AU2001255248A1 - Low dielectric constant organic dielectrics based on cage-like structures - Google Patents

Low dielectric constant organic dielectrics based on cage-like structures

Info

Publication number
AU2001255248A1
AU2001255248A1 AU2001255248A AU5524801A AU2001255248A1 AU 2001255248 A1 AU2001255248 A1 AU 2001255248A1 AU 2001255248 A AU2001255248 A AU 2001255248A AU 5524801 A AU5524801 A AU 5524801A AU 2001255248 A1 AU2001255248 A1 AU 2001255248A1
Authority
AU
Australia
Prior art keywords
dielectric constant
low dielectric
cage
structures
constant organic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001255248A
Other languages
English (en)
Inventor
Emma Brouk
Boris Korolev
Kreisler Lau
Roger Leung
Feng Quan Liu
Ruslan Zherebin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
Honeywell International Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honeywell International Inc filed Critical Honeywell International Inc
Publication of AU2001255248A1 publication Critical patent/AU2001255248A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/24—Crosslinking, e.g. vulcanising, of macromolecules
    • C08J3/246—Intercrosslinking of at least two polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F257/00—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
    • C08F257/02—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00 on to polymers of styrene or alkyl-substituted styrenes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L51/003—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained by reactions only involving unsaturated carbon-to-carbon bonds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/902—Specified use of nanostructure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/963—Miscellaneous

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Formation Of Insulating Films (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Organic Insulating Materials (AREA)
  • Rolling Contact Bearings (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Polyethers (AREA)
  • Micromachines (AREA)
  • Laminated Bodies (AREA)
AU2001255248A 2000-04-07 2001-04-06 Low dielectric constant organic dielectrics based on cage-like structures Abandoned AU2001255248A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09545058 2000-04-07
US09/545,058 US6509415B1 (en) 2000-04-07 2000-04-07 Low dielectric constant organic dielectrics based on cage-like structures
PCT/US2001/011273 WO2001078110A2 (en) 2000-04-07 2001-04-06 Low dielectric constant organic dielectrics based on cage-like structures

Publications (1)

Publication Number Publication Date
AU2001255248A1 true AU2001255248A1 (en) 2001-10-23

Family

ID=24174726

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001255248A Abandoned AU2001255248A1 (en) 2000-04-07 2001-04-06 Low dielectric constant organic dielectrics based on cage-like structures

Country Status (10)

Country Link
US (2) US6509415B1 (enExample)
EP (1) EP1274755B1 (enExample)
JP (1) JP4795607B2 (enExample)
KR (1) KR100823777B1 (enExample)
CN (1) CN1227276C (enExample)
AT (1) ATE386758T1 (enExample)
AU (1) AU2001255248A1 (enExample)
DE (1) DE60132883T2 (enExample)
HK (1) HK1054398A1 (enExample)
WO (1) WO2001078110A2 (enExample)

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US7049005B2 (en) * 2001-05-30 2006-05-23 Honeywell International Inc. Organic compositions
US6740685B2 (en) * 2001-05-30 2004-05-25 Honeywell International Inc. Organic compositions
US20040247896A1 (en) * 2001-12-31 2004-12-09 Paul Apen Organic compositions
AU2003202905A1 (en) * 2002-01-08 2003-07-24 Honeywell International Inc. Organic composition
EP1466356A2 (en) * 2002-01-15 2004-10-13 Honeywell International Inc. Organic compositions
US7060204B2 (en) * 2002-04-29 2006-06-13 Honeywell International Inc. Organic compositions
US6855738B2 (en) * 2003-06-06 2005-02-15 Dow Global Technologies Inc. Nanoporous laminates
US7488565B2 (en) * 2003-10-01 2009-02-10 Chevron U.S.A. Inc. Photoresist compositions comprising diamondoid derivatives
US7208243B2 (en) * 2004-12-01 2007-04-24 Toyota Technical Center Usa, Inc. Proton exchange membranes using cycloaddition reaction between azide and alkyne containing components
KR20060090483A (ko) * 2005-02-07 2006-08-11 삼성코닝 주식회사 풀러렌을 포함하는 저유전 박막 형성용 조성물, 이를이용한 저유전 박막 및 저유전 박막의 제조방법
US7531209B2 (en) 2005-02-24 2009-05-12 Michael Raymond Ayers Porous films and bodies with enhanced mechanical strength
JP4516857B2 (ja) * 2005-02-28 2010-08-04 富士フイルム株式会社 カゴ構造を有する重合体、それを含む膜形成用組成物、絶縁膜および電子デバイス
JP2006253577A (ja) * 2005-03-14 2006-09-21 Fuji Photo Film Co Ltd 絶縁膜、その製造方法及び該絶縁膜を有するデバイス
JP2006291160A (ja) * 2005-03-14 2006-10-26 Fuji Photo Film Co Ltd 膜形成用組成物、それを用いた絶縁膜および電子デバイス
JP4368319B2 (ja) * 2005-03-14 2009-11-18 富士フイルム株式会社 絶縁膜とそれを製造する方法、およびそれを用いた電子デバイス
JP2006253573A (ja) * 2005-03-14 2006-09-21 Fuji Photo Film Co Ltd 絶縁膜とそれを製造する方法、およびそれを用いた電子デバイス
JP4542927B2 (ja) * 2005-03-17 2010-09-15 富士フイルム株式会社 膜形成用組成物、該組成物から得られた絶縁膜およびそれを有する電子デバイス
US7432133B2 (en) * 2005-10-24 2008-10-07 Freescale Semiconductor, Inc. Plastic packaged device with die interface layer
US20070090545A1 (en) * 2005-10-24 2007-04-26 Condie Brian W Semiconductor device with improved encapsulation
US7435625B2 (en) * 2005-10-24 2008-10-14 Freescale Semiconductor, Inc. Semiconductor device with reduced package cross-talk and loss
JP2007161779A (ja) * 2005-12-09 2007-06-28 Fujifilm Corp 膜形成用組成物
ATE556118T1 (de) * 2006-03-29 2012-05-15 Sumitomo Bakelite Co Harzzusammensetzung, lack, harzfolie und halbleitervorrichtung mit der harzfolie
WO2007143028A2 (en) 2006-05-31 2007-12-13 Roskilde Semiconductor Llc Low dielectric constant materials prepared from soluble fullerene clusters
WO2007143026A2 (en) 2006-05-31 2007-12-13 Roskilde Semiconductor Llc Linked periodic networks of alternating carbon and inorganic clusters for use as low dielectric constant materials
US7883742B2 (en) 2006-05-31 2011-02-08 Roskilde Semiconductor Llc Porous materials derived from polymer composites
US7875315B2 (en) 2006-05-31 2011-01-25 Roskilde Semiconductor Llc Porous inorganic solids for use as low dielectric constant materials
JP5134233B2 (ja) * 2006-11-29 2013-01-30 出光興産株式会社 アダマンタン誘導体、その製造方法及びアダマンタン誘導体を含む樹脂組成物
US20080173541A1 (en) * 2007-01-22 2008-07-24 Eal Lee Target designs and related methods for reduced eddy currents, increased resistance and resistivity, and enhanced cooling
US20090026924A1 (en) * 2007-07-23 2009-01-29 Leung Roger Y Methods of making low-refractive index and/or low-k organosilicate coatings
US8702919B2 (en) * 2007-08-13 2014-04-22 Honeywell International Inc. Target designs and related methods for coupled target assemblies, methods of production and uses thereof
CN101219934B (zh) * 2008-01-25 2010-06-02 吉林大学 4,8-二(1-金刚烷基)-1,5-萘二酚、制备方法及用于合成聚合物材料
JPWO2012111314A1 (ja) * 2011-02-18 2014-07-03 出光興産株式会社 電子素子用絶縁材料形成用組成物、電子素子用絶縁材料、電子素子及び薄膜トランジスタ
CN105152881B (zh) * 2015-06-23 2018-06-29 复旦大学 含金刚烷与六氟环丁烷结构的苯并环丁烯单体、其制备方法及应用
CN109294203B (zh) * 2018-10-10 2021-04-09 湖南七纬科技有限公司 一种新能源汽车动力电池用阻燃防火材料及其制备方法

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Also Published As

Publication number Publication date
WO2001078110A2 (en) 2001-10-18
EP1274755A4 (en) 2004-05-12
WO2001078110A3 (en) 2002-03-07
EP1274755A2 (en) 2003-01-15
JP4795607B2 (ja) 2011-10-19
KR20020091181A (ko) 2002-12-05
HK1054398A1 (zh) 2003-11-28
DE60132883D1 (de) 2008-04-03
US6849696B2 (en) 2005-02-01
JP2003530464A (ja) 2003-10-14
US20030187139A1 (en) 2003-10-02
DE60132883T2 (de) 2009-03-05
ATE386758T1 (de) 2008-03-15
CN1420899A (zh) 2003-05-28
EP1274755B1 (en) 2008-02-20
KR100823777B1 (ko) 2008-04-21
WO2001078110B1 (en) 2002-05-16
US6509415B1 (en) 2003-01-21
CN1227276C (zh) 2005-11-16

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