-08-11 1998-10-27 Philips Electronics North America Corporation Field emission environmental scanning electron microscope
JP3774953B2 (ja) * 1995-10-19 2006-05-17 株式会社日立製作所 走査形電子顕微鏡
DE69638126D1 (de) * 1995-10-19 2010-04-01 Hitachi Ltd Rasterelektronenmikroskop
JPH09274883A (ja) * 1996-04-03 1997-10-21 Hitachi Ltd Ｆｉｂ／ｓｅｍ複合装置
EP1022766B1 (de) * 1998-11-30 2004-02-04 Advantest Corporation Teilchenstrahlgerät
US6291823B1 (en) * 1999-10-12 2001-09-18 Sandia Corporation Ion-induced electron emission microscopy

Also Published As

Publication number Publication date
DE60038007T2 (de) 2008-05-29
JP2002033069A (ja) 2002-01-31
US20010048075A1 (en) 2001-12-06
EP1160825B1 (de) 2008-02-13
US6720557B2 (en) 2004-04-13
JP4562945B2 (ja) 2010-10-13
EP1160825A1 (de) 2001-12-05

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee