DE60118070D1 - Teilchenstrahlgerät - Google Patents
TeilchenstrahlgerätInfo
- Publication number
- DE60118070D1 DE60118070D1 DE60118070T DE60118070T DE60118070D1 DE 60118070 D1 DE60118070 D1 DE 60118070D1 DE 60118070 T DE60118070 T DE 60118070T DE 60118070 T DE60118070 T DE 60118070T DE 60118070 D1 DE60118070 D1 DE 60118070D1
- Authority
- DE
- Germany
- Prior art keywords
- particle beam
- particle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/047—Changing particle velocity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2446—Position sensitive detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2448—Secondary particle detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP01121183A EP1288996B1 (de) | 2001-09-04 | 2001-09-04 | Teilchenstrahlgerät |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60118070D1 true DE60118070D1 (de) | 2006-05-11 |
DE60118070T2 DE60118070T2 (de) | 2006-08-17 |
Family
ID=8178542
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60118070T Expired - Lifetime DE60118070T2 (de) | 2001-09-04 | 2001-09-04 | Partikelstrahlgerät |
Country Status (4)
Country | Link |
---|---|
US (1) | US6667478B2 (de) |
EP (1) | EP1288996B1 (de) |
JP (1) | JP4141211B2 (de) |
DE (1) | DE60118070T2 (de) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4632407B2 (ja) * | 2004-06-21 | 2011-02-16 | 株式会社トプコン | 電子線装置 |
US7141791B2 (en) * | 2004-09-07 | 2006-11-28 | Kla-Tencor Technologies Corporation | Apparatus and method for E-beam dark field imaging |
JP2006114225A (ja) * | 2004-10-12 | 2006-04-27 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
JP4943733B2 (ja) * | 2005-04-28 | 2012-05-30 | 株式会社日立ハイテクノロジーズ | 荷電粒子ビームを用いた検査方法及び検査装置 |
US7462828B2 (en) * | 2005-04-28 | 2008-12-09 | Hitachi High-Technologies Corporation | Inspection method and inspection system using charged particle beam |
JP4795883B2 (ja) * | 2006-07-21 | 2011-10-19 | 株式会社日立ハイテクノロジーズ | パターン検査・計測装置 |
EP1883094B1 (de) * | 2006-07-24 | 2012-05-02 | ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Teilchenstrahlapparat und Verfahren zur Untersuchung einer Probe |
JP4988308B2 (ja) * | 2006-11-07 | 2012-08-01 | 株式会社日立ハイテクノロジーズ | ガス増幅形検出器およびそれを用いた電子線応用装置 |
DE602007005631D1 (de) * | 2007-07-27 | 2010-05-12 | Integrated Circuit Testing | Elektrostatische Linsenanordnung |
US8003498B2 (en) * | 2007-11-13 | 2011-08-23 | Varian Semiconductor Equipment Associates, Inc. | Particle beam assisted modification of thin film materials |
DE102008025495A1 (de) * | 2008-05-28 | 2009-12-10 | Carl Zeiss Nts Gmbh | Elektronenmikroskopiesystem mit Spannungsversorgungssystem |
JP5352144B2 (ja) * | 2008-07-22 | 2013-11-27 | 株式会社荏原製作所 | 荷電粒子ビーム検査方法及び装置 |
WO2010021012A1 (en) | 2008-08-20 | 2010-02-25 | Advantest Corporation | Electron detection device and scanning electron microscope |
EP2219204B1 (de) * | 2009-02-12 | 2012-03-21 | ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Anordnung und Verfahren zur Kontrastverbesserung in einer Vorrichtung mit geladenem Partikelstrahl zur Inspektion eines Probestücks |
JP2011138648A (ja) * | 2009-12-28 | 2011-07-14 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
US8319192B2 (en) * | 2010-08-24 | 2012-11-27 | Hermes Microvision Inc. | Charged particle apparatus |
CN102592932A (zh) * | 2012-02-21 | 2012-07-18 | 南京特能电子有限公司 | 半导体背散射电子探测器 |
EP2682978B1 (de) * | 2012-07-05 | 2016-10-19 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Verunreinigungsverringerungselektrode für Partikeldetektor |
JP2012186177A (ja) * | 2012-06-18 | 2012-09-27 | Hitachi High-Technologies Corp | 電子線応用装置 |
EP2833390A1 (de) * | 2013-08-02 | 2015-02-04 | Fei Company | Verwendung von elektrostatischen Objektivlinsen in einem Elektronenmikroskop |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2921151C2 (de) * | 1979-05-25 | 1982-12-02 | Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar | Vorrichtung zum Nachweis von in einem Abtast-Elektronenstrahlmikroskop von einer Probe ausgehenden Rückstreuelektronen |
JPS60143630A (ja) * | 1983-12-29 | 1985-07-29 | Fujitsu Ltd | イオン注入方法 |
DE3638682A1 (de) * | 1986-11-13 | 1988-05-19 | Siemens Ag | Spektrometerobjektiv fuer korpuskularstrahlmesstechnik |
US4926054A (en) * | 1988-03-17 | 1990-05-15 | Ict Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh | Objective lens for focusing charged particles in an electron microscope |
JPH0467550A (ja) * | 1990-07-05 | 1992-03-03 | Fujitsu Ltd | 電子ビーム装置及びその画像取得方法 |
DE4216730C2 (de) * | 1992-05-20 | 2003-07-24 | Advantest Corp | Rasterelektronenstrahlgerät |
JP2927627B2 (ja) * | 1992-10-20 | 1999-07-28 | 株式会社日立製作所 | 走査電子顕微鏡 |
US5644132A (en) * | 1994-06-20 | 1997-07-01 | Opan Technologies Ltd. | System for high resolution imaging and measurement of topographic and material features on a specimen |
US5894124A (en) * | 1995-03-17 | 1999-04-13 | Hitachi, Ltd. | Scanning electron microscope and its analogous device |
DE69638126D1 (de) * | 1995-10-19 | 2010-04-01 | Hitachi Ltd | Rasterelektronenmikroskop |
US6580074B1 (en) * | 1996-09-24 | 2003-06-17 | Hitachi, Ltd. | Charged particle beam emitting device |
GB9719417D0 (en) * | 1997-09-13 | 1997-11-12 | Univ York | Electron microscope |
US5945672A (en) * | 1998-01-29 | 1999-08-31 | Fei Company | Gaseous backscattered electron detector for an environmental scanning electron microscope |
WO2000019482A1 (fr) * | 1998-09-25 | 2000-04-06 | Hitachi, Ltd. | Microscope electronique a balayage |
EP1022766B1 (de) * | 1998-11-30 | 2004-02-04 | Advantest Corporation | Teilchenstrahlgerät |
DE60038007T2 (de) * | 2000-05-31 | 2008-05-29 | Advantest Corporation | Teilchenstrahlgerät |
-
2001
- 2001-09-04 EP EP01121183A patent/EP1288996B1/de not_active Expired - Lifetime
- 2001-09-04 DE DE60118070T patent/DE60118070T2/de not_active Expired - Lifetime
-
2002
- 2002-08-30 US US10/231,686 patent/US6667478B2/en not_active Expired - Fee Related
- 2002-09-02 JP JP2002257008A patent/JP4141211B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP1288996B1 (de) | 2006-03-22 |
DE60118070T2 (de) | 2006-08-17 |
US20030062478A1 (en) | 2003-04-03 |
JP2003109532A (ja) | 2003-04-11 |
JP4141211B2 (ja) | 2008-08-27 |
EP1288996A1 (de) | 2003-03-05 |
US6667478B2 (en) | 2003-12-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |