KR100823777B1 - 케이지형 구조에 기초한 저유전율 유기 유전체 - Google Patents

케이지형 구조에 기초한 저유전율 유기 유전체 Download PDF

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KR100823777B1
KR100823777B1 KR1020027013423A KR20027013423A KR100823777B1 KR 100823777 B1 KR100823777 B1 KR 100823777B1 KR 1020027013423 A KR1020027013423 A KR 1020027013423A KR 20027013423 A KR20027013423 A KR 20027013423A KR 100823777 B1 KR100823777 B1 KR 100823777B1
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dielectric constant
cage structure
backbones
cage
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KR20020091181A (ko
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크라이슬러 라우
펭 콴 리우
보리스 코로레브
엠마 브룩
루슬란 제레빈
로저 륭
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허니웰 인터내셔날 인코포레이티드
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/24—Crosslinking, e.g. vulcanising, of macromolecules
    • C08J3/246—Intercrosslinking of at least two polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F257/00—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
    • C08F257/02—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00 on to polymers of styrene or alkyl-substituted styrenes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L51/003—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained by reactions only involving unsaturated carbon-to-carbon bonds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/902—Specified use of nanostructure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/963—Miscellaneous

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Formation Of Insulating Films (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Organic Insulating Materials (AREA)
  • Polyethers (AREA)
  • Rolling Contact Bearings (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Laminated Bodies (AREA)
  • Micromachines (AREA)
KR1020027013423A 2000-04-07 2001-04-06 케이지형 구조에 기초한 저유전율 유기 유전체 Expired - Fee Related KR100823777B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/545,058 US6509415B1 (en) 2000-04-07 2000-04-07 Low dielectric constant organic dielectrics based on cage-like structures
US09/545,058 2000-04-07

Publications (2)

Publication Number Publication Date
KR20020091181A KR20020091181A (ko) 2002-12-05
KR100823777B1 true KR100823777B1 (ko) 2008-04-21

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Country Status (10)

Country Link
US (2) US6509415B1 (enExample)
EP (1) EP1274755B1 (enExample)
JP (1) JP4795607B2 (enExample)
KR (1) KR100823777B1 (enExample)
CN (1) CN1227276C (enExample)
AT (1) ATE386758T1 (enExample)
AU (1) AU2001255248A1 (enExample)
DE (1) DE60132883T2 (enExample)
HK (1) HK1054398A1 (enExample)
WO (1) WO2001078110A2 (enExample)

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EP1463770B1 (en) * 2002-01-08 2007-07-04 Honeywell International Inc. Organic composition
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US7060204B2 (en) * 2002-04-29 2006-06-13 Honeywell International Inc. Organic compositions
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US7488565B2 (en) * 2003-10-01 2009-02-10 Chevron U.S.A. Inc. Photoresist compositions comprising diamondoid derivatives
US7208243B2 (en) * 2004-12-01 2007-04-24 Toyota Technical Center Usa, Inc. Proton exchange membranes using cycloaddition reaction between azide and alkyne containing components
KR20060090483A (ko) * 2005-02-07 2006-08-11 삼성코닝 주식회사 풀러렌을 포함하는 저유전 박막 형성용 조성물, 이를이용한 저유전 박막 및 저유전 박막의 제조방법
US7531209B2 (en) 2005-02-24 2009-05-12 Michael Raymond Ayers Porous films and bodies with enhanced mechanical strength
JP4516857B2 (ja) * 2005-02-28 2010-08-04 富士フイルム株式会社 カゴ構造を有する重合体、それを含む膜形成用組成物、絶縁膜および電子デバイス
JP2006291160A (ja) * 2005-03-14 2006-10-26 Fuji Photo Film Co Ltd 膜形成用組成物、それを用いた絶縁膜および電子デバイス
JP2006253573A (ja) * 2005-03-14 2006-09-21 Fuji Photo Film Co Ltd 絶縁膜とそれを製造する方法、およびそれを用いた電子デバイス
JP4368319B2 (ja) * 2005-03-14 2009-11-18 富士フイルム株式会社 絶縁膜とそれを製造する方法、およびそれを用いた電子デバイス
JP2006253577A (ja) * 2005-03-14 2006-09-21 Fuji Photo Film Co Ltd 絶縁膜、その製造方法及び該絶縁膜を有するデバイス
JP4542927B2 (ja) * 2005-03-17 2010-09-15 富士フイルム株式会社 膜形成用組成物、該組成物から得られた絶縁膜およびそれを有する電子デバイス
US20070090545A1 (en) * 2005-10-24 2007-04-26 Condie Brian W Semiconductor device with improved encapsulation
US7435625B2 (en) * 2005-10-24 2008-10-14 Freescale Semiconductor, Inc. Semiconductor device with reduced package cross-talk and loss
US7432133B2 (en) * 2005-10-24 2008-10-07 Freescale Semiconductor, Inc. Plastic packaged device with die interface layer
JP2007161779A (ja) * 2005-12-09 2007-06-28 Fujifilm Corp 膜形成用組成物
ATE556118T1 (de) * 2006-03-29 2012-05-15 Sumitomo Bakelite Co Harzzusammensetzung, lack, harzfolie und halbleitervorrichtung mit der harzfolie
WO2007143025A2 (en) 2006-05-31 2007-12-13 Roskilde Semiconductor Llc Porous inorganic solids for use as low dielectric constant materials
WO2007143026A2 (en) 2006-05-31 2007-12-13 Roskilde Semiconductor Llc Linked periodic networks of alternating carbon and inorganic clusters for use as low dielectric constant materials
WO2007143029A1 (en) 2006-05-31 2007-12-13 Roskilde Semiconductor Llc Porous materials derived from polymer composites
US7790234B2 (en) 2006-05-31 2010-09-07 Michael Raymond Ayers Low dielectric constant materials prepared from soluble fullerene clusters
JP5134233B2 (ja) 2006-11-29 2013-01-30 出光興産株式会社 アダマンタン誘導体、その製造方法及びアダマンタン誘導体を含む樹脂組成物
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Publication number Publication date
ATE386758T1 (de) 2008-03-15
US6849696B2 (en) 2005-02-01
DE60132883T2 (de) 2009-03-05
US20030187139A1 (en) 2003-10-02
JP2003530464A (ja) 2003-10-14
CN1420899A (zh) 2003-05-28
AU2001255248A1 (en) 2001-10-23
JP4795607B2 (ja) 2011-10-19
EP1274755A2 (en) 2003-01-15
EP1274755B1 (en) 2008-02-20
US6509415B1 (en) 2003-01-21
DE60132883D1 (de) 2008-04-03
WO2001078110A2 (en) 2001-10-18
HK1054398A1 (zh) 2003-11-28
CN1227276C (zh) 2005-11-16
EP1274755A4 (en) 2004-05-12
WO2001078110B1 (en) 2002-05-16
KR20020091181A (ko) 2002-12-05
WO2001078110A3 (en) 2002-03-07

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