DE60132883T2 - Organische dielektrika mit niedriger dielektrizitätskonstante basierend auf käfig-ähnlichen strukturen - Google Patents
Organische dielektrika mit niedriger dielektrizitätskonstante basierend auf käfig-ähnlichen strukturen Download PDFInfo
- Publication number
- DE60132883T2 DE60132883T2 DE60132883T DE60132883T DE60132883T2 DE 60132883 T2 DE60132883 T2 DE 60132883T2 DE 60132883 T DE60132883 T DE 60132883T DE 60132883 T DE60132883 T DE 60132883T DE 60132883 T2 DE60132883 T2 DE 60132883T2
- Authority
- DE
- Germany
- Prior art keywords
- dielectric constant
- low dielectric
- constant material
- material according
- cage structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000003989 dielectric material Substances 0.000 title description 6
- 239000000463 material Substances 0.000 claims abstract description 47
- 125000003118 aryl group Chemical group 0.000 claims abstract description 27
- 238000006243 chemical reaction Methods 0.000 claims abstract description 23
- 238000004132 cross linking Methods 0.000 claims abstract description 19
- 239000004971 Cross linker Substances 0.000 claims abstract description 7
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical compound C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 claims description 44
- 229920000642 polymer Polymers 0.000 claims description 19
- 125000004429 atom Chemical group 0.000 claims description 13
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 13
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 11
- 239000012212 insulator Substances 0.000 claims description 7
- -1 arylene ether Chemical compound 0.000 claims description 6
- ZICQBHNGXDOVJF-UHFFFAOYSA-N diamantane Chemical class C1C2C3CC(C4)CC2C2C4C3CC1C2 ZICQBHNGXDOVJF-UHFFFAOYSA-N 0.000 claims description 6
- 229920000412 polyarylene Polymers 0.000 claims description 6
- 125000001424 substituent group Chemical group 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 238000006352 cycloaddition reaction Methods 0.000 claims description 4
- 229910052736 halogen Inorganic materials 0.000 claims description 4
- 150000002367 halogens Chemical class 0.000 claims description 4
- PLGPSDNOLCVGSS-UHFFFAOYSA-N Tetraphenylcyclopentadienone Chemical compound O=C1C(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=C1C1=CC=CC=C1 PLGPSDNOLCVGSS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims description 3
- 238000005698 Diels-Alder reaction Methods 0.000 claims description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 2
- 239000012039 electrophile Substances 0.000 claims description 2
- 239000012038 nucleophile Substances 0.000 claims description 2
- 239000000178 monomer Substances 0.000 description 15
- 239000011159 matrix material Substances 0.000 description 13
- 230000015572 biosynthetic process Effects 0.000 description 12
- 239000000126 substance Substances 0.000 description 12
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical class C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 11
- 229910003472 fullerene Inorganic materials 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- 238000003786 synthesis reaction Methods 0.000 description 11
- 239000000203 mixture Substances 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 8
- 239000007783 nanoporous material Substances 0.000 description 8
- 239000002105 nanoparticle Substances 0.000 description 7
- 239000011148 porous material Substances 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 238000013459 approach Methods 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 238000013461 design Methods 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- GHMLBKRAJCXXBS-UHFFFAOYSA-N Resorcinol Natural products OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 5
- 229910003460 diamond Inorganic materials 0.000 description 5
- 239000010432 diamond Substances 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 125000004800 4-bromophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Br 0.000 description 4
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 4
- 230000006855 networking Effects 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- IPYQYZMTGJXJNH-UHFFFAOYSA-N 4,6-bis(1-adamantyl)benzene-1,3-diol Chemical compound C1C(C2)CC(C3)CC2CC13C1=C(O)C=C(O)C(C23CC4CC(CC(C4)C2)C3)=C1 IPYQYZMTGJXJNH-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000011324 bead Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- JRXXLCKWQFKACW-UHFFFAOYSA-N biphenylacetylene Chemical class C1=CC=CC=C1C#CC1=CC=CC=C1 JRXXLCKWQFKACW-UHFFFAOYSA-N 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 125000005842 heteroatom Chemical group 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 229920000620 organic polymer Polymers 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- SWVWJFWKWBFPID-UHFFFAOYSA-N 1,3,5,7-tetrabromoadamantane Chemical compound C1C(C2)(Br)CC3(Br)CC1(Br)CC2(Br)C3 SWVWJFWKWBFPID-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- UEXCJVNBTNXOEH-UHFFFAOYSA-N Ethynylbenzene Chemical group C#CC1=CC=CC=C1 UEXCJVNBTNXOEH-UHFFFAOYSA-N 0.000 description 2
- MHABMANUFPZXEB-UHFFFAOYSA-N O-demethyl-aloesaponarin I Natural products O=C1C2=CC=CC(O)=C2C(=O)C2=C1C=C(O)C(C(O)=O)=C2C MHABMANUFPZXEB-UHFFFAOYSA-N 0.000 description 2
- 229920001400 block copolymer Polymers 0.000 description 2
- QXJJQWWVWRCVQT-UHFFFAOYSA-K calcium;sodium;phosphate Chemical compound [Na+].[Ca+2].[O-]P([O-])([O-])=O QXJJQWWVWRCVQT-UHFFFAOYSA-K 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 150000003983 crown ethers Chemical class 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000010348 incorporation Methods 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 229910052809 inorganic oxide Inorganic materials 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical class CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- YDUVZTACEKAXTE-UHFFFAOYSA-N 1,3,5,7-tetraphenyladamantane Chemical class C1C(C2)(C=3C=CC=CC=3)CC(C3)(C=4C=CC=CC=4)CC1(C=1C=CC=CC=1)CC23C1=CC=CC=C1 YDUVZTACEKAXTE-UHFFFAOYSA-N 0.000 description 1
- 150000005207 1,3-dihydroxybenzenes Chemical class 0.000 description 1
- HFFUXLCRPYMGFM-UHFFFAOYSA-N 1-fluoro-4-[2-(4-fluorophenyl)ethynyl]benzene Chemical compound C1=CC(F)=CC=C1C#CC1=CC=C(F)C=C1 HFFUXLCRPYMGFM-UHFFFAOYSA-N 0.000 description 1
- 102100027324 2-hydroxyacyl-CoA lyase 1 Human genes 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- 101001009252 Homo sapiens 2-hydroxyacyl-CoA lyase 1 Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229930194542 Keto Natural products 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000002253 acid Chemical group 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 150000004645 aluminates Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000007080 aromatic substitution reaction Methods 0.000 description 1
- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 description 1
- YNHIGQDRGKUECZ-UHFFFAOYSA-L bis(triphenylphosphine)palladium(ii) dichloride Chemical compound [Cl-].[Cl-].[Pd+2].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 YNHIGQDRGKUECZ-UHFFFAOYSA-L 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- VJYIFXVZLXQVHO-UHFFFAOYSA-N chlorsulfuron Chemical compound COC1=NC(C)=NC(NC(=O)NS(=O)(=O)C=2C(=CC=CC=2)Cl)=N1 VJYIFXVZLXQVHO-UHFFFAOYSA-N 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- LSXDOTMGLUJQCM-UHFFFAOYSA-M copper(i) iodide Chemical compound I[Cu] LSXDOTMGLUJQCM-UHFFFAOYSA-M 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007336 electrophilic substitution reaction Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 150000002148 esters Chemical group 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 150000002170 ethers Chemical group 0.000 description 1
- XEHVFKKSDRMODV-UHFFFAOYSA-N ethynyl Chemical compound C#[C] XEHVFKKSDRMODV-UHFFFAOYSA-N 0.000 description 1
- 238000003306 harvesting Methods 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 229920000592 inorganic polymer Polymers 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 125000000468 ketone group Chemical group 0.000 description 1
- 238000004895 liquid chromatography mass spectrometry Methods 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 239000012452 mother liquor Substances 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000000269 nucleophilic effect Effects 0.000 description 1
- 238000010534 nucleophilic substitution reaction Methods 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000007348 radical reaction Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- 238000010898 silica gel chromatography Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 150000001608 tolans Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/24—Crosslinking, e.g. vulcanising, of macromolecules
- C08J3/246—Intercrosslinking of at least two polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F257/00—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
- C08F257/02—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00 on to polymers of styrene or alkyl-substituted styrenes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
- C08L51/003—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained by reactions only involving unsaturated carbon-to-carbon bonds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/902—Specified use of nanostructure
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/963—Miscellaneous
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Formation Of Insulating Films (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Organic Insulating Materials (AREA)
- Rolling Contact Bearings (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Polyethers (AREA)
- Micromachines (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US545058 | 2000-04-07 | ||
| US09/545,058 US6509415B1 (en) | 2000-04-07 | 2000-04-07 | Low dielectric constant organic dielectrics based on cage-like structures |
| PCT/US2001/011273 WO2001078110A2 (en) | 2000-04-07 | 2001-04-06 | Low dielectric constant organic dielectrics based on cage-like structures |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE60132883D1 DE60132883D1 (de) | 2008-04-03 |
| DE60132883T2 true DE60132883T2 (de) | 2009-03-05 |
Family
ID=24174726
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60132883T Expired - Lifetime DE60132883T2 (de) | 2000-04-07 | 2001-04-06 | Organische dielektrika mit niedriger dielektrizitätskonstante basierend auf käfig-ähnlichen strukturen |
Country Status (10)
| Country | Link |
|---|---|
| US (2) | US6509415B1 (enExample) |
| EP (1) | EP1274755B1 (enExample) |
| JP (1) | JP4795607B2 (enExample) |
| KR (1) | KR100823777B1 (enExample) |
| CN (1) | CN1227276C (enExample) |
| AT (1) | ATE386758T1 (enExample) |
| AU (1) | AU2001255248A1 (enExample) |
| DE (1) | DE60132883T2 (enExample) |
| HK (1) | HK1054398A1 (enExample) |
| WO (1) | WO2001078110A2 (enExample) |
Families Citing this family (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020022708A1 (en) * | 2000-07-19 | 2002-02-21 | Honeywell International Inc. | Compositions and methods for thermosetting molecules in organic compositions |
| US6783589B2 (en) * | 2001-01-19 | 2004-08-31 | Chevron U.S.A. Inc. | Diamondoid-containing materials in microelectronics |
| WO2002081546A1 (en) * | 2001-04-06 | 2002-10-17 | Honeywell International Inc. | Low dielectric constant materials and methods of preparation thereof |
| US7141188B2 (en) * | 2001-05-30 | 2006-11-28 | Honeywell International Inc. | Organic compositions |
| US7049005B2 (en) * | 2001-05-30 | 2006-05-23 | Honeywell International Inc. | Organic compositions |
| US6740685B2 (en) * | 2001-05-30 | 2004-05-25 | Honeywell International Inc. | Organic compositions |
| US20040247896A1 (en) * | 2001-12-31 | 2004-12-09 | Paul Apen | Organic compositions |
| AU2003202905A1 (en) * | 2002-01-08 | 2003-07-24 | Honeywell International Inc. | Organic composition |
| EP1466356A2 (en) * | 2002-01-15 | 2004-10-13 | Honeywell International Inc. | Organic compositions |
| US7060204B2 (en) * | 2002-04-29 | 2006-06-13 | Honeywell International Inc. | Organic compositions |
| US6855738B2 (en) * | 2003-06-06 | 2005-02-15 | Dow Global Technologies Inc. | Nanoporous laminates |
| US7488565B2 (en) * | 2003-10-01 | 2009-02-10 | Chevron U.S.A. Inc. | Photoresist compositions comprising diamondoid derivatives |
| US7208243B2 (en) * | 2004-12-01 | 2007-04-24 | Toyota Technical Center Usa, Inc. | Proton exchange membranes using cycloaddition reaction between azide and alkyne containing components |
| KR20060090483A (ko) * | 2005-02-07 | 2006-08-11 | 삼성코닝 주식회사 | 풀러렌을 포함하는 저유전 박막 형성용 조성물, 이를이용한 저유전 박막 및 저유전 박막의 제조방법 |
| US7531209B2 (en) | 2005-02-24 | 2009-05-12 | Michael Raymond Ayers | Porous films and bodies with enhanced mechanical strength |
| JP4516857B2 (ja) * | 2005-02-28 | 2010-08-04 | 富士フイルム株式会社 | カゴ構造を有する重合体、それを含む膜形成用組成物、絶縁膜および電子デバイス |
| JP2006253577A (ja) * | 2005-03-14 | 2006-09-21 | Fuji Photo Film Co Ltd | 絶縁膜、その製造方法及び該絶縁膜を有するデバイス |
| JP2006291160A (ja) * | 2005-03-14 | 2006-10-26 | Fuji Photo Film Co Ltd | 膜形成用組成物、それを用いた絶縁膜および電子デバイス |
| JP4368319B2 (ja) * | 2005-03-14 | 2009-11-18 | 富士フイルム株式会社 | 絶縁膜とそれを製造する方法、およびそれを用いた電子デバイス |
| JP2006253573A (ja) * | 2005-03-14 | 2006-09-21 | Fuji Photo Film Co Ltd | 絶縁膜とそれを製造する方法、およびそれを用いた電子デバイス |
| JP4542927B2 (ja) * | 2005-03-17 | 2010-09-15 | 富士フイルム株式会社 | 膜形成用組成物、該組成物から得られた絶縁膜およびそれを有する電子デバイス |
| US7432133B2 (en) * | 2005-10-24 | 2008-10-07 | Freescale Semiconductor, Inc. | Plastic packaged device with die interface layer |
| US20070090545A1 (en) * | 2005-10-24 | 2007-04-26 | Condie Brian W | Semiconductor device with improved encapsulation |
| US7435625B2 (en) * | 2005-10-24 | 2008-10-14 | Freescale Semiconductor, Inc. | Semiconductor device with reduced package cross-talk and loss |
| JP2007161779A (ja) * | 2005-12-09 | 2007-06-28 | Fujifilm Corp | 膜形成用組成物 |
| ATE556118T1 (de) * | 2006-03-29 | 2012-05-15 | Sumitomo Bakelite Co | Harzzusammensetzung, lack, harzfolie und halbleitervorrichtung mit der harzfolie |
| WO2007143028A2 (en) | 2006-05-31 | 2007-12-13 | Roskilde Semiconductor Llc | Low dielectric constant materials prepared from soluble fullerene clusters |
| WO2007143026A2 (en) | 2006-05-31 | 2007-12-13 | Roskilde Semiconductor Llc | Linked periodic networks of alternating carbon and inorganic clusters for use as low dielectric constant materials |
| US7883742B2 (en) | 2006-05-31 | 2011-02-08 | Roskilde Semiconductor Llc | Porous materials derived from polymer composites |
| US7875315B2 (en) | 2006-05-31 | 2011-01-25 | Roskilde Semiconductor Llc | Porous inorganic solids for use as low dielectric constant materials |
| JP5134233B2 (ja) * | 2006-11-29 | 2013-01-30 | 出光興産株式会社 | アダマンタン誘導体、その製造方法及びアダマンタン誘導体を含む樹脂組成物 |
| US20080173541A1 (en) * | 2007-01-22 | 2008-07-24 | Eal Lee | Target designs and related methods for reduced eddy currents, increased resistance and resistivity, and enhanced cooling |
| US20090026924A1 (en) * | 2007-07-23 | 2009-01-29 | Leung Roger Y | Methods of making low-refractive index and/or low-k organosilicate coatings |
| US8702919B2 (en) * | 2007-08-13 | 2014-04-22 | Honeywell International Inc. | Target designs and related methods for coupled target assemblies, methods of production and uses thereof |
| CN101219934B (zh) * | 2008-01-25 | 2010-06-02 | 吉林大学 | 4,8-二(1-金刚烷基)-1,5-萘二酚、制备方法及用于合成聚合物材料 |
| JPWO2012111314A1 (ja) * | 2011-02-18 | 2014-07-03 | 出光興産株式会社 | 電子素子用絶縁材料形成用組成物、電子素子用絶縁材料、電子素子及び薄膜トランジスタ |
| CN105152881B (zh) * | 2015-06-23 | 2018-06-29 | 复旦大学 | 含金刚烷与六氟环丁烷结构的苯并环丁烯单体、其制备方法及应用 |
| CN109294203B (zh) * | 2018-10-10 | 2021-04-09 | 湖南七纬科技有限公司 | 一种新能源汽车动力电池用阻燃防火材料及其制备方法 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3580964A (en) * | 1967-09-06 | 1971-05-25 | Sun Oil Co | Curable linear polyesters |
| US3795658A (en) * | 1971-12-30 | 1974-03-05 | Sun Research Development | Epoxy resins from dimethyladamantane bisphenols |
| US5019660A (en) | 1990-01-30 | 1991-05-28 | Mobil Oil Corporation | Diamondoid polymeric compositions |
| US5166313A (en) | 1991-04-29 | 1992-11-24 | Fluorochem, Inc. | Diamantane modified rigid-rod poly benzazole and method of manufacture |
| US5347063A (en) | 1993-03-09 | 1994-09-13 | Mobil Oil Corporation | Method for direct arylation of diamondoids |
| US5874516A (en) * | 1995-07-13 | 1999-02-23 | Air Products And Chemicals, Inc. | Nonfunctionalized poly(arylene ethers) |
| JPH10130371A (ja) * | 1996-11-01 | 1998-05-19 | Nippon Kayaku Co Ltd | アダマンタン類、これらを含有する熱可塑性樹脂及びこれらを含有する熱硬化性樹脂組成物 |
| EP2256133B1 (en) * | 1997-01-08 | 2016-12-14 | Sigma-Aldrich Co. LLC | Bioconjugation of macromolecules |
| US6124421A (en) * | 1997-12-12 | 2000-09-26 | Alliedsignal Inc. | Poly(arylene ether) compositions and methods of manufacture thereof |
| US6303733B1 (en) * | 1997-12-12 | 2001-10-16 | Alliedsignal Inc. | Poly(arylene ether) homopolymer compositions and methods of manufacture thereof |
| US6172128B1 (en) * | 1999-04-09 | 2001-01-09 | Honeywell International Inc. | Nanoporous polymers crosslinked via cyclic structures |
| JP2003520864A (ja) * | 1999-04-09 | 2003-07-08 | アライドシグナル・インコーポレイテツド | ナノ多孔質薄膜構造への前駆体として架橋に用いられる反応性基を有する骨格を持ったポリマー |
| US6156812A (en) * | 1999-04-09 | 2000-12-05 | Honeywell International Inc. | Nanoporous material fabricated using polymeric template strands |
| JP4211161B2 (ja) * | 1999-11-09 | 2009-01-21 | Ｊｓｒ株式会社 | ジイン含有（共）重合体、その製造方法及び硬化膜 |
| JP4325046B2 (ja) * | 1999-11-09 | 2009-09-02 | Ｊｓｒ株式会社 | 膜形成用組成物、膜の形成方法、及び膜 |
| JP3442049B2 (ja) * | 2000-03-29 | 2003-09-02 | 住友ベークライト株式会社 | 耐熱性樹脂前駆体、耐熱性樹脂及び絶縁膜並びに半導体装置 |
| US6380270B1 (en) * | 2000-09-26 | 2002-04-30 | Honeywell International Inc. | Photogenerated nanoporous materials |
-
2000
- 2000-04-07 US US09/545,058 patent/US6509415B1/en not_active Expired - Fee Related
-
2001
- 2001-04-06 JP JP2001575466A patent/JP4795607B2/ja not_active Expired - Fee Related
- 2001-04-06 AT AT01928386T patent/ATE386758T1/de not_active IP Right Cessation
- 2001-04-06 CN CNB018074413A patent/CN1227276C/zh not_active Expired - Fee Related
- 2001-04-06 WO PCT/US2001/011273 patent/WO2001078110A2/en not_active Ceased
- 2001-04-06 DE DE60132883T patent/DE60132883T2/de not_active Expired - Lifetime
- 2001-04-06 HK HK03106542.7A patent/HK1054398A1/zh unknown
- 2001-04-06 KR KR1020027013423A patent/KR100823777B1/ko not_active Expired - Fee Related
- 2001-04-06 AU AU2001255248A patent/AU2001255248A1/en not_active Abandoned
- 2001-04-06 EP EP01928386A patent/EP1274755B1/en not_active Expired - Lifetime
-
2002
- 2002-11-12 US US10/293,024 patent/US6849696B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| WO2001078110A2 (en) | 2001-10-18 |
| EP1274755A4 (en) | 2004-05-12 |
| WO2001078110A3 (en) | 2002-03-07 |
| EP1274755A2 (en) | 2003-01-15 |
| JP4795607B2 (ja) | 2011-10-19 |
| KR20020091181A (ko) | 2002-12-05 |
| HK1054398A1 (zh) | 2003-11-28 |
| DE60132883D1 (de) | 2008-04-03 |
| US6849696B2 (en) | 2005-02-01 |
| JP2003530464A (ja) | 2003-10-14 |
| US20030187139A1 (en) | 2003-10-02 |
| ATE386758T1 (de) | 2008-03-15 |
| CN1420899A (zh) | 2003-05-28 |
| EP1274755B1 (en) | 2008-02-20 |
| KR100823777B1 (ko) | 2008-04-21 |
| WO2001078110B1 (en) | 2002-05-16 |
| US6509415B1 (en) | 2003-01-21 |
| AU2001255248A1 (en) | 2001-10-23 |
| CN1227276C (zh) | 2005-11-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE60132883T2 (de) | Organische dielektrika mit niedriger dielektrizitätskonstante basierend auf käfig-ähnlichen strukturen | |
| DE69930874T2 (de) | Eine zusammensetzung enthaltend einen vernetzbaren matrixpercursor und eine porenstruktur bildendes material und eine daraus hergestellte poröse matrix | |
| DE69913011T2 (de) | Funktionelle Gruppen für die Vernetzung von Polymeren | |
| DE69220385T2 (de) | Verdichtung von strukturgebilden mit benzoxazinen | |
| DE1954233A1 (de) | Bildung einer hydrolysebestaendigen Verbindung zwischen Glas und Polytetrafluoraethylen | |
| DE2551869B2 (de) | Verfahren zur Herstellung eines Copolymeren aus einem Polyimidoligomeren | |
| DE2316579A1 (de) | Vorpolymere | |
| EP0332012B1 (de) | Hochtemperaturbeständige Polyarylethersulfon-/Polyaryletherketon-Formmassen mit verbesserter Phasenbindung | |
| DE2316580B2 (de) | In Polysulfone bzw. Polyäther thermisch härtbare Vorpolymere | |
| KR20040016843A (ko) | 케이지형 구조에 기초한 저유전율 유기 유전체 | |
| DE2136747A1 (de) | Thermoplastisches Harzgemisch | |
| DE3785432T2 (de) | Kunstharzzusammensetzung. | |
| EP0855430B1 (de) | Thermoplastische Formmassen | |
| DE69015768T2 (de) | Expandierte Materialien auf Basis von Nadimidharz. | |
| EP0381172B1 (de) | Homogen gemischte Legierungen aus aromatischen Polyamiden und Poly-N-Vinylpyrrolidon, Verfahren zu ihrer Herstellung und ihre Verwendung | |
| DE19532195B4 (de) | Elektrische Widerstandszusammensetzung und elektrisches Widerstandsmaterial | |
| EP0604881B1 (de) | Homogene Polymerlegierungen auf der Basis von sulfonierten, aromatischen Polyetherketonen | |
| DE3309075A1 (de) | Verfahren zur herstellung von aromatischen polyketonen | |
| DE2208212A1 (de) | Verfahren zur Herstellung von PoIyacetylenfasern | |
| EP0249715B1 (de) | Schlagzähe Polyester-Formmassen | |
| DE19606959A1 (de) | Faserpulp, Verfahren zu dessen Herstellung und dessen Verwendung | |
| DE69431649T2 (de) | Verfahren zur Herstellung von molekularen Verbundmaterialien, die ein steifes aromatisches Polymer enthalten | |
| DE2162159A1 (de) | Verfahren zur Herstellung verstärkter Polyamid-Form- und Preßharze | |
| DE4229743A1 (de) | Quellfähige, vernetzte, unschmelzbare Polycarbosilane | |
| EP0336159A1 (de) | Hochtemperaturbeständige Cyanophenyleneinheiten gebunden enthaltende Polyarylenethersulfon-Blockcopolykondensate, Verfahren zu ihrer Herstellung und ihre Verwendung |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition |